Abstract: When a dry cleaning process is performed in a processing chamber by adding nitrogen monoxide (NO) gas to a cleaning gas, the handling is facilitated, and cleaning performance is improved. A substrate processing apparatus includes a processing vessel configured to process a substrate, a first cleaning gas supply system configured to pre-mix a gas containing fluorine atoms with the NO gas and supply the pre-mixed gas into the processing vessel, and a second cleaning gas supply system installed apart from the first cleaning gas supply system and configured to supply the fluorine-containing gas into the processing vessel.

Abstract: Cleaning of an ion implantation system or components thereof, utilizing a reactive cleaning reagent enabling growth/etching of the filament in an ion source of the arc chamber, by appropriate control of temperature in the arc chamber to effect the desired filament growth or alternative filament etching. Also described is the use of reactive gases such as XeFx, WFx, AsFx, PFx and TaFx, wherein x has a stoichioimetrically appropriate value or range of values, for cleaning regions of ion implanters, or components of implanters, in in situ or ex situ cleaning arrangements, under ambient temperature, elevated temperature or plasma conditions. Among specific reactive cleaning agents, BrF3 is described as useful for cleaning ion implant systems or component(s) thereof, in in situ or ex situ cleaning arrangements.

Abstract: An apparatus for cleaning a CVD apparatus that can efficiently remove a by-product such as SiO2 or Si3N4 stuck and deposited onto the surface of an internal wall, an electrode, or the like in a reaction chamber in a film forming process, and a method for cleaning a CVD apparatus. A control monitors luminous intensity data of an F radical in a reaction chamber by optical emission spectroscopy and compares the data with calibrated prestored luminous intensity data, and ends cleaning after a predetermined time passes from reaching a luminous intensity saturation point. Furthermore, concentration data of SiF4 in a gas discharged from the reaction chamber are monitored by a Fourier transform infrared spectrometry and compared with prestored concentration data of SiF4 to decide that the predetermined time has passed when a predetermined cleaning end point concentration is reached, thereby ending the cleaning.

Abstract: The present invention is a drain adapter for adapting a flushing device to a drainpipe. The adapter has a main body including an indent portion for retaining the flushing device during operation. The main body also includes an enlarged portion. The enlarged portion corresponds to a sink recess and expands under pressure to retain the adapter within the drainpipe.

Abstract: A fluid handling device with an anisotropic wetting surface including a substrate with a multiplicity of asymmetric substantially uniformly shaped asperities thereon. Each asperity has a first asperity rise angle and a second asperity rise angle relative to the substrate. The asperities are structured to present a desired retentive force ratio (f1/f2) greater or less than unity caused by asymmetry between the first asperity rise angle and the second asperity rise angle according to the formula: f3/f2=sin(?3+½??0)/sin(?2+½??0).

Abstract: A method for cleaning a vacuum pump (10) having a pump chamber (12) with at least one pump rotor (14) includes performing the steps of: a) filling a cleaning liquid (28) into the pump chamber (12), b) distributing the cleaning liquid (28) in the pump chamber (12), c) dissolving impurities with the cleaning liquid (28), d) draining the cleaning liquid (28) from the pump chamber (12).

Abstract: A process for conducting cleaning operations at predetermined time intervals in a chamber or container of a fluid-receiving device of a foodstuff-processing apparatus first comprises receiving a first fluid in the chamber or container. Then, first and second degrees of cleaning are determined at first and second moments in time, respectively. Then, a first difference between the first and second degrees of cleaning is determined. In a first case, in which the second degree of cleaning lies below a first limit value, the action duration of the at least one cleaning agent during at least one subsequent cleaning operation is set depending on the first degree of cleaning. In a second case, in which the second degree of cleaning lies above the first limit value, a greater amount of cleaning agent is supplied and/or the time interval between two subsequent, successive cleaning operations is shortened.

Abstract: Semiconductor device fabrication equipment performs a PEOX (physical enhanced oxidation) process, and includes a remote plasma generator for cleaning a process chamber of the equipment. After a PEOX process has been preformed, a purging gas is supplied into the process chamber to purge the process chamber, and the remote plasma generator produces plasma using a first cleaning gas. Accordingly, a reactor of the remote plasma generator is cleaned by the first cleaning gas plasma. Subsequently, the purging gas is supplied to purge the process chamber, and the remote plasma generator produces plasma using a second cleaning gas to remove the first cleaning gas plasma from the remote plasma generator and the process chamber. Finally, full flush operations are performed to remove any gases remaining in the process chamber.

Abstract: A cleaning apparatus that includes a device carrier that holds a device, a guide plate that guides the device carrier during extraction or retraction, a carrier support that supports the device carrier, and a ramp that supports and guides the carrier support to a cleaning position.

Abstract: An in-situ method of cleaning a vacuum deposition chamber can include flowing at least one reactive gas into the chamber.

Abstract: A tire vulcanization mold cleaning method for cleaning a molding surface of a sector of the tire vulcanization mold for molding a tread portion of a pneumatic tire by using plasma created in an atmosphere of a reaction gas which chemically reacts with dirt attached to the molding surface of the sector. The method comprises the steps of placing the sector on a electrode table in a cleaning tank with the molding surface of the sector facing a discharge electrode, supplying the reaction gas to the cleaning tank while pressure in the cleaning tank is reduced, supplying a high-frequency power to the discharge electrode to create the plasma between the discharge electrode and the molding surface of the sector, and applying to the electrode table a high-frequency voltage having a frequency lower than a high frequency wave supplied to the discharge electrode to make the electrode table generate a negative self-bias.

Abstract: Disclosed are methods and apparatus for cleaning heat exchangers and similar vessels by introducing chemical cleaning solutions and/or solvents while maintaining a target temperature range by direct steam injection into the cleaning solution. The steam may be injected directly into the heat exchanger or into a temporary side stream loop for recirculating the cleaning solution or admixed with fluids being injected to the heat exchanger. The disclosed methods are suitable for removing metallic oxides from a heat exchanger under chemically reducing conditions or metallic species such as copper under chemically oxidizing conditions. In order to further enhance the heat transfer efficiency of heating cleaning solvents by direct steam injection, mixing on the secondary side of the heat exchanger can be enhanced by gas sparging or by transferring liquid between heat exchangers when more than one heat exchanger is being cleaned at the same time.

Abstract: The invention provides a deckle system for extrusion dies. In certain embodiments, the invention provides methods of cleaning an extrusion die equipped with a retractable external deckle system. Also provided in some embodiments is a deckle system having a novel deckle adjustment mechanism. In other embodiments, the invention provides an advantageous internal deckle member equipped with a removable, replaceable internally threaded insert.

Abstract: In an ion implanter, a Faraday cup is utilized to receive an ion beam generated during ion source cleaning. The detected beam has an associated mass spectrum which indicates when the ion source cleaning process is complete. The mass spectrum results in a signal composed of a cleaning agent and the material comprising the ion source. This signal will rise over time as the ion source chamber is being cleaned and will level-off and remain constant once the deposits are etched away from the source chamber, thereby utilizing existing implant tools to determine endpoint detection during ion source cleaning.

Abstract: A method for operating a cleaning device or a cleaning system is proposed. In this case, the cleaning device is set up for carrying out a process for cleaning an article with a germicidal action. The method includes the following steps: information on a target germ with which the article could be contaminated is received; at least one process parameter of the cleaning process is selected according to the target germ in such a way that the target germ is killed with a high degree of probability during the cleaning process; and the cleaning process is carried out with the process parameter.

Abstract: A cleaning solution for automatic biochemical analyzers includes: at least one anionic surfactant, at least one nonionic surfactant, an alkali metal hydroxide, an alkali metal citrate, and a buffering agent stabilizing the pH value above 13.0. In some embodiments, the cleaning solution provides low residual rate of proteins, low residual rate of lipids, desirable within-batch repeatability in clinical testing, low level of cross-contamination, and low level of reactant deposit after cleaning, without affecting test results of the biochemical analyzer. In some embodiments, the cleaning solution has no corrosive effects on the liquid path and reaction cup of the analyzer. The ingredients of the cleaning solution may also be biodegradable.

Abstract: A method of dispensing a first solid product and a second solid product with a solid product dispenser includes placing the first solid product in a product housing of the dispenser and placing the second solid product in the product housing on top of the first solid product, the first and second solid products being different products. A portion of the first solid product is dispensed during each cycle of the dispenser until the first solid product has been partially depleted to a size small enough to allow the second solid product to also be dispensed, then a portion of the first solid product and a portion of the second solid product are dispensed during each cycle of the dispenser until the first solid product has been completely depleted, and then a portion of the second solid product is dispensed during each cycle of the dispenser.

Abstract: An apparatus and method are provided to remove matte-sticking adhered to an inner surface of an inclined rear jacket of an exhaust gas hood for collecting exhaust gas discharged during the converter operation in copper smelting. Scraping means 10a˜10f are each provided with a scraping part 20 for scraping off matte-sticking by moving slidably across the inner surface of the rear jacket 8 by driving means 11 from a sidewall of the exhaust gas hood to at least over the centerline L of the width of the rear jacket 8. The scraping means are arranged in pairs at both right and left sidewalls of the exhaust gas hood 6 in multiple levels along the inclination of the rear jacket 8, thereby allowing the matte-sticking adhered to the rear jacket 8 to be removed over almost its entire surface.

Abstract: A method for altering an initiation time of an apparatus sanitation cycle based upon a base line flow rate. The method may include determining an actual flow rate through the apparatus, comparing the actual flow rate to the base line flow rate, and delaying the initiation time of the apparatus sanitation cycle if the actual flow rate exceeds the base line flow rate.

Abstract: A method of fabricating a substrate processing chamber component involves forming a component having a textured surface and sweeping a jet of pressurized fluid across the textured surface of the component. The jet of fluid is pressurized sufficiently high to dislodge substantially all the particles from the textured surface. The method can be applied to dislodge grit particles from textured exposed surfaces formed by electromagnetic energy beam scanning and grit blasting. The method can also be applied to remove loosely adhered coating particles from the textured surfaces of coated components.

Abstract: A washing machine, such as a laundry washing machine, a washing/drying machine or the like, has a tub housing a drum into which the laundry to be washed is loaded. The machine is equipped with at least one tank for a washing agent, and at least one supply duct is afferent to the tank for delivering the washing agent into the tub. A hydraulic washing circuit floods and drains the tank for cleaning purpose. A tank cleaning method is also disclosed.

Abstract: A paper-roll core that is a soluble, disposable carrier for cleaning and/or disinfecting chemicals. The paper-roll cores are toilet paper roll cores and paper towel roll cores and are rapidly soluble in water and may release cleansers, disinfectants, colors, etc., upon dissolving. Described are: methods of using, manufacturing, advertising, and distributing the paper-roll cores; and methods of advertising and distributing such paper-roll cores to children, who will particularly enjoy the novelty; and methods of modifying existing paper-roll core manufacturing equipment to manufacture soluble cleanser-dispensing paper-roll cores.

Abstract: A pressure flush process for removing debris from internal passageways of a cooled turbine blade includes a step of creating an agitated liquid/gas mixture and a step of injecting the agitated liquid/gas mixture under a positive pressure, into at least some of cooling holes in the blade to pass through the internal passageways and discharging the agitated liquid/gas mixture together with removed debris, through a larger root opening of the blade.

Abstract: A method for the on-line cleaning of a heat exchanger used with petroleum process fluids which create coke deposits of asphaltenic origin on the exchanger tubes. The asphaltenes are removed by re-dissolution in a solvent oil of high solubility power for the asphaltenes. Certain asphaltenic crudes are useful as solvents in view of their chemical similarity to the asphaltene coke precursors; also useful are refined petroleum fractions such as gas oils which are also characterized by their solvency for asphaltenes. The solvent oil may be admitted to the heat exchanger following withdrawal of the process fluid and then allowed to soak and dissolve the asphaltene coke precursors after which the resulting solution may be withdrawn and the exchanger returned to use without being at any time disconnected from its associated process unit.

Abstract: The present invention is improved cleaning method using a composition having at least one ketone for cleaning organic residue.

Abstract: The invention relates to a cleaning system for milking cups, said cleaning system comprising a dispensing device into which at least two different cleaning fluids can be introduced inside the milking cup, in such a way as to enable an efficient intermediate disinfection between individual milking processes.

Abstract: A remote plasma process for removing unwanted deposition build-up from one or more interior surfaces of a substrate processing chamber after processing a substrate disposed in the substrate processing chamber. In one embodiment, the substrate is transferred out of the substrate processing chamber and a flow of a fluorine-containing etchant gas is introduced into a remote plasma source where reactive species are formed. A continuous flow of the reactive species from the remote plasmas source to the substrate processing chamber is generated while a cycle of high and low pressure clean steps is repeated. During the high pressure clean step, reactive species are flown into the substrate processing chamber while pressure within the substrate processing chamber is maintained between 4-15 Torr.

Abstract: A tool for removing particulate matter from a diesel particulate filter (DPF) includes a container defining a chamber that has an open end, and a support associated with the open end that supports a first axial end of the DPF and forms a seal around an outside surface of the can of the DPF and the container. An air nozzle mounted proximate to a second axial end of the DPF directs a narrow flow of air through the DPF that passes through a portion of the DPF element bundle and exits through the first axial end into the container.

Abstract: An exhaust foreline for purging fluids from a semiconductor fabrication chamber is described. The foreline may include a first, second and third ports independently coupled to the chamber. A semiconductor fabrication system is also described that includes a substrate chamber that has a first, second and third interface port. The system may also include a multi-port foreline that has a first, second and third port, where the first foreline port is coupled to the first interface port, the second foreline port is coupled to the second interface port, and the third foreline port is coupled to the third interface port. The system may further include an exhaust vacuum coupled to the multi-port foreline.

Abstract: A device for producing froth comprises means (1) which are adapted to perform a pumping function and to perform a mixing process of at least one liquid and a gas at the same time. Furthermore, the device comprises suitable means (2) for supplying the liquid and the gas to the pumping means (1), and suitable means (3) for discharging froth from the pumping means (1). In order for the device to be capable of producing hot froth, means (4) for supplying steam are provided, and arranged such as to supply the steam directly to the pumping means (1), in particular to an outlet side of the pumping means (1). This way of attributing a heating functionality to the pumping means (1) has many advantages, including the option of a most compact design. Furthermore, the steam may be used for cleaning the pumping means (1).

Abstract: A method for cleaning the interior surfaces of a fuel storage tank. The first step of the method is to extract a material sample from the bottom of the fuel tank to determine how thoroughly the tank must be cleaned. The clean fuel is then removed from the tank and is stored in a holding tank. Loose and liquid contaminants are then vacuumed out of the tank. Next, a self-propelled spray nozzle, a sprayer tube, and a rotating spray nozzle, each of which is connected to a pressurized water supply line, are successively lowered into the fuel tank and are used to scour the various interior surfaces of the tank with pressurized water while wash water and loosened contaminants are simultaneously vacuumed out of the tank. The interior of the tank is then dried, and the clean fuel stored in the holding tank is pumped back into the fuel tank.

Abstract: A method for using a film formation apparatus for a semiconductor process includes a first cleaning process of removing by a first cleaning gas a by-product film from an inner surface of a reaction chamber of the film formation apparatus, while supplying the first cleaning gas into the reaction chamber, and setting an interior of the reaction chamber at a first temperature and a first pressure to activate the first cleaning gas. The method further includes a second cleaning process of then removing by a second cleaning gas a contaminant from the inner surface of the reaction chamber, while supplying the second cleaning gas into the reaction chamber, and setting the interior of the reaction chamber at a second temperature and a second pressure to activate the second cleaning gas. The second cleaning gas includes a chlorine-containing gas.

Abstract: A descaling arrangement for a dishwasher and an associated apparatus are provided. The dishwasher has a tub portion adapted to receive dishware therein, and a fluid circulation system configured to circulate dishwashing fluid about the dishware within the tub portion. A descale system is in fluid communication with the fluid circulation system. The descale system is configured to selectively introduce a descaling substance into dishwashing fluid circulated within the fluid circulation system such that the descaling substance is distributed to at least one of the tub portion and the fluid circulation system for descaling thereof. An associated method is also provided.

Abstract: A cleaning method of a process chamber to remove a nitride layer including aluminum and a transition metal, which is adhered to an inner surface of the process chamber, includes removing the nitride layer by supplying cleaning gases to the process chamber, wherein the cleaning gases comprises a first gas including boron and a second gas including fluorine.

Abstract: Components, systems, and methods for maintaining an extremely dry environment within substrate containers formed of polymers provides supplemental exterior gas washing of the substrate container to minimize permeation of moisture and oxygen through the polymer walls of the container and to control desorption of water entrapped in the polymer walls of the container.

Abstract: A method and apparatus for removing deposition products from internal surfaces of a processing chamber, and for preventing or slowing growth of such deposition products. A halogen containing gas is provided to the chamber to etch away deposition products. A halogen scavenging gas is provided to the chamber to remove any residual halogen. The halogen scavenging gas is generally activated by exposure to electromagnetic energy, either inside the processing chamber by thermal energy, or in a remote chamber by electric field, UV, or microwave. A deposition precursor may be added to the halogen scavenging gas to form a deposition resistant film on the internal surfaces of the chamber. Additionally, or alternately, a deposition resistant film may be formed by sputtering a deposition resistant metal onto internal components of the processing chamber in a PVD process.

Abstract: A method of cleaning a film-forming apparatus to remove a silicon-based material deposited on a constituent member of the film-forming apparatus after being used to form thin films includes introducing a first gas including fluorine gas and a second gas including carbon monoxide gas into the film-forming apparatus, and heating the constituent member. The constituent member includes quartz or silicon carbide and the silicon-based material includes silicon nitride, or the constituent member includes silicon carbide and the silicon-based material includes silicon oxide.

Abstract: A method for cleaning a gas turbine unit. The invention further relates to a nozzle for use in washing the gas turbine unit. The nozzle is arranged to atomize a wash liquid in the air stream in an air intake of the gas turbine unit and comprises a nozzle body comprising an intake end for intake of said wash liquid and outlet end for exit of said wash liquid. The nozzle further comprises a number of orifices that are connected to the outlet end and respective orifice is arranged at a suitable distance from a center axis of said nozzle body, whereby the local density of the injected wash liquid in a desired area can be increased with preserved droplet size and thereby the efficiency of the cleaning process can be significantly improved at the same time as the risk for damaging the components in the gas turbine unit is significantly reduced.

Abstract: The present invention provides a method for removing metal and/or metal oxide contamination from the interior of a vacuum coating reactor, the method comprising the steps of: a) performing an idle coating step by depositing a coating layer, wherein the coating layer comprises silicon; b) at least partly removing the deposited coating layer. The method according to the invention is particularly suitable for cleaning reactors in the context of solar cell manufacturing. The method is time saving and cost saving.

Abstract: Liquid hydrocarbon storage tanks are cleaned by transferring the most contaminated lower fuel layer to an external vessel on a treatment truck where separation into a contaminants portion and a fuel portion occurs. The remnant fuel in the storage tank is cleaned by multiple passes through an external circuit on the truck. The fuel from the vessel is sometimes returned to the remnant fuel to be cleaned. The contaminants are discarded. The initial separation shortens the cleaning cycle. A flexible dip tube stiffened by a guide rod allows probing of the storage tank floor.

Abstract: A method is provided for cleaning the interior of polymer processing equipment having a resin composition retained therein, wherein a contaminant material is adhered to at least a portion of the interior surface of the polymer processing equipment. The method comprises the steps of: charging the polymer processing equipment having a residual polymer composition retained in the interior thereof with a purging composition comprising 45-94 weight % of starch; 0.

Abstract: A method to remove deposits containing magnetite and copper from a container, particularly from a steam generator of a nuclear power plant. In a first step, the container is treated using an alkaline cleaning solution containing a complexing agent forming a soluble complex with iron ions, a reducing agent, and an alkalizing agent. In a second step a further complexing agent forming a more stable complex with iron III ions than the complexing agent used in the first step and an oxidant are added to the cleaning solution of the first step present in the container.

Abstract: A device for disinfecting a portion of an implement such as a needleless hub or injection port. The device includes a body shaped to engage the implement with the portion to be disinfected exposed. A disinfectant area is located on the body so as to permit pivotal displacement of the area relative to the body such that in a first orientation the portion to be disinfected is exposed and in a second orientation the portion to be disinfected is covered and the disinfectant area engages the portion to be disinfected.

Abstract: A method for cleaning a semiconductor equipment is provided. First, a first cleaning step is performed to the process chamber. The first cleaning step includes conducting a cleaning gas into the process chamber via a short processing gas injector for generating a plasma of the cleaning gas in the process chamber. Then, a cleaning step is performed to a long cleaning gas injector. The cleaning step performed to the long cleaning gas injector includes conducting the cleaning gas into the process chamber via the long processing gas injector. Then, a second cleaning step is performed to the process chamber. The second cleaning step includes conducting the plasma of the cleaning gas into the process chamber via the short processing gas injector.

Abstract: A teat cup cleaning device comprises a heating chamber provided with a discharge outlet that is closable by a valve and arranged for connection to a teat cup. A filling device is arranged for filling the heating chamber with an amount of cleaning liquid and retaining a given quantity of gas. The chamber is provided with a heating arrangement arranged to heat the contents of the heating chamber to a temperature T higher than the boiling point Tk of the cleaning liquid at ambient pressure. On operation of the valve superheated cleaning liquid is discharged to clean a teat cup.

Abstract: A device for rinsing a container that dispenses a beverage includes the container that has a wall surrounding a volume that holds ingredients of the beverage and a magnet connected to the wall. A rinsing system includes a nozzle that sprays liquid and a switch that is attracted to the magnet so that when the magnet contacts the switch a rinse cycle is activated.

Abstract: This invention relates in part to a method for cleaning an ion source component of an ion implanter used in semiconductor and microelectronic manufacturing. The ion source component includes an ionization chamber and one or more components contained within the ionization chamber. The interior of the ionization chamber and/or the one or more components contained within the ionization chamber have at least some deposits thereon of elements contained within a dopant gas, e.g., carborane (C2B10H12). The method involves introducing a cleaning gas into the ionization chamber, and reacting the cleaning gas with the deposits under conditions sufficient to remove at least a portion of the deposits from the interior of the ionization chamber and/or from the one or more components contained within the ionization chamber.

Abstract: A method for cleaning containers, in particular bottles of glass or plastics, and a cleaning machine with at least one cleaning medium, with the containers cleaned at least in one station preferential for the cleaning result and/or in a procedure step with at least essentially chemical-free cleaning media. The cleaning medium is advantageously a granular material, in particular granular ice, carried under pressure with compressed air or compressed water. The cleaning machine suited for carrying out the method includes downstream of an unpacking and presoaking station, a pre-cleaning station with a high pressure water blasting pre-cleaning section, and subsequently an intensive cleaning station with at least one intensive cleaning section to which a pressure blasting system for chemical-free, granular material and a carrier medium are associated, and a disinfection station following the intensive cleaning station.

Abstract: The present invention is directed to a method of cleaning an interior surface of a fluid delivery system. The method comprises introducing a first liquid into the fluid delivery system and contacting the interior surface with the first liquid; forming a slurry by introducing a particulate into the first liquid and contacting the interior surface with the slurry; introducing a second liquid into the fluid delivery system and contacting the interior surface with the second liquid; and introducing a third liquid into the fluid delivery system and contacting the interior surface with the third liquid. The first liquid is substantially soluble or substantially insoluble in the second liquid, the second liquid is substantially insoluble in the third liquid, and the particulate is substantially insoluble in the first and second liquids and substantially soluble in the third liquid.

Abstract: A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition mask with water, and a third stage for rinsing the vapor-deposition mask with flowing water. The cleaning apparatus also comprises a fourth stage for treating the vapor-deposition mask with ethanol, a fifth stage for drying the vapor-deposition mask, and a carrying means that carries the vapor-deposition mask to each stage in sequence. It is desirable to adopt N-methyl-2-pyrrolidone as the derivative of pyrrolidone.