Abstract: A device for drying containers, especially bottles, includes a substantially closed drying chamber, with an inlet opening, an outlet opening, and a transport system for the containers. The containers are transported through the drying chamber standing in an upright position. An air supply opening supplies drying air. At least one cleaning device chemically and or mechanically cleans the interior of the drying chamber, whereby a cleanser and/or a disinfectant can be injected into the interior of the drying chamber, distributed inside the drying chamber and removed from the drying chamber through the cleaning device. A method for cleaning a device for drying containers, whereby the at least one cleanser and/or disinfectant is injected into the interior of the drying chamber, distributed inside the drying chamber and removed from the drying chamber through the cleaning device.

Abstract: Systems and methods for cleaning the interior surfaces of tubular members are provided. A flexible conduit having a nozzle disposed on an end can be disposed within the bore of a tubular to be cleaned. The nozzle can have an internal 5-15 degree tapered section with a length-to-diameter ratio of greater than about 2:1. The nozzle can have an outer diameter that is about 80% to 99% of the inner diameter of the tubular. A fluid suspension containing air and solid carbon dioxide can be passed through the nozzle, impinging the surrounding inner surface of the surrounding tubular as the nozzle is disposed within the tubular. The solid carbon dioxide and compressed air suspension can have a solids concentration of from about 0.1% to 10.0% solids. The solids delivery rate through the nozzle can range from about 0.5 lbs/minute to about 5 pounds/minute. The flow of the suspension through the nozzle can be controlled using a remote device.

Abstract: A method for using a film formation apparatus for a semiconductor process to form a thin film on a target substrate while supplying a film formation reactive gas from a first nozzle inside a reaction chamber includes performing a cleaning process to remove a by-product film deposited inside the reaction chamber and the first nozzle, in a state where the reaction chamber does not accommodate the target substrate. The cleaning process includes, in order, an etching step of supplying a cleaning reactive gas for etching the by-product film into the reaction chamber, and activating the cleaning reactive gas, thereby etching the by-product film, and an exhaust step of stopping supply of the cleaning reactive gas and exhausting gas from inside the reaction chamber. The etching step is arranged to use conditions that cause the cleaning reactive gas supplied in the reaction chamber to flow into the first nozzle.

Abstract: A method of using a rendering trailer, the rendering trailer including a dump box or trailer body with a center gate dividing the interior chamber of the trailer body into forward and rearward compartments, from which dead animal parts may be respectively dumped in different locations. A doorway is formed in the center gate to allow a person to walk therethrough to facilitate washing the forward and rearward compartments. A rigid door is mounted on the center gate to open and close the doorway. Opening the door allows the person to walk through the doorway and wash the compartments. A hose may be draped over a sidewall of the trailer and pulled through the doorway to spray the forward compartment. Perforated panels may be mounted along lower ends of left and right side walls of the trailer body to allow water and other fluids to drain therethrough.

Abstract: In a method of manufacturing a semiconductor device, a substrate is loaded to a process chamber having, unit process sections in which unit processes are performed, respectively. The unit processes are performed on the substrate independently from one another at the unit process sections under a respective process pressure. The substrate sequentially undergoes the unit processes at the respective unit process section of the process chamber. Cleaning processes are individually performed to the unit process sections, respectively, when the substrate is transferred from each of the unit process sections and no substrate is positioned at the unit process sections. Accordingly, the process defects of the process units may be sufficiently prevented and the operation period of the manufacturing apparatus is sufficiently elongated.

Abstract: Provided is a method for sterilizing a water treatment apparatus having a plurality of tanks. The method includes, performing a sterilization preparation process to drain purified water from the first tank until a first amount of purified water is left, performing a sterilizing process to sterilize the first tank by supplying the sterilized water supplied from the sterilizing module, to drain water from the first tank through a first water outlet pipe until a second amount of water is left in the first tank, and to drain the second amount of water remaining in the first tank into the second tank through a second water outlet pipe.

Abstract: A cleaning method for cleaning a droplet ejector, which includes nozzles to eject a particulate material composition liquid, and a nozzle plate bearing the nozzles is provided. The cleaning method includes forming a substantially closed cleaning space outside the nozzles and the nozzle plate; supplying a cleaning liquid to the cleaning space so that the nozzles and the nozzle plate are contacted with the cleaning liquid; and vibrating the cleaning liquid when the nozzles and the nozzle plate are contacted with the cleaning liquid to clean the nozzles and the nozzle plate.

Abstract: The present invention is generally directed toward methods of cleaning and descaling surfaces contaminated with food soils, especially clean-in-place systems. More particularly, the methods according to the present invention also provide for sanitizing of surfaces contaminated with food soils. Thus, there is provided a single cleaning cycle that may clean, sanitize, and descale food-soiled surfaces, and in certain embodiments, without the need for a pre-rinse step, using an acidic detergent composition comprising a fatty alkyl-1,3-diaminopropane or salt thereof in the presence of an acid selected from the group consisting of inorganic acids, organic acids, and mixtures thereof.

Abstract: A water heating system is provided. The water heating system includes an inlet connectable to a supply of untreated water, supply and return lines connectable to a point-of-use water treatment system, and an output for dispensing a supply of treated and optionally heated water. An internal heating element is adapted to heat the treated water to one of a plurality of pre-selected temperature settings. Temperature control can be achieved by cycling the power applied to the heating element and/or controlling the flow rate of treated water through the heating element. The water heating system includes additional improvements in electrical compatibility, energy consumption, and remote failure detection.

Abstract: When a dry cleaning process is performed in a processing chamber by adding nitrogen monoxide (NO) gas to a cleaning gas, the handling is facilitated, and cleaning performance is improved. A substrate processing apparatus includes a processing vessel configured to process a substrate, a first cleaning gas supply system configured to pre-mix a gas containing fluorine atoms with the NO gas and supply the pre-mixed gas into the processing vessel, and a second cleaning gas supply system installed apart from the first cleaning gas supply system and configured to supply the fluorine-containing gas into the processing vessel.

Abstract: The method of the invention comprises the following steps: during the disinfection (A) of the apparatus, recording (1) with an acquisition and processing system the disinfection date and data relative to the apparatus disinfection type and level together with identification information of said apparatus; during the use (C) of the apparatus on a patient, recording (5) with said system the date and information concerning the apparatus type of use and the patient together with identification information of said apparatus; sequencing with the acquisition and processing system the information on the disinfection and use on a patient together with identification information of said apparatus; before each use, developing using the acquisition and processing system an instruction allowing or forbidding (6) the use of the apparatus based on the sequencing.

Abstract: Methods for removing and preventing the buildup of unwanted deposits and varnishes on combustion chamber surfaces, particularly injector-igniter components that are exposed to combustion events. A method of removing deposits from an injector-igniter comprises monitoring the current across a pair of electrodes in the injector-igniter, comparing the current with a predetermined threshold level, and performing a cleaning cycle if the current exceeds the threshold level. The cleaning cycle may comprise injecting oxidant through the injector-igniter and into the combustion chamber. The cleaning cycle may further comprise ionizing the oxidant with an electrical discharge having a first polarity and ionizing the oxidant a second time with an electrical discharge having a second polarity. In other cases the cleaning cycle comprises injecting hydrogen through the injector-igniter and into the combustion chamber. In still other cases the cleaning cycle may comprise injecting coolant onto the electrodes.

Abstract: A method of simultaneously cleaning and disinfecting an industrial water system is described and claimed. The method involves the addition to the water of the industrial water system of a Compound selected from the group consisting of the alkali salts of chlorite and chlorate and mixtures thereof; and an acid, followed by allowing the water in the industrial water system to circulate for several hours. The reaction of the alkali salts of chlorite and chlorate and acid produces chlorine dioxide in-situ in the water of the industrial water system. The chlorine dioxide kills microorganisms and the acid acts to remove deposits upon the water-contact surfaces of the equipment. This cleaning and disinfecting method works in a variety of industrial water systems including cooling water systems.

Abstract: A part washing device includes an air inlet; a first valve to regulate air coming into the washing device through the air inlet; a liquid inlet; a second valve to regulate liquid entering the washing device through the liquid inlet; a connector to receive air and liquid from the first valve and the second valve; and a tube to receive the liquid and/or air from the connector and direct the air and/or liquid towards a portion of the part.

Abstract: The invention relates to a device for mechanized emptying of poultry holders and subsequent cleaning of a support structure of the emptied poultry holders on an underside only. The invention also relates to a method for mechanized emptying of poultry holders and subsequent cleaning of a support structure of the emptied poultry holders on an underside only.

Abstract: A method for operating a dishwasher that includes a plurality of water circuits in which rinsing liquid is circulated according to a program control unit. In an exemplary method, the circulation of the rinsing liquid results in the passage of the rinsing liquid through at least one filter element that captures dirt entrained with the rinsing liquid. In response to a selected one of a program command provided by the program control unit and a detection of a defined degree of soiling of the filter element with dirt, the method includes circulating the rinsing liquid in a second water circuit in coordination with disposing the filter element in a second operating state thereof in which dirt can be dislodged from the filter element.

Abstract: A single serving beverage infuser and method of pretreating the same is disclosed herein. In one embodiment, the beverage infuser comprises a receptacle for receiving a charge of beverage infusing material and a tether attached to a top end of the receptacle for suspending the receptacle, the tether being configured such that at least a portion of the tether is capable of hooking onto at least a portion of a beverage container wherein a beverage is to be infused. Preferably, the infuser is made from natural bamboo fibers and, accordingly, the method of pretreating the beverage infuser removes the undesirable woody and bitter taste present in the bamboo fibers.

Abstract: A method for controlling a dishwasher includes sequentially performing a first main washing step, a second main washing step, and a third main washing step. The first main washing step includes supplying washing water, which is heated by a sump heater, to a washing chamber. The second main washing step includes selectively performing a steam spraying action for supplying steam to the washing chamber, and performing a water supplying action for supplying washing water to the washing chamber. The third main washing step includes supplying washing water, heated by the sump heater, to the washing chamber.

Abstract: Disclosed is a wedge bonder, comprising a wedge for bonding a wire to surfaces to form an electrical interconnection therebetween, a cleaning device for cleaning the wedge, and a positioning device to which the wedge is mounted. In particular, the positioning device is operative to move the wedge to the cleaning device for cleaning. A method of cleaning a wedge of a wedge bonder is also disclosed.

Abstract: Embodiments of the invention generally provide methods for cleaning a UV processing chamber. In one embodiment, the method includes flowing an oxygen-containing gas through a plurality of passages formed in a UV transparent gas distribution showerhead and into a processing region located between the UV transparent gas distribution showerhead and a substrate support disposed within the thermal processing chamber, exposing the oxygen-containing gas to UV radiation under a pressure scheme comprising a low pressure stage and a high pressure stage to generate reactive oxygen radicals, and removing unwanted residues or deposition build-up from exposed surfaces of chamber components presented in the thermal processing chamber using the reactive oxygen radicals.

Abstract: An improved method for cleaning heat exchange tube bundles, fin-fans, and other elongated components, using a portable cleaning system comprising a cleaning unit having a cleaning enclosure that receives and cleans the component and a control unit that controls the operation of the system. The cleaning unit has a cleaning enclosure defining a chamber sized and configured to receive the component through a sealable lid. A roller assembly rotates the component while a spray assembly sprays cleaning fluid over and into the rotating component. The cleaning fluid is heated in the chamber using surface heating elements attached to heat transfer plates along sections of the chamber walls. A vapor recovery system captures and treats toxic vapors. In use, the cleaning system is transported to a facility to clean the components on-site using cleaning fluid supplied by the facility and discharging waste to the facility.

Abstract: A substrate processing apparatus includes a substrate holding part, a substrate rotating mechanism, and a chamber. The substrate rotating mechanism incudes an annular rotor part disposed in an internal space of the chamber and a stator part disposed around the rotor part outside the chamber. The substrate holding part is attached to the rotor part in the internal space of the chamber. In the substrate rotating mechanism, a rotating force is generated about a central axis between the stator part and the rotor part. The rotor part is thereby rotated about the central axis, being in a floating state, together with a substrate and the substrate holding part. In the substrate processing apparatus, the substrate can be easily rotated in the internal space having excellent sealability. As a result, it is possible to easily perform single-substrate processing in a sealed internal space.

Abstract: A cleaning substrate that can prevent a decrease in the operating rate of a substrate processing apparatus. The cleaning substrate that cleans the interior of a chamber in the substrate processing apparatus has a removal mechanism that removes foreign matter in the chamber.

Abstract: An apparatus for treating containers, including a transport device which transports the containers along a specified transport path, the transport device including a plurality of holding elements for holding the containers, with the holding elements being transported along the specified transport path. The apparatus includes a cleaning device for sterilizing the holding elements at least in sections.

Abstract: A method of blast cleaning the inside of a hollow article, such as a storage tank. The method includes the introduction of outside air and evacuation of inside air to permit blast cleaning to be carried out while managing the conditions within the enclosed interior space within the hollow article. Managing the interior space conditions permits rapid application of protective coatings to the cleaned surface.

Abstract: A portable automated mini-bulk container rinsing system for rinsing mini-bulk containers in a closed, efficient environmentally friendly and economical manner is disclosed. The system includes a cap attachable to a mini-bulk container opening; a rigid tube extending from the cap configured to extend into the mini-bulk container interior; a spray head coupled to the tube at a distal end of the tube spaced from the cap and configured to be within the mini-bulk container interior when the cap is attached to the mini-bulk container opening; and a fluid coupling member attached to an end of the rigid tube opposite the spray head and adapted to be coupled to a source of cleaning fluid, wherein fluid under pressure can flow from the source, through the fluid coupling, through the tube and through the spray head to rinse the mini-bulk container when the cap is coupled to the mini-bulk container opening.

Abstract: A method for removing sludge from a crude oil storage tank comprising a bottom and a moveable roof configured to float on the top of a quantity of crude oil disposed in said storage tank, where the method includes reducing a volume of crude oil in the storage tank to about a level of a sludge sediment in the storage tank, measuring a topology of the sludge disposed on said bottom, reliquefying asphaltene deposits, pumping the reliquefying asphaltene deposits out of the storage tank, wherein the method is performed without the entry of one or more persons into said storage tank.

Abstract: System and method for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the vaporizer, vaporizing the precursor in the vaporizer and supplying the vaporized precursor to a reaction chamber in fluid communication with the vaporizer, and shutting down the vaporizer and the reaction chamber after a period of time. The method can also include conducting maintenance of the injector at the vaporizer by using a vapor solvent rinse.

Abstract: An aqueous cleaning solution that has been previously used to remove deposits from a nuclear steam generator (or other vessel) is reused after being transferred from the steam generator into an external vessel. The spent cleaning solution may be reconditioned and reused in a further cleaning of the same steam generator or a different steam generator. The different cleanings being accomplished by the cleaning solution may be of the same type or different types (e.g., iron oxide removal and/or copper removal).

Abstract: Disclosed is a method for cleaning deposits from one or more parts of an engine fuel delivery system, the method comprising introducing into the engine fuel delivery system a cleaning composition comprising (a) one or more aromatic hydrocarbon solvents; and (b) one or more propylene glycol ethers.

Abstract: A mobile cleaning device for cleaning parts of a burner is provided. The mobile cleaning device includes a closable pressure vessel, wherein a nozzle end of the burner is located inside the pressure vessel. An end of the burner, which is used for supplying fuel and is arranged opposite from the nozzle end, is located outside the pressure vessel. Further, a method for cleaning parts of the burner is provided.

Abstract: A rotary impingement cleaning apparatus is configured for use in sanitary environments with a minimum of components to enable easy inspection and cleaning. The components of the cleaning apparatus are formed to fit relatively loosely to one another and promote self flushing and self drainage of cleaning liquid. A stator is mounted within a housing for diverting the flow of the pressurized cleaning liquid from axial to angular to impinge and rotationally drive a rotator stem or a rotor. The rotator stem or rotor causes an elbow to rotate around the vertical axis and a number of nozzles mounted to a nozzle housing to rotate around the horizontal axis.

Abstract: An air wiping device for cleaning an elongated product that passes through the air wiping device. The air wiping device includes a housing having an internal tubular passage through which the elongated product extends with the housing tubular passage having an inlet end and an outlet end for respectively receiving and passing the elongated product; a plurality of air outlets mounted in the housing and adapted to direct a flow of compressed air in a direction having a component in an opposite direction to the flow of the elongated product through the housing; and a ceramic insert disposed in the internal tubular passage of the housing and through which the elongated product passes. The ceramic insert includes a tapered input through which the elongated product is received and an output through which the elongated product passes from the housing.

Abstract: Methods of cleaning a processing chamber with nitrogen trifluoride (NF3) are described. The methods involve a concurrent introduction of nitrogen trifluoride and a reactive diluent into the chamber. The NF3 may be excited in a plasma inside the chamber or in a remote plasma region upstream from the chamber. The reactive diluent may be introduced upstream or downstream of the remote plasma such that both NF3 and the reactive diluent (and any plasma-generated effluents) are present in the chamber during cleaning. The presence of the reactive diluent enhances the chamber-cleaning effectiveness of the NF3.

Abstract: A method for removal of wax deposited on an inner wall in contact with a fluid stream. The method includes the steps of cooling the inner wall and the fluid stream to a temperature of or below the wax appearance temperature, enabling wax to dissolve and precipitate on the inner wall, and heating of the inner wall for a short period of time to release the deposited wax from the surface of the inner wall, mainly in the form of solid parts. The thickness of wax deposits in a pipe section can be determined by computing the temperatures obtained upstream and downstream in the said pipe section, before and after applying heat pulse.

Abstract: An external coil assembly for a transcutaneous system is disclosed. The assembly comprises: a housing having a skin-adjacent surface, an opposing exposed surface and a threaded shaft open to the exposed surface and extending toward the skin-adjacent surface; an external coil secured within the housing; and a magnet with a threaded exterior surface to threadingly engage the threaded shaft, wherein at least one of either the shaft thread or the magnet thread has at least one transverse channel forming discontinuities in the thread.

Abstract: A teat cup cleaning device comprises a heating chamber provided with a discharge outlet that is closable by a valve and arranged for connection to a teat cup. A filling device is arranged for filling the heating chamber with an amount of cleaning liquid and retaining a given quantity of gas. The chamber is provided with a heating arrangement arranged to heat the contents of the heating chamber to a temperature T higher than the boiling point Tk of the cleaning liquid at ambient pressure. On operation of the valve superheated cleaning liquid is discharged to clean a teat cup.

Abstract: A tool that includes a handle and a head extending from the handle. A stationary shoe portion of the head levels tobacco as the tool pulls the tobacco down a chute of a cigarette-packing device and into a chamber of the cigarette-packing device. A pair of movable arm portions of the head eliminate dust of the tobacco from being pulled into the chamber of the cigarette-packing device by skipping over the dust of the tobacco being pulled down the chute of the cigarette-packing device, and packs the ends of the tobacco in the chamber of the cigarette-packing device more densely so as to form end plugs that prevent the tobacco from leaving a paper tube to thereby prevent collapsing of a finished cigarette.

Abstract: A method for cleaning a gassing manifold includes providing a gassing module and a complementary clean in place module for coupling to the gassing module. Cleaning solution is pumped from the clean in place module to the gassing module above a minimum flow rate and velocity for effective cleaning.

Abstract: A method for cleaning a component comprises a first stage including the steps of: (i) loading a component into the cleaning chamber of a flush station, (ii) directing a deionized water stream through first filter means, (iii) introducing carbon dioxide into the filtered water stream, (iv) directing the carbonated water stream into a fluid passage to be cleaned in the component, and (v) collecting the dirty water stream after it passes through the component and directing the collected dirty water stream through second filter means for reuse. The method can further include a second stage including the steps of: (vi) loading the component into a testing chamber of a testing station, (vii) directing a deionized water stream through third filter means, (viii) directing the filtered water stream into the fluid passage in the component, and (ix) collecting the water stream after it passes through the component and directing the collected water stream into a particle counter.

Abstract: A method and apparatus for cleaning residue from components of semiconductor processing systems used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive material for sufficient time and under sufficient conditions to at least partially remove the residue. When the residue and the material from which the components are constructed are different, the gas-phase reactive material is selectively reactive with the residue and minimally reactive with the materials from which the components of the ion implanter are constructed. When the residue and the material from which the components are constructed is the same, then the gas-phase reactive material may be reactive with both the residue and the component part.

Abstract: The device according to the invention is used to clean medical instruments having at least one instrument cavity and at least two openings, wherein the device has a first fastening module for detachably fastening the medical instrument and a second fastening module for detachably fastening a first container for receiving liquid (insert in drawing) and/or air (insert in drawing), wherein the device comprises a cleaning device cavity which is designed such that when the medical instrument and container are fastened, the liquid and/or air can be flushed from the interior of the container through the cleaning device cavity into the instrument cavity.

Abstract: Improved methods and apparatuses for removing residue from the interior surfaces of the deposition reactor are provided. The methods involve increasing availability of cleaning reagent radicals inside the deposition chamber by generating cleaning reagent radicals in a remote plasma generator and then further delivering in-situ plasma energy while the cleaning reagent mixture is introduced into the deposition chamber. Certain embodiments involve a multi-stage process including a stage in which the cleaning reagent mixture is introduced at a high pressure (e.g., about 0.6 Torr or more) and a stage the cleaning reagent mixture is introduced at a low pressure (e.g., about 0.6 Torr or less).

Abstract: A method for plasma-etching a magnetic film and plasma-cleaning, in which deposits in an etching processing chamber are efficiently removed while corrosion of a wafer is suppressed, is provided. A plasma processing method for plasma-etching a to-be-processed substrate having a magnetic film in an etching processing chamber includes the steps of plasma-etching the magnetic film using a first gas not containing chlorine, transferring out the to-be-processed substrate from the etching processing chamber, first plasma-cleaning of the etching processing chamber using a second gas containing chlorine, and second plasma-cleaning using a third gas containing hydrogen after the first plasma cleaning.

Abstract: A system and method for semiconductor processing chamber includes a housing that can cover an annular gap of a pedestal well of the semiconductor processing chamber. A cleaning nozzle is removably coupled to a compressed dry air (CDA) supply. The cleaning nozzle can inject the CDA into the pedestal well while the housing can contain a byproduct dust agitated by the injected CDA. The byproduct dust is evacuated by at least one vacuum port that is removably coupled to a vacuum source.

Abstract: An automated cleaning system for an aircraft fuselage interior is provided. The system has a movable assembly designed to fit within an aircraft fuselage interior to be cleaned. The movable assembly has a removable track assembly and an automated transport mechanism mounted on the removable track assembly, the automated transport mechanism being a guided cart that travels on the removable track assembly. The movable assembly further has a manifold and frame assembly mounted on the automated transport mechanism and a fluid dispensing assembly coupled to the manifold and frame assembly for dispensing fluids onto an aircraft fuselage interior surface. The system further has a fluid management system coupled to the movable assembly for supplying the fluids to the fluid dispensing assembly. The system further has a control system that communicates with and controls the movable assembly and the fluid management system.

Abstract: A method for cleaning containers, in particular bottles of glass or plastics, and a cleaning machine with at least one cleaning medium, with the containers cleaned at least in one station preferential for the cleaning result and/or in a procedure step with at least essentially chemical-free cleaning media. The cleaning medium is advantageously a granular material, in particular granular ice, carried under pressure with compressed air or compressed water. The cleaning machine suited for carrying out the method includes downstream of an unpacking and presoaking station, a pre-cleaning station with a high pressure water blasting pre-cleaning section, and subsequently an intensive cleaning station with at least one intensive cleaning section to which a pressure blasting system for chemical-free, granular material and a carrier medium are associated, and a disinfection station following the intensive cleaning station.

Abstract: Transport scheduling and transport processes for low microbial (“LM”) bulk products are described. The transport scheduling and processes facilitate low microbial activity in a LM bulk product during the transport of the LM bulk product.

Abstract: Transport scheduling and transport processes for low microbial (“LM”) bulk products are described. The transport scheduling and processes facilitate low microbial activity in a LM bulk product during the transport of the LM bulk product.

Abstract: A nozzle cleaning method includes cleaning an outer wall of a dispenser nozzle after liquid is sucked and before the liquid is discharged and cleaning at least an inner wall of the dispenser nozzle after the liquid is discharged.