Abstract: Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof.

Abstract: Vinyl addition polymer compositions, methods for forming such compositions, methods for using such compositions to form microelectronic and optoelectronic devices are provided. The vinyl addition polymer encompassed by such compositions has a polymer backbone having two or more distinct types of repeat units derived from norbornene-type monomers independently selected from monomers of Formula I: wherein each of X, m, R1, R2, R3, and R4 is as defined herein and wherein a first type of repeat unit is derived from a glycidyl ether substituted norbornene monomer and a second type of repeat unit is derived from an aralkyl substituted norbornene monomer.

Abstract: Described is a cyclobutene polymer comprising: monomeric units of cyclobutene, said cyclobutene having at least one fused ring system substituted thereon, said polymer comprising not more than 10 mol percent ring-opened units of said cyclobutene; and said polymer having a molecular weight of at least 1,000; said polymer optionally copolymerized with a comonomer to form a copolymer therewith. Compositions thereof and methods of making the same are also described.

Abstract: An optical film comprising a thermoplastic resin, which is such that the slow axis direction in the film plane differs from the film tilt direction and the birefringence of a sliced section of the film that contains the tilt direction and the thickness direction in the plane varies in the thickness direction of the film.

Abstract: The present invention is directed generally to the use of propylene-based elastomers in articles. The propylene-based elastomers have isotactic polypropylene crystallinity, a melting point by DSC of 110° C. or less, a heat of fusion of from 5 to 50 J/g, and comprise at least 75 wt % propylene-derived units, at least 6 wt % ethylene-derived units, and optionally diene-derived units. The present invention is also directed to processes for making articles comprising propylene-based elastomers.

Abstract: A film comprising a norbornene (NB) compound addition polymer that is excellent in chemical resistance, optical properties and the like, has a high Tg, a low water absorption ratio and a low linear expansion coefficient, and is soluble in an ordinary solvent. The film comprising a NB compound addition polymer essentially consisting of repeating units derived from NB compound monomers, wherein the addition polymer has a specific Mw and has a sum of the units (A1) and (A2) of 70% by mol or more based on the total units, wherein the molar number of each unit satisfies the following equations: 70/30?[{(A1)+(A2)}/(B)]?100 and 10/90?(A1)/(A2)?98/2, or the addition polymer has a specific Mw and Mn and essentially consists of the units (A1) and (B), wherein the molar number of each unit satisfies the following equation: 70/30?[(A1)/(B)] ?98/2.

Abstract: Novel ester compounds having formulae (1) to (4) wherein A1 is a polymerizable functional group having a carbon-carbon double bond, A2 is oxygen, methylene or ethylene, R1 is a monovalent hydrocarbon group, R2 is H or a monovalent hydrocarbon group, any pair of R1 and/or R2 may form an aliphatic hydrocarbon ring, R3 is a monovalent hydrocarbon group, and n is 0 to 6 are polymerizable into polymers. Resist compositions comprising the polymers as a base resin are thermally stable and sensitive to high-energy radiation, have excellent sensitivity and resolution, and lend themselves to micropatterning with electron beam or deep-UV.

Abstract: The present invention relates to a catalyst system for preparing a cyclic olefin addition polymer, a method for preparing the catalyst system and a cyclic olefin addition polymer prepared by the method, and more particularly to the method comprising the steps of contacting some content of norbornene-based monomer having a specific polar functional group with a catalyst system comprising a) a Group X transition metal compound; b) a compound comprising a neutral Group XV electron donor ligand having a cone angle of at least 160°; and c) a salt capable of offering an anion that can be weakly coordinated to the transition metal of the a) the Group X transition metal compound.

Abstract: Disclosed is a method for producing a norbornene monomer composition, a norbornene polymer produced using the norbornene monomer composition, an optical film including the norbornene polymer, and a method for producing the norbornene polymer. The method includes reacting a reaction solution that contains cyclopentadiene, dicyclopentadiene, or a mixture of cyclopentadiene and dicyclopentadiene, an acetate compound, and a solvent so that a content of an exo isomer is 50 mol % or more. Variables such as a reaction temperature, a reaction time, a molar ratio between reactants, and addition of a solvent are controlled so that the exo isomer is contained in content of 50 mol % or more. Accordingly, it is possible to industrially produce an acetate norbornene addition polymer by using the acetate norbornene monomer composition containing the exo isomer in content of 50 mol % or more.

Abstract: Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions.

Abstract: A production method of an objective lens for optical pickup apparatus having a numerical aperture NA of image side of 0.80 to 0.90 is disclosed. The method includes steps of molding resin composition containing copolymer of ?-olefin and a cyclic olefin represented by Formula (I) or (II) to form lens shape, and thermally processing the molded product under a condition at a temperature between Tg ?45° C. and Tg ?15° C. for 12 to 168 hours, wherein the Formula (I) and (II) is detailed in the specification.

Abstract: A polymerizable composition is obtained by mixing a metathesis polymerization catalyst including benzylidene(1,3-dimethyl-4-imidazolidin-2-ylidene)(tricyclohexylphosphine)ruthenium dichloride, a cycloolefin monomer such as 2-norbornene or tetracyclo[6.2.1.13,6.02,7]dodec-4-ene, a chain transfer agent such as allyl methacrylate, and hollow particles such as Shirasu balloons. A crosslinkable resin composite is obtained by coating or impregnating the polymerizable composition onto or into a support medium, and carrying out bulk polymerization of the polymerizable composition. A crosslinked resin composite is obtained by crosslinking the crosslinkable resin composite.

Abstract: Disclosed is a method of producing a cyclic olefin polymer having a polar functional group, an olefin polymer produced by using the method, an optical anisotropic film including the olefin polymer, and a catalyst composition for producing the cyclic olefin polymer. In the olefin polymerization method and the catalyst composition for polymerization, since deactivation of the catalyst due to polar functional groups of monomers is capable of being suppressed, it is possible to produce polyolefins having a high molecular weight at high polymerization yield during polyolefin polymerization. Furthermore, the cyclic olefin having the polar functional groups has excellent polymerization reactivity and the activity of the catalyst composition including the same is maintained under a variable polymerization condition. Accordingly, the present invention is very useful for a mass-production process.

Abstract: Embodiments of the invention provide a class of ethylene/?-olefin block interpolymers. The ethylene/?-olefin interpolymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, Mw/Mn, greater than about 1.3. Preferably, the block index is from about 0.2 to about 1. In addition or alternatively, the block ethylene/?-olefin interpolymer is characterized by having at least one fraction obtained by Temperature Rising Elution Fractionation (‘TREF’), wherein the fraction has a block index greater than about 0.3 and up to about 1.0 and the ethylene/?-olefin interpolymer has a molecular weight distribution, Mw/Mn, greater than about 1.4.

Abstract: Acrylic copolymers that include the controlled placement of functional groups within the polymer structure are provided. The copolymers contain a reactive segment and a non-reactive segment and are manufactured via a controlled radical polymerization process. The copolymers are useful in the manufacture of adhesives and elastomers.

Abstract: Disclosed herein are polymeric molds that can be used to make molded articles. The polymeric molds are made from cyclic olefin polymers that may be formed by ring opening metathesis polymerization (ROMP) of a polycyclic monomer having two or more reactive double bonds and a cyclic monomer comprising one reactive double bond. Fluorinated monomers may be used. The polymeric molds may be structured molds in that they have at least one microstructured feature having a dimension of less than about 2 mm, or less than about 500 um. The polymeric molds may also have a plurality of such microstructured features. Also disclosed herein are methods of making the polymeric molds, methods of making molded articles therefrom, and the molded articles.

Abstract: An aspect of the present invention relates to a binder composition for a magnetic recording medium, which comprises a vinyl copolymer comprising a structural unit denoted by general formula [1],: wherein, in general formula [1], R1 denotes a hydrogen atom, a halogen atom, or a methyl group, L1 denotes a single bond or a divalent linking group, and Y an alicyclic group; a structural unit denoted by general formula [2]: wherein, in general formula [2], R2 denotes a hydrogen atom, a halogen atom, or a methyl group, L2 denotes a single bond or a divalent linking group, and Z denotes a hydrocarbon group with a carbon number ranging from 8 to 50; and a structural unit denoted by general formula [3]: wherein, in general formula [3], R3 denotes a hydrogen atom, a halogen atom, or a methyl group, and L3 denotes a single bond or a divalent linking group.

Abstract: The present invention provides homopolymers resulting from ROMP of oxanorbornene dicarboxylic anhydride moieties and non-homopolymers resulting from ROMP of norbornene dicarboxylic anhydrides and oxanorbornene dicarboxylic anhydrides with co-monomer moieties. The invention further provides hydrogenated homopolymers resulting from ROMP of oxanorbornene dicarboxylic anhydrides and hydrogenated non-homopolymers resulting from ROMP of norbornene dicarboxylic anhydrides and oxanorbornene dicarboxylic anhydrides with co-monomer moieties. The invention further provides a wide variety of compositions comprising the novel ROMP moieties. Some of the novel ROMP moiety structures are set out below, wherein R1, R2, X, n, and m are defined herein.

Abstract: The present invention provides a material for forming a protective film that has favorable alkali solubility and gives a protective film excelling in water repellency, as well as a method for forming a photoresist pattern using this material for forming a protective film. The material for forming a protective film of the present invention contains an alkali-soluble polymer having a unit derived from a monomer represented by the following general formula (A-1) as a constitutional unit. In the general formula (A-1), R1 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or the like; R2, R3, and R4 are each independently an alkylene chain having 1 to 6 carbon atoms or the like; R5 and R6 are each independently an alkyl group or fluoroalkyl group having 1 to 15 carbon atoms or the like; and at least one of R5 and R6 is a fluoroalkyl group; Z is an alkylene chain having 1 to 2 carbon atoms or an oxygen atom; m is 0 or 1; and n is an integer of 0 to 3.

Abstract: An organometallic compound obtained by mixing following (a), (b) and (c): (a) a neutral organopalladium complex that has a palladium atom and two organic ligands each having at least three carbon atoms participating in a bond to the palladium atom; (b) an organophosphorus compound having one phosphorus atom; and (c) a salt comprising: an anion having no unshared electron pair in a central atom; and a counter-cation. And a process for producing a norbornene compound polymer, the process comprising: subjecting at least one norbornene compound represented by formula (A) as defined in the specification to polymerization reaction in a presence of an organometallic complex catalyst produced by mixing compound (a) and compound (d) described in the specification.

Abstract: An organic layer composition and a liquid crystal display including the same are provided. An organic layer composition according to an exemplary embodiment includes a binder formed by copolymerizing compounds included in a first group and a second group, wherein the first group includes an acryl-based compound and the second group includes a compound without a —COO— group.

Abstract: The present invention provides a photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and a structural unit derived from a compound represented by the formula (a): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C6 alkyl group or a C1-C6 halogenated alkyl group, k represents an integer of 1 to 6, W1 represents a C6-C18 divalent aromatic hydrocarbon group which can have one or more substituents selected from the group consisting of a halogen atom, a hydroxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C6-C14 aryl group, a C7-C15 aralkyl group, a glycidyloxy group and a C2-C4 acyl group, and R2 represents a hydrogen atom, a group represented by the formula (R2-1) or a group represented by the formula (R2-2), wherein R3, R4 and R5 independently each represent a C1-C12 hydrocarbon group, and R3 and R4 can be bonded each other to form a ring, R6 and R7 independently each represent a hydrogen atom or a

Abstract: A pattern is formed by (1) coating a first positive resist composition onto a substrate, baking, patternwise exposing, PEB, and developing to form a first positive resist pattern including a large area feature, (2) applying a resist-modifying composition comprising a basic nitrogen-containing compound and heating to modify the first resist pattern, and (3) coating a second positive resist composition thereon, patternwise exposing, and developing to form a second resist pattern. The large area feature in the first resist pattern has a film retentivity of at least 50% after the second pattern formation.

Abstract: The present invention provides a method for preparation of an 1-alkene-acrylate based copolymer comprising a step of a radical polymerization reaction of 1-alkene and acrylate based monomer under presence of a metal oxide or Lewis acid, and a method for preparation of an alkene-acrylate based copolymer comprising reacting alkene with an acrylate based monomer under presence of a metal oxide. In the method of preparation according to the present invention, the process is simple and properties of the copolymer can be easily controlled by preparing the copolymer in a mild condition of 100° C. or less and 200 bar or less. In addition, the amount of the polar group of the copolymer prepared by the method is so high that the copolymer can be used for transparent optical products.

Abstract: Disclosed herein is a resin composition for an organic insulating layer, a method of manufacturing the same, and a display panel including an insulating layer formed using the resin composition. The resin composition for an organic insulating layer is produced by polymerizing about 5 to about 35 wt % of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture of the unsaturated carboxylic acid and the unsaturated carboxylic acid anhydride, about 5 to about 40 wt % of a styrene compound, about 5 to about 40 wt % of an epoxy compound, about 0.1 to about 10 wt % of an isobornyl compound, and about 20 to about 40 wt % of a dicyclopentadiene compound, based on the total weight of unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, styrene compound, isobornyl compound, and dicyclopentadiene compound.

Abstract: The present invention provides a fluorinated cyclic olefin electret film including a fluorinated cyclic olefin polymer film characterized by having a cyclic olefin polymer grafted with a fluorocarbon alkyl group, and a parylene film over the fluorinated cyclic olefin polymer film.

Abstract: A hydrogenated crystalline norbornene ring-opening polymer is obtained by hydrogenating 80% or more of carbon-carbon double bonds of a ring-opening polymer that is obtained by ring-opening polymerization of norbornene monomers including 90 to 100 wt % of 2-norbornene and 0 to 10 wt % of a 2-norbornene derivative having a substituent which does not include an aliphatic carbon-carbon double bond in the presence of a branching agent, the hydrogenated crystalline norbornene ring-opening polymer having a melting point of 110 to 145° C. and a branching index of 0.3 to 0.98, and a molded article is obtained by molding the hydrogenated crystalline norbornene ring-opening polymer. The hydrogenated crystalline norbornene ring-opening polymer has excellent industrial productivity, and the molded article has excellent productivity and moisture resistance.

Abstract: The invention relates to a process for the preparation of a polymer comprising monomeric units of ethylene, an ?-olefin and a vinyl norbornene applying as a catalyst system: a. a bridged or an group 4 metal containing an unbridged catalyst having a single cyclopentadienyl ligand and a mono substituted nitrogen ligand, wherein said catalyst is defined by the formula (I): b. an aluminoxane activating compound, c. 0-0.20 mol per mol of the catalyst of a further activating compound, wherein Y is a substituted carbon or nitrogen atom. The invention further relates to a polymer obtainable with the process of the invention.

Abstract: Polymeric compositions for semiconductor applications comprising 10 to 99 wt. % of norbornene-type cycloolefin monomers represented by one or more of Formula I(a), I(b), and optionally I(c) and/or I(d), 0.0005 to 0.5 wt. % of an addition polymerization procatalyst, and optionally: up to 0.5 wt. % of a cocatalyst, up to 59 wt. % of a crosslinking monomer, up to 50 wt. % of a viscosifier, up to 20 wt. % of a thixotropic additive(s), up to 80 wt. % of a filler, up to 10 wt. % of an antioxidant, and up to 0.6 wt. % of an antioxidant synergist, the total of the components of the formulation adding up to 100%. Such formulations are mass polymerized, or cured, to form polymeric compositions that have properties desirable for a variety of specific electronic, microelectronic, optoelectronic and micro-optoelectronic applications such as die attach adhesives, underfill materials, prepreg binders, encapsulants, protective layers, and other related applications.

Abstract: A salt represented by the formula (I-Pa): wherein Xpa represents a single bond or a C1-C4 alkylene group, Rpa represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—, Ypa represents a polymerizable group, and Zpa+ represents an organic cation.

Abstract: The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.

Abstract: A retardation film, formed by stretching a film including a norbornene-based, ring-opening polymer containing a structural unit (A) represented by a formula (1), has high transparency, excellent wavelength dispersion characteristics in a single layer, is capable of providing specific retardation to broadband light, is extremely adhesive to other materials, is capable of attaining optical characteristics that are unique among negative birefringence characteristics, and is capable of providing a reverse dispersion of birefringence wavelength dispersion characteristics. The present invention also provides a liquid crystal display device using the foregoing film.

Abstract: A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to form a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.

Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.

Abstract: A polymerizable composition comprising a norbornene monomer, a metathesis polymerization catalyst, and a nonpolar radical generating agent, from which a crosslinkable resin can be obtained that is suitable as an electric material and the like used in an electric circuit board. By coating or impregnating this polymerizable composition onto or into a support, and then carrying out bulk polymerization to obtain a crosslinkable resin composite, and then crosslinking the crosslinkable resin composite to obtain a crosslinked resin composite having excellent characteristics such as electric insulation, adhesion, mechanical strength, heat resistance, dielectric properties and the like. The compound has a dipole moment of 0.5 or less, generates radicals by heating, and can initiate a crosslinking reaction.

Abstract: The present invention relates to a catalytic composition for producing a 1-alkene-acrylate copolymer that includes a metal nano catalyst, and a method for producing a 1-alkene-acrylate copolymer. In the catalytic composition for producing a 1 -alkene-acrylate copolymer, since the content of the polar comonomer is high, it may be used to produce the 1-alkene-acrylate copolymer that has no crystallinity and is capable of being used as an optical material. The method for producing the 1-alkene-acrylate copolymer may be produced by using a simple process of a mild polymerization condition without a polymerization condition of high temperature and high pressure, and it is easy to control physical properties.

Abstract: There are provided an etching mask which has a superior thermal imprinting characteristic and also a good anti-etching characteristic, a base material with the etching mask, a microfabricated product to which those etching mask and base material are applied, and a production method of the microfabricated product. The etching mask formed of a thermoplastic resin containing at least one kind of skeleton expressed by a chemical formula (1) or a chemical formula (2) in a main chain wherein R1, R2, R3, R4, R5, R6, R7, R8 in the formulae (1), (2) can be different or same one another, each of which is a hydrogen atom, a deuterium atom, a hydrocarbon group having a carbon number of 1 to 15, a halogen atom, or a substituent group containing a hetero atom like oxygen or sulfur, and may form a ring structure one another and wherein m and n are integers equal to or greater than 0.

Abstract: A compound represented by the formula (1) is provided. A polymerizable liquid crystal composition containing the compound can be controlled in birefringence and is excellent in stability of a liquid crystal phase. An anisotropic polymer excellent in uniformity of alignment is obtained by coating and polymerizing the composition on a supporting substrate. In the formula (1), at least one of Ra represents a polymerizable group, A represents a ring group, Y and Z each represent a single bond or alkylene; in which —CH2— in the alkylene may be replaced by another group, and m and n each represent an integer of from 0 to 5.

Abstract: A polyvinyl alcohol type resin, which renders possible preparation of a packaging material having high gas barrier property under a high humidity condition even as a monolayer film, is provided. The polyvinyl alcohol (PVA) type resin of the invention has at least a PVA structural unit and also has an alicyclic structural unit in the main chain. A monolayer film containing this PVA type resin and a laminate containing at least one layer comprising this PVA type resin can be used as a packaging material which shows high gas barrier property even under a high humidity condition.

Abstract: A process for producing packaging composed of thermoformable film composed of thermoplastic polyolefins provides the thermoforming of the film at temperatures in the range from 70 to 170° C., thus giving packaging which has a high heat distortion temperature in the range from 60 to 200° C. and which has a high water-vapor barrier. The thermoformable film comprises an amount in the range from 5 to 100% by weight of COC with a glass transition temperature Tg in the range from 65 to 200° C.

Abstract: Described are novel monomers bearing functionalities capable of initiating control free radical reactions, and a novel process using these initiating monomers in the co-polymerization of an olefin for the formation of well-controlled polyethylene graft polymers where the graft component is derived from controlled free radical polymerization reactions. The initiating monomers are produced by combining an amount of 5-norbornen-2-ol with a hydride or amine for a predetermined amount of time to form a mixture; and adding an amount of an alkyl or acyl halide to said mixture. Polymerization of an olefin with an initiating monomer is conducted in the presence of a metal compound, where the metal compound is comprised of a Group VIII transition metal complex.

Abstract: A monomer compound that contains at least one polymerizable functional group per molecule, and at least one bicycloheptyl-, bicycloheptenyl-, or branched (C5-C42)alkyl-polyether radical per molecule, wherein the bicycloheptyl- or bicycloheptenyl-polyether radical may optionally be substituted on one or more of the ring carbon atoms by one or two (C1-C6)alkyl groups per ring carbon atom is useful in making polymers, particularly pH responsive polymers.

Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.

Abstract: Resist compositions comprising a hydrogenated ring-opening metathesis polymer bearing an alicyclic structure in its backbone and comprising structural units having an oxygen atom incorporated as part of the cyclic structure exhibit a high resolution and minimal proximity bias upon ArF excimer laser lithography and have high etching resistance.

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group.

Abstract: There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R? each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).

Abstract: A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.

Abstract: Provided is a resin having an alicyclic structure in a main chain, which is excellent in etching resistance and developing property, a resist composition for exposure with a high energy radiation using the resin, and a method for forming a pattern using the resist composition. Also provided is a hydrogenated ring-opening metathesis polymer which is comprised of alicyclic skeleton-containing structural units [A], [B] and a structural unit [C] selected from the following general formula [5] and/or [6]: wherein, e and f represent respectively an integer of 0 to 3, wherein the at least one of X1 of the general formula [1] of the structural unit [A], X2 of the general formula [3] and X3 of the general formula [4] of the structural unit [B] is —O—, and wherein the molar ratio of the structural units [A], [B] and [C] satisfies simultaneously that [A]/([B]+[C]) is from 20/80 to 98/2, ([A]+[B])/[C] is from 99/1 to 50/50, and ([A]+[C])/[B] is from 99/1 to 21/79.

Abstract: Disclosed is a method for preparing a cycloolefin polymer containing polar functional groups, comprising the steps of: a) preparing a catalyst mixture including i) a precatalyst; ii) a first cocatalyst; and iii) a second cocatalyst; and b) subjecting a monomer solution comprising a norbornene-based compound containing a polar functional group to an addition polymerization reaction in the presence of an organic solvent and the catalyst mixture, wherein the product yield of the prepared polymer is 50% by weight or more based on the total weight of the monomer.

Abstract: Disclosed is a method for preparing a cycloolefin polymer containing polar functional groups, comprising: preparing a catalyst mixture including i) a precatalyst, containing a Group 10 transition metal having a ligand containing oxygen ions bonded to the metal; ii) a first cocatalyst which is an organic compound containing a Group 15 element; and iii) a second cocatalyst which is capable of providing an anion and weakly coordinating to the metal of the precatalyst; and subjecting a monomer solution comprising a norbornene-based compound containing a polar functional group to an addition polymerization reaction in the presence of an organic solvent and the catalyst mixture, at a temperature of 80-200° C., the total amount of the organic solvent being 50-800% by weight based on the total weight of the monomer contained in the monomer solution, and the product yield of the polymer being 50% by weight or more based on the total weight of the monomer.