Abstract: The invention relates to a gyroscopic sensor comprising a sensitive element designed to vibrate; an electrode carrier capable of carrying electrodes for exciting the sensitive element and electrodes for detecting the vibration of the sensitive element; and support rods designed to support the electrode carrier, characterized in that the support rods have at least one bulged end.

Abstract: The present invention provides a security functional thin film and a security product containing such a thin film. The security functional thin film is of an amorphous structure, and possesses soft magnetic characteristics. Large Barkhausen effect can be detected along the in-plane preferred direction of magnetization; and the Large Barkhausen effect significantly attenuates, or no such signal can be detected, in a direction perpendicular to the in-plane preferred direction of magnetization. The thin film has a thickness of 20-300 nm, and the thin film also possesses element encoding characteristics that can be authenticated by experts. The security functional thin film of the present invention can be fabricated by magnetron sputtering web coating process.

Abstract: A turbine engine component includes an electron beam-physical vapor deposition thermal barrier coating covering at least a portion of a substrate. The thermal barrier coating includes an inner layer having a columnar-grained microstructure with inter-columnar gap porosity. The inner layer includes a stabilized ceramic material. The thermal barrier coating also includes a substantially non-porous outer layer, covering the inner layer and including the stabilized ceramic material. The outer layer is deposited with continuous line-of-sight exposure to the vapor source under oxygen deficient conditions. The outer layer may further comprise a dopant oxide that is more readily reducible than the stabilized ceramic material. During deposition, the outer layer may also have an oxygen deficient stoichiometry with respect to the inner layer. Oxygen stoichiometry in the outer layer may be restored by exposure of the coated component to an oxidizing environment.

Abstract: A magnetic recording medium which does not easily cause a material containing Fe or Co to corrode is disclosed. The method for manufacturing a magnetic recording medium 122 includes a process of forming a magnetic layer 30 on a non-magnetic substrate 10, a process of forming a recessed area 65 in the magnetic layer 30, a process of forming a corrosion-resistant film 60 to cover an exposure surface 65c of the recessed area 65, and a process of forming a magnetic recording pattern made of the magnetically separated magnetic layer 30 by forming a non-magnetic layer 40 to fill in the recessed area 65.

Abstract: Silicon dots are formed at a relatively low temperature, while suppressing occurrence of defects and clustering of silicon dots and damages caused by plasma, with high controllability of particle diameter and high reproducibility between substrates. Moreover, silicon dots and insulating film are formed at a relatively low temperature, with high controllability of the particle diameter of the silicon dots, high controllability of the thickness of the insulating film and high reproducibility between substrates.

Abstract: Described herein are diffraction gratings and methods for the manufacture thereof. One method comprises applying a force to a substrate to strain the substrate, disposing a thin film on at least a portion of the substrate, and reducing the force applied to the substrate, thereby causing the thin film to buckle.

Abstract: The present invention relates to a cutting tool for metal machining with improved wear properties, comprising a cutting tool substrate of cemented carbide, cermet, ceramics or a super hard material, and a wear resistant coating, wherein the wear resistant coating comprises a PVD Ti—Si—C—N layer, and a method of making thereof.

Abstract: A method for making a coaxial cable, the method comprises the steps of: providing a carbon nanotube structure; and forming at least one conductive coating on a plurality of carbon nanotubes of the carbon nanotube structure; a carbon nanotube wire-like structure from the carbon nanotubes with at least one conductive coating; at least one layer of insulating material on the carbon nanotube wire-like structure; at least one layer of shielding material on the at least one layer of insulating material; and one layer of sheathing material on the at least one layer of shielding material.

Abstract: The information recording medium 3 comprises an information layer having a metal layer 5 on a substrate 4, wherein concavo-convex portion is formed in the substrate to give main information such as image and voice, and the metal layer contains Al, Si and M (wherein M is at least one element selected from a group consisting of Cr and Ni) and enables sub-information to be additionally recorded therein at low cost by laser-beam 7 irradiation.

Abstract: Provided is a method for forming a gapless semiconductor thin film. The method includes the steps of providing a lead palladium oxide target, arranging the lead palladium oxide target in a vacuum container and providing a substrate, and forming a lead palladium oxide thin film on the substrate using the lead palladium oxide target.

Abstract: A method is described for producing nuclear fuel products, including the steps of receiving metallic or intermetallic uranium-based fuel particle cores, providing at least one physical vapour deposited coating layer surrounding the fuel particle core and embedding the nuclear fuel particles in a matrix so as to form a powder mixture of matrix material and coated fuel particles. The at least one physical vapour deposited coating layer may include inhibitors of inhibiting, stabilizing and/or reducing interaction between metallic and intermetallic uranium-based fuel particles cores and the matrix wherein the fuel particles typically may be embedded. The deposited coating layer may include neutron poisons.

Abstract: Embodiments of the invention provide sputtering targets utilized in physical vapor deposition (PVD) and methods to form such sputtering targets. In one embodiment, a sputtering target contains a target layer disposed on a backing plate, and a protective coating layer—usually containing a nickel material—covering and protecting a region of the backing plate that would otherwise be exposed to plasma during the PVD processes. In many examples, the target layer contains a nickel-platinum alloy, the backing plate contains a copper alloy (e.g., copper-zinc), and the protective coating layer contains metallic nickel. The protective coating layer eliminates the formation of highly conductive, copper contaminants typically derived by plasma erosion of the copper alloy contained within the exposed surfaces of the backing plate. Therefore, the substrates and the interior surfaces of the PVD chamber remain free of such copper contaminants during the PVD processes.

Abstract: The invention relates to a protective coating, having the chemical composition CaSibBdNeOgHlMem, wherein Me is at least one metal of the group consisting of {Al, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Y, Sc, La, Ce, Nd, Pm, Sm, Pr, Mg, Ni, Co, Fe, Mn}, with a+b+d+e+g+l+m=1. According to the invention, the following conditions are satisfied: 0.45?a?0.98, 0.01?b?0.40, 0.01?d?0.30, 0?e?0.35, 0?g?0.20, 0?1?0.35, 0?m?0.20. The invention relates also to a coated member having a protective coating, as well as to a method for producing a protective coating, in particular a multilayer film for a member.

Abstract: The present invention is a preparation method of an anti-bacterial coating on a plastic surface. A preparation method of an anti-bacterial coating on a plastic surface with a better anti-bacterial effect is provided and comprises putting a plastic substrate into a PVD vacuum device; coating an anti-bacterial metallic layer on the plastic surface; and spray coating an anti-bacterial middle coating on the sample coated with anti-bacterial metallic coating. Utilizing PVD to coat antibacterial layer offsets timeliness of bacterial activity of the organic anti-bacterial coating, which allows the products with double bacterial layers have excellent anti-bacterial and bacteria-inhibited effects during their life spans. The anti-bacterial effect can not only be lasted for a long time, but also achieve high anti-bacterial efficiency (antibacterial rate is more than 99%).

Abstract: A layer of phase change material with silicon or another semiconductor, or a silicon-based or other semiconductor-based additive, is formed using a composite sputter target including the silicon or other semiconductor, and the phase change material. The concentration of silicon or other semiconductor is more than five times greater than the specified concentration of silicon or other semiconductor in the layer being formed. For silicon-based additive in GST-type phase change materials, sputter target may comprise more than 40 at % silicon. Silicon-based or other semiconductor-based additives can be formed using the composite sputter target with a flow of reactive gases, such as oxygen or nitrogen, in the sputter chamber during the deposition.

Abstract: A substrate cooling device includes: a substrate holding stage including a recess defining a space between a substrate mounting unit and a substrate mounted on the substrate mounting unit; a holding member that exerts a pressing force against the substrate holding stage so as to fix the substrate to the substrate holding stage; a refrigerator connected to the substrate holding stage; a coolant gas inlet path including a coolant gas inlet opening that is provided at the substrate holding stage and opens to a recessed face of the recess, the coolant gas inlet path connecting a space in the recess via the coolant gas inlet opening to a coolant gas supply; and a coolant gas outlet path including a coolant gas outlet opening that is provided at the substrate holding stage independently of the coolant gas inlet opening and opens to the recessed face of the recess.

Abstract: A piezo film ultrasonic transducer has a piezo film including first and second opposing surfaces and a working portion and a lead-out portion. A first plated metal electrode layer is on the first surface of the working portion and the lead-out portion of the piezo film; a first conductive layer is on the first metal plated electrode layer; and a second metal electrode layer is on the opposite surface of the working portion and the lead-out portion. A first conductive layer is on the first metal electrode layer and a second conductive layer is on the second metal electrode layer.

Abstract: A coated glass includes a glass substrate, a first titanium oxide layer, a silver layer, a titanium layer, a titanium nitrogen layer and a second titanium oxide. The first titanium oxide layer is formed on the glass substrate. The silver layer is formed on the first titanium oxide layer. The titanium layer is formed on the sliver layer. The titanium nitrogen layer is formed on the titanium layer, and the second titanium oxide layer is formed on the titanium nitrogen layer.

Abstract: An electronic device includes a substrate, a metallic coating formed on the substrate by vacuum sputtering or vacuum vapor deposition and a top paint coating formed on the metallic coating. The metallic coating comprising a plurality of titanium oxide layers interleaved with an equal number of silicon oxide layers and has a reflectively of about 50%-80%. The top paint coating includes pearl pigments.

Abstract: A method according to one embodiment includes forming a high Ku first oxide magnetic layer above a substrate by sputtering; forming a low Ku second oxide magnetic layer above the first oxide magnetic layer by sputtering; forming an exchange coupling layer of CoCrPt-oxide above the second oxide magnetic layer; and forming a magnetic cap layer above the exchange coupling layer. Additional systems and methods are also presented.

Abstract: Provided are a method of forming a conductive layer on an inner portion of a through-electrode in which uniform adhesion property of plating in the inner portion of a through-hole is enhanced and a tact time is short, and a semiconductor device. The method of forming a conductive layer includes: a first plating step of forming a first plating layer on the inner portion of the through-hole; a plating suppression layer forming step of forming a plating suppression layer including a material different from a material of the first plating layer in an opening portion of the through-hole after the first plating step; and a second plating step of forming a second plating layer by plating on the inner portion of the through-hole after the plating suppression layer forming step.

Abstract: A coated cutting tool is disclosed having a substrate and a coating including an aperiodic, multilayered structure with an average composition of (Ti, Al, Cr, Si)N, wherein the average composition is (Ti(1-a-b-c)AlaCrbSic)N, where 0<a<0.5, preferably 0.05<a<0.4 most preferably 0.25<a<0.3, where 0<b<0.15, preferably 0.02<b<0.10, most preferably 0.04<b<0.08, where 0.01<c<0.17, preferably 0.02<c<0.10, most preferably 0.04<c<0.08, and a+b+c<1, and wherein the average thickness of the individual layers is 0.1 to 100 nm.

Abstract: In a method of producing a layered composite, wherein at least one layer including cubic boron nitride is deposited on a substrate and, during the deposition, 3 to 15 at % oxygen is added for assuming the nitrogen locations of the cubic boron-nitride grating or intermediate grating locations, thereby providing for cubic boron nitride layers with a thickness of at least 2 ?m without the formation of cracks.

Abstract: A deposition method for electrochromic WOx films involves cyclic deposition of very thin poisoned and metallic tungsten oxide layers to build up a film with a desired general stoichiometry with x in the range of 3>x>2.75. The method may include: charging a deposition chamber with oxygen gas to poison a tungsten metal target; initiating sputtering of the target while reducing the oxygen partial pressure being supplied to the chamber and pumping the chamber; sputtering target for time t1+t2 to form first and second tungsten oxide layers, where the first layer is deposited during time t1 from a poisoned target and the second layer is deposited during time t2 from a metallic target, and where the stoichiometry of the film comprising the first and second layers is a function of t1 and t2; and, repeating until a desired film thickness is achieved.

Abstract: A system and method for in-situ introduction of gas into a vacuum deposition chamber having a target with a length/width form factor ratio greater than 1 includes a plurality of manifolds arranged around the target to deliver a gas to the vacuum chamber. A gas supply is coupled to the manifolds, and a mass flow controller couples each manifold to the gas supply. Each manifold includes a plurality of orifices for introducing gas into the vacuum chamber from the manifold. The method includes arranging a plurality of manifolds around the target, providing a gas supply to the manifolds, controlling a flow rate of the gas with a mass flow controller between each manifold and the gas supply, introducing the gas into the vacuum chamber through orifices in the manifolds, and locating the manifolds and orifices on each manifold to introduce the gas in a controlled arranged manner about the target.

Abstract: A method of a preparing double-layer antimicrobial coating comprises: placing a plastic substrate into a PVD vacuum equipment for a vacuum process; rinsing and activating the substrate when the vacuum level reaches 10?2; coating a metal film onto the activated substrate by the vacuum process; spraying an antimicrobial intermediate coating onto the metal film; and then coating an antimicrobial metal film by PVD to obtain a double-layer antimicrobial layer. The coating has two antimicrobial layers, and includes bores because the density of the coated film layer produced by PVD is low, so that the antimicrobial agent of the antimicrobial intermediate coating can pass through the bores and move to the surface of the coating and the surface of the antimicrobial coating, so as to kill the bacteria or suppress their grown. The method is very suitable for the sanitary, electronics, electrical appliances and the automobile industry.

Abstract: A patterned substrate for a touch screen sensor assembly that includes a plurality of electrodes that are formed from a first transparent conductive layer that has a first surface resistivity. The substrate also has a plurality of traces that may be used to couple the electrodes controller associated with the touch screen sensor assembly. The traces are formed from a second conductive layer that has a second surface resistivity that is less than the surface resistivity of the first conductive layer. The first and second conductive layers may be formed from indium tin oxide (ITO) having different surface resistivities. A second, similarly configured substrate can be provided and may be spaced apart from the first substrate by a dielectric spacer.

Abstract: A method of making a heat treated (HT) coated article to be used in shower door applications, window applications, or any other suitable applications where transparent coated articles are desired. For example, certain embodiments of this invention relate to a method of making a coated article including a step of heat treating a glass substrate coated with at least a layer of or including carbon and an overlying protective film including a zinc oxide inclusive layer. Following and/or during heat treatment (e.g., thermal tempering, or the like) the protective film may be removed. Other embodiments of this invention relate to the pre-HT coated article, or the post-HT coated article.

Abstract: A recording layer excellent in recording property, an optical information recording medium including the recording layer, and a sputtering target for producing the recording layer. The recording layer on which recording is performed through irradiation with a laser light, contains: a Pd oxide; a Ag oxide; and an oxide of a metal X of having an absolute value of the standard free energy of oxide formation per 1 mol of oxygen that is larger than an oxide of Pd and Ag, wherein a ratio of Pd atom to a total (metal X atom+Pd atom+Ag atom) is from 10 to 60 atomic %, a ratio of Ag atom to the total is from 5 to 45 atomic %, and a ratio of Pd atom and the Ag atom to the total is 75 atomic % or less.

Abstract: To provide a method for manufacturing a perpendicular magnetic recording medium which has improved electromagnetic conversion characteristics, and thus making it possible to achieve the much higher recording density. Disclosed is a method for manufacturing a perpendicular magnetic recording medium to be used for recording information by a perpendicular magnetic recording system, the perpendicular magnetic recording medium including at least a soft magnetic layer, an underlayer, and a magnetic recording layer on a substrate. In the method, the underlayer is formed by sputtering deposition, including a low-gas-pressure deposited layer deposited at a low gas pressure during the deposition, and a high-gas-pressure deposited layer deposited at a high gas pressure during the deposition. The high-gas-pressure deposited layer is formed of a multilayer deposited by decreasing a deposition rate in a stepwise manner.

Abstract: An aspect of the present invention relates to a press-molding glass material, which comprises a core part comprised of optical glass and a silicon oxide film of less than 15 nm in thickness covering at least a portion of the core part, the portion being to be an optically functional surface, as well as has a surface free energy as measured by a three-liquid method of equal to or lower than 75 mJ/m2. A further aspect of the present invention relates to a method of manufacturing a press-molding glass material comprising a core part comprised of optical glass and a silicon oxide film covering at least a portion of the core part to be an optically functional surface.

Abstract: A process for surface treating aluminum or aluminum alloy comprises the following steps. Providing a substrate made of aluminum or aluminum alloy. The substrate is treated with a chemical conversion treatment solution containing molybdate as the main film forming agent, to form a molybdate conversion film on the substrate. Then, a ceramic coating comprising refractory compound is formed on the molybdate conversion film by physical vapor deposition.

Abstract: The subject of the invention is a process for obtaining a substrate coated on at least part of its surface with at least one film of oxide of a metal M the physical thickness of which is 30 nm or less, said oxide film not being part of a multilayer comprising at least one silver film, said process comprising the following steps: at least one intermediate film of a material chosen from the metal M, a nitride of the metal M, a carbide of the metal M and an oxygen-substoichiometric oxide of the metal M is deposited by sputtering, said intermediate film not being deposited above or beneath a titanium-oxide-based film, the physical thickness of said intermediate film being 30 nm or less; and at least part of the surface of said intermediate film is oxidized using a heat treatment, during which said intermediate film is in direct contact with an oxidizing atmosphere, especially air, the temperature of said substrate during said heat treatment not exceeding 150° C.

Abstract: Provided is low emissivity glass including a low emissivity layer containing electrically conductive metal; and a composite metal oxide formed on one or both sides of the low emissivity layer and expressed by a following chemical formula 1: TiCeOx??(1) wherein Ti is titanium element, Ce is cerium element, and Ox is oxide. Since the dielectric layer which serves as protecting low emissivity layer of low emissivity glass and reducing emissivity contains the composite metal oxide expressed by the above chemical formula 1, visible light transmissivity can be greatly increased with excellent low emissivity.

Abstract: A ceramic plate with reflective film and method of manufacturing the same are provided. The ceramic plate with reflective film at least comprises a ceramic substrate and a reflective film. The reflective film at least includes a glass layer and a metal film with metal crystals. Each of the metal crystals possesses a particular diameter for providing high infrared reflectivity with a particular wavelength.

Abstract: A process for treating the surface of aluminum or aluminum alloy comprises providing a substrate made of aluminum or aluminum alloy. Then a zinc-plating layer is formed on the substrate by electroless plating with a zinc electroless plating solution, and a ceramic coating comprising refractory compound is next formed on the zinc-plating layer using physical vapor deposition.

Abstract: A process for treating the surface of aluminum or aluminum alloy comprises providing a substrate made of aluminum or aluminum alloy. Then a silane-based hybrid film doped with cerous salt is formed on the substrate by sol-gel process, and a ceramic coating comprising refractory compound is formed on the silane-based hybrid film by physical vapor deposition.

Abstract: An article includes a substrate and a hard film formed on the substrate. The hard film includes a plurality of TiAlN layers and a plurality of BN layers, each BN layer and each TiAlN layer is alternately arranged. The disclosure also describes a method to make the article.

Abstract: An article includes a substrate and a hard film formed on the substrate; the hard film includes a plurality of complex layers and a plurality of Ni layers, each complex layer and Ni layer alternately arranged; each complex layer includes a plurality of TiAlN layers and a plurality of CrAlN layers, each TiAlN layer alternately arranged with each CrAlN layer. The disclosure also described a method to make the article.

Abstract: The invention relates to a method of manufacturing of metal electrodes for electrolytic applications by means of a continuous deposition of a layer of noble metals upon metal substrates by a physical vapour deposition technique.

Abstract: A method for fabricating composite carbon nanotube structure is presented. A carbon nanotube array is provided. A first carbon nanotube structure is drawn from the carbon nanotube array. The first carbon nanotube structure is located on the substrate. A second carbon nanotube structure is grown on a surface of the first carbon nanotube structure to form a composite carbon nanotube structure. A composite carbon nanotube structure is also presented.

Abstract: The subject of the invention is a material comprising a glass substrate coated on at least one of its faces with a thin-film multilayer comprising, starting from said substrate, at least one lower dielectric layer, at least one functional layer made of a metal or metal nitride, at least one upper dielectric layer and at least one layer of titanium oxide at least partially crystallized in the anatase form, said metal or metal nitride being based on Nb, NbN, W, WN, Ta, TaN or any of their alloys or solid solutions.

Abstract: A metal-coated polyimide film is excellent in long-term adhesion reliability, exhibits various dimensional stabilities, and is particularly suitable for FPC, COF and TAB applications. The metal-coated polyimide film comprises a non-thermoplastic polyimide film; and a metal layer being directly formed on one surface or both surfaces of the non-thermoplastic polyimide film without using an adhesive, wherein the non-thermoplastic polyimide film contains a non-thermoplastic polyimide resin having a thermoplastic polyimide block component.

Abstract: A device housing is described. The device housing includes a transparent substrate, a color layer formed on an inside surface of the substrate, and a reflection layer formed on the color layer. The substrate is made of transparent glass or plastic. The color layer is a zirconium oxide layer. The reflection layer is a zirconium layer. The color value of the device housing has a L* coordinate between 30 and 35, an a* coordinate between 9 and 11, and a b* coordinate between ?18 and ?20 in the CIE LAB color system. A method for making the device housing is also described.

Abstract: A mixed anatase-rutile phase, non-stoichiometric titania photocatalyst material is a highly reactive and is a UV and visible light responsive photocastalyst in the as-deposited condition (i.e. without the need for a subsequent thermal treatment). The mixed phase, non-stoichiometric titania thin film material is non-stoichiometric in terms of its oxygen content such that the thin film material shows a marked red-shift in photoresponse.

Abstract: An electrospray thruster and methods of manufacturing such thrusters are provided. The micro-electrospray thruster increases the thrust density of conventional electrospray thrusters by miniaturizing the individual components of the thruster thereby allowing for the increase in the number and density of the charged particle emitters.

Abstract: A transparent conductive structure includes a substrate unit and a conductive unit. The substrate unit includes at least one plastic substrate. The conductive unit includes at least one transparent conductive film and at least one nanometer conductive group formed at the same time, wherein the transparent conductive film is formed on the plastic substrate, and the nanometer conductive group includes a plurality of conductive nanowire filaments mixed or embedded in the transparent conductive film. In other words, both the transparent conductive film and the nanometer conductive group in the instant disclosure can be respectively formed by two different forming methods (such as sputtering and vaporing) at the same time, and the conductive nanowire filaments of the nanometer conductive group can be formed inside the transparent conductive film.

Abstract: A method of fabricating a component is provided. The fabrication method includes depositing a first layer of a structural coating on an outer surface of a substrate. The substrate has at least one hollow interior space. The fabrication method further includes machining the substrate through the first layer of the structural coating, to define one or more openings in the first layer of the structural coating and to form respective one or more grooves in the outer surface of the substrate. Each groove has a respective base and extends at least partially along the surface of the substrate. The fabrication method further includes depositing a second layer of the structural coating over the first layer of the structural coating and over the groove(s), such that the groove(s) and the second layer of the structural coating together define one or more channels for cooling the component. A component is also disclosed.

Abstract: A method of preparing conductive ribs on a chassis includes steps as follows. A plastic case is provided with at least one elastic rib integrally formed thereon. Then, a conductive film is formed to overlay on both an inner surface of the plastic case and the surfaces of the elastic rib. A chassis with conductive ribs and a method of assembling an electric device including the same are also provided in the invention.

Abstract: An aluminum article includes a substrate comprising a surface having a plurality of pores defined therein by high energy beam etching; and a transparent vacuum deposition layer deposited on the surface and filling the pores.