Abstract: Process for production of post-crosslinkable thermoplastic resins by bulk-polymerizing a polymerizable composition (A) comprising (I) a monomer fluid containing a cyclic olefin (?) having two or more metathetical ring-opening reaction sites in the molecule in an amount 10 wt % or above based on the total amount of the monomers or a monomer fluid containing a norbornene monomer and a crosslinking agent, (II) a metathetical polymerization catalyst, and (III) a chain transfer agent; thermoplastic resins obtained by this process. These thermoplastic resins are free from odor due to residual monomers and are excellent in storage stability. Process for producing crosslinked resins and composite materials which comprises laminating the thermoplastic resin to a substrate and then crosslinking the thermoplastic resin.

Abstract: There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R? each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).

Abstract: Norbornene monomers with fluorene group and polymer material thereof are disclosed. The norbornene monomers with fluorene group are prepared by Diels-Alder reation. The Norbornene monomers containing fluorene groups are highly active for ring-opening-metathesis polymerization (ROMP), and the molecular weight and PDI value of the obtained polymers are controllable.

Abstract: A method of controlling the molecular weight of poly(cyclic)olefin (norbornene-type) polymers and activating the polymerization thereof with a single material is provided. Such method include adding a chain transfer/activating agent to a mixture of monomer(s), catalyst, solvent and an optional cocatalyst and polymerizing the mixture to form a polymer. It is shown that the amount of chain transfer/activating agent in the mixture can serve to control the molecular weight of the resulting polymer, its percent conversion or both, and in some embodiments the optical density of the resulting polymer.

Abstract: A method of polymerizing poly(cyclic)olefin monomers encompassing (a) combining a monomer composition containing the poly(cyclic)olefin monomers, a non-olefinic chain transfer agent and an activator compound to faun a mixture; (b) heating the mixture; and (c) adding a polymerization catalyst containing Ni and/or Pd. The non-olefinic chain transfer agent includes one or more compounds selected from H2, alkylsilanes, alkylalkoxysilanes, alkylgermanes, alkylalkoxygermanes, alkylstannanes, and alkylalkoxystannanes. The activator is characterized as having an active hydrogen with a pKa of at least 5. The resulting poly(cyclic)olefin polymers can be used in photoresist compositions.

Abstract: A method of preparing a polymer having a tapered block copolymer structure. The method comprises polymerizing a first olefin monomer and a different second olefin monomer in the presence of a catalyst supporting living or quasi-living polymerization. In certain embodiments, the catalyst comprises two neutral metal complexes. In preferred embodiments, a tapered block copolymer structure is formed by adding one monomer in a single batch at the start of the polymerization reaction, and adding a second monomer throughout the course of the reaction. The present invention also provides polymers having one or more tapered block copolymer sections, and compositions based on these polymers.

Abstract: Methods and compositions for the generation of quasi-living catalysts for homo-polymerization of olefins such as ethylene, ?-olefins and functionalized olefins and for the co-polymerization of olefins with functionalized monomers is disclosed. A process for producing these homo- and co-polymers is also disclosed. A polymeric material with enhanced hydrophilic properties, generated by the co-polymerization of ethylene with 5-norbornen-2-yl acetate, is also disclosed.

Abstract: A (meth)acrylate compound having an acid-labile ester group, a photosensitive polymer, and a resist composition including the same, the (meth)acrylate compound being represented by the following Chemical Formula 1 wherein, R1 is hydrogen or methyl, R2 and R3 are each independently a substituted or unsubstituted linear alkyl, a substituted or unsubstituted cyclic alkyl, or linked each other to form a monocyclic ring or a fused-ring, and R4 is a linear ester or cyclic ester group.

Abstract: Polymers comprising repeating units of the formula I where the variables are defined as follows: a is an integer from 0 to 3, R1, R2, R3 are identical or different and are selected independently from among hydrogen, C1-C20-alkyl, C1-C20-alkyl containing one or more Si, N, P, O or S atoms, C6-C30-aryl, preferably C6-C14-aryl, C4-C14-heteroaryl, —N(C6-C14-aryl)2, and Y1, where Y1 may be identical or different and are selected from among —CH?CH2, trans- or cis-CH?CH—C6H5, acryloyl, methacryloyl, methylstyryl, O—CH?CH2 and glycidyl, where Y2 is selected from among —CH?CH2, trans- or cis-CH?CH—C6H5, acryloyl, methacryloyl, methylstyryl, —O—CH?CH2 and glycidyl, and one or more groups Y1 or Y2 may be crosslinked to one another.

Abstract: A release layer material of cyclic olefin copolymers (COC) applied in flexible electrical devices represented by Formula (I) or (II) is provided. The invention also provides a substrate structure including the release layer. The substrate structure includes a carrier, a release layer overlying the carrier with one or more blocks with a first area, wherein the release layer includes cyclic olefin copolymers (COC) represented by the disclosed Formula (I) or (II), and a flexible substrate overlying the release layer and the carrier with a second area, wherein the second area is larger than the first area and the flexible substrate has a greater adhesion force than that of the release layer to the carrier. The invention further provides a method for fabricating the substrate structure. In Formula (I) or (II), X is 30-70, X+Y is 100 and R is —H, —CH3 or —C2H5.

Abstract: The present invention provides a graft polymer and compositions comprising a cyclic olefin polymer characterized by having a glass transition temperature of about 60° C. to 250° C. and a molecular weight of about 400 to 300000, and a fluorocarbon alkyl group grafted on the cyclic olefin polymer.

Abstract: An acetal compound of formula (1) is provided wherein R1 is H, methyl or trifluoromethyl, R2 is a monovalent C1-C10 hydrocarbon group, R3 and R4 are H or a monovalent C1-C10 hydrocarbon group, R2 and R3 may together form an aliphatic hydrocarbon ring, and X1 is a single bond or a divalent C1-C4 hydrocarbon group. A polymer comprising recurring units derived from the acetal compound is used as a base resin to formulate a resist composition which exhibits a high resolution when processed by micropatterning technology, especially ArF lithography.

Abstract: The present invention provides a polymer compound which can constitute a photoresist composition which is capable of having an excellent resolution, forming a fine pattern with a good rectangularity, obtaining favorable resist characteristics even when acid strength of a acid generated from an acid generator is weak, and having favorable sensitivity; a photoresist composition including the polymer compound; and a resist pattern formation method using the photoresist composition.

Abstract: A polymer comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, X represents a linear or branched chain C1-C6 alkylene group, Z represents a group represented by the formula (Ia): wherein R2 is independently in each occurrence a linear or branched chain C1-C6 alkyl group and m represents an integer of 0 to 15, and a structural unit represented by the formula (II): wherein R3 represents a hydrogen atom or a methyl group, R4 is independently in each occurrence a linear or branched chain C1-C6 alkyl group and n represents an integer of 0 to 4.

Abstract: Disclosed is a method for preparing a cycloolefin polymer containing polar functional groups, comprising: preparing a catalyst mixture including i) a precatalyst, containing a Group 10 transition metal having a ligand containing oxygen ions bonded to the metal; ii) a first cocatalyst which is an organic compound containing a Group 15 element; and iii) a second cocatalyst which is capable of providing an anion and weakly coordinating to the metal of the precatalyst; and subjecting a monomer solution comprising a norbornene-based compound containing a polar functional group to an addition polymerization reaction in the presence of an organic solvent and the catalyst mixture, at a temperature of 80-200° C., the total amount of the organic solvent being 50-800% by weight based on the total weight of the monomer contained in the monomer solution, and the product yield of the polymer being 50% by weight or more based on the total weight of the monomer.

Abstract: The present invention relates to a norbornene polymer that comprises a norbornene monomer having a photoreactive functional group, and a method of manufacturing the same. The norbornene polymer comprises at least 50 mol % of exo isomers among the norbornene monomers having the photoreactive functional group. Since the norbornene polymer according to the present invention comprises at least 50 mol % of exo isomers among the norbornene monomers having the photoreactive functional group, a molecular weight is significantly increased while the yield is not reduced during the manufacturing of the polymer. In views of the three dimensional structure, stability is ensured because the polymer has a planar structure in which the photoreactive groups between the molecules are close to each other. Therefore, the distance between the photoreactive groups is reduced, thus increasing the photoreaction rate.

Abstract: A polar group-containing olefin copolymer having excellent adhesion properties to metals or polar resins and excellent compatibility therewith, a process for preparing the copolymer, a thermoplastic resin composition containing the copolymer, and uses thereof. The polar group-containing olefin copolymer comprises a constituent unit derived from an ?-olefin of 2 to 20 carbon atoms, and a constituent unit derived from a straight-chain, branched or cyclic polar group-containing monomer having at the end a polar group such as a hydroxyl group or an epoxy group and/or a constituent unit derived from a macromonomer having at the end a polymer segment obtained by anionic polymerization, ring-opening polymerization or polycondensation. The polar group-containing olefin copolymer can be prepared by polymerizing the ?-olefin with the polar group-containing monomer and/or the macromonomer in the presence of a metallocene catalyst.

Abstract: An olefin polymerization catalyst which includes an organometallic compound of the following Formula 1; aluminoxane; and an organic transition metal compound of the following Formula 2: M1R11R2mR3n or R2mR3nM1R11M1R2mR3n??[Formula 1 ] in Formula 1, M1 is selected from the group consisting of Group 2A, 2B and 3A of the Periodic Table, R1 is cyclic hydrocarbyl group of 5 to 30 carbon atoms, R2 and R3 are independently hydrocarbyl group of 1 to 24 carbon atoms, l is an integer of more than 1, m and n are independently an integer of 0 to 2, l+m+n is equal to the valence of M1, Q is a divalent group; M2R4pXq??[Formula 2 ] in Formula 2, M2 is Ti, Zr or Hf; R4 is cyclic hydrocarbyl group of 5 to 30 carbon atoms, X is halogen atom, p is an integer of 0 or 1, q is an integer of 3 or 4, p+q is equal to the valence of metal M2.

Abstract: To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R?, R? and R?? are each hydrogen, methyl, or trifluoromethyl; R1 is hydrogen, C1-4 linear or branched alkyl, alkoxy, or C1-4 linear or branched fluoroalkyl; X is a C7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R2 and R3 are each independently C1-4 linear or branched alkyl; R4 is a C4-20 alicyclic hydrocarbon group; R5 is C1-4 linear or branched alkyl; and R6 and R7 are each hydrogen or C1-4 linear or branched alkyl.

Abstract: The invention pertains to low polydispersity acrylic polymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity polymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.

Abstract: The invention relates to compositions, polymerizable by ring-opening metathesis, which contain (a) at least one monomer and/or oligomer which is polymerizable by ring-opening metathesis polymerization, (b) at least one filler and (c) at least one initiator for the ring-opening metathesis polymerization. The compositions are characterized in that the initiator is chemically or physically bound to the filler.

Abstract: A polymer compound including a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R2 and R3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R2 and R3 may be bonded together to form an alkylene group that may include an oxygen atom or sulfur atom at an arbitrary position, —O— or —S—; R4 and R5 each independently represents a hydrogen atom, an alkyl group that may include an oxygen atom at an arbitrary position, a cycloalkyl group that may include an oxygen atom at an arbitrary position or an alkoxycarbonyl group.

Abstract: A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of main-chain carbon-carbon double bonds of a ring-open polymer which is obtained by ring-opening polymerization of 2-norbornene is disclosed. The hydrogenated norbornene ring-open polymer has a weight average molecular weight (Mw) determined by gel permeation chromatography (GPC) of 50,000 to 200,000, a molecular weight distribution (Mw/Mn) of 1.5 to 10.0, and a melting point of 110 to 145° C.

Abstract: A resin comprising a structural unit represented by the formula (I): wherein Q1 and Q2 represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more —CH2— may be replaced by —O— etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion.

Abstract: A composition curable by a metathesis reaction upon mixing its components and comprising an olefin-containing substrate, a metathesis catalyst, and a reaction control agent for slowing the progress of the metathesis reaction. The metathesis catalyst is a ruthenium or osmium carbene complex catalyst having high activity and good air stability. In one embodiment, the catalyst is free of phosphine ligands. The reaction control agent is an organic compound that contains carbon-carbon double and/or triple bonds and one or more Group 14 atoms and is present in an amount effective to slow the progress of the metathesis reaction. In one embodiment, the olefin-containing substrate may comprise one or more oligomers or polymers having a >20 wt. % linear siloxane (Si—O—Si) backbone tethered and/or end-capped with functional olefin groups, such as cycloalkenyl group.

Abstract: The present invention relates to a to a norbornene-based polymer having a low dielectric constant and low-loss properties, and an insulating material, a printed circuit board and a functional device using the same. More particularly, it relates to a norbornene-based polymer expressed by the following formula (1): wherein, at least one of R1 to R4 is independently substituted or unsubstituted linear C4-C31 arylalkyl or substituted or unsubstituted branched C4-C31 arylalkyl; the rest of R1 to R4 are each and independently H, substituted or unsubstituted linear C1-C3 alkyl, or substituted or unsubstituted branched C1-C3 alkyl; and n is an integer of 250 to 400.

Abstract: A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C1-C10 organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

Abstract: The present invention relates to a norbornene monomer, a polynorbornene derivative, a liquid crystal alignment film including the same, and a liquid crystal display device including the same. More particularly, the present invention relates to a norbornene monomer, a polynorbornene derivative, a liquid crystal alignment film including the same, and a liquid crystal display device including the same, which have an alignment property by photoreaction, excellent thermal stability and photoreactivity, the increased photo-reaction rate and reliability of the alignment film, thereby showing high manufacturing process efficiency.

Abstract: The invention relates to a process for the production of post-crosslinkable thermoplastic resins by bulk-polymerizing a polymerizable composition (A) comprising (I) a monomer fluid containing a cyclic olefin (?) having two or more metathetical ring-opening reaction sites in the molecule in an amount 10 wt % or above based on the total amount of the monomers or a monomer fluid containing a norbornene monomer and a crosslinking agent, (II) a metathetical polymerization catalyst, and (III) a chain transfer agent; thermoplastic resins obtained by this process; and a process for producing crosslinked resins or crosslinked resin composite materials which comprises laminating such a thermoplastic resin with a substrate at need and then crosslinking the thermoplastic resin. According to the invention, thermoplastic resins which are free from odor due to residual monomers and excellent in storage stability can be efficiently obtained by a simple process of bulk-polymerizing the composition (A).

Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.

Abstract: A copolymer contains 10 to 69 mol % of a structural unit derived from propylene, 1 to 50 mol % of a structural unit derived from at least one ?-olefin having a carbon number of from 4 to 20 and 30 to 89 mol % of a structural unit derived from at least one cyclic olefin represented by the formula (1) as defined herein, and has a weight average molecular weight of from 50,000 to 1,000,000.

Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.

Abstract: An aromatic ring-containing polymer, a polymer mixture, an antireflective hardmask composition, and a method for patterning a material on a substrate, the aromatic ring-containing polymer including at least one aromatic ring-containing polymer represented by Formulae 1, 2, or 3.

Abstract: The present invention provides 1-alkene-acrylate based copolymer prepared by a method comprising step of a radical polymerization reaction of 1-alkene and acrylate based monomer under presence of a metal oxide or Lewis acid. The 1-alkene-acrylated based copolymer according to the present invention is a random copolymer of 1-alkene and a polar monomer, and an amount of a polar group contained in the copolymer is very high so that the alkene is not crystalline. Accordingly, when the copolymer is processed into a polymer film, a transparency of the polymer is not affected. Due to such a feature, the copolymer can be used for optical products.

Abstract: There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.

Abstract: A positive working resist composition comprises a specific resin. The specific resin comprises: a repeating unit having a first specific group; and a repeating unit having a second specific group, the first specific group being different from the second specific group; and a specific structure in an end terminal of the resin. The specific resin decomposes by action of an acid to increase its solubility in an alkaline developer.

Abstract: Disclosed is a method for producing a norbornene monomer composition, a norbornene polymer produced using the norbornene monomer composition, an optical film including the norbornene polymer, and a method for producing the norbornene polymer. The method includes reacting a reaction solution that contains cyclopentadiene, dicyclopentadiene, or a mixture of cyclopentadiene and dicyclopentadiene, an acetate compound, and a solvent so that a content of an exo isomer is 50 mol % or more. Variables such as a reaction temperature, a reaction time, a molar ratio between reactants, and addition of a solvent are controlled so that the exo isomer is contained in content of 50 mol % or more. Accordingly, it is possible to industrially produce an acetate norbornene addition polymer by using the acetate norbornene monomer composition containing the exo isomer in content of 50 mol % or more.

Abstract: The present invention is a polyolefin polymer containing vinyl groups at both ends thereof, and a composition and a molded product containing the polymer, wherein the polymer contains a constitutional unit derived from at least one selected from the group consisting of ethylene (a), an ?-olefin (b) having 3 to 20 carbon atoms, and a cyclic olefin (c), and (1) a ratio of terminal vinylation is 70% or more relative to all of both ends of molecular chains, and (2) an intrinsic viscosity [?] is in the range of 0.01 to 10 dl/g as measured in a decalin solution at 135° C. The polymer of the present invention may be molded by a LIM molding, an injection molding, a transfer molding, a compression molding, and the like, and is excellent in acid resistance, gas permeation resistance, hydrolysis resistance, and dynamic fatigue resistance. From the polymer, a thermoplastic resin composition and a crosslinkable resin composition, and a crosslinked composition having excellent mechanical characteristics are obtained.

Abstract: This invention is a monomer comprising at least two dienophile groups and at least two ring structures which ring structures are characterized by the presence of two conjugated carbon-to-carbon double bonds and the presence of a leaving group L, wherein L is characterized that when the ring structure reacts with a dienophile in the presence of heat or other energy sources, L is removed to form an aromatic ring structure. This invention is also curable oligomers and polymers and highly cross-linked polymers made with such monomers. Moreover, this invention is a method of making porous films by combining such monomers or their oligomers with a porogen, curing the polymer and removing the porogen.

Abstract: A production method of an objective lens for optical pickup apparatus having a numerical aperture NA of image side of 0.80 to 0.90 is disclosed. The method includes steps of molding resin composition containing copolymer of ?-olefin and a cyclic olefin represented by Formula (I) or (II) to form lens shape, and thermally processing the molded product under a condition at a temperature between Tg ?45° C. and Tg ?15° C. for 12 to 168 hours, wherein the Formula (I) and (II) is detailed in the specification.

Abstract: A positive photosensitive composition comprises: a polymer compound having an acid-decomposable structure on a terminal of the polymer compound; and a compound capable of generating an acid upon irradiation with actinic ray or radiation.

Abstract: The present invention provides method of preparing alkene-acrylate-norbornene terpolymer by polymerization of a monomer mixture consisting of alkene, acrylate and norbornene by a radical initiator under the presence of a Lewis acid. In the method of preparing the alkene-acrylate-norbornene terpolymer of the present invention, the terpolymer may be prepared in the mild condition of low temperature and low pressure by using the Lewis acid so that the process is simple and the property of the terpolymer may be easily controlled. In addition, the terpolymer prepared by the method includes the ethylene and the norbornene simultaneously so that it has high glass transition temperature, and the brittle property in forming of film is improved.

Abstract: [Problems] To provide a norbornene compound addition polymer film that is excellent in heat resistance, chemical resistance, dimensional stability and the like and favorable for use for optical parts and electric insulating parts. [Means for Solving Problems] The norbornene compound addition polymer film satisfies at least either one of the following: when it is heated from 25° C. up to 200° C. and then again cooled to 25° C., the dimensional change rate thereof between before heating and after cooling is at most 100 ppm, or the dimensional change rate thereof between before and after dipping in propylene glycol monomethyl ether acetate at 25° C. for 1 hour is at most 100 ppm. The method for producing the norbornene compound addition polymer film comprises a step of maintaining the film having a residual solvent content of at most 5,000 ppm of the norbornene compound addition polymer having a glass transition temperature of T° C.

Abstract: [Problems] To provide a film comprising a norbornene (NB) compound addition polymer that is excellent in chemical resistance, optical properties and the like, has a high Tg, a low water absorption ratio and a low linear expansion coefficient, and is soluble in an ordinary solvent.

Abstract: The invention relates to polymeric transition metal catalysts, to processes for preparing them, to intermediates and also to the use of the transition metal catalysts as catalysts in organic reactions, in particular in olefin metathesis reactions.

Abstract: A positive resist composition is provided comprising (A) a resin component having a carboxylic acid moiety protected with an acetal protective group which is decomposable under the action of an acid, wherein in the carboxylic acid moiety protected with an acetal protective group, deprotection occurs not by way of ?-elimination, and (B) a photoacid generator. The resist composition exhibits a high resolution when processed by ArF lithography.

Abstract: A norbornene ring-opened polymer hydrogenated product having a syndiotactic structure and a process for producing the same are disclosed. The ring-opened polymer hydrogenated product contains a repeating unit originating from a polycyclic norbornene monomer with three or more rings in the polymer repeating units, having a weight average molecular weight of 500 to 1,000,000, and having a racemo diad proportion of 51% or more. The process comprises a step of polymerizing a polycyclic norbornene monomer having three or more rings by solution polymerization using a group 6 transition metal compound with a hydroxyl group-containing aryloxy group or the like bonded thereto as a polymerization catalyst to obtain a ring-opened polymer and a step of hydrogenating double bonds in the main chain of the ring-opened polymer.

Abstract: The present invention provides a polymer comprising a structural unit represented by the formula (Ia) or (Ib): wherein R1 represents a hydrogen atom etc., R2 represents a linear, branched chain or cyclic C1-C8 alkyl group, R3 represents a methyl group, n represents an integer of 0 to 14, Z1 represents a single bond etc., k represents an integer of 1 to 4, R4 and R5 each independently represents a hydrogen atom etc., and m represents an integer of 1 to 3, a structural unit represented by the formula (II): wherein R6 and R7 each independently represents a hydrogen atom etc., R8 represents a methyl group, R9 represents a hydrogen atom etc., Z2 represents a single bond etc., k? represents an integer of 1 to 4, Z? represents a group capable to eliminate by an action of an acid, and a structural unit represented by the formula (III): wherein R10 represents a carboxyl group etc., l? represents an integer of 0 to 3, Z3 represents a single bond etc., and k? represents an integer of 1 to 4.

Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Abstract: The present invention provides a crosslinked propylene-based elastomer having an isotactic propylene triad tacticity of from 65 to 95%, a melting point by DSC equal to or less than 110° C., a heat of fusion of from 5 J/g to 50 J/g, an ultimate tensile strength of 1 MPa or greater, a Die C tear strength of 50 lb/in or greater, and a ratio of Shore A hardness to MFR@230° C. prior to crosslinking of 160 or less, and comprising at least 75 wt % propylene-derived units, at least 5 wt % ethylene-derived units, and from 0.3 to 10 wt % diene-derived units. The present invention also provides elastomeric compositions comprising a crosslinked propylene-based elastomer as described herein and from 0 to 5 parts by weight of carbon black per 100 parts of polymer. The present invention also provides articles such as films, fibers, nonwovens, molded objects, and extruded forms which include any of the inventive compositions described herein.