Bridged Monomer Patents (Class 526/281)
  • Patent number: 8263722
    Abstract: The invention relates to a continuous polymerization process for preparing a random ethylene interpolymer with propylene and/or 1-butene which comprises: (A) polymerizing ethylene, and as an ?-olefin comonomer propylene and/or 1-butene under continuous random polymerization conditions in the presence of single site catalyst system employing an ionic activator having cyclic ligands shielding a central charge bearing atom, at a temperature of 140° C. to 250° C. at a conversion of ethylene of 80 to 99% and a comonomer conversion of from at least 30% and (B) devolatilizing the polymer to provide an ethylene copolymer having a density of from 0.85 to 0.92 g/cm3, an MI of from 0.01 to 100 g/10 min, preferably from 0.1 to 20, and an I21/I2 of from 30 to 400. The invention also relates to polymers made by such processes containing as ?-olefin comonomer propylene and/or 1-butene, having a density of from 0.85 to 0.92 g/cm3, an MI of from 0.
    Type: Grant
    Filed: March 21, 2005
    Date of Patent: September 11, 2012
    Assignee: Exxonmobil Chemical Patents Inc.
    Inventors: Narayanaswami Raja Dharmarajan, Rui Zhao, Bruce Allan Harrington, George James Pehlert, Periagaram S. Ravishankar, Kent L. Chasey
  • Publication number: 20120208950
    Abstract: A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of main-chain carbon-carbon double bonds of a ring-open polymer obtained by ring-opening polymerization of 2-norbornene. The hydrogenated norbornene ring-open polymer has a weight average molecular weight determined by gel permeation chromatography (GPC) of 50,000 to 200,000, a molecular weight distribution of 1.5 to 10.0, and a melting point of 110 to 145° C. A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of carbon-carbon double bonds of a ring-open polymer obtained by ring-opening copolymerization of 2-norbornene and a substituent-containing norbornene monomer, wherein the proportion of a repeating unit (A) derived from the 2-norbornene with respect to all repeating units is 90 to 99 wt % and the proportion of a repeating unit (B) derived from the substituent-containing norbornene monomer with respect to all repeating units is 1 to 10 wt %. A resin composition and a molding material.
    Type: Application
    Filed: December 23, 2011
    Publication date: August 16, 2012
    Applicant: ZEON CORPORATION
    Inventors: Haruhiko Takahashi, Teiji Kohara, Nobuhiro Kudo, Koichi Ikeda, Tokudai Ogawa, Takeshi Hirata
  • Patent number: 8236910
    Abstract: Cycloolefin copolymers which are distinguished by the presence of racemic diads of repeating polycyclic units and additionally by racemic triads of repeating polycyclic units are described. These copolymers can be prepared by copolymerization of polycyclic olefins with linear olefins in the presence of metallocene catalysts which have no Cs symmetry in relation to the centroid-M-centroid plane. The novel copolymers can be used for the production of shaped articles, in particular of films.
    Type: Grant
    Filed: March 19, 2008
    Date of Patent: August 7, 2012
    Assignee: Topas Advanced Polymers GmbH
    Inventors: Dieter Ruchatz, Anne-Meike Schauwienold, Peter Jörg
  • Patent number: 8236907
    Abstract: A catalyst composition comprising a neutral bimetallic diphenoxydiiminate complex of group 10 metals or Ni, Pd or Pt is disclosed. The compositions can be used for the preparation of homo- and co-polymers of olefinic monomer compounds.
    Type: Grant
    Filed: October 6, 2009
    Date of Patent: August 7, 2012
    Assignee: Northwestern University
    Inventors: Tobin J. Marks, Brandon A. Rodriguez, Massimiliano Delferro
  • Publication number: 20120193617
    Abstract: A subject for the invention is to provide compounds where a film formation can be made by a wet film formation method, a heating temperature at the film formation is low, the film formed therefrom has high stability, and the other layers can be laminated thereon by a wet film formation method or another method. The compounds are usable as a material for electronic device which decreases little in charge transport efficiency or luminescent efficiency and which have excellent driving stability. The invention resides in a compound and a polymer which are characterized by having a elimination group of a specific structure and in an organic compound characterized by having a elimination group having a low elimination temperature.
    Type: Application
    Filed: April 16, 2012
    Publication date: August 2, 2012
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Toshiyuki Urano, Toshimitsu Nakai, Koichiro Iida, Yanjun Li, Tatsushi Baba
  • Patent number: 8232039
    Abstract: A polymer comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, X represents a linear or branched chain C1-C6 alkylene group, Z represents a group represented by the formula (Ia): wherein R2 is independently in each occurrence a linear or branched chain C1-C6 alkyl group and m represents an integer of 0 to 15, and a structural unit represented by the formula (II): wherein R3 represents a hydrogen atom or a methyl group, R4 is independently in each occurrence a linear or branched chain C1-C6 alkyl group and n represents an integer of 0 to 4.
    Type: Grant
    Filed: November 4, 2009
    Date of Patent: July 31, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Nobuo Ando, Kazuhiko Hashimoto
  • Publication number: 20120177578
    Abstract: The present invention generally relates to compositions, methods, and systems comprising polymers that are fluorous-soluble and/or organize at interfaces between a fluorous phase and a non-fluorous phase. In some embodiments, emulsions or films are provided comprising a polymer. The polymers, emulsions, and films can be used in many applications, including for determining, treating, and/or imaging a condition and/or disease in a subject. The polymer may also be incorporated into various optoelectronic device such as photovoltaic cells, organic light-emitting diodes, organic field effect transistors, or the like. In some embodiments, the polymers comprise pi-conjugated backbones, and in some cases, are highly emissive.
    Type: Application
    Filed: August 19, 2011
    Publication date: July 12, 2012
    Applicant: Massachusetts Institute of Technology
    Inventors: Timothy M. Swager, Jeewoo Lim, Yohei Takeda
  • Publication number: 20120171398
    Abstract: A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of main-chain carbon-carbon double bonds of a ring-open polymer obtained by ring-opening polymerization of 2-norbornene. The hydrogenated norbornene ring-open polymer has a weight average molecular weight determined by gel permeation chromatography (GPC) of 50,000 to 200,000, a molecular weight distribution of 1.5 to 10.0, and a melting point of 110 to 145° C. A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of carbon-carbon double bonds of a ring-open polymer obtained by ring-opening copolymerization of 2-norbornene and a substituent-containing norbornene monomer, wherein the proportion of a repeating unit (A) derived from the 2-norbornene with respect to all repeating units is 90 to 99 wt % and the proportion of a repeating unit (B) derived from the substituent-containing norbornene monomer with respect to all repeating units is 1 to 10 wt %. A resin composition and a molding material.
    Type: Application
    Filed: December 23, 2011
    Publication date: July 5, 2012
    Applicant: ZEON CORPORATION
    Inventors: Haruhiko TAKAHASHI, Teiji KOHARA, Nobuhiro KUDO, Koichi IKEDA, Tokudai OGAWA, Takeshi HIRATA
  • Patent number: 8210967
    Abstract: Elastomeric interpolymers comprising at least two, or more, cyclic olefin monomers that are prepared by ring opening metathesis polymerization, and that are characterized by having no crystallinity, a glass transition temperature (Tg) of less than ?80° C., and a number average molecular weight (Mn) of at least 40 kg/mole, and functionalized products thereof. A ring opening metathesis polymerization process for producing the elastomeric interpolymers having no crystallinity. Uses of the elastomeric interpolymers in applications such as rubber compounds, tires, and the like. Cores of golf balls that are prepared by using metathesis polymerization produced elastomeric interpolymers having 0 to about 30% crystallinity.
    Type: Grant
    Filed: October 15, 2007
    Date of Patent: July 3, 2012
    Assignee: Firestone Polymers, LLC
    Inventors: James Pawlow, Christopher Robertson, Daniel Graves, Mitch Barry
  • Patent number: 8211514
    Abstract: A reverse dispersion retardation film is formed by stretching a film containing a norbornene-based ring-opening copolymer containing a structural unit (A) represented by a general formula (1) and a structural unit (B) represented by a general formula (2), wherein a total amount of the structural unit (A) and an exo-form structural unit, among the structural units (B), is not less than 20 mol % but not more than 65 mol % of all the structural units.
    Type: Grant
    Filed: December 24, 2009
    Date of Patent: July 3, 2012
    Assignee: JX Nippon Oil & Energy Corporation
    Inventors: Tadahiro Kaminade, Shinichi Komatsu, Hisashi Sone, Takeshi Koike, Sayako Kawahama
  • Patent number: 8211615
    Abstract: The present invention provides a copolymer which can prevent problems associated with immersion lithography (including occurrence of a pattern defect such as water mark, and variation in sensitivity or abnormal patterning due to elution of an additive such as a radiation-sensitive acid-generator) and which provides surface characteristics suitable for immersion lithography, and a composition containing the copolymer.
    Type: Grant
    Filed: October 30, 2007
    Date of Patent: July 3, 2012
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Takanori Yamagishi, Tomo Oikawa, Takayoshi Okada
  • Patent number: 8211984
    Abstract: Provided are a ring-opening metathesis polymer and a hydrogenated product thereof that are useful as materials for an optical component, and a method for preparation thereof. The present invention relates to a ring-opening metathesis polymer comprising at least repeating structural units [A] represented by the following General Formula [1] and repeating structural units [B] represented by the following General Formula [2] at a constitutional molar ratio [A]/[B] of 0.1/99.9 to 100/0. The present invention relates to a ring-opening metathesis polymer comprising at least repeating structural units [A] represented by the following General Formula [1] and repeating structural units [B] represented by the following General Formula [2] at a constitutional molar ratio [A]/[B] of 0.1/99.9 to 100/0.
    Type: Grant
    Filed: January 17, 2007
    Date of Patent: July 3, 2012
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Tadahiro Sunaga, Yuichi Okawa, Takashi Ochiai, Keiichi Ikeda
  • Publication number: 20120165461
    Abstract: A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of main-chain carbon-carbon double bonds of a ring-open polymer obtained by ring-opening polymerization of 2-norbornene. The hydrogenated norbornene ring-open polymer has a weight average molecular weight determined by gel permeation chromatography (GPC) of 50,000 to 200,000, a molecular weight distribution of 1.5 to 10.0, and a melting point of 110 to 145° C. A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of carbon-carbon double bonds of a ring-open polymer obtained by ring-opening copolymerization of 2-norbornene and a substituent-containing norbornene monomer, wherein the proportion of a repeating unit (A) derived from the 2-norbornene with respect to all repeating units is 90 to 99 wt % and the proportion of a repeating unit (B) derived from the substituent-containing norbornene monomer with respect to all repeating units is 1 to 10 wt %. A resin composition and a molding material.
    Type: Application
    Filed: December 23, 2011
    Publication date: June 28, 2012
    Applicant: ZEON CORPORATION
    Inventors: Haruhiko TAKAHASHI, Teiji KOHARA, Nobuhiro Kudo, Koichi Ikeda, Tokudai Ogawa, Takeshi Hirata
  • Patent number: 8207279
    Abstract: Disclosed is a method for producing a norbornene monomer composition, a norbornene polymer produced using the norbornene monomer composition, an optical film including the norbornene polymer, and a method for producing the norbornene polymer. The method includes reacting a reaction solution that contains cyclopentadiene, dicyclopentadiene, or a mixture of cyclopentadiene and dicyclopentadiene, an acetate compound, and a solvent so that a content of an exo isomer is 50 mol % or more. Variables such as a reaction temperature, a reaction time, a molar ratio between reactants, and addition of a solvent are controlled so that the exo isomer is contained in content of 50 mol % or more. Accordingly, it is possible to industrially produce an acetate norbornene addition polymer by using the acetate norbornene monomer composition containing the exo isomer in content of 50 mol % or more.
    Type: Grant
    Filed: June 26, 2007
    Date of Patent: June 26, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Dai-Seung Choi, Hye-Young Jung, Sung-Don Hong, Jung-Min Lee, Hee-Jean Lee, Sung-Ho Chun
  • Patent number: 8207283
    Abstract: Disclosed is a method for producing a norbornene monomer composition, a norbornene polymer produced using the norbornene monomer composition, an optical film including the norbornene polymer, and a method for producing the norbornene polymer. The method includes reacting a reaction solution that contains cyclopentadiene, dicyclopentadiene, or a mixture of cyclopentadiene and dicyclopentadiene, an acetate compound, and a solvent so that a content of an exo isomer is 50 mol % or more. Variables such as a reaction temperature, a reaction time, a molar ratio between reactants, and addition of a solvent are controlled so that the exo isomer is contained in content of 50 mol % or more. Accordingly, it is possible to industrially produce an acetate norbornene addition polymer by using the acetate norbornene monomer composition containing the exo isomer in content of 50 mol % or more.
    Type: Grant
    Filed: April 6, 2011
    Date of Patent: June 26, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Dai-Seung Choi, Hye-Young Jung, Sung-Don Hong, Jung-Min Lee, Hee-Jean Lee, Sung-Ho Chun
  • Patent number: 8188191
    Abstract: The present invention is a polyolefin polymer containing vinyl groups at both ends thereof, and a composition and a molded product containing the polymer, wherein the polymer contains a constitutional unit derived from at least one selected from the group consisting of ethylene (a), an ?-olefin (b) having 3 to 20 carbon atoms, and a cyclic olefin (c), and (1) a ratio of terminal vinylation is 70% or more relative to all of both ends of molecular chains, and (2) an intrinsic viscosity [?] is in the range of 0.01 to 10 dl/g as measured in a decalin solution at 135° C. The polymer of the present invention may be molded by a LIM molding, an injection molding, a transfer molding, a compression molding, and the like, and is excellent in acid resistance, gas permeation resistance, hydrolysis resistance, and dynamic fatigue resistance. From the polymer, a thermoplastic resin composition and a crosslinkable resin composition, and a crosslinked composition having excellent mechanical characteristics are obtained.
    Type: Grant
    Filed: August 29, 2007
    Date of Patent: May 29, 2012
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Shigenobu Ikenaga, Keiji Okada, Yoshiki Shimokawatoko, Akihiro Matsuda, Shigekazu Matsui, Masahiro Enna
  • Patent number: 8182977
    Abstract: A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, wherein R0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents an alkyl group having 1 to 4 carbon atoms, and R3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R3 and R3 bonding to each other together with a carbon atom.
    Type: Grant
    Filed: March 23, 2010
    Date of Patent: May 22, 2012
    Assignee: JSR Corporation
    Inventors: Norihiko Ikeda, Hiromitsu Nakashima, Saki Harada
  • Patent number: 8168366
    Abstract: The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.
    Type: Grant
    Filed: October 16, 2008
    Date of Patent: May 1, 2012
    Assignee: International Business Machines Corporation
    Inventors: Robert David Allen, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D Truong
  • Patent number: 8163860
    Abstract: The invention relates to a norbornene copolymer having excellent properties such as transparency, heat resistance, low water absorption and electric insulating property, which copolymer comprises a monomer unit represented by formula (1) and formula (2) and having a number average molecular weight (Mn) of 300,000 to 2,000,000. (In the formulae, R1 represents an alkyl group having 1 to 10 carbon atoms; and R2, R3 and R4 independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms.
    Type: Grant
    Filed: January 29, 2010
    Date of Patent: April 24, 2012
    Assignees: Showa Denko K.K., Riken
    Inventors: Shojiro Kaita, Nobuyuki Kibino, Kazufumi Kai
  • Patent number: 8158748
    Abstract: The invention provides hetero-functional compound compounds useful in a variety of adhesive applications. More particularly, the invention provides compounds bearing at least one electron rich olefinic bond and at least one electron poor olefinic bond, wherein the two olefinic bonds are separated by a C3 to about C500 aliphatic, cycloaliphatic, or aromatic spacer.
    Type: Grant
    Filed: August 13, 2009
    Date of Patent: April 17, 2012
    Assignee: Designer Molecules, Inc.
    Inventors: Stephen M. Dershem, Farhad G Mizori
  • Patent number: 8158732
    Abstract: A method for preparing a cyclic olefin addition polymer of high gas permeability, which method including subjecting a specific type of cyclic olefin-functional siloxane and a mixture thereof with a specific type of cyclic olefin compound to addition polymerization in the presence of a multi-component catalyst containing (A) a zero-valent palladium compound, (B) an ionic boron compound, and (C) a phosphine compound having a substituent group selected from an alkyl group having 3 to 6 carbon atoms, a cycloalkyl group and an aryl group, to obtain a cyclic olefin addition polymer of high gas permeability wherein a ratio of the structural units derived from the cyclic olefin-functional siloxane is at 10 to 100 mole % of the addition polymer and a number average molecular weight (Mn) ranges from 100,000 to 2,000,000.
    Type: Grant
    Filed: July 28, 2011
    Date of Patent: April 17, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasuo Wakatsuki, Hiroaki Tetsuka
  • Patent number: 8148484
    Abstract: Norbornene-based biocidal polymers having primary, secondary or tertiary amine or phosphine end groups, the parent monomers, processes for preparing the monomers and polymers, and their use.
    Type: Grant
    Filed: October 16, 2006
    Date of Patent: April 3, 2012
    Assignee: KE Kelit Kunststoffwerk GesmbH
    Inventors: Xaver Norbert Gstrein, Wolfgang Kern, Karl Rametsteiner, Gerhard Seyfriedsberger, Franz Stelzer
  • Publication number: 20120075560
    Abstract: Disclosed therein are a photoreactive polymer, and an alignment layer comprising the same that exhibit excellences in alignment rate and alignment stability. The photoreactive polymer comprises a cyclic olefin-based repeating unit with at least one photoreactive substituent, and the maximum absolute value of a variation in dichloric ratio per unit UV dose as given by d(dichloric ratio)/d(mJ/cm2) upon exposure to a polarized UV radiation having a wavelength of 150 to 450 nm at a total exposure dose of 20 mJ/cm2 or less is at least 0.003.
    Type: Application
    Filed: September 23, 2011
    Publication date: March 29, 2012
    Applicant: LG CHEM, LTD.
    Inventors: Dong-Woo Yoo, Sung-Ho Chun, Dai-Seung Choi
  • Patent number: 8143429
    Abstract: A process for synthesizing an organic transition metal complex compound with an atom group having an electron-donor ability, in an industrially and economically advantageous manner, without a compound having a proton-donor ability being a metal salt, and a metathesis catalyst produced with the use of the above process, are provided. A process for producing an organic transition metal complex compound in which an atom group having an electron-withdrawing ability can be converted into an atom group having a stronger electron-donor ability, by contacting an compound having a proton-donor ability with the organic transition metal complex compound with an atom group having an electron-withdrawing ability, in the presence of an basic compound, and a metathesis catalyst of which the content of an alkali metal is reduced, and which is obtainable with the use of the above process, are provided.
    Type: Grant
    Filed: October 17, 2006
    Date of Patent: March 27, 2012
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Takashi Ochiai, Yuichi Okawa, Tadahiro Sunaga
  • Patent number: 8143360
    Abstract: The invention is a composition comprising a curable arylcyclobutene based oligomer or polymer and a dissolution inhibitor which comprises a compound comprising at least two diazonaphthoquinone (DNQ) moieties each of which is pendant from different phenyl groups.
    Type: Grant
    Filed: October 12, 2005
    Date of Patent: March 27, 2012
    Assignee: Dow Global Technologies LLC
    Inventors: Ying Hung So, Edmund J. Stark, Shellene K. Thurston, Kayla J. Gallant (nee Baranck), Yongfu Li
  • Patent number: 8138286
    Abstract: Cycloolefin copolymers which are distinguished by the presence of racemic diads of repeating polycyclic units and additionally by racemic triads of repeating polycyclic units are described. These copolymers can be prepared by copolymerization of polycyclic olefins with linear olefins in the presence of metallocene catalysts which have no Cs symmetry in relation to the centroid-M-centroid plane. The novel copolymers can be used for the production of shaped articles, in particular of films.
    Type: Grant
    Filed: March 19, 2008
    Date of Patent: March 20, 2012
    Assignee: Topas Advanced Polymers GmbH
    Inventors: Dieter Ruchatz, Anne-Meike Schauwienold, Peter Jörg
  • Publication number: 20120065322
    Abstract: The present invention relates to a (meth)acrylate polymer for preparing a coating composition, where the (meth)acrylate polymer has a weight-average molecular weight in the range from 10 000 to 60 000 g/mol and the (meth)acrylate polymer comprises 0.5 to 40% by weight of units derived from (meth)acrylic monomers which in the alkyl radical have at least one double bond and 8 to 40 carbon atoms, 0.1 to 10% by weight of units derived from monomers containing acid groups, and 50 to 99.4% by weight of units derived from (meth)acrylates having 1 to 12 carbon atoms in the alkyl radical that have no double bonds or heteroatoms in the alkyl radical, and these (meth)acrylates having 1 to 12 carbon atoms in the alkyl radical are selected such that a polymer composed of these (meth)acrylates having 1 to 12 carbon atoms in the alkyl radical has a glass transition temperature of at least 40° C., based in each case on the weight of the (meth)acrylate polymer.
    Type: Application
    Filed: March 2, 2010
    Publication date: March 15, 2012
    Applicant: EVONIK ROEHM GmbH
    Inventors: Stefanie Maus, Christine Maria Breiner, Cornelia Borgmann, Ulrike Behrens, Oliver Marx, Stephan Fengler
  • Publication number: 20120056249
    Abstract: Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as interlayers applied to fluoropolymer layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin interlayers and processes for preparing such polycycloolefin interlayers and electronic devices.
    Type: Application
    Filed: September 1, 2011
    Publication date: March 8, 2012
    Applicants: Promerus LLC, Merck Patent GmbH
    Inventors: David Christoph Mueller, Pawel Miskiewicz, Toby Cull, Piotr Wierzchowiec, Andrew Bell, Edmund Elce, Larry F. Rhodes, Kazuyoshi Fujita, Hendra Ng, Pramod Kandanarachchi, Steven Smith
  • Patent number: 8129086
    Abstract: A polymer suitable as a base resin for a positive resist composition, in particular a chemically amplified positive resist composition, having a higher resolution, a larger exposure allowance, a smaller sparse-dense size difference, a better process applicability, a better pattern configuration after exposure, and in addition, a further excellent etching resistance, than a conventional positive resist. A positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain the polymer. A polymer has a hydrogen atom of at least a carboxyl group is substituted by an acid labile group represented by the following general formula (2), a positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain a polymer like this.
    Type: Grant
    Filed: May 18, 2009
    Date of Patent: March 6, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takeru Watanabe, Seiichiro Tachibana
  • Patent number: 8124709
    Abstract: Embodiments of the invention provide a class of mesophase separated ethylene/?-olefin block interpolymers with controlled block sequences. The ethylene/?-olefin interpolymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, Mw/Mn, greater than about 1.4. Preferably, the block index is from about 0.2 to about 1. In addition or alternatively, the block ethylene/?-olefin interpolymer is characterized by having at least one fraction obtained by Temperature Rising Elution Fractionation (‘TREF’), wherein the fraction has a block index greater than about 0.3 and up to about 1.0 and the ethylene/?-olefin interpolymer has a molecular weight distribution, Mw/Mn, greater than about 1.4.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: February 28, 2012
    Assignee: Dow Global Technologies LLC
    Inventors: Gary R. Marchand, Yunwa W. Cheung, Benjamin C. Poon, Jeffrey D. Weinhold, Kim L. Walton, Pankaj Gupta, Colin Lipishan, Phillip D. Hustad, Roger L. Kuhlman, Edmund M. Carnahan, Eddy I. Garcia-Meitin, Patricia L. Roberts
  • Patent number: 8120168
    Abstract: Materials, and methods that use such materials, that are useful for forming chip stacks, chip and wafer bonding and wafer thinning are disclosed. Such methods and materials provide strong bonds while also being readily removed with little or no residues.
    Type: Grant
    Filed: September 20, 2007
    Date of Patent: February 21, 2012
    Assignee: Promerus LLC
    Inventors: Chris Apanius, Robert A. Shick, Hendra Ng, Andrew Bell, Wei Zhang, Phil Neal
  • Patent number: 8115036
    Abstract: The present invention relates to a fluorine-containing cyclic compound of formula (5): wherein R2-R4 and R9-R15 are independently a hydrogen atom, a halogen atom, or a C1-C25 straight-chain, branched or cyclic alkyl group, and may contain fluorine atom, oxygen atom, sulfur atom, or nitrogen atom. R10 and R11, R12 and R13, or R14 and R15 may be bonded together to form a ring. In such a case, it is a C1-C25 alkylene group that may contain a hetero atom such as oxygen, sulfur and nitrogen, “a” is 0 or 1, “b” is an integer of 0-2 and “c” is an integer of 0-2.
    Type: Grant
    Filed: April 22, 2010
    Date of Patent: February 14, 2012
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Shinichi Sumida, Michitaka Ootani, Takeo Komata, Kazuhiko Maeda
  • Patent number: 8114948
    Abstract: A copolymer composition including a copolymer having repeat units of structural formula I: where X is selected from —CH2—, —CH2—CH2— and O; m is an integer from 0 to 5; and each occurrence of R1-R4 are independently selected from H; C1 to C25 linear, branched, and cyclic alkyl, aryl, aralkyl, alkaryl, alkenyl and alkynyl that can include one or more hetero atoms selected from O, N, and Si; a group that contains an epoxy functionality; —(CH2)nC(O)OR5; —(CH2)nC(O)OR6; —(CH2)nOR6; —(CH2)nOC(O)R6; —(CH2)nC(O)R6; —(CH2)nOC(O)OR6; and any combination of two of R1, R2, R3, and R4 linked together by a linking group. A portion of the repeat units having structural formula I contain at least one epoxy functional pendant group. The copolymer composition can be included with a material that photonically forms a catalyst in a photodefinable dielectric composition, which can be used to form a photodefinable layer on a substrate.
    Type: Grant
    Filed: January 3, 2006
    Date of Patent: February 14, 2012
    Assignee: Sumitomo Bakelite Company, Ltd.
    Inventors: Edmund Elce, Takashi Hirano, Jeffrey C. Krotine, Jr., Larry F. Rhodes, Brian L. Goodall, SaiKumar Jayaraman, W. Chris McDougall, Shenliang Sun
  • Patent number: 8105749
    Abstract: There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R? each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).
    Type: Grant
    Filed: June 11, 2010
    Date of Patent: January 31, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takahiro Dazai, Takayoshi Mori, Hiroaki Shimizu, Kyoko Ohshita
  • Publication number: 20120021151
    Abstract: Shaped articles made with a partially crystalline, cycloolefin elastomer of norbornene and ethylene typically having at least one glass transition temperature (Tg) in the range of from ?10° C. to 15° C. and a crystalline melting temperature in the range of from 60° C. to 125° C. and a % crystallinity by weight in the range of from 5% to 40%. The shaped articles may be in the form of medical tubing; a contact lens mold or component thereof; a container such as a bottle, a squeeze bottle or a squeeze tube; an eyedropper or eyedropper component; an elastomeric closure, optionally a pierceable elastomeric closure or the shaped article is selected from shrink film and/or shrink tubing.
    Type: Application
    Filed: September 29, 2011
    Publication date: January 26, 2012
    Inventors: Paul D. Tatarka, Timothy M. Kneale, Barbara Canale-Schmidt
  • Publication number: 20120018710
    Abstract: A polymerizable monomer represented by the following formula (1) which is substituted by one or more groups comprising a polymerizable functional group wherein Ar1 and Ar4 to Ar6 are independently a substituted or unsubstituted aryl group having 6 to 40 ring carbon atoms; and Ar2, Ar3 and L1 are a substituted or unsubstituted arylene group having 6 to 40 ring carbon atoms:
    Type: Application
    Filed: February 9, 2010
    Publication date: January 26, 2012
    Inventors: Mitsuru Eida, Masami Watanabe, Masahiko Fukuda, Nobuhiro Yabunouchi
  • Patent number: 8101697
    Abstract: A method for preparing multi-functional high-trans elastomeric polymers that have various applications such as in vulcanizable rubber compositions, moisture curable resin compositions, as well as other areas.
    Type: Grant
    Filed: February 1, 2006
    Date of Patent: January 24, 2012
    Assignee: Bridgestone Corporation
    Inventors: James H. Pawlow, Takayuki Yako, Jason T. Poulton, Sandra Warren, Christopher Robertson
  • Publication number: 20120015116
    Abstract: This disclosure relates to photoreactive polymer exhibiting more rapid photoreaction speed and excellent alignment, a preparation method thereof, and an alignment layer comprising the same. The photoreactive polymer comprises a specific repeat unit including an azo type functional group in the content of 50 mole % or more of the total polymer.
    Type: Application
    Filed: July 15, 2011
    Publication date: January 19, 2012
    Inventors: Dai-Seung CHOI, Sung-Ho CHUN, Young-Chul WON, Dong-Woo YOO
  • Publication number: 20120010381
    Abstract: The present invention relates to a specific photoreactive polymer that shows excellent alignment stability and thermal stability together with excellent liquid crystal alignment, thereby being desirably used in an alignment film of a liquid crystal display device, a compound having a photoreactive functional group that is used as a monomer for the preparation of the photoreactive polymer, and an alignment film.
    Type: Application
    Filed: July 6, 2011
    Publication date: January 12, 2012
    Inventors: Dai-Seung CHOI, Sung-Ho Chun, Young-Chul Won, Dong-Woo Yoo
  • Patent number: 8084563
    Abstract: A cyclic olefin addition copolymer includes a structural unit (1) derived from a cyclic olefin compound with a C4 alkyl substituent group and a structural unit (2) derived from a cyclic olefin compound with a C5-12 alkyl substituent group, and optionally includes a structural unit (3) derived from another cyclic olefin compound. The novel cyclic olefin addition copolymers according to the present invention are excellent in melt-formability, transparency and heat resistance, have low water absorption properties, low dielectric constant and low metal content, and are suitably used in optical parts such as optical films. Processes according to the present invention produce the cyclic olefin addition copolymers at high yield with small amounts of catalysts.
    Type: Grant
    Filed: July 4, 2007
    Date of Patent: December 27, 2011
    Assignee: JSR Corporation
    Inventors: Toshinori Sakagami, Takashi Imamura, Takashi Tsubouchi
  • Publication number: 20110313120
    Abstract: Described is a cyclobutene polymer comprising: monomeric units of cyclobutene, said cyclobutene having at least one fused ring system substituted thereon, said polymer comprising not more than 10 mol percent ring-opened units of said cyclobutene; and said polymer having a molecular weight of at least 1,000; said polymer optionally copolymerized with a comonomer to form a copolymer therewith. Compositions thereof and methods of making the same are also described.
    Type: Application
    Filed: August 30, 2011
    Publication date: December 22, 2011
    Inventors: Bruce M. Novak, Keitaro Seto
  • Patent number: 8080623
    Abstract: A polymerizable composition suitable as an electric material and the like used in an electric circuit board, which comprises a norbornene monomer, a metathesis polymerization catalyst, and a chain transfer agent composed of a compound represented by formula (A): CH2?CH—Y—OCO—CR1?CH2 wherein Y represents a divalent hydrocarbon group having 3 to 20 carbon atoms, and R1 represents a hydrogen atom or a methyl group. By further comprising a crosslinking agent in the polymerizable composition, obtaining a crosslinkable resin by carrying out bulk polymerization, and crosslinking the crosslinkable resin to obtain a molded article and a crosslinked resin composite having excellent characteristics such as electric insulation, adhesion, mechanical strength, heat resistance, dielectric properties and the like.
    Type: Grant
    Filed: October 19, 2007
    Date of Patent: December 20, 2011
    Assignee: Zeon Corporation
    Inventors: Kiyoshige Kojima, Junji Kodemura
  • Patent number: 8067516
    Abstract: A copolymer for positive type lithography, having at least a recurring unit (A) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (A) [in the formula (A), R10 is a hydrogen atom or a hydrocarbon group which may be substituted by fluorine atom; R11 is a crosslinked, alicyclic hydrocarbon group; n is an integer of 0 or 1; and R12 is an acid-dissociating, dissolution-suppressing group], and a terminal structure (B) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (B) [in the formula (B), R21 is a hydrocarbon group which may contain nitrogen atom; R22 is an acid-dissociating, dissolution-suppressing group; and p is a site of bonding with copolymer main chain]. The copolymer is used in chemically amplified positive type lithography and is superior in lithography properties (e.g.
    Type: Grant
    Filed: May 4, 2007
    Date of Patent: November 29, 2011
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Minoru Iijima, Takanori Yamagishi
  • Patent number: 8063163
    Abstract: A novel cycloolefin copolymer that can be employed in the production of molding with fewer defects, for example, fewer gel particles (fish eyes). There is provided a cycloolefin copolymer comprising 80 to 20 mol % of repeating units derived from an ?-olefin monomer and 20 to 80 mol % of repeating units derived from at least one cycloolefin monomer selected from the group consisting of monomer of the general formula (I), monomer of the general formula (II), monomer of the general formula (III), monomer of the general formula (IV) and monomer of the general formula (V), wherein with respect to the repeating units derived from cycloolefin monomer, the proportion thereof being present in the form of dimer (Rd) is 50 mol % or below and the proportion thereof being present in the form of trimer (Rt) 5 mol % or above.
    Type: Grant
    Filed: November 24, 2005
    Date of Patent: November 22, 2011
    Assignees: Polypastics Co., Ltd., Topas Advanced Polymers GmbH
    Inventors: Wilfried Hatke, Matthias Bruch, Anne-Meike Schauwienold, Udo Manfred Stehling, Hiroyuki Kanai, Hajime Serizawa, Hiroshi Hiraike, Takahiko Sawada, Kazunari Yagi, Isao Higuchi, Katsunori Toyoshima, Takeharu Morita
  • Patent number: 8053531
    Abstract: A hydrogenated crystalline norbornene ring-opening polymer is obtained by hydrogenating 80% or more of carbon-carbon double bonds of a ring-opening polymer that is obtained by ring-opening polymerization of norbornene monomers including 90 to 100 wt % of 2-norbornene and 0 to 10 wt % of a 2-norbornene derivative having a substituent which does not include an aliphatic carbon-carbon double bond in the presence of a branching agent, the hydrogenated crystalline norbornene ring-opening polymer having a melting point of 110 to 145° C. and a branching index of 0.3 to 0.98, and a molded article is obtained by molding the hydrogenated crystalline norbornene ring-opening polymer. The hydrogenated crystalline norbornene ring-opening polymer has excellent industrial productivity, and the molded article has excellent productivity and moisture resistance.
    Type: Grant
    Filed: February 27, 2009
    Date of Patent: November 8, 2011
    Assignee: Zeon Corporation
    Inventors: Takeshi Hirata, Takashi Houkawa, Hiroaki Matsuda, Yosuke Naka
  • Patent number: 8048612
    Abstract: A polymer comprising a structural unit represented by the formula (Ia) or (Ib): wherein R1 represents a hydrogen atom etc., R2 represents a linear, branched chain or cyclic C1-C8 alkyl group, R3 represents a methyl group, n represents an integer of 0 to 14, Z1 represents a single bond etc., k represents an integer of 1 to 4, R4 and R5 each independently represents a hydrogen atom etc., and m represents an integer of 1 to 3, a structural unit represented by the formula (II): wherein R6 and R7 each independently represents a hydrogen atom etc., R8 represents a methyl group, R9 represents a hydrogen atom etc., n? represents an integer of 0 to 12, Z2 represents a single bond etc., k? represents an integer of 1 to 4, R21 and R22 each independently represents a hydrogen atom etc.
    Type: Grant
    Filed: May 18, 2009
    Date of Patent: November 1, 2011
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yusuke Fuji, Mitsuhiro Hata
  • Publication number: 20110263806
    Abstract: The invention relates to a copolymer for producing molded compounds or cast glass for the production of molded bodies having increased dimensional stability under heat, obtainable from the copolymerization of A) one or more ethylenically unsaturated ester compounds of the formula (I), where R1 is hydrogen or methyl and R2 a linear or branched alkyl group with 1 to 8 carbon atoms, B) one or more ethylenically unsaturated ester compounds of the formula (II), where R3 is hydrogen or methyl and R4 a cyclic group with 8 to 30 carbon atoms, C) one or more ethylenically unsaturated ester compounds of the formula (III), where R5 is hydrogen or methyl and R6 and R7, independently of each other, are hydrogen or a linear or branched group with 1 to 40 carbon atoms.
    Type: Application
    Filed: October 15, 2009
    Publication date: October 27, 2011
    Applicant: Evonik Roehm GmbH
    Inventors: Gerald Dietrich, Ruediger Carloff, Wilhelm Karnbrock, Joachim Knebel, Zhong Shen, Chiew-Chiang Haw
  • Patent number: 8034532
    Abstract: A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.
    Type: Grant
    Filed: April 28, 2006
    Date of Patent: October 11, 2011
    Assignee: International Business Machines Corporation
    Inventors: Robert David Allen, Phillip Joe Brock, Carl E. Larson, Ratnam Sooriyakumaran, Linda Karin Sundberg, Hoa D Truong
  • Publication number: 20110244249
    Abstract: An intermediate transfer media, such as a belt, that includes a cyclo olefin polymer.
    Type: Application
    Filed: March 30, 2010
    Publication date: October 6, 2011
    Applicant: XEROX CORPORATION
    Inventor: Jin Wu
  • Publication number: 20110245443
    Abstract: Disclosed is a method for producing a norbornene monomer composition, a norbornene polymer produced using the norbornene monomer composition, an optical film including the norbornene polymer, and a method for producing the norbornene polymer. The method includes reacting a reaction solution that contains cyclopentadiene, dicyclopentadiene, or a mixture of cyclopentadiene and dicyclopentadiene, an acetate compound, and a solvent so that a content of an exo isomer is 50 mol % or more. Variables such as a reaction temperature, a reaction time, a molar ratio between reactants, and addition of a solvent are controlled so that the exo isomer is contained in content of 50 mol % or more. Accordingly, it is possible to industrially produce an acetate norbornene addition polymer by using the acetate norbornene monomer composition containing the exo isomer in content of 50 mol % or more.
    Type: Application
    Filed: April 6, 2011
    Publication date: October 6, 2011
    Inventors: Dai-Seung CHOI, Hye-Young Jung, Sung-Don Hong, Jung-Min Lee, Hee-Jean Lee, Sung-Ho Chun