Abstract: Novel copolymers suitable for forming the top layer photoimagable coating in a deep U V. particularly a 193 nm and 248 nm, bilayer resist system providing high resolution photolithography. Chemically amplified photoresist composition and organosilicon moieties suitable for use in the binder resin for photoimagable etching resistant photoresist composition that is suitable as a material for use in ArF and KrF photolithography using the novel copolymers.

Abstract: A heat mode type negative image recording material is provided which comprises (A) a polymer compound that is insoluble in water but is soluble in an alkali aqueous solution and has at least one of groups represented by general formulae (1) to (3) on a side chain; (B) a photothermal conversion agent; and (C) an onium salt compound forming radicals by heat mode exposure with light that is capable of being absorbed by said photothermal conversion agent (B), said heat mode type negative image recording material being capable of recording an image by heat mode exposure. The general formulae are defined in the specification.

Abstract: The invention relates to a method for producing laser-engravable flexographic printing elements on flexible metallic supports comprising a cross-linked elastomeric layer and an absorber for laser radiation. The invention also relates to a method for producing flexographic printing plates by means of laser engraving using flexographic printing elements of the aforementioned type, and to flexographic printing plates produced using such a method.

Abstract: A photo- or thermo-polymerizable composition including an alkali-soluble polymerizable polymer that contains a structure represented by the following general formula (I) on a side chain.

Abstract: An infrared-sensitive photosensitive composition comprising: (A) a resin; (B) a novolak resin; and (C) a light-to-heat converting substance, wherein the resin (A) has, as copolymer components, at least: (1) a (meth)acrylic acid or a monomer represented by formula (I) as defined herein; and (2) at least one compound selected from the group consisting of a (meth)acrylic ester, a (meth)acrylamide derivative, and a styrene derivative.

Abstract: Infrared absorbing compounds in which the anion is selected from the group consisting of 5-isatinsulfonate, 10-camphorsulfonate, and 4,5-dihydroxy-1,3-benzenedisulfonate are disclosed. Negative-working imageable elements containing these compounds have improved dot stability.

Abstract: The use of certain mercapto compounds as shelf life improvers for infrared-sensitive lithographic printing plate precursors is disclosed. The compounds are five-membered heteroaromatic rings containing a nitrogen atom and at least one other heteroatom, which can be oxygen, sulfur, or another nitrogen atom, such that two ring heteroatoms are bonded to a ring carbon bearing a thiol group.

Abstract: A lithographic printing plate precursor comprising a hydrophilic support and an image-forming layer containing a heat radical-generating agent, a polymethine dye, and at least one component selected from fine particles containing a compound having a radical polymerizable group and microcapsules encapsulating a compound having a radical polymerizable group.

Abstract: Positive photoresists and associated processes for microlithography in the ultraviolet (UV) and violet are disclosed. The photoresists comprise (a) a branched copolymer containing protected acid groups and (b) at least one photoacid generator. The photoresists have high transparency throughout the UV, good development properties, high plasma etch resistance and other desirable properties, and are useful for microlithography in the near, far, and extreme UV, particularly at wavelengths less than or equal to 365 nm.

Abstract: A photosensitive formulation for high-temperature-resistant photoresists is based on polyhydroxyamides. The photosensitive formulations display a much higher photosensitivity than the comparable formulations based on quinone azide photoactive components. After conversion to the polybenzoxazole, the novel formulations also display a lower dielectric constant than the quinone azide-based formulations. A film can be made by applying the photosensitive formulation to a wafer and then evaporating the solvent. A method for fabricating electronics and micorelectronics structures a wafer by using the film in photolithography.

Abstract: A negative-working lithographic printing plate has a coating which is imaged by heating an area of the coating with an infrared laser and actinically reacting the coating in the heated area with ultraviolet or visible radiation. The coating contains an infrared absorber but the coating is not imageable by infrared radiation or by the heat generated. The imaging time is reduced since the actinic reaction rate is increased at the elevated temperature.

Abstract: A heat-sensitive lithographic printing plate precursor comprising a support having provided thereon (A) an ink-receiving layer and (B) a hydrophilic layer comprising 80 to 99 parts by weight of a colloidal particulate oxide or hydroxide of at least one element selected from a group consisting of beryllium, magnesium, aluminum, silicon, titanium, boron, germanium, tin, zirconium, iron, vanadium, antimony and a transition metal, and 1 to 20 parts by weight of a polyacrylic acid having a weight-average molecular weight of more than 50,000, and at least one of the ink-receiving layer and the hydrophilic layer including a light-heat converting agent.

Abstract: The present invention provides methods for lithography utilizing X-ray radiation. More particularly, the methods of the invention can be employed for lithography at wavelengths in a range between about 0.8 nm and 30 nm, and more particularly, at wavelengths in a range between 0.8 and 1.2 nm. The methods of the invention employ photoresist compositions having fluorinated polymers with a fluorine content of at least about 10% by weight to provide enhanced sensitivity for X-ray lithography.

Abstract: There are disclosed a light-sensitive composition which comprises (A) at least one water-soluble polymer selected from a cationic water-soluble polymer having a phenyl group substituted by a vinyl group at a side chain of the polymer and a water-soluble polymer having a phenyl group substituted by a vinyl group and a sulfonate group at a side chain of the polymer, and (B) at least one of a photopolymerization initiator and a photo-acid generator; and a light-sensitive composition which comprises at least one cationic monomer having two or more polymerizable unsaturated groups in the molecule, at least one polymer, and at least one of a photopolymerizable initiator and a photo-acid generator.

Abstract: A photosensitive printing element comprising a support; and a photopolymerizable layer comprising a photopolymerizable composition comprising at least one elastomeric binder, at least one monomer, an initiator having sensitivity to actinic radiation, and at least one photobleachable compound having sensitivity to actinic radiation; is described. Preferred photobleachable compounds are unsubstituted or substituted naphthylvinyl pyridines; unsubstituted or substituted styrylquinolines; diphenyl maleic anhydride; isomers of any of the foregoing; derivatives of any of the foregoing; and any combination of the foregoing. Such photosensitive printing elements are used to prepare flexographic printing plates and are useful in enhancing resolution and differentiating image areas from non-image areas in images produced therefrom by reducing the deleterious effect of scattered light.

Abstract: The present invention relates to IR-sensitive compositions containing an initator system comprising: (a) at least one compound capable of absorbing IR radiation selected from triarylamine dyes, thiazolium dyes, indolium dyes, oxazolium dyes, cyanine dyes, polyaniline dyes, polypyrrole dyes, polythiophene dyes and phthalocyanine pigments (b) at least one compound capable of producing radicals selected from polyhaloalkyl-substituted compounds (c) at least one polycarboxylic acid represented by the following formula I wherein Y is selected from the group consisting of O, S and NR7, each of R4, R5 and R6 is independently selected from the group consisting of hydrogen, C1-C4 alkyl, aryl which is optionally substituted, —COOH and NR8CH2COOH, R7 is selected from the group consisting of hydrogen, C1-C6 alkyl, —CH2CH2OH, and C1-C5 alkyl substituted with -COOH, R8 is selected from the group consisting of —CH2COOH, —CH2OH and —(CH2)2N(CH2COOH)2 and r is 0, 1, 2 or 3 with the proviso that at least one of R4, R5, R

Abstract: A stamper reception layer 11 of an optical disk producing sheet 1 is composed of a polymeric material that has energy-curing properties and possesses a pre-curing storage elastic modulus of 103 to 106 Pa. The number of deposits on a stamper can thus be reduced with this optical disk producing sheet 1.

Abstract: A photosensitive composition comprising a resin containing a repeating unit corresponding to a monomer having a structure represented by formula (I) defined in the specification, and a negative working lithographic printing plate having a negative working photosensitive layer comprising the above-described photosensitive composition.

Abstract: Disclosed are photoimageable compositions having improved stripping properties as well as methods for manufacturing printed wiring boards using such photoimageable compositions.

Abstract: There are disclosed a photosensitive resin composition comprising: at least one photosensitive resin among a polyamide resin (A) having a repeating unit (U1) represented by general formula (I) below and a polyamideimide resin (B) having a repeating unit (U2) represented by general formula (II); and at least one photopolymerizable compound among a silane coupling agent (C) having a photopolymerizable unsaturated bond and a photopolymerizable unsaturated monomer (D) comprising a monomer (d1) having at least 5 photopolymerizable unsaturated bonds per molecule General formula (I): (in the formula, X1 denotes a trivalent organic group having an aromatic ring, Y1 denotes a divalent organic group having an aromatic ring, and R1 denotes a monovalent organic group having a photosensitive group) General formula (II): (in the formula, X2 and Y2 denote trivalent organic groups having an aromatic ring, and R2 denotes a monovalent organic group having a photosensitive group), a pattern production process using s

Abstract: The present invention relates to IR-sensitive compositions suitable for the manufacture of printing plates developable on-press. The IR-sensitive compositions comprise a first polymeric binder which does not comprise acidic groups having a pKa value?8; a second polymeric binder comprising polyether groups; an initiator system; and a free radical polymerizable system comprising at least one member selected from unsaturated free radical polymerizable monomers, free radical polymerizable oligomers and polymers containing C?C bonds in the back bone and/or in the side chain groups. The initiator system includes (i) at least one compound capable of absorbing IR radiation; (ii) at least one compound capable of producing radicals selected from polyhaloalkyl-substituted compounds; and (iii) at least one polycarboxylic acid of formula R4—(CR5R6)r—Y—CH2COOH, wherein oxi<redii+1.6 eV, where oxi=oxidation potential of component (i) in eV, and redii=reduction potential of component (ii) in eV.

Abstract: A plate-making method of a lithographic printing plate comprising exposing imagewise a photosensitive lithographic printing plate comprising an aluminum support and a photosensitive layer comprising a photosensitive composition of photopolymerization type, which contains a compound having a nitrogen atom and an ethylenically unsaturated double bond, a photopolymerization initiator and a polymer binder, and developing the exposed printing plate with a developing solution containing (1) an inorganic alkali agent and (2) a nonionic surface active agent having a polyoxyalkylene ether group.

Abstract: A curable composition comprising a compound (A) having at least one active energy ray curable polymerizable functional group, a fluorine-containing copolymer (B) obtained by (1) copolymerizing a polymerizable monomer (a) having a polyfluoroalkyl group and a polymerizable monomer (b) having a photo-curable functional group, or (2) introducing a photo-curable functional group into a fluorine-containing copolymer (D) obtained by copolymerizing a polymerizable monomer (a) having a polyfluoroalkyl group and a polymerizable monomer (d) having a group capable of introducing a photo-curable functional group, and a photopolymerization initiator.

Abstract: A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating an acid and/or radical species by the irradiation of electron beams or X-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent causing crosslinking with the resin of component (B) by the action of an acid, and (D) a compound having at least one unsaturated bond capable of being polymerized by an acid and/or a radical, and a negative-working resist composition for electron beams or X-rays comprising (A) a compound generating an acid and/or radical species by the irradiation of electron beams or X-rays, (B′) a resin having at least one unsaturated bond polymerizable by an acid and/or an alkali, which is insoluble in water but soluble in an alkali aqueous solution, and (C) a crosslinking agent causing crosslinking with the resin (B′) by the action of an acid are disclosed.

Abstract: The present invention provides a resin composition that includes (A) a polymer compound that has, on a side chain of a main chain polymer, through a linkage group containing a hydrogen-bonding group and a ring structure, a terminal ethylenic unsaturated bond, and is soluble or swelling in water or an alkali aqueous solution, and (B) a compound that generates radicals when exposed to light or heat. The invention further provides a thermo/photosensitive composition that includes (A′) a polymer compound that has a non-acidic hydrogen-bonding group on a side chain and is soluble or swelling in water or an alkali aqueous solution, and (B′) a compound that generates radicals when exposed to light or heat.

Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula 1

Abstract: A lithographic printing plate precursor comprising a hydrophilic support having provided thereon an image-forming layer containing a radical initiator, an infrared absorbing dye, and at least one component selected from fine particles containing a radical polymerizable compound having the specific structure and microcapsules encapsulating a radical polymerizable compound having the specific structure.

Abstract: A photosensitive constituent for a flexographic printing plate comprising a polyester film as support (B) and a photosensitive elastomer composition (C) and having an adhesive layer (A) therebetween, wherein the photosensitive elastomer composition (C) comprises, as essential components, (a) 50% by weight or more of at least one thermoplastic elastomer comprising a mono-vinyl-substituted aromatic hydrocarbon and a conjugated diene, (b) 5 to 40% by weight of at least one diene-based liquid rubber, (c) 1 to 20% by weight of at least one ethylenically unsaturated compound having 2 unsaturated bonds within its molecule, and (d) 0.1 to 3% by weight of at least one photopolymerization initiator, and wherein (1) the thermoplastic elastomer has an average ratio of vinyl bond units in conjugated diene segments thereof of 10 to 20 mol % and (2) the liquid rubber has a number average molecular weight (Mn) of 500 to 5,000 and an average ratio of vinyl bond units of 50 to 70 mol %.

Abstract: Disclosed are photoimageable compositions containing silsesquioxane binder polymers and photoactive compounds, methods of forming relief images using such compositions and methods of manufacturing electronic devices using such compositions. Such compositions are useful as photoresists and in the manufacture of optoelectronic devices.

Abstract: A photosensitive resin composition which includes a photosensitive saponified PVA having a pendant group derived from a quaternary styrylpyridinium or styrylquinolinium, or a derivative thereof. The composition comprises a photosensitive saponified PVA which has structural units represented by formulas (1) to (4): which product is dissolved in at least one organic solvent selected from the group consisting of compounds represented by formulas (5), (6), and (7). The resin composition can be dissolved in a comparatively safe high-boiling-point solvent, such as propylene glycol, and can be developed with water.

Abstract: A negative photosensitive lithographic printing plate comprises: a support; and a photosensitive layer containing: i) a modified poly(vinyl alcohol) resin binder having a radical-polymerizable group and an acid group; and ii) at least one of a photo-polymerization initiator and a heat-polymerization initiator.

Abstract: A photoreactive resin composition having high sensitivity and causing less gelation, and methods of manufacturing a circuit board and a ceramic multilayer substrate having a high-resolution wiring pattern and via holes by a photolithography process using the photoreactive resin composition are described. The photoreactive resin composition contains an inorganic powder containing a polyvalent metal powder and/or a polyvalent metal oxide powder, an alkali-soluble first polymer having an ethylenically unsaturated double bond, a monomer having an ethylenically unsaturated double bond, a photoreaction initiator, an organic solvent, and a second polymer having a pyrrolidone ring in a side chain.

Abstract: A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate.

Abstract: A photosensitive composition for optical waveguides comprising of an organic oligomer, a polymerization initiator and a crosslinking agent, the organic oligomer being a silicone oligomer represented by the following formula (1), wherein X denotes hydrogen, deuterium, halogen, an alkyl group or an alkoxy group; m is an integer from 1 to 5; x and y represent the proportion of respective units, and neither x nor y is 0; and R1 denotes a methyl, ethyl, or isopropyl group; a production method thereof, and a polymer optical waveguide pattern formation method using the same.

Abstract: A lithographic printing plate precursor comprises an image forming layer containing at least one polymer compound having a fluoroaliphatic group on the side chain, wherein the fluoroaliphatic group is derived from a fluoroaliphatic compound produced by a telomerization or oligomerization method.

Abstract: A method for making a relief printing plate from an imageable lithographic printing plate precursor. The relief printing plate has ink-receptive cured areas, and ink-repellent non-image areas. The method comprises the steps of: a) imaging the lithographic printing plate precursor to produce ink-receptive image areas and ink-repellent non-image areas; b) applying a curable composition to form a coating on ink-receptive image areas; and c) curing the coating to produce ink-receptive cured areas. The method of another embodiment further comprises the steps of: d) applying a curable composition to form a coating on ink-receptive cured areas; e) curing the coating on the cured areas; and f) repeating steps d) and e) to attain a desired relief depth for the ink-receptive cured areas. In the practice of an embodiment of the invention, a modified rotary printing press may be employed to make a relief printing plate from a lithographic printing plate.

Abstract: The invention provides a lithographic printing for precursor having an imagable coating on an aluminum support, wherein the imagable coating comprises a polymeric substance comprising colorant groups, and wherein the aluminum support on which the coating is provided is anodized but not subsequently modified by means of a post-anodic treatment compound, and the coating does not comprise a colorant dye. The polymeric substance may also comprise pendent infra-red or developer dissolution inhibiting groups, and these groups may also be the colorant groups themselves.

Abstract: The present invention provides: a photosensitive resin composition, which can form uniform coating films having higher coating film strength without causing surface contamination, decrease of evenness of coating films, decrease of film thickness, and coloring by decomposition in heat treatment of subsequent steps, and has good sensitivity of exposure. The photosensitive resin composition comprises a lactone-ring-containing polymer (A) as an essential component, wherein: the lactone-ring-containing polymer (A) is obtained by carrying out polymerization of comonomers and lactonization at the same time wherein the comonomers include a 2-(hydroxyalkyl)acrylate ester and an acidic-group-containing monomer; and the lactone-ring-containing polymer (A) is obtained by almost quantitatively carrying out lactonization of a 2-(hydroxyalkyl)acrylate ester structural unit.

Abstract: A negative resist composition comprising: (A) a compound being capable of generating an acid upon irradiation with an actinic ray or a radiation; (B) an alkali-soluble polymer; and (C) at least two crosslinking agents being capable of generating crosslinking with the polymer (B) by an action of an acid, wherein the crosslinking agent (C) comprises at least two compounds having a different skeleton from each other, which are selected from phenol derivatives having at least one of a hydroxymethyl group and an alkoxymethyl group on a benzene ring thereof, in which a sum of the hydroxymethyl group and the alkoxymethyl group is two or more, one of the at least two crosslinking agents comprises one or two benzene rings in the molecule thereof, and other one of the at least two crosslinking agents comprises from 3 to 5 benzene rings in the molecule thereof.

Abstract: A negative image-recording material which can be imagewise-exposed by IR radiation from IR lasers and enables direct image formation from digital data of a computer or the like. The material, when used in a lithographic printing plate, ensures good hardenability in an image area, exhibits good printing durability, even if not heated for image-formation, and ensures a large number of good prints from the printing plate. The material includes (A) an IR absorber having an oxidation potential of at most 0.35 V (vs. SCE), (B) a thermal radical generator and (C) a radical-polymerizing compound. The material is imagewise-exposed to IR radiation for image formation. Preferably, the IR absorber (A) has, in a chromophoric group, an electron-donating substituent having a Hammett's &sgr;para value of at most −0.10, and the thermal radical generator (B) is an onium salt.

Abstract: An improved photopolymerizable resin composition for use in making flexographic printing plates, wherein the resin composition comprises a base polymer, a reactive crosslinking agent, a photoinitiator, and a nanoparticle-sized filler. Printing plates produced using the improved compositions of the invention have increased toughness, less tack, reduced cold flow, and higher hardness as compared to prior art compositions that do not contain nanoparticle fillers.

Abstract: A photosolder resist composition of the invention is characterized by containing (A) a resin containing radical polymerization groups and carboxyl groups obtained by adding a cyclic ether group of a cyclic ether group-containing vinyl monomer to a carboxylic group of a radical copolymer containing at least isobornyl (meth) acrylate and a carboxyl group-containing vinyl monomer as monomer units; (B) an inorganic filler; and (C) a photocurable mixture of a polyfunctional acrylic monomer (c1), a cyclic ether group-containing compound (c2), and a photopolymerization initiator (c3).

Abstract: This invention relates to a negative photoresist composition with multi-reaction models. When the photoresist composition according to the present invention is used in photolithography processes employing UV light to produce cross-link reactions and multi-reactions including radical polymerization and cationic polymerization also occur. The photoresist composition can be used to control light reaction efficiency and increase reaction thoroughness, thus obtaining a high resolution pattern.

Abstract: A photoimageable composition comprising finely divided particles of inorganic materials comprising functional phase particles selective from electrically conductive, resistive and dielectric particles; and inorganic binder dispersed in organic medium comprising an aqueous developable polymer; photoinitiation system; and a photospeed enhancer wherein the enhancer comprises a ratio of 30/70 to 70/30 mixture selected from stearic acid and palmitic acid; salt of stearate and salt of palmitate; stearic acid and salt of palmitate; salt of stearate and palmitic acid; and organic solvent.

Abstract: The present invention provides a resin composition that includes (A) a polymer compound that has, on a side chain of a main chain polymer, through a linkage group containing a hydrogen-bonding group and a ring structure, a terminal ethylenic unsaturated bond, and is soluble or swelling in water or an alkali aqueous solution, and (B) a compound that generates radicals when exposed to light or heat. The invention further provides a thermo/photosensitive composition that includes (A′) a polymer compound that has a non-acidic hydrogen-bonding group on a side chain and is soluble or swelling in water or an alkali aqueous solution, and (B′) a compound that generates radicals when exposed to light or heat.

Abstract: Disclosed is a photosensitive resin composition which can be developed using a dilute aqueous alkaline solution after ultraviolet ray exposure, is excellent in pot life, capable of preventing deposits from being generated in a cured coated film, capable of widening heat control tolerance, and is excellent in sensitivity, in heat resistance, in chemical resistance and in electric insulating properties, thereby rendering the composition suitable for use as a solder resist for producing a printed wiring board. This photosensitive resin composition comprises (A) an active energy ray-curable resin having at least two ethylenic unsaturated linkages per molecule thereof, (B) at least one kind material selected from acid salts of N-substituted melamine compound and acid salts of guanamine compound, (C) a photopolymerization initiator, (D) a diluent, and (E) a thermosetting compound. There is also disclosed a printed wiring board where this photosensitive resin composition is employed.

Abstract: A laser-engravable flexographic printing element comprising an elastomeric, relief-forming, laser-engravable, thermally and/or photochemically crosslinkable layer comprising, as binder, at least 5% by weight of syndiotactic 1,2-polybutadiene having a content of 1,2-linked butadiene units of from 80 to 100%, a degree of crystallinity of from 5 to 30% and a mean molecular weight of from 20,000 to 300,000 g/mol on a flexible, dimensionally stable support.

Abstract: Energy curable varnish and energy curable, water washable printing ink compositions suitable for waterless lithographic printing are disclosed each containing: water soluble ethylenically unsaturated reactive oligomers and monomers; water insoluble ethylenically unsaturated reactive oligomers and monomers; and a resin selected from water soluble non-reactive resins, a water insoluble acid or base functional resins and water insoluble ethylenically unsaturated reactive resins, wherein said water insoluble resins contain acid functional groups.

Abstract: There are disclosed a light-sensitive composition which comprises a polymer comprising a carboxyl group and a polymerizable double bond at the side chain, an organic-borate salt, and a hindered amine compound or a protonic acid captor; and a lithographic printing plate which comprises an aluminum plate and a light-sensitive layer comprising the above light-sensitive composition.

Abstract: The invention provides a photopolymer package for use in making a hand stamp plate, the package consisting of a sachet containing a photocurable liquid polymer, the walls of the sachet being formed of material capable of being released from the cured photopolymer. Methods for the formation of the package and the hand stamp plate are also provided. The invention eliminates the requirement for the use of a backing layer in the package and thereby offers significant advantages over the prior art in terms of cost and efficiency.