Abstract: The present disclosure provides a system and method for a cleaning apparatus that includes a swash assembly for allowing independent control of the nozzle pitch from the nozzle rotation, and further includes supplying a cleaning fluid through the same apparatus used to rotate the nozzle. The method and system allows cleaning with spray patterns of substantially 360 degrees spherical ranges of motion. The nozzle angle can be controlled by hydraulic cylinders that can reversibly translate a rack along a longitudinal axis of a nozzle assembly to engage a pitch gear coupled to the nozzle. The system is automatically resettable to a default position upon failure of hydraulic pressure. Generally, a plurality of nozzles are used to balance the side forces on the main mast. A remote control system allows an operator to design and control an optimal cleaning procedure, and to adjust the nozzle rotation, angle, and cleaning regime.

Abstract: The coffee machine comprises: a water tank (11); at least one first pump (17); at least one first boiler (31) for heating the water; a coffee brewing unit (25); and circuits to feed hot water and/or steam, with a first outlet (43) for hot water or steam towards an emulsifying device which can be connected to a connection joint (35) of the coffee machine; a second outlet for hot water and/or wash water.

Abstract: The invention relates to a protective cap for sealing a connector for a container containing medical substances, a connector system and a method for cleaning and/or disinfecting a surface of a recessed membrane of a connector. The protective cap (1, 1?) according to the invention comprises an external cap section (2) and an internal cap section (3), wherein a substantially annular hollow space (4) is formed between the external cap section (2) and the internal cap section (3) for the insertion of an annular connection component (21) of a connector (20), wherein the internal cap section (2) contains a swab (5, 5?, 5?) for cleaning and/or disinfecting a membrane (23) of the connector (20) set back from the edge (22) of the connection component (21).

Abstract: A plasma processing apparatus is provided with a first exhaust path which extends downward from an exhaust hole; a second exhaust path which is connected to a downstream end portion of the first exhaust path in the exhausting direction and extends in a direction perpendicular to a direction in which the first exhaust path extends, and whose cross-section, which orthogonally intersects with the exhausting direction, is horizontally long such that a widthwise length is greater than a vertical length in the cross-section; a third exhaust path which is connected to a downstream end portion of the second exhaust path in the exhausting direction and extends in a direction perpendicular to the direction in which the second exhaust path extends; a pump which is connected to a downstream end portion of the third exhaust path in the exhausting direction and depressurizes an inside of a processing container; a pressure control valve which is provided in the second exhaust path, and comprises a pressure control valve pla

Abstract: A steam cooking appliance apparatus includes a muffle unit which at least partially bounds a cooking chamber. The muffle unit has a muffle element which forms a boundary surface of the cooking chamber in at least one operating state. The boundary surface of the cooking chamber has a cooking fat adhesion which is lower than a cooking fat adhesion of stainless steel. At least one cleaning unit is provided for cleaning at least part of the muffle unit.

Abstract: According to the invention, the method for cleaning a dual cooking mode oven, comprising a muffle forming the cooking enclosure, and a boiler for sending water, as vapour, inside the enclosure of the muffle, is characterized in that the washing step of the muffle and the descaling step of the boiler are carried out in parallel, simultaneously.

Abstract: A composition is provided for use in cleaning a surface of a cementitious material. The composition includes HCI, urea, complex substituted keto-amine-hydrochloride, an alcohol, an ethoxylate, and a ketone. A method of using the composition includes applying the composition to a surface from which it is desired to clean a cementitious material and removing the composition and released cementitious material from the surface. Methods are also provided for performing hydraulic fracturing of an oil or a gas well; for adjusting a pH of a drilling fluid; for adjusting and maintaining a pH of a process fluid; for solubilizing calcium carbonate in an aqueous suspension or dispersion of calcium carbonate; for removing a foulant in a fluid-handling element; adjusting a pH and lowering a salt level of turf.

Abstract: The disclosure features a method of performing a boil-out cleaning process in connection with a fryer. The fryer includes a vat, a vessel for receiving oil drained from the vat, the vessel movable from an under-unit position, an oil drain path leading from an outlet opening of the vat to the pan, and an oil return path from the vessel back to the vat. The oil return path includes a pump. A drain valve is located along the oil drain path. The drain valve is opened to drain oil from the vat into the vessel is opened. The drain valve is closed after draining the oil from the vat. A boil-out cleaning fluid is delivered to the vat and the boil-out cleaning fluid is heated. A boil-out drain path is provided with an inlet positioned for receiving boil-out fluid from the drain valve and an outlet positioned forward of a front of the fryer unit. A container is placed below the outlet of the boil-out drain path.

Abstract: A method for cleaning a filtering membrane, contaminated by contaminants including inorganic and organic materials during a fluid-filtering process, is disclosed, the method comprises cleaning the filtering membrane by using a first cleaning solution of pH 6˜9 so as to remove the organic material from the filtering membrane; and cleaning the filtering membrane by using a second acid cleaning solution so as to remove the inorganic material from the filtering membrane, wherein the cleaning method of the present invention uses the first cleaning solution having pH 6˜9 instead of a strong-alkaline cleaning solution so as to prevent the filtering membrane from being damaged, and also uses the cleaning solution maintained at a a relatively low temperature instead of hot water so as to improve economical efficiency by reduction of energy consumption.

Abstract: An apparatus for cleaning heat exchanging surfaces includes at least one supply line for a cleaning fluid. The supply line has an end and an extent axis. The supply line is bendable in a first direction transverse to the extent axis and resistant to bending in at least one second direction transverse to the extent axis. At least one fluid distribution device is disposed at the end of the supply line. The supply line may be telescopic. An assembly having a heating installation and an apparatus for cleaning heat exchanging surfaces of the heating installation, and a method for carrying out a relative movement between at least one supply line and a heating installation, are also provided.

Abstract: Method and apparatus for removing residual material from sample wells of a multiwell plate. Wells located on a multiwell plate are placed in fluid communication with wash wells of a wash reservoir where cleaning fluid is provided to remove residual material from the sample wells of the multiwell plate.

Abstract: A system and method for removing an organic residue from a charged particle beam system includes a conduit that is coupled to the column and is for adding oxygen to the column. A heater is coupled to the column and is for increasing the temperature in the column. A pump is coupled to the column and is for removing a gas from the chamber, wherein the gas is a byproduct of a chemical reaction of the organic residue and the oxygen.

Abstract: A container rinsing system (10) has an air nozzle adapted to be positioned proximate an opening of the container and adapted to direct a supply of compressed air to the container. A vacuum member is adapted to be in communication with a vacuum source. The vacuum member is positioned around the air nozzle and adapted to vacuum foreign particles away from the container.

Abstract: A system and apparatus for use in flushing at least a portion of a motor with a cleansing fluid. A water inlet apparatus (10) and inlet (20) for flushing a boat motor with fresh water is provided and a system incorporating the apparatus (10) (and inlet 20) is also provided. In particular, the system and apparatus are used to flush a boat motor with fresh water after use. The apparatus has one or more inlets adapted to receive a fresh water source (e.g. a hose) and a valve, such as a diaphragm valve, that selectively allows flow of the fresh water into the motor instead of its usual water source (e.g. salt water). Preferably the valve is automatic and is actuated under pressure of the incoming fresh water. The inlet(s) are secured in a surface of the boat inside a basin, which may have a cover (optional) to protect the inlet(s) from the weather/elements.

Abstract: A lavatory pan washing apparatus includes a water supply unit supplying washing water into a rim so that a whirling flow is formed in a lavatory bowl, an air inlet pipe connected to a water discharge channel continuing to the downstream side of a water sealing portion of a pan, an air sucking unit sucking air through the pipe from the channel, and a control unit configured to activate the water supply unit at a time of washing of the pan so that the washing water is supplied into the water sealing portion. The control unit is configured to start activation of the air sucking unit after rise of a water level in the lavatory bowl, so that air is sucked through the pipe from the channel. The control unit is configured to deactivate the water supply unit after air has flowed through the air inlet pipe into the channel.

Abstract: The invention relates to a container treatment machine, in particular a filling, closing or rinsing unit for containers, such as bottles, cans, barrels, kegs etc., comprising a container feed, a container discharge, at least one feed line for at least one product, and a cleaning device (3) for cleaning the outer surfaces by means of a cleaning fluid (13), characterized in that the cleaning device (3) comprises a robot (4) and a track (5), wherein the track (5) runs around the rotational axis thereof in at least one angular region, wherein the robot (4) is arranged on or at said track (5) and can be driven by means of a linear drive (8).

Abstract: A cleaning compound is provided. The cleaning compound includes about 0.1 weight percent to about 10 weight percent of a fatty acid dispersed in water. The cleaning compound includes an amount of a base sufficient to bring a pH of the fatty acid water solution to about a level where above about 50% of the dispersed fatty acid is ionized. A method for cleaning a substrate, a system for cleaning a substrate, and a cleaning solution prepared by a process are also provided.

Abstract: A method for removing particles or deposits from a surface having particles or deposits thereon. The method involves contacting a surface with a chemical composition sufficient to selectively dissolve and remove at least a portion of the particles or deposits from the surface. The chemical composition is compatible with the surface. This disclosure also relates to a system of specially designed equipment for removing particles or deposits from a surface having particles or deposits thereon. The disclosure is useful, for example, in cleaning porous surfaces, media for cartridge, pleated and membrane surfaces, and internal walls of tanks or filter housings.

Abstract: A domestic appliance includes at least one component having a surface that can become laden with organic dirt. The surface includes a photocatalyst and is made from a primary-formed first material in which the photocatalyst is dispersed. A photoradiation source is provided for irradiating the photocatalyst with an activating electromagnetic radiation.

Abstract: Disclosed are cleaning solvents and cleaning methods for metallic compounds deposited on the equipment that supplies organometallic compounds to the manufacturing tool in the photovoltaic industry or the semiconductor industry. The cleaning solvents and the cleaning methods disclosed not only selectively remove the metallic compound without corroding the equipment, but also improve the ordinary cleaning process. Moreover, the cleaning solvents and the cleaning methods disclosed improve maintenance costs for the supply system because the equipment may be cleaned without being detached from the supply system.

Abstract: An automated process for cleaning fruit bins, and particularly grape bins, deploys a conveyer system in which bins are simultaneously rinsed on the inside and outside in an inverted position. Two rinse cycles are rapidly completed with the conveyance of the inverted bins through a wash station. The wash station deploys a pivoting U-shaped spray rod inside the bin, below the conveyor track, while the outside is rinsed by a second surrounding inverted U-shaped spray bar that moves transverse to conveyor direction will the bin is stationary inside the wash station. A pivoting L-shaped arm with an integrated conveyor track move the bins on or off the central conveyor, while flipping them 90 degrees. Two such conveyors return the bins to an upright position for use and stacking. The water from a first rinse is optionally screens to remove solids and collected water is then locally treated before using it to rinse subsequent bins.

Abstract: The present invention relates to a method and a device for internally cleaning cans (1) having openings (2). According to the invention, an axially displaceable spray element (7) is provided for discharging a cleaning medium into the opening (2) in the course of (overhead) internally cleaning the can (1). To this end, said spray element (7) travels into the associated can (1) and back out again.

Abstract: A method of cleaning equipment such as heat exchangers, evaporators, tanks and other industrial equipment using clean-in-place procedures and a pre-treatment solution prior to the conventional CIP cleaning process. The pre-treatment step improves the degree of softening of the soil, and thus facilitates its removal. The pre-treatment solution can be a strong acidic solution, a strong alkaline solution, or comprise a penetrant. A preferred strong acidic solution is an acid peroxide solution. In some embodiments, the pre-treatment may include no strong alkali or acid ingredient; rather, the penetrant provides acceptable levels of pre-treatment.

Abstract: The narrow diameter channel has a diameter of about 0.02 centimeter to about 1.6 centimeters and a length of about 0.75 meter to about 5 meters. The internal surface of the narrow diameter channel is hydrophobic, and the surface flow entities exhibit an advancing contact angle of greater than 50 degrees and a receding contact angle of greater than zero degree. The detachment of contaminants from the internal surface of the narrow diameter channel is produced by a sweeping of the internal surface of the narrow diameter channel with the three-phase contact lines of the surface flow entities, the cleaning medium is not predispersed in the gas before entering the channel, and less that 10% of the surface of the channel is covered by a contiguous annular film.

Abstract: In closed cooling water systems of the kind where deionized and usually deaerated cooling water comes into contact with copper or copper alloys, the formation of scales, depositions due to general copper corrosion is eliminated by the addition of H2 to the cooling water system. The product formed in anoxic (O2-free) water may be described as CuOyHx, but this product can be reduced and, thus, avoided if a sufficient amount of hydrogen is supplied. The life of the stator coil copper pipe for cooling water in an electric generator can be extended significantly by this invention, which is applicable also to other fields, such as closed cooling water systems for particle accelerators and nuclear fusion reactors (such as ITER), for example. In addition, the maintenance cost for such water cooling systems in contact with copper metal will be reduced drastically.

Abstract: A CVD vacuum vessel including an electrically conductive partition plate which divides the interior of the vacuum vessel into a plasma generating space and a film-deposition processing space, and an electrically conductive spiral shield. The electrically conductive partition plate has a plurality of through-holes connecting the plasma generating space to the film-deposition processing space and a heater for heating the electrically conductive partition plate. The partitioning plate is mounted to the vacuum vessel by means of a mounting screw such that electrical contact between the partitioning plate and the vacuum vessel is achieved through said spiral shield.

Abstract: The invention consists in a disposable module (31) for purifying a fluid, in particular water, adapted to form part of a fluid purification system and comprising fluid purification means (25, 28), a housing (35) in which the purification means are housed, and means for removably connecting the purification module (31) to the purification system to establish fluid communication between the purification system and the purification module (31), characterized in that the housing (35) contains from the outset a cleaning agent (36) disposed to come into contact with the fluid caused to circulate inside the housing (35) to clean at least a portion of the purification system. It also consists in the purification system and corresponding fabrication and cleaning methods.

Abstract: The invention is an elongated device which prepares pipes and fittings for bonding in a matter of seconds. This unit attaches to a drill and embodies brushes which clean both the interiors and exteriors of pipes and fittings varying in size. The vertical brush's unique folding assembly allows quick and easy access to the exterior brush without the removal of any parts.

Abstract: Methods for processing substrates in dual chamber processing systems comprising first and second process chambers that share resources may include performing a first internal chamber clean in each of the first process chamber and the second process chamber; and subsequently processing a substrate in one of the first process chamber or the second process chamber by: providing a substrate to one of the first process chamber or the second process chamber; providing a process gas to the first process chamber and the second process chamber; forming a plasma in only the one of the first process chamber or the second process chamber having the substrate contained therein; and providing an inert gas to the first process chamber and the second process chamber via one or more channels formed in a surface of respective substrate supports disposed in the first process chamber and the second process chamber while processing the substrate.

Abstract: A method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at low cost. The method of cleaning the support plate includes the step of removing an organic substance adhered to the support plate by putting the support plate in contact with oxygen plasma.

Abstract: The present invention presents a resin composition for cleaning a plastics-processing machine, containing a tracer substance and a thermoplastic resins, wherewith the plastics-processing machine is cleaned. After the plastics-processing machine finishing with processing of a resin is cleaned with the resin composition, the resin composition remaining in the processing machine is discharged with a subsequent resin. The residue of the said resin composition is checked by detecting fluorescence on the surface of a molding after the molding containing the subsequent resin is obtained in the discharging process of the said resin composition remaining in the processing machine.

Abstract: A method and system for cleaning foreign material from a fluid reservoir of an implantable medical device, the fluid reservoir being substantially enclosed in an interior portion of the implantable device and accessible from an environment exterior of the implantable device through a penetrable septum. An elongated member having a first end and a second end is engaged with a source of ultrasonic energy capable of imparting vibrations to the first end. The septum is penetrated by the elongated member in a manner such that the first end extends into the fluid reservoir, and the second end does not extend into the reservoir. The ultrasonic energy source is activated to impart vibrations into the reservoir via the elongated member first end, in an amount sufficient to break up the foreign material into particulates, which can then be removed from the reservoir.

Abstract: One exemplary embodiment can be an apparatus for isomerizing a hydrocarbon stream rich in a C4 hydrocarbon and/or at least one of a C5 and C6 hydrocarbon. The apparatus can include: a vessel containing a fluid including at least one reactant; a fluid transfer device receiving the fluid including at least one reactant from the vessel; at least one drier receiving the fluid including at least one reactant from the fluid transfer device; and a reactor communicating with the at least one drier to receive the fluid including at least one reactant. In addition, the at least one drier may communicate with the vessel at least by sending the fluid including at least one reactant or the regenerant through a fluid tapering device for at least one of regulating the flow and reducing the pressure of the regenerant to the vessel.

Abstract: An apparatus and method for cleaning passageways and the like with a two-phase mixture of gas under pressure and an aqueous cleaning solution. The two-phase cleaning mixture is generated in a module and is passed out of the module at a predetermined rate that determines droplet size, velocity and droplet density at the pipeline surface to be cleaned. The droplets impact the walls of the passageway to be cleaned, thereby fragmenting, eroding and removing contaminants in said passageway. These are then flushed out of the passageway by the two-phase flow. The flow of cleaning solution can be steady or pulsed. The apparatus and process include a clean-in-place system that is useful in food, beverage, pharmaceutical and similar process industries.

Abstract: Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.

Abstract: The present invention relates to reactive purge compound for cleaning polymer processing equipment wherein the reactive purge compound that includes i) at least about 50 wt.% of a polymeric carrier component based on the total weight of the reactive purge compound; and ii) a chain scission catalyst component dispersed in the polymeric carrier component; wherein a) the chain scission catalyst component includes a chain scission catalyst selected from the group consisting of at least one alkali metal hydroxide, at least one alkaline earth metal hydroxide, and any combination thereof; b) the reactive purge compound further comprises a water generating component; or c) both (a) and (b); wherein the reactive purge compound is a feedstock material in the form of a plurality of pellets, granules, rods, powder or other particles.

Abstract: A method for using a film formation apparatus for a semiconductor process includes setting an idling state where a reaction chamber of the film formation apparatus accommodates no product target substrate therein, and then, performing a purging process of removing a contaminant present in an inner surface of the reaction chamber by causing radicals to act on the inner surface of the reaction chamber. The radicals are generated by activating a purging process gas containing oxygen and hydrogen as elements.

Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.

Abstract: A paper-roll core that is a soluble, disposable carrier for cleaning and/or disinfecting chemicals. The paper-roll cores are toilet paper roll cores and paper towel roll cores and are rapidly soluble in water and may release cleansers, disinfectants, colors, etc., upon dissolving. Described are: methods of using, manufacturing, advertising, and distributing the paper-roll cores; and methods of advertising and distributing such paper-roll cores to children, who will particularly enjoy the novelty; and methods of modifying existing paper-roll core manufacturing equipment to manufacture soluble cleanser-dispensing paper-roll cores.

Abstract: A cleaning device includes at least: a holder, a lance having a fluid distribution device, a drive unit for a translational motion of the lance in the holder, and a fluid conducting system having a feed, a return, and flow paths starting from the feed to the return and to the fluid distribution device. At least one actuating means (or actuator) is provided in order to connect the feed to the return or to the fluid distribution device as needed. Furthermore, a method involves cleaning heating surfaces of a convection section of a thermal power plant that includes spaced heat exchanger pipes using such a cleaning device.

Abstract: A method for cleaning a water purifier comprising: a filtering unit; a water tank unit for storing purified water having passed through the filtering unit; and a discharging unit for discharging out the purified water stored in the water tank unit, the method comprises: a cleaning water supplying step of supplying cleaning water in which a cleaning agent is dissolved to the water tank unit; a cleaning water discharging step of discharging the cleaning water when a predetermined time has lapsed; a rinsing water supplying step of supplying rinsing water to the water tank unit when the cleaning water discharging step has been completed; and a rinsing water discharging step of discharging the rinsing water when a predetermined time has lapsed. In the method, cleaning and rinsing processes for a water purifier are automatically executed by a series of consecutive processes. Accordingly, a user can directly clean the water purifier if necessary without requiring a Codi's visit.

Abstract: A cleaning apparatus for cleaning measuring probes (18) of a gas turbine engine (1). The invention further relates to a method for cleaning measuring probes (18) of an gas turbine engine (1). The apparatus comprises distribution means (30) comprising a plurality of supply means (31, 32, 33), each comprising connection means (33) arranged for connection to a probe (18), and each supply means (31, 32, 33) being arranged to, when connected to a probe (18), distribute pressurized cleaning liquid to said measuring probe (18), wherein a substantially simultaneous cleaning of probes connected to said distribution means (30) via said supply means (31, 32, 33) can be obtained.

Abstract: In order to produce a cleaning device for cleaning a workpiece including a suction apparatus for sucking out impurities from an interior of the work piece wherein the suction apparatus has a particularly large suction effect, it is proposed that the suction apparatus at least one vacuum tank, at least one evacuation device for evacuating the vacuum tank, at least one ventilation line for connecting the vacuum tank to the workpiece and at least one blocking device for blocking off the connection between the vacuum tank and the workpiece.

Abstract: A cleaning method for a turbo molecular pump, which enables the exhausting ability of the turbo molecular pump to be restored without bringing about a decrease in the productivity of a substrate processing apparatus. A vaporizing gas that vaporizes foreign matter attached to an internal surface of the turbo molecular pump is supplied toward the foreign matter.

Abstract: A method and system for launching a pipeline pig includes the steps of compressing a modulating bypass valve of a pipeline pig and installing a locking means to temporally maintain the bypass valve in the compressed state. Once the pig has travelled a predetermined distance through the pipeline, the locking means is released and retrieved through the launch trap door. The locking means is preferably a launching pin having a clip attachment that receives the clips of a retractable lead. The lead is housed by a retraction device that is detachably secured to the launch trap door. The modulating valve has sufficient mass and aerodynamic drag to overcome the force of a gas spring. The valve moves between a retracted and compressed position substantially instantaneously upon the pipeline pig stalling and between the compressed and retracted position substantially instantaneously upon the pipeline pig accelerating.

Abstract: When plasma processing is finished, a gate valve 13a is closed and cleaning gas is ejected from holes 121a of a shower plate 121, and at the same time, a microwave is generated from a microwave generator 101. Further, at this time, the inside of a process chamber 110 is exhausted through a second exhaust port 106. Since the exhaust is conducted through a second exhaust port 106 positioned lower than a wafer stage 104 in a lowered state when the inside of the process chamber 110 is cleaned, it is possible to more effectively remove gas and reaction products deposited especially in a lower portion of the process chamber 110.

Abstract: Methods of extending the lifetime of pressure gauges coupled to process chambers are disclosed herein. In some embodiments, the methods may include isolating the pressure gauge from a processing volume of the process chamber, increasing a moisture content of the processing volume to above a desired moisture level while the pressure gauge is isolated from the processing volume of the process chamber, reducing a moisture content of the processing volume to a desired moisture level, wherein the processing volume has a leak rate of about 2 mTorr/min or less at the desired moisture level, and exposing the pressure gauge to the processing volume after reaching the desired moisture level. In some embodiments, the moisture content of the process chamber may be increased by performing a cleaning process in the process chamber or by allowing air to enter the processing volume.

Abstract: A cleaning device for a site of a medical implement is disclosed, as are methods for using such devices. The cleaning device can include a cap having an opening to an inner cavity, and the opening can be adapted to receive a site of the medical implement. The inner cavity can include a male luer protrusion that extends up from an inner wall toward the opening, and can be sized and adapted for insertion into a female luer when the cap is provided on the medical implement. The cleaning device can further include a cleaning material that contains a cleaning agent prior to receipt of the site of the medical implement, i.e. the cleaning material is pre-loaded with the cleaning agent. The cleaning material can be at least partially secured in the inner cavity and adapted to swab and clean the site with the cleaning agent. The cap can further include a friction-forming member for creating a friction-based fitting of the cap onto the site of the medical implement.

Abstract: A method for cleaning a component comprises a first stage including the steps of: (i) loading a component into the cleaning chamber of a flush station, (ii) directing a deionized water stream through first filter means, (iii) introducing carbon dioxide into the filtered water stream, (iv) directing the carbonated water stream into a fluid passage to be cleaned in the component, and (v) collecting the dirty water stream after it passes through the component and directing the collected dirty water stream through second filter means for reuse. The method can further include a second stage including the steps of: (vi) loading the component into a testing chamber of a testing station, (vii) directing a deionized water stream through third filter means, (viii) directing the filtered water stream into the fluid passage in the component, and (ix) collecting the water stream after it passes through the component and directing the collected water stream into a particle counter.

Abstract: A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing about a decrease in the throughput of a substrate processing system. Before the gate valve brings the atmospheric transfer chamber and the internal pressure variable transfer chamber into communication with each other, the pressure in the internal pressure variable transfer chamber is increased so that the pressure in the internal pressure variable transfer chamber can become higher than the pressure in the atmospheric transfer chamber.