Ethylenic Unsaturation Within The Side Chain Component Patents (Class 430/287.1)
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Patent number: 6734248Abstract: A polyimide resin composition comprising a polyimide resin (A) and at least one 1H-tetrazole (B) selected from the group consisting of 1H-tetrazole, 5,5′-bis-1H-tetrazole, and derivatives thereof, and having an excellent rust preventing effect on copper and copper alloys.Type: GrantFiled: September 25, 2001Date of Patent: May 11, 2004Assignees: Nippon Zeon Co., Ltd., Fujitsu LimitedInventors: Akira Tanaka, Satoshi Tazaki, Yasuhiro Yoneda, Kishio Yokouchi
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Patent number: 6730453Abstract: The invention provides a high molecular weight silicone compound comprising recurring units of formula (1) and having a weight average molecular weight of 1,000-50,000. Some or all of the hydrogen atoms of carboxyl groups or carboxyl and hydroxyl groups in the silicone compound may be replaced by acid labile groups. Z is a di- to hexavalent, non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; Z is a di- to hexavalent, normal or branched hydrocarbon group or non-aromatic, monocyclic or polycyclic hydrocarbon or bridged cyclic hydrocarbon group; x, y and z are integers of 1-5 corresponding to the valence of Z and Z′; R1 is —OCHR—R′—OH or —NHCHR—R′—OH; R2 is alkyl or alkenyl or a monovalent, non-aromatic, polycyclic hydrocarbon or bridged cyclic hydrocarbon group; p1, p2, p3 and p4 are 0 or positive numbers.Type: GrantFiled: June 25, 2001Date of Patent: May 4, 2004Assignee: Shin Etsu Chemical Co., Ltd.Inventors: Mutsuo Nakashima, Ichiro Kaneko, Toshinobu Ishihara, Junji Tsuchiya, Jun Hatakeyama, Shigehiro Nagura
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Publication number: 20040081912Abstract: A photosensitive polysilazane which may be used as a positive-tone photoresist, and a method of forming a patterned polysilazane film by use of such a composition are provided. The photosensitive polysilazane composition of the invention is characterized by comprising a polysilazane, particularly polymethylsilazane or polyphenylsilazane, and an optically acid-generating agent. The patterned polysilazane film is obtained by exposing a coating of the photosensitive polysilazane composition of the invention to light in a pattern and dissolving off the exposed portion.Type: ApplicationFiled: December 8, 2003Publication date: April 29, 2004Inventors: Tatsuro Nagahara, Hideki Matsuo, Tomoko Aoki, Kazuhiro Yamada
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Publication number: 20040081911Abstract: Polymer materials are described that undergo a two-level three-dimensional crosslinking process. During this process, hydrophilic polymers are crosslinked at two levels, the first results in a low level of crosslinking which leads to a toughening of the layer preventing dissolution by the fountain solution but with the layer remaining hydrophilic. The second level of crosslinking is higher and is the result of exposure to a laser diode thermal imaging device. The crosslinking at this second level results in a loss of hydrophilicity and provides instead an oleophilic image capable of accepting and transferring oil-based ink. The polymer materials are particularly useful in lithographic printing systems where they may used in articles such as a printing plate comprising a substrate having coated thereon a layer that becomes less hydrophilic upon exposure to thermal energy (e.g.Type: ApplicationFiled: August 25, 2003Publication date: April 29, 2004Inventors: Horst Noglik, Tibor Horvath, Joyce Diana Dewi Djauhari Lukas, David A. Morgan
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Patent number: 6723490Abstract: Positive-working thermally imageable elements, useful as printing plate precursors and having reduced ablation when thermally imaged, and methods for their preparation are disclosed. In one aspect, the elements contain a hydrophilic substrate, an underlayer, a barrier layer, and a top layer. The underlayer comprises a photothermal conversion material.Type: GrantFiled: November 15, 2001Date of Patent: April 20, 2004Assignee: Kodak Polychrome Graphics LLCInventors: Jayanti Patel, Paul West, Kevin Ray, Kevin Williams
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Publication number: 20040067431Abstract: A photoreactive composition comprises (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; and (b) a photoinitiator system comprising photochemically-effective amounts of (1) at least one type of semiconductor nanoparticle quantum dot that has at least one electronic excited state that is accessible by absorption of two or more photons, and (2) a composition, different from said reactive species, that is capable of interacting with the excited state of the semiconductor nanoparticle quantum dot to form at least one reaction-initiating species.Type: ApplicationFiled: October 2, 2002Publication date: April 8, 2004Applicant: 3M Innovative Properties CompanyInventors: David S. Arney, Catherine A. Leatherdale, Manoj Nirmal
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Publication number: 20040067441Abstract: An improved light attenuating compound for use in the production of microdevices is provided. Broadly, the light attenuating compound is non-aromatic and can be directly incorporated (either physically or chemically) into photolithographic compositions such as bottom anti-reflective coatings (BARC) and contact or via hole fill materials. The preferred non-aromatic compounds of the invention are conjugated aliphatic and alicyclic compounds which greatly enhance the plasma etch rate of the composition. Furthermore, the light attenuating compounds are useful for absorbing light at shorter wavelengths. In one embodiment, the inventive compounds can be polymerized so as to serve as both the polymer binder of the composition as well as the light absorbing constituent.Type: ApplicationFiled: October 20, 2003Publication date: April 8, 2004Inventors: Xie Shao, Robert Cox, Shreeram V. Deshpande, Tony D. Flaim, Rama Puligadda
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Patent number: 6709799Abstract: There is provided a resist composition containing a photosensitive resin and used in photolithography, said photosensitive resin having a transmittance of 40% or more for a light having a wavelength of 157 nm in applying to a thickness of 0.1 &mgr;m. The composition has a characteristic that it allows easy formation of a fine pattern having a good profile, particularly at a wavelength for exposure with an F2 excimer laser.Type: GrantFiled: December 22, 2000Date of Patent: March 23, 2004Assignee: Sumitomo Chemical Company, LimitedInventor: Kazuhiko Hashimoto
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Publication number: 20040035570Abstract: A cooling apparatus for cooling an optical element provided in a vacuum atmosphere includes a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer, and a controller for controlling temperature of the radiation cooling part.Type: ApplicationFiled: July 31, 2003Publication date: February 26, 2004Inventor: Shinichi Hara
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Patent number: 6692793Abstract: A photo curable resin composition, which comprises (A) an acid-modified, vinyl group-containing epoxy resin, (B) an elastomer, (C) a photopolymerization initiator, (D) a diluent and (E) a curing agent, can give a high performance cured film having distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics, and a photosensitive element, which comprises a support and a layer of the photo curable resin composition laid on the support, has distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics.Type: GrantFiled: July 3, 2001Date of Patent: February 17, 2004Assignee: HItachi Chemical Company, Ltd.Inventors: Kuniaki Sato, Hiroaki Hirakura, Toshihiko Ito, Takao Hirayama, Toshizumi Yoshino
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Patent number: 6689531Abstract: A resist composition showing excellent close adherence at the interface of a substrate and a resist, improving problems in wet etching, having excellent sensitivity and resolution, and also showing excellent resist performances, and comprising a compound of the general formula (I): wherein, R1 and R2 represent each independently a hydrogen atom or an alkyl group, R3 represents a hydrogen atom, alkyl group, aryl group, aralkyl group, alkenyl group, alkylcarbonyl group, arylcarbonyl group or aralkylcarbonyl group, n represents an integer of 1 to 40, m represents an integer of 1 to 5, and l represents an integer of 1 to 5, is provided.Type: GrantFiled: August 27, 2002Date of Patent: February 10, 2004Assignees: Sumitomo Chemical Company, Limited, Dongwoo Fine-Chem Co., Ltd.Inventors: Sang Tae Kim, Seung Jin Kang, Shi Jin Sung, Masumi Suetsugu, Airi Yamada
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Patent number: 6689539Abstract: The present invention provides a photosensitive lithographic printing plate which displays superior ink receptivity and superior film strength of the photosensitive layer (image area). The photosensitive lithographic printing plate is produced by providing, on top of a support, a photosensitive composition comprising a fluororesin having a fluoro aliphatic group of 3 to 20 carbon atoms in which at least two of three terminal hydrogen atoms are substituted for fluorine atoms, and an ethylene based unsaturated group, as well as a negative photosensitive compound.Type: GrantFiled: April 20, 2001Date of Patent: February 10, 2004Assignee: Kodak Polychrome Graphics LLCInventors: Masamichi Kamiya, Koji Hayashi, Hirotaka Komine, Miyuki Makino
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Publication number: 20040023146Abstract: A lithographic printing plate precursor is disclosed, which comprises an image-forming layer which contains a hydrophilic resin, an acid precursor and at least one component selected from fine particles containing a compound having a vinyloxy group and microcapsules containing a compound having a vinyloxy group, on a hydrophilic support, which can be development processed on a printing machine.Type: ApplicationFiled: July 14, 2003Publication date: February 5, 2004Applicant: Fuji Photo Film Co., Ltd.Inventors: Kazuo Maemoto, Keiji Akiyama, Hiromitsu Yanaka
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Publication number: 20040023152Abstract: Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component.Type: ApplicationFiled: May 14, 2003Publication date: February 5, 2004Inventors: Andrew Edward Feiring, Jerald Feldman
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Patent number: 6682869Abstract: A chemical amplification, positive resist composition is provided comprising (A) a photoacid generator and (B) a resin which changes its solubility in an alkali developer under the action of acid and has substituents of the formula: Ph—(CH2)nOCH(CH2CH3)— wherein Ph is phenyl and n=1 or 2. The composition has many advantages including improved focal latitude, improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect left after coating, development and stripping, and improved pattern profile after development and is suited for microfabrication by any lithography, especially deep UV lithography.Type: GrantFiled: March 6, 2001Date of Patent: January 27, 2004Assignee: Shin-Etu Chemical Co., Ltd.Inventors: Youichi Ohsawa, Jun Watanabe, Takanobu Takeda, Akihiro Seki
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Publication number: 20040013968Abstract: Negative thermosensitive lithographic printing plates developable with a non-alkaline aqueous developer and method of developing such plates. The plate comprises on a substrate a thermosensitive layer comprising an ethylenically unsaturated monomer, a free radical initiator, and an infrared absorbing dye. The plate can be imagewise exposed with an infrared laser to cause hardening in the exposed areas and then developed with a non-alkaline aqueous developer to remove the non-exposed areas. The non-alkaline aqueous developer can be water or an aqueous solution comprising at least 60% of water and having a pH of 2.0 to 10.0.Type: ApplicationFiled: July 22, 2002Publication date: January 22, 2004Inventor: Gary Ganghui Teng
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Publication number: 20040009429Abstract: A positive-working photosensitive composition containing (A) at least one member selected from a compound having a phenacylsulfonium salt structure and a compound having a sulfonium salt structure not having an aromatic ring, each of which compounds generates an acid upon irradiation with actinic rays or radiations and (B) a resin having specific repeating units, which is decomposed by the action of an acid to increase its solubility in an alkaline developing solution; a positive-working photosensitive composition containing (A) a compound to generate an aromatic sulfonic acid substituted with at least one fluorine atom and/or a group having at least one fluorine atom, upon irradiation with actinic rays or radiations and (B) a resin having a repeating unit having a maleic anhydride structure in the main chain thereof, which is decomposed by the action of an acid to increase its solubility in an alkaline developing solution; and a positive-working photosensitive composition containing (A) a sulfonium salt to gType: ApplicationFiled: December 30, 2002Publication date: January 15, 2004Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Kenichiro Sato
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Publication number: 20040009430Abstract: The photosensitive resin composition of the present invention is an excellent photosensitive resin composition: exhibiting significant transmissibility at the use of an exposure light source of 160 nm or less, more specifically F2 excimer laser light , where line edge roughness and development time dependence are small and a problem of footing formation is improved; and comprising a resin which decomposes by an action of acid to increase the solubility in alkali developer, in which the resin contains a specific repeat unit; a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, in which the compound includes at least two kinds of compounds selected from the group consisting of specific compounds (B1), (B2), (B3) and (B4).Type: ApplicationFiled: June 6, 2003Publication date: January 15, 2004Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Shinichi Kanna, Kazuyoshi Mizutani, Tomoya Sasaki
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Patent number: 6673514Abstract: A thermally imagable article comprises a substrate on which is coated a positive working heat-sensitive composition comprising a hydroxyl group-containing polymer and a heat-labile moiety which decreases the developer solubility of the composition as compared to the developer solubility of the composition without the heat-labile moiety, wherein the heat-sensitive composition does not comprise an acid generating moiety. The invention also provides novel positive working compositions comprising heat-labile moieties, and imagable articles comprising said compositions.Type: GrantFiled: September 7, 2001Date of Patent: January 6, 2004Assignee: Kodak Polychrome Graphics LLCInventors: Anthony Paul Kitson, Diane Cook, Kevin Barry Ray, Colin Adrian Wright
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Patent number: 6670100Abstract: A positive type actinic ray-curable (dry film having, on the surface of a non-actinic ray-curable substrate, a solid positive type actinic ray-curable urethane resin layer formed from (1) a resin composition containing, as essential components, (A1) an ether linkage-containing olefinicaly unsaturated compound, (B1), an acid group-containing urethane resin having a weight average molecular weight of 1,000 to 200,000 and an acid group content in the range of 0.Type: GrantFiled: May 18, 2000Date of Patent: December 30, 2003Assignee: Kansai Paint Co., Ltd.Inventors: Takeya Hasegawa, Genji Imai
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Publication number: 20030232280Abstract: The present invention discloses a negative planographic printing plate precursor for infrared exposure having an image recording layer containing an infrared absorbing agent, a radical generator and a radical polymerizable compound on a support characterized in that a sensitivity ratio (S1/S60) of a sensitivity (S60) when developed 60 minutes after infrared laser exposure to a sensitivity (S1) when developed one minute after exposure is at least 0.5 and less than 1.0 in the image recording layer. It is preferable that this composition contains a polymer compound which has a functional group having high radical reactivity and can be dissolved or swollen in water or an aqueous alkali solution.Type: ApplicationFiled: June 5, 2003Publication date: December 18, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Takahiro Goto
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Publication number: 20030232277Abstract: A positive resist composition comprising:Type: ApplicationFiled: April 25, 2003Publication date: December 18, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Tomoya Sasaki, Kazuyoshi Mizutani, Shinichi Kanna
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Publication number: 20030228538Abstract: One embodiment of the present invention is a photoresist formulation that includes e-beam cross-linkable substituents, which substituents include one or more of the following functional groups: (a) carbon-carbon double bonds; (b) a strained ring system; (c) a halogenated compound; and (d) one or more organo-silicon moieties.Type: ApplicationFiled: May 28, 2003Publication date: December 11, 2003Applicant: Applied Materials, Inc.Inventors: Timothy Weidman, William R. Li vesay, Matthew F. Ross
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Patent number: 6660446Abstract: A heat-sensitive composition comprising a compound of a specific general formula which generates an acid or radical when heated, and a compound whose physical and chemical properties are irreversibly changed by an acid or radical.Type: GrantFiled: May 29, 2001Date of Patent: December 9, 2003Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuto Shimada, Tadahiro Sorori, Kunihiko Kodama
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Publication number: 20030219681Abstract: A photosensitive printing element comprising a support; and a photopolymerizable layer comprising a photopolymerizable composition comprising at least one elastomeric binder, at least one monomer, an initiator having sensitivity to actinic radiation, and at least one photobleachable compound having sensitivity to actinic radiation; is described. Preferred photobleachable compounds are unsubstituted or substituted naphthylvinyl pyridines; unsubstituted or substituted styrylquinolines; diphenyl maleic anhydride; isomers of any of the foregoing; derivatives of any of the foregoing; and any combination of the foregoing. Such photosensitive printing elements are used to prepare flexographic printing plates and are useful in enhancing resolution and differentiating image areas from non-image areas in images produced therefrom by reducing the deleterious effect of scattered light.Type: ApplicationFiled: April 15, 2003Publication date: November 27, 2003Inventors: Lap Kin Cheng, Lap-Tak Andrew Cheng
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Publication number: 20030215745Abstract: A process for producing a polymer compound having a double bond in a side chain, wherein a functional group represented by the following formula (1) is subjected to an elimination reaction to form the polymer compound which includes another functional group having the double bond in the side chain thereof represented by the following formula (2): 1Type: ApplicationFiled: March 11, 2003Publication date: November 20, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Kazuhiro Fujimaki
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Publication number: 20030215747Abstract: This invention relates to a photo-polymerization type photosensitive electrode paste composition for a plasma display panel that is capable of preventing a bubble from occurring on an electrode surface during an electrode paste printing process and a damage of an electrode pattern caused by adhesive strength reduction, and a method of fabricating the electrode using the same.Type: ApplicationFiled: November 27, 2002Publication date: November 20, 2003Applicant: LG Electronics Inc.Inventors: Sang Tae Kim, Seung Tae Park, Lee Soon Park, Jong Woo Park
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Patent number: 6645697Abstract: A photopolymerizable composition which is highly sensitive to light in the visible region and long-wavelength regions including the near infrared region, is not sensitive to light in the ultraviolet region, and has excellent handling efficiency under day light fluorescent lamps. The composition contains an ethylenically unsaturated compound, a dye which has a basic structure, a photopolymerization initiator, and a photopolymerizable lithographic printing plate which has a support and a layer of the photopolymerizable composition on its surface.Type: GrantFiled: February 22, 2002Date of Patent: November 11, 2003Assignee: Mitsubishi Chemical CorporationInventor: Toshiyuki Urano
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Publication number: 20030203313Abstract: The present invention provides a planographic printing plate precursor comprising a substrate and a negative image recording layer provided on the substrate containing: a compound that generates a radical or an acid by light or heat; a polymerizable compound or a crosslinking compound; and an infrared ray absorbing agent, wherein a dynamic friction coefficient of the outermost surface of the planographic printing plate precursor, at the side of the negative image recording layer being provided toward an inserting paper inserted into between the planographic printing plate precursors when the planographic printing plate precursors are laminated, is within a range from 0.2 to 0.7, as well as a planographic printing plate precursor laminate comprising the pluralty of the planographic printing plate precursors and inserting paper.Type: ApplicationFiled: March 28, 2003Publication date: October 30, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Takahiro Goto
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Publication number: 20030203312Abstract: An infrared-sensitive photosensitive composition comprising:Type: ApplicationFiled: March 19, 2003Publication date: October 30, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Takeshi Serikawa, Ikuo Kawauchi, Mitsumasa Tsuchiya, Ippei Nakamura
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Publication number: 20030203305Abstract: A negative resist composition comprising (A-1) an alkali-soluble resin containing a repeating unit represented by formula (1) defined in the specification, (A-2) an alkali-soluble resin containing a repeating unit represented by formula (2) defined in the specification, (B) a crosslinking agent crosslinking with the alkali-soluble resin (A-1) or (A-2) by the action of an acid, (C) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (D) a nitrogen-containing basic compound.Type: ApplicationFiled: March 26, 2003Publication date: October 30, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Shoichiro Yasunami, Yutaka Adegawa, Koji Shirakawa
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Patent number: 6638689Abstract: Photoresist compositions, which can attain high-accuracy etching without causing separation and flexible printed wiring boards prepared with the photoresist compositions are disclosed. In order to etch a polyimide precursor layer on a conductive circuit, a photoresist composition comprising a photopolymerizable organic material (A), a water-soluble resin (B) and an amino-group-containing resin (C) is applied on the surface of the polyimide precursor layer to form a photoresist layer. Then, the photoresist layer is patterned by a photolithographic process. The polyimide precursor layer is etched and the pattern of the photoresist layer is transferred to the polyimide precursor layer. The amino-group-containing resin (C) in the photoresist layer is combined with an acid anhydride in the polyimide precursor layer to attain good adhesion and high-accuracy etching without causing separation of the photoresist layer.Type: GrantFiled: April 8, 1999Date of Patent: October 28, 2003Assignee: Sony Chemicals Corp.Inventors: Satoshi Takahashi, Akira Tsutsumi, Koichi Uno, Minoru Nagashima
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Patent number: 6638683Abstract: A positive photoresist composition comprises the combination of (a) Resin A obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (I) and (b) Resin B obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (II) or (III) or a nonpolymeric dissolution inhibitive compound which has at least one kind of group selected from tertiary alkyl ester groups and tertiary alkyl carbonate groups; wherein R1, W, n, and R4 are as defined in the specification.Type: GrantFiled: June 24, 1998Date of Patent: October 28, 2003Assignee: Fuji Photo Film Co., Ltd.Inventors: Shiro Tan, Toshiaki Aoai, Toru Fujimori
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Patent number: 6638687Abstract: A method for preparing a lithographic printing plate involving the steps of subjecting, to imagewise exposure, a presensitized plate for use in making a lithographic printing plate comprising an aluminum substrate provided thereon with a light-sensitive layer formed from a photopolymerizable light-sensitive composition, which comprises a compound having an ethylenically unsaturated double bond, a photopolymerization initiator and a polyurethane resin binder and then developing the imagewise exposed plate with a developer containing an inorganic alkaline agent and a nonionic surfactant, carrying a polyoxyalkylene ether group, having a pH value ranging from 10.0 to 12.5 and an electrical conductivity ranging from 3 to 30 mS/cm.Type: GrantFiled: December 6, 2001Date of Patent: October 28, 2003Assignee: Fuji Photo Film Co., Ltd.Inventors: Tatsuji Higashi, Yasuo Okamoto
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Publication number: 20030198890Abstract: A negative-type planographic printing plate having, disposed on a support, a recording layer comprising an image recording material which contains an infrared ray absorbing agent and can be recorded by irradiation with an infrared ray, in which, as for the infrared ray absorbing agent comprising a cyanine dye, at least one of substituents on nitrogen atoms at both ends was selected from the group consisting of the following substituents: —C(═X)R1; —C(═X)NR2R3; —CH≡CR4R5; —C═CR6; —CHR7R8;—CR9R10R11; and —Ar, wherein X represents O, S or Se; R1 to R6 each independently represent H or a hydrocarbon group having 20 or fewer carbon atoms which may have a substituent; R7 to R11 each independently represent a hydrocarbon group having 20 or fewer carbon atoms which may have a substituent; and Ar represents an aromatic group which may have a substituent.Type: ApplicationFiled: March 18, 2003Publication date: October 23, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Yukio Abe, Kazuto Shimada
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Publication number: 20030198891Abstract: An ester compound of the following formula (1) is provided.Type: ApplicationFiled: March 19, 2003Publication date: October 23, 2003Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Koji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho, Takeru Watanabe, Matsuo Nakashima, Seiichiro Tachibana, Jun Hatakeyama
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Patent number: 6635401Abstract: Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer having a 2-cyano acrylic monomer.Type: GrantFiled: June 21, 2001Date of Patent: October 21, 2003Assignee: International Business Machines CorporationInventors: Wenjie Li, Pushkara Rao Varanasi
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Publication number: 20030194654Abstract: A method for treating a photosensitive lithographic printing plate, which comprises exposing the photosensitive lithographic printing plate to laser light, developing with a developer containing an alkali metal silicate and then carrying out post-exposure treatment, said photosensitive lithographic printing plate being prepared by forming a photopolymerizable photosensitive layer having a film thickness of from 1.2 to 4 g/m2 and further forming a protective layer having a film thickness of from 2 to 8 g/m2 on a support having a centerline average height (Ra) of at least 0.35 &mgr;m.Type: ApplicationFiled: March 5, 2003Publication date: October 16, 2003Applicant: MITSUBISHI CHEMICAL CORPORATIONInventors: Eriko Toshimitsu, Hideaki Okamoto
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Patent number: 6632586Abstract: A positive resist composition which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, and (B) a resin which is decomposed by the action of an acid to increase solubility in an alkaline developing solution and contains repeating units represented by formulae (I) and (V):Type: GrantFiled: September 9, 1999Date of Patent: October 14, 2003Assignee: Fuji Photo Film Co., Ltd.Inventors: Toshiaki Aoai, Kenichiro Sato
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Patent number: 6632580Abstract: A lithographic printing plate precursor is disclosed, which comprises an image-forming layer which contains a hydrophilic resin, an acid precursor and at least one component selected from fine particles containing a compound having a vinyloxy group and microcapsules containing a compound having a vinyloxy group, on a hydrophilic support, which can be development processed on a printing machine.Type: GrantFiled: June 1, 2001Date of Patent: October 14, 2003Assignee: Fuji Photo Film Co., Ltd.Inventor: Kazuo Maemoto
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Publication number: 20030190554Abstract: A plate-making method of a printing plate comprising exposing a printing plate precursor having a photosensitive layer comprising a photopolymerizable composition containing (i) a crosslinking agent having two ethylenic polymerizable groups and (ii) a crosslinking agent having three or more ethylenic polymerizable groups, and development processing the exposed printing plate precursor with an alkali developer having a pH of not more than 12.5.Type: ApplicationFiled: August 29, 2002Publication date: October 9, 2003Inventor: Kazuto Kunita
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Publication number: 20030186162Abstract: The invention provides a hydrophilic member precursor having a hydrophilic surface that is formed by contacting a hydrophobic polymer-containing layer formed on a substrate with a composition that contains a polymerizing group-having hydrophilic polymer followed by applying energy thereto to thereby directly chemically bond the polymerizing group-having hydrophilic polymer to the hydrophobic polymer-containing layer. The invention also provides a hydrophilic member from the hydrophilic member precursor, as well as a pattern forming material, a support for planographic printing plates, and a planographic printing plate precursor.Type: ApplicationFiled: October 10, 2002Publication date: October 2, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Miki Takahashi, Koichi Kawamura
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Patent number: 6627385Abstract: Graft copolymers are used for the production of laser-engravable relief printing plates, the graft copolymers being obtained by free radical polymerization of vinyl esters in the presence of polyalkylene oxides and subsequent hydrolysis of the ester function. Processes for the production of transparent flexographic printing plates by means of laser engraving using said graft copolymers are described.Type: GrantFiled: March 23, 2001Date of Patent: September 30, 2003Assignee: BASF Drucksysteme GmbHInventors: Margit Hiller, Alfred Leinenbach, Uwe Stebani, Wolfgang Wenzl
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Publication number: 20030180636Abstract: A laser imageable flexographic printing plate and a method of making the laser imageable flexographic printing plate using a collapsible UV cross-linkable material comprising a UV-curable elastomer, an IR dye, and microspheres is disclosed. The collapsible UV cross-linkable material is mixed together and then extruded to form a printing plate. An IR laser is used to collapse and melt the collapsible UV cross-linkable material to form a relief image on the printing plate. The printing plate is thereafter UV cured by face exposure to crosslink and cure the formed relief image. The invention addresses a market need for eliminating chemical processing of printing plates, thus going from plate to press much more quickly. The printing plate may also contain a thin layer of a high-density non-collapsible UV-curable elastomer between the collapsible layer and the cover sheet of the plate which acts as the print surface in the final plate.Type: ApplicationFiled: March 25, 2002Publication date: September 25, 2003Inventors: Rustom Sam Kanga, Daniel Rosen
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Patent number: 6623908Abstract: An imaging member, such as a negative-working printing plate or on-press cylinder, has an imaging layer comprised of a thermally sensitive ionomer (charged polymer) and a photothermal conversion material that is a bis(aminoaryl)polymethine dye that is soluble in water or a water-miscible organic solvent, and that has a &lgr;max greater than 700 nm as measured in water or the water-miscible organic solvent.Type: GrantFiled: March 28, 2001Date of Patent: September 23, 2003Assignee: Eastman Kodak CompanyInventors: Shiying Zheng, Ruizheng Wang, Kevin W. Williams
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Publication number: 20030175622Abstract: In accordance with the present invention, there are provided high performance, photoimageable resin compositions for flexographic printing, having excellent physical properties, e.g., resilience, hardness, toughness, and the like, as well as increased rates of cure upon exposure to radiation. In a further aspect of the invention, there are provided printing plates prepared employing invention compositions, wherein said printing plates are characterized as having excellent exposure sensitivity, the capability of rapidly curing upon exposure, excellent retention of fine details, and excellent colorless performance. Moreover, printing plates prepared employing invention compositions have good flexibility, excellent washout properties, and retain such properties over extended periods of storage. In another aspect of the invention, there are provided methods for the preparation of formulations comprising said compositions and methods for use thereof.Type: ApplicationFiled: March 11, 2003Publication date: September 18, 2003Applicant: Napp Systems, Inc.Inventors: Yuxin Hu, David H. Roberts, Reny R. Paguio, Maria Teresa A. Castillo
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Publication number: 20030165776Abstract: A negative resist composition comprising (A) an alkali-soluble polymer, (B) a cross-linking agent forming cross-links between molecules of the alkali-soluble polymer (A) under the action of an acid and (C) a specified acid generator, which can satisfy all of performance requirements concerning sensitivity, resolution, pattern profile and line-edge roughness in the pattern formation by irradiation with electron beams or X-rays.Type: ApplicationFiled: December 30, 2002Publication date: September 4, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Shoichiro Yasunami, Kunihiko Kodama
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Publication number: 20030165778Abstract: A lithographic process comprises the steps of image-wise heating a presensitized lithographic printing plate and removing an unheated area of an image-forming layer to form a lithographic printing plate. The presensitized lithographic printing plate comprises a hydrophilic support and the image-forming layer. The image-forming layer contains a compound or a polymer having o-quinodimethane structures or precursor structures thereof. The lithographic printing plate is prepared by a reaction of the o-quinodimethane structures.Type: ApplicationFiled: July 8, 2002Publication date: September 4, 2003Inventors: Naonori Makino, Hidekazu Oohashi
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Publication number: 20030162121Abstract: The invention provides a negative image recording material comprising: a support and an image recording layer disposed on the support, the image recording layer comprising an amide-acid compound containing a carboxyl group and an amide group expressed by the following General Formula (1): 1Type: ApplicationFiled: December 31, 2002Publication date: August 28, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Keitaro Aoshima
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Patent number: RE38256Abstract: Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin.Type: GrantFiled: November 24, 1999Date of Patent: September 23, 2003Assignee: Kabushiki Kaisha ToshibaInventors: Toru Ushirogouchi, Naomi Shida, Takuya Naito, Koji Asakawa, Akinori Hongu, Makoto Nakase, Hirokazu Niki