Abstract: Transport scheduling and transport processes for low microbial (“LM”) bulk products are described. The transport scheduling and processes facilitate low microbial activity in a LM bulk product during the transport of the LM bulk product.

Abstract: Systems and methods for exposing semiconductor workpieces to vapors for through-hole cleaning and/or other processes are disclosed. A representative method includes exposing a semiconductor workpiece to a vapor, with the semiconductor workpiece having an opening extending from a first surface of the workpiece through the workpiece to a second surface facing opposite from the first surface. The opening can include a contaminant, and the method can further include drawing the vapor and the contaminant through at least a portion of the opening and away from the second surface of the semiconductor workpiece.

Abstract: Methods and apparatus for the cleaning PECVD chambers that utilize molecular fluorine as the cleaning material.

Abstract: Disclosed are a nozzle cleaning apparatus and a nozzle cleaning method, which are capable of effectively cleaning a nozzle for discharging a process liquid to a substrate. A nozzle 30 is accommodated in a cleaning container 2 having a funnel-shaped portion 2b. A solvent T as a cleaning liquid is supplied along an inner surface of the funnel-shaped portion 2b. The solvent T forms a vortex flow whirling around the nozzle 30. By exposing the nozzle 30 to the vortex flow, the nozzle 30 can be effectively, thoroughly cleaned.

Abstract: A dry cleaning method of a substrate processing apparatus includes forming a metal oxide by oxidizing a metal film adhered to the inside of a processing chamber of the substrate processing apparatus; forming a complex by reacting the metal oxide with ?-diketone; and sublimating the complex to be removed. A cleaning gas containing oxygen and ?-diketone is supplied into the processing chamber while heating the inside of the processing chamber. A flow rate ratio of oxygen to ?-diketone in the cleaning gas is set such that a formation rate of the metal oxide is lower than a formation rate of the complex.

Abstract: A method of cleaning fouled process equipment which includes a process vessel (10) fouled by an organic foulant, includes spraying a hydrocarbon stream at a pressure of at least 69 bar(g) at fouled surfaces inside the process vessel (10) thereby to dislodge the organic foulant from the fouled surfaces. The hydrocarbon stream is sprayed from at least one nozzle (24) located inside the process vessel (10). The hydrocarbon stream is at a temperature below the melting point of the organic foulant or below the melting point of a major component of the organic foulant when the organic foulant is a multi-component organic foulant. The dislodged foulant is removed from the process vessel (10).

Abstract: A portable cleaning system for a CVD reactor. The cleaning system comprises two components: (1) a stand-mounted gloved box assembly for mounting a flow flange or shower head of a CVD reactor thereto, and (2) a gloved device such as a gloved flange or gloved cylinder for mounting to the reactor chamber. Both components can be equipped with a filtration device for capturing particles that are cleaned out of the CVD reactor. Both systems can be purged with an inert gas to guard against pyrophoric reactions. The system can be used for cleaning existing CVD reactors without the need for costly modification of the CVD reactor to accommodate the cleaning equipment. Also, one cleaning system can be used to service several CVD reactors.

Abstract: The invention relates to a holder for an active ingredient comprising a fixing portion for mechanical fixing under a toilet bowl rim, and a receiving portion joined to the fixing portion for receiving an active ingredient. One problem of such known holders is that they are troublesome to fix to the toilet bowl and to remove again therefrom. This disadvantage is overcome according to the invention by at least parts of the fixing portion being formed from a biodegradable, preferably water-soluble material.

Abstract: Described herein is a disposable module for purifying a fluid, in particular water, adapted to form part of a fluid purification system and method of cleaning at least a portion of a fluid purification system using such a disposable module, where the method includes the steps of: (a) providing a disposable module which includes a housing containing a cleaning agent from the outset: (b) connecting the module to a purification system which is downstream of the module and starting a system cleaning procedure, thereby to clean at least a portion of the purification system.

Abstract: A fuel injection flush tool adapted to be connected to a conventional fuel injection flush canister in which a supply of combustible liquid fuel injection cleaner is stored. Liquid cleaner is delivered from the flush canister to a gasoline or diesel-driven engine being serviced by which to burn off carbon deposits from the fuel injectors and related parts during a tune-up or service. During one embodiment, air is applied to the flush canister so that the liquid cleaner is delivered from the canister at a pressure which corresponds to the operating pressure of the engine running at idle. In this case, the fuel injectors can advantageously be cleaned (i.e., decarbonized) in a relatively short time and at reduced cost without having to turn off the engine, disable the fuel pump, or remove seats, fuses, relays, etc.

Abstract: A method for cleaning tanks and other containers including, but not necessarily limited to, tanks associated with land-based drilling rigs and/or used in connection with hydraulic fracturing operations. Recoverable liquids and associated solids are first removed from a tank to be cleaned. A cleaning solution is prepared in a weir tank and sprayed into a tank to be cleaned. Sprayed cleaning solution, together with any debris or residue from the tank being cleaned, is pumped back to the weir tank and recycled for further cleaning.

Abstract: A teat cup cleaning device comprises a heating chamber provided with a discharge outlet that is closable by a valve and arranged for connection to a teat cup. A filling device is arranged for filling the heating chamber with an amount of cleaning liquid and retaining a given quantity of gas. The chamber is provided with a heating arrangement arranged to heat the contents of the heating chamber to a temperature T higher than the boiling point Tk of the cleaning liquid at ambient pressure. On operation of the valve superheated cleaning liquid is discharged to clean a teat cup.

Abstract: A method of removing a metal protective layer from a surface of a reactor component comprising treating the metal protective layer with one or more chemical removal agents to remove at least a portion of the metal protective layer from the reactor component. A method of removing a metal protective layer from a surface of a reactor component comprising treating the metal protective layer to remove the metal protective layer from the reactor component, and determining a thickness of the reactor component following treatment.

Abstract: A method is disclosed for removing deposits from rotating parts of a gas turbine engine while under full fire or idle speed utilizing a particulate coke composition. The coke composition may be introduced directly into the combustion chamber (combustor) of the gas turbine or, alternatively, anywhere in the fuel stream, water washing system, or the combustion air system. By kinetic impact with the deposits on blades and vanes, the deposits will be dislodged and will thereby restore the gas turbine to rated power output. If introduced into the compressor section, the coke particles impinge on those metal surfaces, cleaning them prior to entering the hot gas section where the process is repeated.

Abstract: Systems and methods for processing a substrate include supplying steam in a chamber, arranging a substrate with a deposited layer that includes silicon in the chamber, and directing UV light onto the deposited layer in the presence of the steam for a predetermined conversion period to at least partially convert the deposited layer. Systems and methods for densifying a deposited layer of a substrate include supplying ammonia in a chamber, arranging the substrate that includes the deposited layer in the chamber, and directing UV light onto the deposited layer in the presence of the ammonia for a predetermined conversion period to at least partially densify the deposited layer.

Abstract: In the case of a device and a method for cleaning substrates on a carrier, to the underside of which the substrates are fastened so as to be parallel to and slightly apart from one another, the carrier has in its interior a plurality of longitudinal channels, which run parallel to one another. As a result of the sawing of the wafers, they merge, via openings, into interstices between the substrates. As a result of a relative movement, an elongate tube, from which cleaning fluid is let out, is introduced into one of the longitudinal channels, the relative movement being achieved substantially through moving of the carrier.

Abstract: An apparatus for determining an endpoint of a process by measuring a thickness of a layer is provided. The layer is disposed on the surface by a prior process. The apparatus includes means for providing a sensor that is coplanar with the surface, wherein the sensor is configured to measure the thickness. The apparatus also includes means for exposing the plasma chamber to a plasma, wherein the thickness is changed by the exposing, and means for determining the thickness as a function of time. The apparatus further includes means for ascertaining a steady state condition in the thickness, the steady state condition being characterized by a substantially stable measurement of the thickness, a start of the steady state condition representing the endpoint.

Abstract: A cleaned component having a polycrystalline structure, a method and apparatus for cleaning a leached component to form the cleaned component, and a method for determining the effectiveness of cleaning the leached component. The cleaned component includes a leached layer that has at least a portion of by-product materials removed. The by-product materials were deposited into the leached layer during a leaching process that formed the leached layer. The apparatus and method for cleaning includes a tank, a cleaning fluid placed within the tank, and at least a portion of the leached layer immersed into the cleaning fluid. Optionally, a transducer emits ultrasonic waves into the leached layer. The method for determining the effectiveness of cleaning includes cleaning the leached component to form the cleaned component, measuring one or more capacitance values of the cleaned component, repeating the cleaning and the measuring until achieving a stable lower limit capacitance value.

Abstract: A method for cleaning a filtering membrane, contaminated by contaminants including inorganic and organic materials during a fluid-filtering process, is disclosed, the method comprises cleaning the filtering membrane by using a first cleaning solution of pH 6˜9 so as to remove the organic material from the filtering membrane; and cleaning the filtering membrane by using a second acid cleaning solution so as to remove the inorganic material from the filtering membrane, wherein the cleaning method of the present invention uses the first cleaning solution having pH 6˜9 instead of a strong-alkaline cleaning solution so as to prevent the filtering membrane from being damaged, and also uses the cleaning solution maintained at a relatively low temperature instead of hot water so as to improve economical efficiency by reduction of energy consumption.

Abstract: An in-situ method of cleaning a vacuum deposition chamber can include flowing at least one reactive gas into the chamber.

Abstract: Cleaning systems and methods include use of a container or holding apparatus to receive one or more components used in a medical procedure (e.g., a walled container or a non-walled container including a plurality of holding structures) and a manifold apparatus. For example, the manifold apparatus may include an inlet connection connectable to a reprocessor fitting of a reprocessing apparatus to receive a fluid therefrom (e.g., a cleaning solution, a disinfecting solution, and a rinsing solution) and one or more outlets configured to provide the at least one fluid into or through one or more components received by the container. For example, the one or more outlets may include an outlet connection connectable to a component fitting of at least one of the components.

Abstract: A method of removing a reaction gas remaining in a process chamber after a process of treating a substrate in the process chamber is completed includes exhausting the reaction gas remaining in the process chamber to a region outside of the process chamber through an exhaust line, and supplying a cleaning gas into the process chamber through a gas supplying line.

Abstract: A sealed storage vessel containing volatile organic vapor over a bottom sludge layer is cleaned by (a) determining the level of free oil in the vessel and then using (b) either a two-stage or one-stage treatment regime, adding a cleaning agent thereto. If the free oil is greater than 2 volume percent the two-stage regime is used where an oil release agent is initially mixed with the sludge to separate the oil from solids in the sludge. The separated oil floats on the surface of water and is removed without substantially exposing the vessel's interior to the atmosphere, leaving within the vessel a mixture of water, solids, and trace amounts of hydrocarbons. Next, a predetermined amount of an emulsifying agent is added to substantially emulsify the trace hydrocarbons, so the level of volatile organic compounds remaining in the interior of the vessel is no greater than 5,000 ppmv, measured as methane, at least one hour after adding the emulsifying agent.

Abstract: A method of monitoring a tube or pipeline, wherein an IP comprising an electronics module arrangement, is driven along the interior of the tube or pipeline by fluid pressure, wherein the IP transmits monitoring signals through the fluid that provides the pressure to the wall of the tube or pipeline, receives signals returned from the wall, analyzes the returned signals and stores data relating to the condition of the wall of the pipeline.

Abstract: A method for reducing coke deposits includes heating an alcohol-fuel mixture to decompose alcohol and form water to produce a fuel-water mixture and delivering the fuel-water mixture to a carbon-steam gasification catalyst. The fuel-water mixture reacts with the carbon-steam gasification catalyst such that coke deposits are prevented from remaining in a space near the carbon-steam gasification catalyst.

Abstract: A susceptor includes a plurality of holes in a first area and a plurality of holes in a second area. The first and second areas overlap a location which corresponds to at least one portion of a semiconductor device to be processed. The holes in the first area are provided in a first pattern and the holes in the second area are provided in a second pattern which may be different from the second pattern. The first and second patterns may differ, for example, based on the size, arrangement, spacing, location, and/or density of the holes.

Abstract: A process for quickly removing hydrocarbon contaminants and noxious gases in a safe and effective manner from catalytic reactors, other media packed process vessels and associated equipment in the vapor phase without using steam. The cleaning agent contains one or more solvents, such as terpenes or other organic solvents. The cleaning agent is injected into contaminated equipment, along with a carrier gas, in the form of a cleaning vapor.

Abstract: To remove the deposit including a high dielectric constant film deposited on an inside of a processing chamber, by using a cleaning gas activated only by heat. The method includes the steps of: loading a substrate or a plurality of substrates into the processing chamber; performing processing to deposit the high dielectric constant film on the substrate by supplying processing gas into the processing chamber; unloading the processed substrate from the inside of the processing chamber; and cleaning the inside of the processing chamber by supplying a halide gas and an oxygen based gas into the processing chamber, and removing the deposit including the high dielectric constant film deposited on the inside of the processing chamber, and in the step of cleaning the inside of the processing chamber, the concentration of the oxygen based gas in the halide gas and the oxygen based gas is set to be less than 7%.

Abstract: A cleaning agent/rinsing agent for cleaning a heating apparatus for cooking food are contained in a cartridge. The cartridge is sealed to prevent premature release of the cleaning/rinsing agents. Inside the cavity of the heating apparatus, a mechanism for opening the cartridge is located in the drain of the cavity of the heating apparatus. By pushing the cartridge onto the mechanism and twisting the cartridge, protruding edges of the mechanism penetrate the seal. Upon lifting the cartridge, the cleaning/rinsing agent drops out and into the cavity drain. The rinsing agent may be retained above the drain and cleaning box via encapsulation or the rinsing agent and configuration of the mechanism. The empty cartridge is removed and the cavity of the heating apparatus is ready for cleaning.

Abstract: Disclosed are methods and apparatus for cleaning heat exchangers and similar vessels by introducing chemical cleaning solutions and/or solvents while maintaining a target temperature range by direct steam injection into the cleaning solution. The steam may be injected directly into the heat exchanger or into a temporary side stream loop for recirculating the cleaning solution or admixed with fluids being injected to the heat exchanger. The disclosed methods are suitable for removing metallic oxides from a heat exchanger under chemically reducing conditions or metallic species such as copper under chemically oxidizing conditions. In order to further enhance the heat transfer efficiency of heating cleaning solvents by direct steam injection, mixing on the secondary side of the heat exchanger can be enhanced by gas sparging or by transferring liquid between heat exchangers when more than one heat exchanger is being cleaned at the same time.

Abstract: An assembly tool is provided. The assembly tool comprises a body, a first vacuum channel defined within the body, and a first locating pin attached to the body. The first locating pin has a shaft portion arranged within a surrounding portion of the body. The first locating pin is configured to engage a first alignment feature of a hard drive component at a first contact area to align the hard drive component with the assembly tool. The body is configured to couple the first vacuum channel to a vacuum source and to facilitate particle evacuation from the first contact area via the first vacuum channel when a vacuum is applied by the vacuum source.

Abstract: Methods of extending the lifetime of pressure gauges coupled to process chambers are disclosed herein. In some embodiments, the methods may include isolating the pressure gauge from a processing volume of the process chamber, increasing a moisture content of the processing volume to above a desired moisture level while the pressure gauge is isolated from the processing volume of the process chamber, reducing a moisture content of the processing volume to a desired moisture level, wherein the processing volume has a leak rate of about 2 mTorr/min or less at the desired moisture level, and exposing the pressure gauge to the processing volume after reaching the desired moisture level. In some embodiments, the moisture content of the process chamber may be increased by performing a cleaning process in the process chamber or by allowing air to enter the processing volume.

Abstract: A cleaning bullet for use in a track can include a compressible body to clean the track, and a motorized device to propel the body through the track. In some embodiments, the motorized device includes wheels rotatably coupled to the device, a motor to drive the wheels, and a power source to supply power to the motor. Also, in some embodiments, one or more wheels engage an inner or outer surface of the track to move the motorized device along the track.

Abstract: Methods and apparatus for reducing post PECVD vacuum and abatement system fouling. Chamber cleaning times are reduced leading to increased efficiency and lower cost fabrication processes by introducing F2 or a fluorine containing gas into the PECVD system. When using F2, the cleaning gas may be introduced directly to desired locations of the system where it can interact without activation with unwanted deposits. Alternatively, the cleaning gas may be activated in-situ in the equipment using existing plasma discharge equipment, or the cleaning gas may be activated using an RPS and then introduced to the desired location in its already activated state.

Abstract: A cover for a pedicure spa containing an automatic sanitation apparatus is disclosed. When activated, the cover automatically sprays disinfectant in a circular motion from a nozzle on the bottom of the cover. The interior surfaces of the pedicure basin are treated with the disinfectant solution. The pedicure basin is thereby efficiently and thoroughly sanitized.

Abstract: An agent for cleaning a container configured for making a nutritional shake and a method of using the agent is presented. The agent comprises a packaging unit being configured for containing at least one quantity of a mixture for cleaning the container. A mixture is configured to be dissolvable in water. The dissolved mixture is operable for substantially removing residue from the container in which the container is left substantially absent of aftertaste.

Abstract: An apparatus and method for cleaning, sanitizing and recharging a self chilling container having a heat exchange unit including compressed carbon internally thereof including a plurality of sources of cleaning and sanitizing materials connected through a plurality of valves to the container for injecting and exhausting the materials into and from the container. A source of carbon dioxide gas to be injected into said heat exchange unit to be adsorbed by said carbon. A source of chilled fluid and means for circulating the chilled fluid through the container during adsorption of said carbon dioxide gas to remove heat generated thereby.

Abstract: A tablet compressing machine and a process for cleaning a tablet compressing machine with a rotor unit, in which an actuator is provided for the purpose of tilting a sealed housing of the tablet compressing machine, in which the rotor unit, a rinsing unit and the powder supply are disposed, so that the cleaning liquid may drain off horizontal surfaces in the sealed housing. The process therefore comprises the steps of distributing the cleaning liquid, tilting the tablet compressing machine and discharging the cleaning liquid. Retrofitting of existing tablet compressing machines is possible.

Abstract: A closed-loop system for cleaning vessels containing drilling fluid residue. High pressure jets of water-based cleaning fluid are used to clean the interior of a vessel. The resulting slurry is sent to one or more solids/liquid separation stages to remove drill cuttings and other drilling fluid solids. The substantially solids-free cleaning fluid discharge is recycled.

Abstract: The base plate of a robotic or manually propelled tank or pool cleaning apparatus includes a transverse conduit positioned on the interior surface of the base plate and is in fluid communication with a source of pressurized water that is also located within the pool cleaner's housing, which pressurized water is discharged from the bottom or lower portion of the transverse conduit through a plurality of openings that extend along a line that is transverse to the longitudinal axis of the pool cleaner's direction of travel, to produce downwardly-directed water jets that are discharged through and below the base plate towards the surface of the pool or tank over which the pool cleaning apparatus is moving to dislodge and suspend dirt and debris that is then drawn into and retained by the pool cleaner's filter.

Abstract: A cleaning or care device for the cleaning or care of medical or dental instruments, having a cleaning or care chamber in which at least two connections for the instruments to be cleaned are provided, and a supply device for supplying the at least two connections with a cleaning or care agent. The at least two connections and the supply device can be moved relative to one another in such a way that one of the connections can be connected to the supply device and supplied with a cleaning or care agent, while another of the connections is not connected to the supply device and cannot be supplied with a cleaning or care agent. A corresponding method for the cleaning or care of medical or dental instruments with such a cleaning or care device is also described.

Abstract: An in-situ method of cleaning a vacuum deposition chamber can include flowing at least one reactive gas into the chamber.

Abstract: A method of cleaning a plasma processing apparatus for processing a target in a process container, which is vacuum-evacuatable, using plasma, includes performing a first cleaning process by supplying a cleaning gas into the process container to generate plasma and maintaining the pressure in the process container at a first pressure, and performing a second cleaning process by supplying a cleaning gas into the process container to generate plasma and maintaining the pressure in the process container at a second pressure that is higher than the first pressure. Accordingly, the plasma processing apparatus can be efficiently and rapidly cleaned without damaging at least one of the group consisting of inner surfaces of the process container and members in the process container.

Abstract: A tool for cleaning a personal care applicator, particularly an applicator for a product that is subject to dry out. In some embodiments, the invention is implemented as a reusable cleaning tool. In other embodiments, the invention is implemented as a disposable, single-use or limited use cleaning tool. The tool comprises a relatively flat body having first and second exterior surfaces, and one or more cleaning regions that extend through the body. As an applicator is drawn through the cleaning region, dried out product is scraped off the applicator.

Abstract: Problem: To provide a cleaning liquid and a cleaning method having excellent leaning capability. In a process of liquid immersion lithography, they can preventing the damage to be caused by the component released from the photoresist to photoexposure devices; the waste treatment is easy; the efficiency in substitution with the cleaning liquid for the medium for liquid immersion lithography is high, and the production cost is reduced not detracting from the throughput in semiconductor production. Means for Solution: A cleaning liquid to be used for cleaning a photoexposure device in a process of liquid immersion lithography, which comprises at least 5% by mass of a nonionic surfactant containing at least one group selected from an ethyleneoxy group, a propyleneoxy group and a polyglycerin group, and a balance of water; and a cleaning method using it.

Abstract: Non-metallic deposits are selectively removed from aluminum containing substrates such as aluminum faceplates using a selective deposition removal (SDR) solution. The SDR solution does not substantially etch the faceplate holes, thereby preserving the hole diameter integrity and increasing the number of times the faceplate may be cleaned or refurbished while remaining within processing hole diameter tolerances. In an embodiment, the SDR solution comprises, in wt % of the solution, 15.5%+/?2% HF or buffered HF acid, 3.8%+/?0.5% NH4F pH buffer, 59.7%+/?5% ethylene glycol, and the balance H2O.

Abstract: A method of cleaning an inside of a processing chamber is provided according to an embodiment of the present disclosure. The method includes supplying a fluorine-based gas and a nitrogen oxide-based gas as the cleaning gas, into the processing chamber heated to a first temperature, and removing a deposit by a thermochemical reaction. The method further includes changing a temperature in the processing chamber to a second temperature higher than the first temperature, and supplying the fluorine-based gas and the nitrogen oxide-based gas as the cleaning gas, and removing extraneous materials, remaining on the surface of the member in the processing chamber, by a thermochemical reaction.

Abstract: A pulse detonation device can provide one or more shock waves to an operating device. The pulse detonation device includes a pulse detonation chamber providing one or more shock waves, at least one pulse detonation outlet extending into the operating device and in operative association with the pulse detonation chamber, and a rotary union. The rotary union rotatably attaches the pulse detonation chamber to the at least one pulse detonation outlet, wherein the at least one pulse detonation outlet can move with respect to the pulse detonation chamber. The at least one pulse detonation outlet is rotatable within the operating device and can deliver the one or more shock waves to a plurality of locations within the operating device.

Abstract: A device for clearing obstructions from a medical tube, such as a chest tube, is disclosed in various embodiments. The device features a clearance member in the form of a loop. The loop desirably has a diameter that substantially corresponds to the inner diameter of the medical tube. Also desirably, the loop presents a substantially unobstructed pathway therethrough for the flow of material from a location in the medical tube distal to the loop to a location in the medical tube proximal to the loop regardless whether the clearance member is being translated or is at rest in the medical tube. Methods of utilizing such a device are also disclosed.

Abstract: A water heater rejuvenation system and process wherein a system kit comprises an introduction-extraction tube, a water heater wrench, and an amount of calcium cleaning solution. The system and process may include the steps of draining the water heater reservoir, opening an access to the water heater reservoir, introducing an amount of calcium cleaning solution into the reservoir, via an introduction-extraction tube, allowing an amount of time to pass, extracting the cleaning solution and debris from the reservoir with the introduction-extraction tube, closing the access to the reservoir, and filling the reservoir with water. Alternatively, the system and process may include introducing an additional amount of solution to remove additional debris, and using a wet/dry vacuum to facilitate extraction of the solution and debris from the reservoir.