From Fused Or Bridged Ring Containing Monomer Patents (Class 526/280)
-
Patent number: 6538087Abstract: The present invention relates to polymer compositions and methods of polymerizing such compositions. Furthermore, the present invention relates to polymer compositions that are useful in forming waveguides and to methods for making waveguides using such polymer compositions.Type: GrantFiled: July 27, 2001Date of Patent: March 25, 2003Assignee: Promerus, LLCInventors: Xiao-Mei Zhao, Ramakrishna Ravikiran, Phillip S. Neal, Robert A. Shick, Larry F. Rhodes, Andrew Bell
-
Publication number: 20030054285Abstract: A polymer for a chemically amplified negative photoresist and a photoresist composition are provided.Type: ApplicationFiled: March 7, 2002Publication date: March 20, 2003Inventors: Beom-Wook Lee, Ik-Chul Lim, Seung-Joon Yoo
-
Patent number: 6525153Abstract: Polymers comprising polycyclic repeating units containing pendant anhydride moieties are disclosed. The polymer can be polymerized from polycycloolefins containing pendant anhydride moieties in the presence of a nickel containing single component catalyst. In optional embodiments the polycycloolefin monomer containing the pendant anhydride functionality can be copolymerized with other polycycloolefin monomers that contain pendant functional groups to yield random copolymer products.Type: GrantFiled: March 9, 2000Date of Patent: February 25, 2003Assignees: Sumitomo Bakelite Co., Ltd., International Business Machines Corp.Inventors: Saikumar Jayaraman, Brian L. Goodall, Richard Vicari, John-Henry Lipian, Robert David Allen, Juliann Opitz, Thomas I. Wallow
-
Publication number: 20030027962Abstract: An in-situ method for performing organic metathesis polymer chemistry in the solid state includes the step of providing an organic monomer and a catalyst, the catalyst for driving a metathesis polymerization reaction of the monomer. The organic monomer can be provided as a liquid monomer. The reaction produces reaction products including a polymeric end product and at least one volatile reaction product. At least a portion of the volatile reaction product is removed during the reaction to favor formation of the reaction product. Significantly, the reaction is performed at a temperature being below an average melting point of the polymeric end product such that at least a portion of the reaction is performed in the solid phase.Type: ApplicationFiled: August 1, 2002Publication date: February 6, 2003Inventors: Kenneth B. Wagener, Stephen E. Lehman, Garrett W. Oakley, Jason A. Smith
-
Publication number: 20020197411Abstract: A refinish basecoat composition includes at least one pigment and an hydroxyl-functional acrylic polymer. The acrylic polymer has a number average molecular weight of at least about 6000 and is polymerized using at least about 45% by weight cycloaliphatic monomer, based on total monomer weight polymerized. A mixer system that can be used to prepare the refinish basecoat has a plurality of color components, each independently including at least one pigment dispersed by the hydroxyl-functional acrylic polymer, and a pigment-free component containing the hydroxyl-functional acrylic polymer.Type: ApplicationFiled: June 21, 2001Publication date: December 26, 2002Inventors: Emerson Keith Colyer, Douglas H. Larrow
-
Patent number: 6497939Abstract: A flat plate made of a cycloolefin polymer comprising at least 30% by weight, based on the cyclopolefin polymer, of repeating units (A) having an alicyclic structure. The repeating units (A) comprises at least 30% by weight, based on the repeating units (A), of repeating units (A-i) having no norbornane structure. The cycloolefin polymer has a weight average molecular weight of 5,000 to 50,000. The flat plate is especially useful as a light guide plate.Type: GrantFiled: February 3, 1999Date of Patent: December 24, 2002Assignee: Nippon Zeon Co., Ltd.Inventors: Kazuyuki Obuchi, Teruhiko Suzuki, Kenji Otoi
-
Patent number: 6495273Abstract: A light-emitting polymer and its preparation method, the polymer being excellent in electron injection and transport ability as well as hole injection and transport ability in an EL device, the EL device manufactured from the polymer being also emittable in the blue emission region, in which the EL device from an inorganic material is not mostly emittable. The light-emitting polymer of the invention is an alternated copolymer having repeated units (arylenevinylene units) excellent in hole injection and transport ability and repeated units (fluorinated tetraphenyl units) excellent in electron injection and transport ability with alternated order, as shown in formula (II). An EL device manufactured from the light-emitting polymer, a fluorinated tetraphenyl derivative of formula (I), which is used as a monomer to prepare the light-emitting polymer, and their preparation methods.Type: GrantFiled: September 15, 1999Date of Patent: December 17, 2002Assignee: Electronics and Telecommunications Research InstituteInventors: Do Hoon Hwang, Tae Hyoung Zyung, Lee Mi Do, Hye Yong Chu
-
Patent number: 6482910Abstract: A polymer composition comprising a polynorbonene backbone and pendant cyclotriphosphazene groups has been developed. The pendant cyclotriphosphazene group can have various substituents such as C1-C10 alkyl, C1-C10 haloalkyl, C3-C6 cycloalkyl, phenyl, substituted phenyl, aryl, —(CH2CH2OCH2CH2)nOCH3 in which n is a positive integer, aminoalkyl, alkoxyalkyl, phenoxyalkyl, aryloxyalkyl and amidoalkyl. The polynorbonene backbone can have substituents such as H, CH3, X which is a halo group, and C2-C6 alkyl, C3-C6 cycloalkyl, C2-C6 alkoxy, phenoxy, and aryloxy. In a preferred embodiment, the pendant triphosphazene group can have either —CH2CF3, phenyl, 4-ethylcarboxylatophenyl, —CH2CH3, or —CH2CH2OCH2CH2OCH3 while the polynorbonene backbone can have H and low alkyl groups. The polyphosphazene compositions can be prepared readily via ring-opening-metathesis-polymerization of an olefin having norbornene structure with pendant cyclotriphosphazene groups.Type: GrantFiled: August 23, 2000Date of Patent: November 19, 2002Assignee: The Penn State Research FoundationInventors: Harry R. Allcock, Walter R. Laredo
-
Patent number: 6458901Abstract: A propylene copolymer comprising propylene, at least one olefin selected from the group consisting of olefins having 2 to 20 carbon atoms except propylene, and a cyclic olefin, wherein the total number of carbon atoms of the monomers except the cyclic olefin is at least 7. This copolymer is mixed with a thermoplastic resin such as polypropylene to provide a thermoplastic resin composition having excellent flexibility, transparency, resistance to whitening on bending, scratch resistance and heat resistance.Type: GrantFiled: May 12, 2000Date of Patent: October 1, 2002Assignee: Sumitomo Chemical Company, LimitedInventors: Keisaku Yamamoto, Hirofumi Johoji, Hidetake Hozumi
-
Publication number: 20020132911Abstract: Soluble poly(bis-9,9′-fluorenes) comprise identical or different structural repeating units of the formula 1, 1Type: ApplicationFiled: March 14, 2002Publication date: September 19, 2002Inventors: Ralf-Roman Rietz, Wolfgang Wernet
-
Publication number: 20020090452Abstract: An organic anti-reflective polymer having the following Formula 1, its preparation method, an anti-reflective coating composition comprising the organic anti-reflective polymer and a preparation method of an anti-reflective coating made therefrom. The anti-reflective coating comprising the polymer eliminates standing waves caused by the optical properties of lower layers on the wafer and by the thickness changes of the photoresist, prevents back reflection and CD alteration caused by the diffracted and reflected light from such lower layers. Such advantages enable the formation of stable ultrafine patterns suitable for 64M, 256M, 1G, 4G, and 16G DRAM semiconductor devices, improving the production yields and controlling the k values. It is also possible to prevent undercutting due to an unbalanced acidity after finishing the coating.Type: ApplicationFiled: June 25, 2001Publication date: July 11, 2002Inventors: Sung-Eun Hong, Min-Ho Jung, Jae-Chang Jung, Geun-Su Lee, Ki-Ho Baik
-
Publication number: 20020090459Abstract: An aqueous acrylic emulsion polymer including, as copolymerized units, 70 to 99.5% by weight, based on dry polymer weight, monoethylenically unsaturated nonionic (meth)acrylic monomer and from 0.3 to 10% by weight, based on dry polymer weight, monoethylenically unsaturated acid monomer, wherein at least 40% by weight, based on dry polymer weight, of the emulsion polymer is formed by redox polymerization in the presence of 0.001 to 0.05 moles chain transfer agent per kg dry polymer weight is provided. An aqueous coating composition including the acrylic emulsion polymer, a method for improving the scrub resistance of a dry coating, a method for improving the adhesion of a dry coating, and a method for improving the adhesion of a dry coating to an alkyd substrate are provided.Type: ApplicationFiled: October 22, 2001Publication date: July 11, 2002Inventor: Ralph Craig Even
-
Patent number: 6409875Abstract: The invention discloses an adhesion agent composition comprising at least one C3-C200 olefin compound having at least one metathesis active double bond, wherein the olefin is substituted or unsubstituted; and at least one compatibilizing functionality for interacting with a substrate surface. The substrate surface can be any surface, for example, silicate glasses, silicate minerals, metals, metal alloys, ceramics, natural stones, plastics, carbon, silicon, and semiconductors. The invention also discloses articles of manufacture utilizing these adhesion agents as well as methods for adhering a polyolefin to a substrate surface.Type: GrantFiled: February 4, 2000Date of Patent: June 25, 2002Assignee: Materia, Inc.Inventors: Michael A. Giardello, Christopher M. Haar
-
Patent number: 6403239Abstract: This invention relates to (co)polymers which contain at least one repeat chain unit of the general formula (1) or (2) and optionally contain repeat units of the general formula (3) in which L1 and L2 mean a photoluminescent residue, wherein the proportion of structural units of the formulae (1) and/or (2) is in each case 0.5 to 100 mol. %, and (3) 0 to 99.5 mol. %, and the molar percentages add up to 100, to the use thereof for the production of electroluminescent devices and to the electroluminescent devices.Type: GrantFiled: May 8, 2001Date of Patent: June 11, 2002Assignee: Bayer AGInventors: Yun Chen, Rolf Wehrmann, Andreas Elschner, Ralf Dujardin
-
Publication number: 20020061420Abstract: An electroluminescent polymer represented by the following formula (1): 1Type: ApplicationFiled: November 7, 2001Publication date: May 23, 2002Applicant: Samsung SDI Co., Ltd.Inventors: Byung Hee Sohn, Kwang Yeon Lee
-
Patent number: 6388032Abstract: A cyclic olefin polymer having a small content of a catalyst residue, a production process for the same and use of the same as an optical material. Catalysts used for polymerization and/or hydrogenation reaction for forming the cyclic olefin polymer are decomposed efficiently by adding at least one compound selected from the group consisting of an &agr;-oxyacid and &bgr;-oxyacid having one hydroxyl group and one carboxyl group in the molecule and derivatives obtained by substituting hydroxyl group thereof by an alkoxyl group, and the decomposition products are removed by rendering them insoluble in a reaction solvent used for the polymerization and/or hydrogenation reaction and precipitating them efficiently.Type: GrantFiled: April 14, 2000Date of Patent: May 14, 2002Assignee: Teijin LimitedInventors: Michio Yamaura, Kiyonari Hashidzume, Hideaki Nitta, Masaki Takeuchi, Kaoru Iwata
-
Publication number: 20020051938Abstract: This invention relates to resins and photoresist compositions that comprise such resins. Preferred polymers of the invention comprise adjacent saturated carbon atoms, either integral or pendant to the polymer backbone, that have a substantially gauche conformation. Polymers of the invention are particularly useful as a resin binder component of chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm and preferably about 157 nm. In such short-wavelength imaging applications, polymers of the invention that have a population of dihedral angles of adjacent saturated carbon atoms that are enriched in substantially gauche conformations can provide reduced undesired absorbance of the high energy exposure radiation.Type: ApplicationFiled: September 8, 2001Publication date: May 2, 2002Applicant: Shipley Company, L.L.C.Inventors: Peter Trefonas, Gary N. Taylor, Charles R. Szmanda
-
Publication number: 20020051895Abstract: A fluorene-based polymer of the following Formula (I) and electroluminescent devices using the same.Type: ApplicationFiled: September 4, 2001Publication date: May 2, 2002Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KIST)Inventors: Hyun Nam Cho, Young Chul Kim, Jae-Min Hong, Jong-Bok Kim, Doo Kyung Moon, Young Sei Park, Ho Seong Nam
-
Patent number: 6380431Abstract: Fluorescent monomers are described and claimed.Type: GrantFiled: August 31, 1999Date of Patent: April 30, 2002Assignee: Nalco Chemical CompanyInventors: Wesley L. Whipple, Patrick G. Murray
-
Patent number: 6372930Abstract: Polymeric ligands, polymeric metallocenes, and processes for preparing same are provided. The process for preparing polymeric metallocenes comprises reacting a polymeric ligand, a transition metal compound, and an alkali metal compound. In one embodiment, a process for preparing polymeric ligands comprises reacting at least one bridged cyclopentadienyl-type monomer and an initiator under polymerization conditions. In another embodiment, a polymeric ligand is represented by the formula [Q′]n, wherein Q′ is a unit containing at least one bridged cyclopentadienyl-type group and wherein n is 1-5000.Type: GrantFiled: February 10, 2000Date of Patent: April 16, 2002Assignee: Phillips Petroleum CompanyInventors: Peter Schertl, Helmut G. Alt, M. Bruce Welch, Bernd Peifer, Syriac J. Palackal
-
Patent number: 6369181Abstract: The present invention relates to a copolymer resin for a photoresist used with far ultraviolet rays such as KrF or ArF.Type: GrantFiled: December 29, 1998Date of Patent: April 9, 2002Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
-
Patent number: 6365686Abstract: The invention relates to a method for producing a cycloolefin copolymer by polymerization of 0.1-99.9 wt. %, with respect to the total amount of monomers, of at least one polycyclic olefin, 0-99.9 wt. %, with respect to the total amount of monomers, of at least one monocyclic olefin, 0.1-99.9 wt. %, with respect to the total amount of monomers, of at least one acyclic 1-olefin, in the presence of a catalyst system consisting of at least one cocatalyst and at least one metal coordination complex with taut geometry.Type: GrantFiled: July 29, 1999Date of Patent: April 2, 2002Assignee: Ticona GmbHInventors: Alexandra Jacobs, Gerhard Fink, Dieter Ruchatz
-
Patent number: 6344286Abstract: A diacetylene-based polymer of the following formula (I): wherein, Ar represents a light emitting group. The present invention also provides an electroluminescence device having a structure of anode/luminescent layer/cathode added with a transfer layer and/or a reflection layer, if necessary, in which the luminescent layer is made of the diacetylene-based polymer containing the light emitting group. The polymer of the present invention can be easily blended with a variety of macromolecules for general use.Type: GrantFiled: August 19, 1999Date of Patent: February 5, 2002Assignees: Hanwha Chemical Corporation, Korea Institute of Science and TechnologyInventors: Chung Yup Kim, Hyun Nam Cho, Dong Young Kim, Young Chul Kim, Jae-Min Hong, Jai Kyeong Kim, Jae-Woong Yu
-
Patent number: 6323295Abstract: Composition comprising (a) catalytic amounts of a one-component catalyst for metathesis polymerization and (b) at least one polymer with strained cycloalkenylene radicals bonded to the polymer backbone via a divalent bridge group, alone or as a mixture with strained cycloolefins. The composition can be polymerized thermally or photochemically by metathesis polymerization and is suitable for the production of shaped articles, coatings and relief images. The polymers (b) are likewise claimed.Type: GrantFiled: August 6, 1997Date of Patent: November 27, 2001Assignee: Ciba Specialty Chemicals CorporationInventors: Andreas Mühlebach, Andreas Hafner, Paul Adriaan Van Der Schaaf
-
Patent number: 6310154Abstract: Solid acids are used as catalysts for the polymerization of a feed stream containing at least one of pure monomer, C5 monomers, and C9 monomers to produce hydrocarbon resins. Freely-associated water may be removed from the solid acid catalyst prior to use. Resins with softening points (Ring and Ball) in the range of about 5° C. to 170° C. can be prepared. These catalysts offer advantages over the traditional Friedel-Crafts polymerization catalysts since the acid sites are an integral part of the solid. The solid acid catalysts are relatively nonhazardous, reusable catalysts which eliminate or at least reduce contamination of the resulting resin products with acid residues or by-products.Type: GrantFiled: January 7, 1998Date of Patent: October 30, 2001Assignee: Eastman Chemical CompanyInventors: Laura M. Babcock, Dennis G. Morrell
-
Publication number: 20010026879Abstract: This invention relates to (co)polymers which contain at least one repeat chain unit of the general formula (1) or (2) and optionally contain repeat units of the general formula (3) 1Type: ApplicationFiled: May 8, 2001Publication date: October 4, 2001Inventors: Yun Chen, Rolf Wehrmann, Andreas Elschner, Ralf Dujardin
-
Patent number: 6291129Abstract: A monomer represented by the following general formula (m-1): wherein R is a group having an alicyclic skeleton, R2s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group, X1 is a bivalent organic group containing a heteroatom, j is an integer of 0 to 3, and R1 is a group selected from the following groups, a monovalent organic group having Si (R1-1), and —(X2)k—R4—(X3)m—C(R6)3 (R1-2), wherein X2 and X3 are a bivalent organic group containing a heteroatom, k and m are an integer of 0 to 3, R4 is a bivalent alkyl group, R6s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group.Type: GrantFiled: August 28, 1998Date of Patent: September 18, 2001Assignee: Kabushiki Kaisha ToshibaInventors: Naomi Shida, Toru Ushirogouchi, Koji Asakawa, Takeshi Okino, Shuji Hayase, Yoshihiko Nakano, Makoto Nakase
-
Patent number: 6281307Abstract: Composition comprising (a) catalytic amounts of a one-component catalyst for metathesis polymerization and (b) at least one polymer with strained cycloalkenylene radicals bonded in the polymer backbone, alone or as a mixture with strained cycloolefins. The composition can be polymerized thermally or photochemically by metathesis polymerization and is suitable for the production of shaped articles, coatings and relief images. The catalyst is selected from Ruthenium and Osmium compounds.Type: GrantFiled: July 31, 1997Date of Patent: August 28, 2001Assignee: Ciba Specialty Chemicals CorporationInventors: Andreas Mühlebach, Andreas Hafner, Paul Adriaan Van Der Schaaf
-
Patent number: 6277935Abstract: A solventless polymerizable composition comprising (a) at least one strained cycloolefin that is liquid or is meltable without decomposition, and (b) a catalytic amount of at least one compound of formula I or Ia or a mixture of compounds of formula I and Ia wherein Me is ruthenium or osmium; T1 and T2 are each independently of the other a tertiary phosphine or T1 and T2 together form a ditertiary diphosphine; T3 is hydrogen, C1-C12alkyl; C3-C8cycloalkyl, C3-C7heterocycloalkyl having one or two hetero atoms selected from the group —O—, —S— and —N—, C6-C14aryl, or C4-C15heteroaryl having from one to three hetero atoms selected from the group —O—, —S— and —N—, which are unsubstituted or substituted by C1-C4alkyl, C1-C4haloalkyl, C1-C4alkoxy, C6-C10aryl, C6-C10aryloxy, —NO2 or by halogen; T4 is C6-C16arene or C4-C15heteroarene each of which is unsubstituted or substituted by from one to three C1-C4alkyl, C1-C4haType: GrantFiled: April 13, 1998Date of Patent: August 21, 2001Assignee: Ciba Specialty Chemicals CorporationInventors: Andreas Hafner, Paul Adriaan Van Der Schaaf, Andreas Mühlebach
-
Patent number: 6248457Abstract: This invention relates to (co)polymers which contain at least one repeat chain unit of the general formula (1) or (2) and optionally contain repeat units of the general formula (3) in which L1 and L2 mean a photoluminescent residue, wherein the proportion of structural units of the formulae (1) and/or (2) is in each case 0.5 to 100 mol. %, and (3) 0 to 99.5 mol. %, and the molar percentages add up to 100, to the use thereof for the production of electroluminescent devices and to the electroluminescent devices.Type: GrantFiled: February 9, 1996Date of Patent: June 19, 2001Assignee: Bayer AGInventors: Yun Chen, Rolf Wehrmann, Andreas Elschner, Ralf Dujardin
-
Publication number: 20010003772Abstract: A polymer bearing specific cyclic silicon-containing groups is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching. The resist composition lends itself to micropatterning for the fabrication of VLSIs.Type: ApplicationFiled: December 1, 2000Publication date: June 14, 2001Inventors: Jun Hatakeyama, Takeshi Kinsho, Mutsuo Nakashima, Koji Hasegawa
-
Patent number: 6207779Abstract: The present invention provides a ring-opened polymer, which is prepared by reacting at least one pericyclic olefin elected from those represented by formulae (I) and (II) through ring-opening metathesis polymerization wherein A and B may be the same or different and are independently selected from the group consisting of halogen, hydrogen, C3-20 cyclic or pericyclic alkyl, C1-20 linear and branched alkyl, C6-20 aryl, C7-20 arylalkyl, C7-20 alkylaryl, silyl, alkylsilyl, germyl, alkylgermyl, alkoxycarbonyl, acyl, and a heterocylic group; or, A and B are linked together to form a C3-20 saturated or unsaturated cyclic hydrocarbon group or a substituted or unsubstituted heterocyclic group; C is selected from the group consisting of oxygen, sulfur, —CH2—, and —SiH2—, wherein each R1 is independently selected from C1-20 alkyl and phenyl; each R is independently selected from hydrogen, halogen, and C1-20 alkyl; and each n is an integer from 1 to 6Type: GrantFiled: December 17, 1998Date of Patent: March 27, 2001Assignees: Industrial Technology Research Institute, Everlight Chemical Industrial CorporationInventors: Sheng-Yueh Chang, Bang-Chein Ho, Jian-Hong Chen, Tai-Sheng Yeh, Jui-Fa Chang
-
Patent number: 6204347Abstract: A catalyst system for the ring-opening metathesis polymerization, which consists of at least two components (a) and (b), wherein (a) is a ruthenium compound of formula I or II RuX2(L1)m(L2)n(L3)o(L4)p (I), ARuX2(L1)r(L2)s (II), wherein L1, L2, L3 and L4 are each independently of the other C1-C18alkylcyanide, C8-C24-aralkylcyanide, tertiary amine, tertiary phosphine which does not contain any secondary alkyl or cycloalkyl radicals bound to the phosphorus atom, or phosphite, X is halogen, A is arene, m, n, o and p are integers from 0 to 4, where 2≦m+n+o+p≦4, r and s are integers from 0 to 2, where 1≦r+s≦2, and (b) is a tertiary phosphine containing at least one secondary alkyl radical or cycloalkyl radical bound to the phosphorus atom, is particularly suitable for the polymerization of strained cycloolefins by the RIM process.Type: GrantFiled: August 18, 1999Date of Patent: March 20, 2001Assignee: Ciba Specialty Chemicals CorporationInventors: Andreas Hafner, Paul Adriaan Van Der Schaaf, Andreas Mühlebach
-
Patent number: 6165672Abstract: The present invention relates to a novel maleimide- or alicyclic olefin-based monomer, a copolymer resin of these monomers and a photoresist using the copolymer resin. The maleimide-introduced copolymer resin according to the present invention can easily be copolymerized with alicyclic olefin unit, has a physical property capable of enduring in 2.38% TMAH developer and increases adhesion of ArF or KrF photoresist. The photoresist film using a copolymer resin according to the present invention can be applied to highly integrate semiconductor devices.Type: GrantFiled: September 14, 1998Date of Patent: December 26, 2000Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Jae Chang Jung, Keun Kyu Kong, Cheol Kyu Bok, Ki Ho Baik
-
Patent number: 6165573Abstract: The present invention provides a multi-layer laminate consisting essentially of:(A) a layer formed from an ethylene/cycloolefin random copolymer which is a copolymer of ethylene and a cycloolefin represented by a specific formula (e.g., tetracyclododecene), or a layer formed from a cycloolefin resin which is a graft modified product of the ethylene/cycloolefin random copolymer, or a layer formed from a cycloolefin resin composition comprising the cycloolefin resin and a polyolefin, and(B) a barrier layer consisting essentially of ethylene/vinyl alcohol copolymer, polyvinylidene chloride, or polyacrylonitrile, with the barrier layer having an oxygen permeability, as measured at 23.degree. C. and RH of 0%, of not more than 10 cc(STP).mm/m.sup.2.24 hr.atm; said multi-layer laminate having a moisture permeability of not more than 0.2 g.mm/m.sup.2.24 hr.atm and an oxygen permeability of not more than 5 cc(STP).mm/m.sup.2.24 hr.atm. This multi-layer laminate has excellent gas-barrier properties and high rigidity.Type: GrantFiled: December 31, 1996Date of Patent: December 26, 2000Assignee: Mitsui Petrochemical Industries LTDInventors: Toshiyuki Hirose, Shigetoshi Nishijima, Yohzoh Yamamoto, Hideshi Kawachi
-
Patent number: 6143472Abstract: This invention relates to a resist composition comprising a polymer containing, as a constituent unit, a monomer unit shown by the general formula [1a] ##STR1## (wherein X is a polycyclic hydrocarbon residue which may have a substituent, Z is a spacer or a direct bond, and R is a substituted alkyl or alkenyl group having one or two protected hydroxyl groups as substituent), a photosensitive compound which can generate an acid upon exposure to light and a solvent which can dissolve the polymer and the photosensitive compound, and a method for formation of a pattern using the said resist composition.The said resist composition shows high sensitivity and high resolution ability in which a polymer having high transmittance against deep-ultraviolet lights having a wavelength of 220 nm or less, particularly ArF excimer laser beams.Type: GrantFiled: November 18, 1998Date of Patent: November 7, 2000Assignees: Wako Pure Chemical Industries, Ltd., Matsushita Electric Industrial Co., Ltd.Inventors: Motoshige Sumino, Akiko Katsuyama
-
Patent number: 6114484Abstract: A method for the removal of metal cyanides or oxoanions from aqueous streams such as waste water streams with compounds containing 1,4-diazabicyclo[2.2.2]octane. Preferred compounds are polymers formed by free radical polymerization of N-4-vinyl benzyl-N.sup.1 -1,4-diazabicyclo[2.2.2]octane dichloride (VBBD) such as copolymers poly (VBBD/acrylamide) and poly (VBBD/dimethyl amino ethyl acrylate benzyl chloride quaternary salt. Poly(1,4-dimethylbenzyl-1,4-diazabicyclo[2.2.2]octane dichloride) for the same purposes is also disclosed.Type: GrantFiled: November 16, 1998Date of Patent: September 5, 2000Assignee: Nalco Chemical CompanyInventor: William J. Ward
-
Patent number: 6114463Abstract: The present invention relates to (co)polymers which contain at least one repeating structural chain unit of the general formula (1) and/or (2) and optionally repeating units of the general formula (3) ##STR1## in which L.sup.1 and L.sup.2, independently of each other, represent a photoluminescent grouping, a process for their preparation, their use in electroluminescent devices and the electroluminescent devices.Type: GrantFiled: August 11, 1997Date of Patent: September 5, 2000Assignee: Bayer AGInventors: Yun Chen, Burkhard Kohler, Rolf Wehrmann, Andreas Elschner, Ralf Dujardin
-
Patent number: 6100212Abstract: A catalyst composition for the polymerization of olefins is provided, which comprises the reaction product of a spirocycle, a complex of an atom selected from Groups 3-14 and the Lanthanides, and an activating cocatalyst.Type: GrantFiled: June 30, 1998Date of Patent: August 8, 2000Assignee: Union Carbide Chemicals & Plastics Technology CorporationInventor: Timothy Todd Wenzel
-
Patent number: 6072014Abstract: A process is provided for preparing polymer compositions which are multimodal in nature. The process involves contacting, under polymerization conditions, a selected addition polymerizable monomer with a metallocene catalyst having two or more distinct and chemically different active sites, and a catalyst activator.Type: GrantFiled: August 11, 1999Date of Patent: June 6, 2000Assignee: SRI InternationalInventor: Robert B. Wilson, Jr.
-
Patent number: 6057410Abstract: Polymeric ligands, polymeric metallocenes, and processes for preparing same are provided. The process for preparing polymeric metallocenes comprises reacting a polymeric ligand, a transition metal compound, and an alkali metal compound. In one embodiment, a process for preparing polymeric ligands comprises reacting at least one bridged cyclopentadienyl-type monomer and an initiator under polymerization conditions. In another embodiment, a polymeric ligand is represented by the formula [Q'].sub.n, wherein Q' is a unit containing at least one bridged cyclopentadienyl-type group and wherein n is 1-5000. In another embodiment, a polymeric metallocene is represented by the formula [Q"MX.sub.m ].sub.Type: GrantFiled: March 26, 1998Date of Patent: May 2, 2000Assignee: Phillips Petroleum CompanyInventors: Helmut G. Alt, Peter Schertl, Bernd Peifer, Syriac J. Palackal, M. Bruce Welch
-
Patent number: 6030255Abstract: An insulator for high frequency connectors which comprises a thermoplastic norbornene resin and has a voltage and standing wave ratio of 1.89 or less even in the high frequency band of 2-3 GHz, and a high frequency connector using the insulator.Type: GrantFiled: July 23, 1997Date of Patent: February 29, 2000Assignee: Nippon Zeon Co., Ltd.Inventors: Yuichiro Konishi, Hajime Tanisho, Yuji Koshima, Teiji Kohara
-
Patent number: 6025448Abstract: A gas phase fluidized bed process is described for producing ethylene polymers having improved processability and an MWD of less than about 2.9. Multiple reactors in series or parallel may be used to produce in-situ blended polymers. Each reactor can separately have a constrained geometry catalyst or a conventional Ziegler-Natta catalyst as needed for obtaining in-situ blended polymer with the desired properties as long as there is a constrained geometry catalyst in at least one reactor. Olefin polymers can be produced according to this invention which have low susceptibility to melt fracture, even under high shear stress conditions.Type: GrantFiled: June 3, 1996Date of Patent: February 15, 2000Assignee: The Dow Chemical CompanyInventors: Robert D. Swindoll, Bruce A. Story, Brian W. S. Kolthammer, Kevin P. Peil, David R. Wilson, James C. Stevens
-
Patent number: 6008306Abstract: Composition of (a) at least one strained cycloolefin and (b) a catalytic quantity of at least one divalent-cationic compound of ruthenium or osmium with a metal atom, to which are bound 1 to 3 tertiary phosphine ligands with, in the case of the ruthenium compounds, sterically exacting substituents, optionally non-photolabile neutral ligands and anions for charge balancing, with the proviso that in ruthenium (trisphenylphosphine)dihalides or hydride-halides the phenyl groups are substituted by C.sub.1 -C.sub.18 alkyl, C.sub.1 -C.sub.18 haloalkyl or C.sub.1 -C.sub.18 alkoxy. The composition is suitable for the production of molded parts of all kinds and of coatings.Type: GrantFiled: May 14, 1997Date of Patent: December 28, 1999Assignee: Ciba Specialty Chemicals CorporationInventors: Andreas Hafner, Paul Adriaan Van Der Schaaf, Andreas Muhlebach
-
Patent number: 5986030Abstract: A cationic water-soluble polymer comprising from 0.001 to 10 mole percent of a repeating mer unit represented by the formula ##STR1## wherein a is an integer of from 1 to 10, R.sub.1 is selected from the group consisting of hydrogen and methyl groups, R.sub.2 and R.sub.3 are methyl groups, fluor is a fluorescing moiety and X is selected from the group consisting of chloride, iodide and bromide ions and wherein the polymer also contains from 90 to 99.Type: GrantFiled: April 15, 1997Date of Patent: November 16, 1999Assignee: Nalco Chemical CompanyInventors: Patrick G. Murray, Wesley L. Whipple
-
Patent number: 5977393Abstract: The present invention generally relates to ruthenium and osmium carbene catalysts for use in olefin metathesis reactions. More particularly, the present invention relates to Schiff base derivatives of ruthenium and osmium carbene catalysts and methods for making the same. The inventive catalysts are generally prepared by the treatment of unmodified catalysts with the salts of the desired Schiff base ligands, in which an anionic and a neutral electron donating ligands of the unmodified catalysts are simultaneously replaced. The Schiff base derivatives of the ruthenium and osmium carbene catalysts show unexpectedly improved thermal stability while maintaining high metathesis activity, even in polar protic solvents. Although the inventive catalysts may be used in all metathesis reactions, use of these catalysts for ring-closing metathesis ("RCM") reactions is particularly preferred.Type: GrantFiled: November 12, 1998Date of Patent: November 2, 1999Assignee: California Institute of TechnologyInventors: Robert H. Grubbs, Sukbok Chang, LeRoy Jones, II, Chunming Wang
-
Patent number: 5973085Abstract: Compounds of the formula I(A).sub.n --B (I)in which A is the radical of a strained cycloolefin, B is a direct bond or an n-valent bridging group and n is an integer from 2 to 8, with the exception of 1,2-bisnorbornenyl-ethane and norbornenecarboxylic acid norbornenemethyl ester. The compounds of the formula I can be polymerized with one-component catalysts (ring-opening metathesis polymerization).Type: GrantFiled: May 14, 1997Date of Patent: October 26, 1999Assignee: Ciba Specialty Chemicals CorporationInventors: Andreas Muhlebach, Andreas Hafner, Paul Adriaan Van Der Schaaf
-
Patent number: 5948268Abstract: An agent for water treatment comprises a water-soluble polymer obtained by polymerizing a monomer component containing a water-soluble monomer capable of dissolving in water of 50.degree. C. in the amount of 1 weight % or more, having an ethylenically unsaturated group, and exhibiting fluorescence. The water-soluble polymer has a ratio of fluorescence intensity FL.sub.1 /FL.sub.2 larger than 1, wherein FL.sub.1 is an intensity of fluorescence obtained in dissolving a water-soluble polymer in a concentration of 10 ppm in pure water, and FL.sub.2 is an intensity of fluorescence obtained in dissolving phenol in a concentration of 0.1 ppm in pure water.Type: GrantFiled: August 9, 1996Date of Patent: September 7, 1999Assignees: Nippon Shokubai Co., Ltd., Kurita Water Industries, Ltd.Inventors: Shigeru Yamaguchi, Takashi Fujisawa
-
Patent number: 5916987Abstract: A sulfur-containing O-(meth)acrylate compound of the following formula (1) is useful as a starting material for a resin composition used in optical applications such as a lens; ##STR1## wherein R represents hydrogen atom or methyl group; 1 represents an integer from 1 to 3; B is ##STR2## n is 1 or 2, m is 1, 2 or 3 and A is selected from certain arylene, aralkylene, thioether, dithioether or thiopheneylene radicals.Type: GrantFiled: May 21, 1997Date of Patent: June 29, 1999Assignee: Mitsui Chemicals, Inc.Inventors: Seiichi Kobayashi, Nobuya Kawauchi, Toshiyuki Suzuki, Masao Imai, Kenichi Fujii
-
Patent number: RE36406Abstract: A process for producing a cycloolefin random copolymer, which comprises(1) copolymerizing (a) ethylene or both ethylene and an alpha-olefin having at least 3 carbon atoms with (b) a cycloolefin such as octahydronaphthalenes and bicyclo[2,2,1]hept-2-ene in the presence of (c) a catalyst formed from a soluble vanadium compound and an organoaluminum compound at least one of which has halogen, in (d) a liquid phase composed of a hydrocarbon medium to form a solution of a cycloolefin random copolymer, and(2) contacting the resulting copolymer solution with (e) an adsorbent containing a metal cation.Type: GrantFiled: December 9, 1993Date of Patent: November 23, 1999Assignee: Mitsui Chemicals, Inc.Inventors: Kotaroh Kishimura, Hideaki Yamaguchi, Syuji Minami