Abstract: The present invention relates to photocurable compositions for use in flexographic printing plates comprising selectively hydrogenated block copolymers of conjugated dienes and monoalkenyl arenes and flexographic printing plates made from the same. The block copolymers, either linear or radial, have terminal blocks of unsaturated conjugated diene. The block copolymer is further comprised of monoalkenyl arene blocks and hydrogenated conjugated diene blocks. The compositions exhibit exceptional improvement in degree of cure over comparative selectively hydrogenated block copolymers.

Abstract: The invention provides a polymerizable composition comprising: a binder polymer containing at least an acid group having an acid dissociation constant (pKa) of 5.5 or more and a radical addition polymerizable group, and a radical-generating compound capable of generating a radical with light or heat. Further, the invention provides a negative-working planographic printing plate precursor which has a recording layer containing the polymerizable composition. Use of the polymerizable composition of the invention provides a planographic printing plate precursor that is capable of forming high-quality images free from stains in non-image portions, and further has high strength in formed image portions and excellent printing endurance.

Abstract: A photosensitive resin composition comprising a resin (A1) having fluorine atom-containing groups, silicon atom-containing groups and ethylenic double bonds, a radical initiator (B) and an alkali-soluble photosensitive resin (D) having at least three ethylenic double bonds per molecule. Further, a photosensitive resin composition comprising a resin (A2) having fluorine atom-containing groups and ethylenic double bonds, a resin (A3) having silicon atom-containing groups and ethylenic double bonds, a radical initiator (B), and an alkali-soluble photosensitive resin (D) having at least three ethylenic double bonds per molecule.

Abstract: A photocurable and thermosetting resin composition comprising (A) a photosensitive prepolymer having a carboxyl group in combination with at least two ethylenically unsaturated double bonds in its molecule, (B) a polymerization initiator, (C) a diluent, (D) an oxetane compound having at least two oxetanyl groups in its molecule, and (E) a curing promotor is developable with an alkaline solution and can be formulated as a one package preparation. Such a photocurable and thermosetting resin composition and a photosensitive dry film prepared by the use thereof are useful as various resist materials and electrical insulating materials, particularly as solder resists for printed circuit boards, interlaminar insulating materials for build-up multi-layer printed circuit boards, and the like.

Abstract: Disclosed is a printing plate material comprising a surface roughened aluminum support, and provided thereon, an image formation layer containing a heat-curable polymer having a main chain polymer in the main chain, and an acryloyl group or a methacryloyl group in the side chain, a glass transition temperature Tg of the main chain polymer being from 0 to 100° C., wherein the printing plate material is capable of being developed on a printing press.

Abstract: A positive resist composition comprising: (A1) a resin containing at least one type of repeating unit represented by the specific formula and additionally containing at least one type of repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound which is capable of generating an acid by the action of actinic ray or radiation.

Abstract: The invention relates to a process for preparing a dry film resist by forming a photocurable resin composition onto a support film with a thickness of 1 to 50 ?m and optionally laminate a protective film onto the photocurable composition layer to obtain a dry film resist; whereby the photocurable resin is formed from a homogeneous mixture comprising (a) from 20–90 wt % of an alkaline soluble binder oligomer or polymer; (b) from 5 to 60 wt % of one or more photopolymerizable monomers which are compatible with the oligomers and polymers of component (a); (c) from 0.01 to 20% by weight of one or more photoinitiators; (d) from 0 to 20% by weight of additives and/or assistants; and (e) from 0.

Abstract: A resist curable resin material composed mainly of a curable prepolymer (for example, a photocurable resin material comprising a photosensitive prepolymer having an ethylenically unsaturated terminal group originating in an acrylic monomer (A), a compound having an ethylenically unsaturated group excluding the photosensitive prepolymer (B), and a photopolymerization initiator (C)) and a flame-retarding agent containing a hydrated metal compound and a brominated epoxy compound are mixed to produce a resist curable resin composition. Alternatively, the resist curable resin material described above and a hydrated metal compound surface-treated with a surface treating agent having an amphipathic property and a polarity are mixed to produce a resist curable resin composition.

Abstract: A composition comprising a polymer according to Structure 1 wherein R is H, Me, Et or C6H5; R? is H or Me; R? is H or Me; n=1 to 100; and Z=1 to 3, is disclosed. The composition can be cured and used in a wide range of articles such as a photopolymer printing plate, sealant, caulk, encapsulent, road marking paint, photoresist, binder, impact modifier, polymer modifier, oxygen or water vapor barrier coating, conformal coating, solder mask, pigment dispersion, stereolithograph, laminating resin, grafted co-polymer, composite, optical fiber coating, paper coating, metal coating, glass coating, plastic coating, wood coating, waterproofing material, electrical insulating material, automotive belt or hose, tire, engine mount, gasket, golf ball core, and rubber roll.

Abstract: A radical polymerizable composition comprising (A) an alkali-soluble resin containing a radical polymerizable group, (B) a radical polymerizable compound, and (C) a radical initiator, wherein reactivity of a polymerizable group of the polymerizable compound 4B) to a polymerizable group of the polymerizable compound (B) is larger than reactivity of a polymerizable group of the polymerizable compound (B) to a radical polymerizable group of the alkali-soluble resin (A), and a reactivity of a radical polymerizable group of the alkali-soluble resin (A) to a polymerizable group of the polymerizable compound (B) is larger than reactivity of a radical polymerizable group of the alkali-soluble resin (A) to a radical polymerizable group of the alkali-soluble resin (A).

Abstract: Antireflective hardmask compositions and techniques for the use of antireflective hardmask compositions for processing of semiconductor devices are provided. In one aspect of the invention, an antireflective hardmask layer for lithography is provided. The antireflective hardmask layer comprises a carbosilane polymer backbone comprising at least one chromophore moiety and at least one transparent moiety; and a crosslinking component. In another aspect of the invention, a method for processing a semiconductor device is provided. The method comprises the steps of: providing a material layer on a substrate; forming an antireflective hardmask layer over the material layer. The antireflective hardmask layer comprises a carbosilane polymer backbone comprising at least one chromophore moiety and at least one transparent moiety; and a crosslinking component.

Abstract: The present invention is to provide a pigment dispersion composition for a color filter having the excellent pigment dispersing property and dispersion stability, good developing property and reactivity, and an extremely small residue generation amount after development, a production method capable of stably producing such a pigment dispersion composition, and a color filter for a display having a high transmittance and a low light scattering property. A pigment dispersion composition for a color filter containing at least a pigment, a pigment dispersing agent, a binder resin, a reactive compound, and a solvent, wherein the binder resin is a compound having a pigment adsorbing block containing a pigment adsorbing group and not containing a reactive group, and a reactive block containing a reactive group and not containing a pigment adsorbing group, is provided.

Abstract: A photosensitive metal nanoparticle and a method of forming a conductive pattern using the same, wherein a self-assembled monolayer of a thiol compound or isocyanide compound having a terminal reactive group is formed on a surface of the metal nanoparticle and a photosensitive group is introduced to the terminal reactive group. The photosensitive metal nanoparticles can easily form a conductive film or pattern having excellent conductivity upon exposure to UV, and thus can be applied for antistatic washable sticky mats or shoes, conductive polyurethane printer rollers, electromagnetic interference shielding, etc.

Abstract: A negative-working CTP plate which is superior in resolution and printing resistance of the image area of a press plate is provided, which is obtained by forming a latent image on a heat-sensitive layer in a heat-sensitive lithographic printing plate comprising a substrate having a hydrophilic surface and a heat-sensitive layer made of an alkali-soluble polymer formed on the surface of the substrate, using heat generated upon irradiation with laser light, and developing the heat-sensitive layer using an alkaline developing solution. In the heat-sensitive lithographic printing plate comprising a substrate having a hydrophilic surface, and a heat-sensitive layer made of an alkali-soluble polymer formed on the surface of the substrate, an advancing contact angle (?f1) of the surface of the heat-sensitive layer with water at 25° C. is within a range from 70° to 110°, a receding contact angle (?b2) of the surface of the heat-sensitive layer with water at 25° C. after heating at 150° C.

Abstract: Polymeric material, containing a latent acid which can be converted to an acid by irradiation by a laser and optionally further ingredients.

Abstract: The invention provides a radical generator, although being a self-cleavage type initiator, which is capable of suppressing volatilization of low molecular weight decomposition materials at the time of light radiation and post-baking, and leaving no low molecular weight decomposition materials in the final product, a photosensitive resin composition and an article using the radical generator. The photoradical generator provided according to the invention contains a compound (a) having one or more self-cleavage type radical-generating parts and one or more ethylenic unsaturated groups in one molecule.

Abstract: A radiation-sensitive resin composition comprising (A) an alkali-soluble resin having an unsaturated group, (B) a compound having at least one ethylenically unsaturated double bond, and (C) a radiation-induced radical polymerization initiator, wherein: the alkali-soluble resin having an unsaturated group (A) is obtained by reacting: 100 parts by weight of a copolymer comprising 1 to 40 wt % structural units derived from (a) a radically polymerizable compound having a carboxyl group; 1 to 50 wt % structural units having a phenolic hydroxyl group which are derived from (b-1) a radically polymerizable compound having a phenolic hydroxyl group or (b-2) a radically polymerizable compound having a functional group convertible into a phenolic hydroxyl group after the copolymerization, other structural units of said copolymer being derived from (c) another radically polymerizable compound; with 0.1 to 20 parts by weight of (d) a radically polymerizable compound having an epoxy group.

Abstract: The positive type photosensitive composition of the present invention comprises a polymer compound (A) having, in a side chain thereof, a polymerizable group or a cross-linkable group, and an infrared absorbent (B). Preferably, the polymerizable group or cross-linkable group is incorporated into molecules of the polymer compound (A) through a structural unit having this group in a side chain thereof. Specifically, the structural unit is preferably a structural unit having any one of structures represented by the following general formulae (1) to (4): wherein A, B, X each independently represents a single bond, an oxygen atom, a sulfur atom or the like; L and M each independently represent a bivalent organic group; R1 to R12 represents a hydrogen atom or a monovalent organic group; R13 to R24 each independently represents a monovalent organic group; and Y represents an oxygen atom, a sulfur atom, or a phenylene group which may have a substituent.

Abstract: The invention is directed to a photo-imageable composition precursor, the precursor composition comprising: (I) finely divided particles of inorganic material comprising: Functional phase particles selected from electrically conductive, resistive, and dielectric particles; inorganic binder having a glass transition temperature in the range of from 325 to 600° C.

Abstract: A novel organosiloxane polymer is obtained by addition reaction of an organohydrogenpolysiloxane, an alkenyl-containing organopolysiloxane and an unsaturated compound of formula (3) or (4). Using the organosiloxane polymer, a photo-curable resin composition is prepared which can be exposed to radiation having a wide range of wavelength and developed to form a pattern.

Abstract: An improved light attenuating compound for use in the production of microdevices is provided. Broadly, the light attenuating compound is non-aromatic and can be directly incorporated (either physically or chemically) into photolithographic compositions such as bottom anti-reflective coatings (BARC) and contact or via hole fill materials. The preferred non-aromatic compounds of the invention are conjugated aliphatic and alicyclic compounds which greatly enhance the plasma etch rate of the composition. Furthermore, the light attenuating compounds are useful for absorbing light at shorter wavelengths. In one embodiment, the inventive compounds can be polymerized so as to serve as both the polymer binder of the composition as well as the light absorbing constituent.

Abstract: This invention relates to a photo-polymerization type photosensitive electrode paste composition for a plasma display panel that is capable of preventing a bubble from occurring on an electrode surface during an electrode paste printing process and a damage of an electrode pattern caused by adhesive strength reduction, and a method of fabricating the electrode using the same. A photo-polymerization type photo-sensitive electrode paste composition for a PDP according to the present invention includes a binder polymer for increasing viscosity; at least one of a multi-functional monomer and a multi-functional oligomer that are combined in the shape of chain in reaction to a radical; metal powder; a frit glass for gluing the metal powder; and a photo-initiator and solvent for generating the radical in reaction to a light.

Abstract: Photoacid generators (PAGs) comprising photoactive moieties and perfluorinated, multifunctional anionic moieties (or incipient anionic moieties) are disclosed which provide photoacids with high acid strength, low volatility and low diffusivity. The present invention further relates to photoacid generators as they are used in photoinitiated or acid-catalyzed processes for uses such as photoresists for microlithography and photopolymerization.

Abstract: A polymer, which contains a structural unit having a carboxyl group represented by the following formula (1) at a side chain of the structural unit, wherein no deposition is formed, when the polymer is dissolved in an alkali aqueous solution having a pH of 10 or more and kept at 25° C. for 60 days: wherein R1 represents a hydrogen atom or a methyl group; R2 represents an (n+1)-valent organic linking group containing an ester group represented by —O(C?O)—; A represents an oxygen atom or NR3—; R3 represents a hydrogen atom, or an monovalent hydrocarbon group having from 1 to 10 carbon atoms; and n indicates an integer of from 1 to 5.

Abstract: A heat mode type negative image recording material is provided which comprises (A) a polymer compound that is insoluble in water but is soluble in an alkali aqueous solution and has at least one of groups represented by general formulae (1) to (3) on a side chain; (B) a photothermal conversion agent; and (C) an onium salt compound forming radicals by heat mode exposure with light that is capable of being absorbed by said photothermal conversion agent (B), said heat mode type negative image recording material being capable of recording an image by heat mode exposure. The general formulae are defined in the specification.

Abstract: A laser-engravable flexographic printing element comprising an elastomeric, relief-forming, laser-engravable, thermally and/or photochemically crosslinkable layer comprising, as binder, at least 5% by weight of syndiotactic 1,2-polybutadiene having a content of 1,2-linked butadiene units of from 80 to 100%, a degree of crystallinity of from 5 to 30% and a mean molecular weight of from 20,000 to 300,000 g/mol on a flexible, dimensionally stable support. The elastomeric, relief-forming, laser-engravable layer preferably comprises: (a) from 50 to 99.9% by weight of one or more binders as component A consisting of (a1) from 5 to 100% by weight of syndiotactic 1,2-polybutadiene having a content of 1,2-linked butadiene units of from 80 to 100%, a degree of crystallinity of from 5 to 30% and a mean molecular weight of from 20,000 to 300,000 g/mol as component A1, and (a2) from 0 to 95% by weight of further binders as component A2, (b) from 0.

Abstract: A heat-sensitive lithographic printing plate of the present invention, which enables image recording by infrared-ray scanning exposure based on digital data and has excellent on-press developability, high resistance to scumming and a long press life, the heat-sensitive lithographic printing plate having on a support with a hydrophilic surface an image-forming layer made up of microcapsules in which a reactive group-containing hydrophobic compound is enclosed, a light-to-heat converting agent and a water-soluble compound which has a reactive group capable of reacting with the hydrophobic compound and is situated outside the microcapsules.

Abstract: A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate.

Abstract: Disclosed are a light sensitive planographic printing plate precursor and its processing method, the precursor comprising a hydrophilic support and provided thereon, a photopolymerizable light sensitive layer containing a compound represented by the following formula (1) or (2) and a compound represented by the following formula (3) or (4):

Abstract: A photo curable resin composition, which comprises (A) an acid-modified, vinyl group-containing epoxy resin, (B) an elastomer, (C) a photopolymerization initiator, (D) a diluent and (E) a curing agent, can give a high performance cured film having distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics, and a photosensitive element, which comprises a support and a layer of the photo curable resin composition laid on the support, has distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics.

Abstract: A polymerizable composition comprising; a dendrimer having at least two polymerizable groups within a molecule; a radical initiator; and an alkali-soluble polymer, and an image recording material comprising a support and a recording layer comprising a polymerizable composition containing a dendrimer having at least two polymerizable groups within a molecule, a radical initiator and an alkali-soluble polymer.

Abstract: A method for producing a photosensitive planographic printing plate may comprise (i) carrying out electrolysis to an aluminum support in an aqueous solution of hydrochloric acid or nitric acid so as to provide the aluminum support with a roughened surface; (ii) coating a photosensitive composition on the roughed surface of the aluminum support to obtain a photosensitive layer, the photosensitive composition containing: (A) a monomer having an ethylenic double bond which is also polymerizable; (B) a photoinitiator composition containing an iron arene complex compound; and (C) a polymer binder, (iii) drying the photosensitive layer.

Abstract: A host matrix—normally a binder such as cellulose acetate propionate in a solvent such as acetone—contains a radiation-polymerizable photopolymer—normally a monomer like dipentaerythritol pentaacrylate in combination with a crosslinker like 1-vinyl-2-pyrrolidinone, an initiator like N-phenyl glycine, and/or a photosensitizer like camphor quinone—that is initially uniformly doped with a stable dye—typically Rhodamine B and/or Bodipy Red—that photoinitiates photopolymerization. Upon selective exposure of certain regions of the matrix by radiation, most normally laser light radiation, the dye will initially migrate and redistribute itself to radiatively-exposed regions until, dye migration being substantially complete, photopolymerization will occur, locking the migrated dye in place at a relatively higher concentration at the selectively exposed regions. The dye therein stably located can be optically detected by, preferably, light-radiation-stimulated fluorescence.

Abstract: The present invention provides an infrared photosensitive composition including a binder polymer (A), a polymerizable compound (B), an infrared absorber (C), and a compound (D) which can generate radicals by the action of light or heat, wherein an acid value of a film produced from the composition is from 0.15 mmol/g to 0.8 mmol/g. The invention also provides a planographic printing plate precursor including a substrate having disposed thereon a recording layer that contains the infrared photosensitive composition.

Abstract: The invention provides a hydrophilic member precursor having a hydrophilic surface that is formed by contacting a hydrophobic polymer-containing layer formed on a substrate with a composition that contains a polymerizing group-having hydrophilic polymer followed by applying energy thereto to thereby directly chemically bond the polymerizing group-having hydrophilic polymer to the hydrophobic polymer-containing layer. The invention also provides a hydrophilic member from the hydrophilic member precursor, as well as a pattern forming material, a support for planographic printing plates, and a planographic printing plate precursor.

Abstract: A method for forming images useful as lithographic printing plate precursors is disclosed. An imageable element in which the imageable layer comprises an acid generator, a crosslinking agent, and a binder is imaged with ultraviolet radiation and developed with a solvent based developer. The acid generator is an iodonium, sulfonium, or diazonium salt in which the anion is an organic sulfate or thiosulfate anion. The binder comprises a copolymer that contains a reactive pendent group capable of undergoing acid crosslinking, in which the reactive pendent group is hydroxyl, carboxylic acid, sulfonamide, alkoxymethyl, or a mixture thereof. The method is especially suited for use with direct digital ultraviolet imaging devices. The resulting image is useful as a lithographic printing plate.

Abstract: A lithographic printing original plate, a lithographic printing plate using the lithographic printing original plate and a process for producing the lithographic printing plate are disclosed. The lithographic printing original plate has, on a substrate, a photosensitive layer made of a crosslinked polymer comprising a hydrophilic polymer, a crosslinking agent and a light absorbing compound or comprising a hydrophilic polymer, a crosslinking agent, a light absorbing compound and a hydrophobic polymer, and has properties that the photosensitive layer is changed from ink-repellent to ink-receptive by irradiation with a light.

Abstract: The invention provides a colored photosensitive resin composition for forming a colored image on a transparent substrate, the colored photosensitive resin composition comprising: an alkali-soluble binder, one of a monomer and an oligomer having at least two ethylenic unsaturated double bonds, one of a photopolymerization initiator and a photopolymerization initiating system, and a pigment, said alkali-soluble binder comprising a copolymer including a structural unit having a carboxyl group, a structural unit represented by the following general formula (1), and a structural unit comprising a (meth)acrylate having at least one of an aromatic ring and an alicyclic ring: wherein R1 represents one of a hydrogen atom and a methyl group; and each of R2 to R6 independently represents one of a hydrogen atom, a substituted and unsubstituted alkyl group, a substituted and unsubstituted aryl group, a halogen atom and a cyano group.

Abstract: To provide a polymerizable composition suitable for a lithographic printing plate precursor which can satisfy the requirements of high sensitivity, excellent storage stability and long press life and enables direct plate making from digital data from computer, etc. when recording is conducted a solid laser or semiconductor laser emitting ultraviolet ray, visible light or infrared ray and a compound therefore, the present invention relates to a photoradical polymerizable composition comprising a polyfunctional crosslinking agent having a specific structure represented by formula (I) or (II) defined in the specification.

Abstract: There is provided a lithographic printing plate precursor having good on-machine development quality, and moreover high sensitivity and high printing durability, which comprises a support having provided thereon an image forming layer containing (1) at least one ingredient selected from the group consisting of fine particles containing a compound having two or more vinyloxy groups and microcapsules encapsulating a compound having two or more vinyloxy groups, (2) a light-to-heat conversion agent, (3) a hydrophilic resin and (4) an acid precursor, wherein the acid precursor is not contained in the fine particles or the microcapsules.

Abstract: A photoimageable composition comprising finely divided particles of inorganic material comprising coated silver particles that are at least partially coated with at least one surfactant and inorganic binder dispersed in organic medium comprising an aqueous developable polymer, photo-initiation system and organic solvent.

Abstract: An object of the present invention is to provide a photosensitive resin composition which is excellent in the compatibility (dispersibility) of photosensitive resin composition components, developability with aqueous developer solution, water resistance, image reproducibility, print wear characteristics in printing with a water base ink and plate wiping-off resistance in removal of ink adhered to any printing plate. The present invention relates to a photosensitive resin composition comprising a hydrophilic copolymer (A) obtained by copolymerizing at least (1) 2 to 15 parts by mass of an unsaturated monomer having a carboxyl group, (2) 50 to 80 parts by mass of a conjugated diene-type monomer, (3) 3 to 20 parts by mass of an aromatic vinyl compound, and (4) 3 to 30 parts by mass of an alkyl (meth)acrylate.

Abstract: One embodiment of the present invention is a photoresist formulation that includes e-beam cross-linkable substituents, which substituents include one or more of the following functional groups: (a) carbon-carbon double bonds; (b) a strained ring system; (c) a halogenated compound; and (d) one or more organo-silicon moieties.

Abstract: The invention relates to organically modified, stable in storage, UV curable, NIR permeable silicic acid polycondensates which are photostructurable in layers having a thickness of 1 to 150 ?m. The invention also relates to the production and use thereof as negative resists. The polycondensates according to the invention are obtainable by condensation of organically modified silanediols of the formula I with organically modified silanes of the formula II. Ar2Si(OH)2 ??(I) RSi(OR?)3 ??(II) The radicals are identical or different and have the following meaning: Ar=a radical having 6 to 20 carbon atoms and at least one aromatic group, R=an organic radical having 2 to 15 carbon atoms and at least one epoxy group and/or at least one C?C double bond, R?=methyl or ethyl. Condensation occurs without the addition of water. The molar ratio of said compounds I and II is 1:1.

Abstract: The present invention is a method of fabricating a semiconductor device using a fully cured BCB layer and removing the same using wet etching. The first step is selecting a substrate. The second step of the method is producing an oxide layer or other coating on the substrate. The third step is applying a BCB layer on the oxide layer. The fourth step is fully curing the BCB layer. The fifth step is processing the device. The sixth step is stressing the substrate, preferably causing the substrate to warp. The seventh step is wet etching the BCB layer. The eighth step is removing the BCB layer. The ninth step is removing the oxide layer.

Abstract: The present invention discloses a negative planographic printing plate precursor for infrared exposure having an image recording layer containing an infrared absorbing agent, a radical generator and a radical polymerizable compound on a support characterized in that a sensitivity ratio (S1/S60) of a sensitivity (S60) when developed 60 minutes after infrared laser exposure to a sensitivity (S1) when developed one minute after exposure is at least 0.5 and less than 1.0 in the image recording layer. It is preferable that this composition contains a polymer compound which has a functional group having high radical reactivity and can be dissolved or swollen in water or an aqueous alkali solution.

Abstract: The use of a compound of formula (A), which comprises a group of sub-formula (I) where R1, R2, R3, R4, R5, R6, X1 and Y1 are various specified organic groups wherein at least one of said groups has sufficient electron whitdrawing properties to activate the multiple bonds to polymerisation, in a stereolithographic composition. Stereolithographic applications of these compounds are also described and claimed.

Abstract: A photosensitive composition for optical waveguides comprising of an organic oligomer, a polymerization initiator and a crosslinking agent, the organic oligomer being a silicone oligomer represented by the following formula (1), wherein X denotes hydrogen, deuterium, halogen, an alkyl group or an alkoxy group; m is an integer from 1 to 5; x and y represent the proportion of respective units, and neither x nor y is 0; and R1 denotes a methyl, ethyl, or isopropyl group; a production method thereof, and a polymer optical waveguide pattern formation method using the same.

Abstract: A copolymer of an acrylate monomer containing fluorine at ?-position with a fluorinated hydroxystyrene derivative is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, resolution, transparency, substrate adhesion and plasma etching resistance, and is suited for lithographic microprocessing.

Abstract: A photosensitive element for use as a photopolymer printing plate comprising a support, a layer of a photopolymerizable material on the support, and an infrared ablation layer which is ablatable by infrared radiation and substantially opaque to actinic radiation on the photopolymerizable material. The infrared ablation layer comprises at least one infrared absorbing material, a radiation opaque material, and at least one binder which is substantially incompatible with low molecular weight materials in the photopolymerizable layer. The infrared ablation layer is tack-free or substantially tack-free on the photopolymerizable layer. The infrared ablation layer is ablatable from the surface of the photopolymerizable layer upon exposure to infrared laser radiation.

Abstract: An apparatus for scaling of teeth and lavage of the gingival sulcus is provided. The apparatus comprises a base unit which contains reservoirs for the medicaments used in the lavage procedure, and a handpiece connected to the base unit by a conduit, which contains an insert for scaling of teeth. Switches on the base unit and a footswitch make it possible for the practitioner to use the apparatus for scaling only, lavage only, or for simultaneous lavage and scaling.