Abstract: A method for manufacturing a surface, the surface having a multiplicity of slightly different patterns, is disclosed with the method comprising the steps of designing a stencil mask having a set of characters for forming the patterns on the surface and reducing shot count or total write time by use of a character varying technique. A system for manufacturing a surface is also disclosed.

Abstract: A method for fracturing or mask data preparation or proximity effect correction is disclosed which comprises the steps of inputting patterns to be formed on a surface, a subset of the patterns being slightly different variations of each other and selecting a set of characters some of which are complex characters to be used to form the number of patterns, and reducing shot count or total write time by use of a character varying technique. A system for fracturing or mask data preparation or proximity effect correction is also disclosed.

Abstract: In the present invention a mask (21) with a concentric pattern (a,b,c,d) is fabricated and aligned on a substrate (130) coated with a photoresist (131) and is then light-exposed. The light-exposed substrate is developed to obtain a concentric pattern of the photoresist in the form of tori. Then, a reflow process is performed for the developed substrate to allow the photoresist in the form of tori to be curved. A stamper in which the concentric pattern of the photoresist in thr form of tori is engraved in a depressed fashion is fabricated. Thereafter, by using the stamper as a mold, a lens and a lens array with the concentric pattern are formed.

Abstract: Very high aperture microlithography projection objectives operating at the wavelengths of 248 nm, 193 nm and also 157 nm, suitable for optical immersion or near-field operation with aperture values that can exceed 1.4 are made feasible with crystalline lenses and crystalline end plates P of NaCl, KCl, KI, RbI, CsI, and MgO, YAG with refractive indices up to and above 2.0. These crystalline lenses and end plates are placed between the system aperture stop AS and the wafer W, preferably as the last lenses on the image side of the objective.

Abstract: A process of manufacturing a liquid crystal display device of transverse electric-field type, wherein a halftone photomask which is used to form a photoresist pattern has a fully light-shielding area preventing UV irradiation of a portion of an active matrix substrate in which a thin-film transistor element is to be formed, so that the photoresist pattern includes a positive resist portion which has a first thickness and which is formed on the above-indicated portion of the substrate. The halftone mask further has a fully light-transmitting area which permits fully UV transmission therethrough to provide the photoresist pattern with a resist-free area which corresponds to a portion of the substrate in which a contact hole serving as a third connection portion connecting an external scanning-line driver circuit and a scanning-line terminal portion through a junction electrode is to be formed.

Abstract: A method for producing a conductive film, which comprises: exposing and developing a light-sensitive material comprising a support and thereon an emulsion layer containing a silver salt emulsion to form a metallic silver; and then subjecting the light-sensitive material to a smoothing treatment (such as a calender treatment).

Abstract: Provided are a light guiding plate for providing a background light source to a non-emission display device, a back light unit, and a microlens used therein. The microlens having a curved incline formed therein is made of a light transmitting material to reflect and refract light emitted from a light source. Here, the microlens has a polyhedral shape including a bottom face, a top face opposed to the bottom face, and a plurality of side faces formed between the bottom face and the top face, wherein at least one side face crossing a traveling direction of the light emitted from the light source among the plurality of side faces is a curved face inclined about the bottom face.

Abstract: A method for manufacturing a surface, the surface having a multiplicity of slightly different patterns, is disclosed with the method comprising the steps of designing a stencil mask having a set of characters for forming the patterns on the surface and reducing shot count or total write time by use of a character varying technique. A system for manufacturing a surface is also disclosed.

Abstract: Polymers, methods of use thereof, and methods of decomposition thereof, are provided. One exemplary polymer, among others, includes, a photodefinable polymer having a sacrificial polymer and a photoinitiator.

Abstract: An optical filter for a plasma display device with improved shielding angle and transmittance, and a method of manufacturing the optical filter. The optical filter includes an external light shielding layer having a plurality of first openings; and an electromagnetic wave shielding layer integrated with the external light shielding layer on one surface of the external light shielding layer, where the electromagnetic wave shielding layer has a plurality of second openings corresponding to the plurality of first openings.

Abstract: There are provided polymer optical waveguide forming material, a polymer optical waveguide and a manufacturing method of the polymer optical waveguide which reduces transmission loss with good processability. The polymer optical waveguide forming material is comprised of a polymer containing norbornene-based structural units including a hydroxy group; a photoacid generator for generating acid by irradiation of an actinic ray; and a monomer component polymerized by acid generated by said photoacid generator.

Abstract: An EL element capable of: preventing the state in which number of excessive layers are laminated on each light emitting part formed in a pattern at the time of forming the light emitting parts using the photolithography method; executing the peeling treatment easily and quickly in the excessive layer peeling process; and preventing generation of color mixture or pixel narrowing derived from the elution of the patterned light emitting part into the light emitting layer coating solution to be coated later, at the end part thereof, at the time of coating a light emitting layer coating solution. In order to achieve the above mentioned object, the present invention provides a method for manufacturing an electroluminescent element using a photolithography method.

Abstract: A device manufacturing system and method are used to perform multiple exposures utilizing a resettable or reversible contrast enhancing layer. A radiation sensitive layer is formed on a substrate. A resettable or reversible contrast enhancing layer is formed on the radiation sensitive layer. The resettable or reversible contrast enhancing layer is bleached with a first pattern. The first pattern formed in the resettable or reversible contrast enhancing layer is transferred to the radiation sensitive layer. The resettable or reversible contrast enhancing layer is reset to unbleach the resettable or reversible contrast enhancing layer. The resettable or reversible contrast enhancing layer is bleached with a second pattern. The second pattern formed in the resettable or reversible contrast enhancing layer is transferred to the radiation sensitive layer.

Abstract: A high-temperature-durable optical film structure and its fabricating method are provided. The optical film structure is formed by covering a surface of a substrate with an optical layer structure and forming a plurality of passage structures on the optical layer structure to divide the optical layer structure into a plurality of optical blocks. The passage structures can be used as a space of releasing the thermal stress to prevent the film deformation and peeling.

Abstract: There is provided a SSC chip whose yield may be improved and whose processing steps may be simplified as compare to those of a prior art PLC chip having a light waveguide circuit to which a spot-size converter (SSC) is added, a fiber array attached with the SSC chip, a PLC module attached with the SSC chip and a method for manufacturing the SSC chip. The SSC chip has four spot-size converters and is fabricated separately from a PLC chip. Each SSC has a straight waveguide having the same core width and height with an end of an input/output waveguide of the PLC chip, a horizontally tapered waveguide in which the core width is enlarged in a tapered shape in the horizontal direction from the core width of the straight waveguide, a vertically tapered waveguide in which the core height is enlarged in a tapered shape in the vertical direction from the core height of the horizontally tapered waveguide and a spot-size enlarged portion whose core width and core height are both enlarged.

Abstract: The invention relates to a process for producing photonic crystals by first providing an inorganic photoresist which, on illumination with energy greater than the electronic band gap of the photoresist, exhibits a phase alteration. Illumination of the photoresist with a laser beam whose energy is lower than the electronic band gap of the photoresist but whose intensity at the focal point is so high that nonlinear effects occur there nevertheless results in a phase alteration in the photoresist. Thereafter, the illuminated photoresist is exposed to an etching solution which preferentially dissolves one phase of the photoresist, and the developed photoresist is finally removed therefrom as a photonic crystal. Inorganic photonic crystals produced by the process according to the invention are suitable for completely optical systems, circuits and components for optical telecommunication or computer systems.

Abstract: The embodiments of the present invention provide an integrated planar polarizing device and methods of fabrication. The device, in the order of incidence along an optical path of an incident light beam from back position to front position, comprises a planar array of micro mirrors, a quarter wave retarder film and a reflective polarization plate. The micro mirrors are regularly spaced-apart in an identical tilted angle ? relative to a base plane. The quarter wave retarder film is positioned between the micro mirrors and the reflective polarization plate.

Abstract: A manufacturing device and a manufacturing method for polymer waveguide devices are revealed. The manufacturing device includes a substrate coated with a photoresist polymer membrane and set on a work platform, a femtosecond laser emitting onto the photoresist polymer membrane, and a lens arranged between the femtosecond laser and the substrate. The polymer waveguide devices are obtained by the femtosecond laser emitting onto the photoresist polymer membrane. Without complicated manufacturing processes, the production efficiency of the polymer waveguide devices is increased.

Abstract: Apparatus (2) comprising a cylindrical substrate (4), and an integrated optical circuit which is provided on the cylindrical substrate and which comprises at least one optical waveguide (6). A process for producing the apparatus (2) is also disclosed.

Abstract: In an optical device, a number of structures having higher portions or lower portions are arranged at a fine pitch equal to or shorter than a wavelength of visible light on a surface of a base. Each of the structures is arranged to form a plurality of arc track rows on the surface of the base, and to form a quasi-hexagonal lattice pattern, and the structure has an elliptical cone or truncated elliptical cone shape having a major axis in a circumferential direction of the arc tracks.

Abstract: A polarizing cube includes a pair of identical and symmetric triangular prisms which sandwich a thin optical composite plate containing a planner array of reflective straight wires spaced apart in parallel as a built-in wire grid polarizer. All of its subcomponents and the polarizing cube itself are physically and optically symmetrical to one of its diagonal planes so as to provide improved integration and robustness for projection display application. The cubic configuration of the disclosed polarizer can be readily produced through common means and sequences typically used in semiconductor wafer fabrication processes, including photolithographic patterning, gap dielectric filling and planarization, and wafer thinning, bonding and cutting among others.

Abstract: A method of accurately forming lower partitions than spacers on a substrate in an electrophoretic medium includes a first resist application step where a first negative resist is applied on the first substrate, a first exposure step where the first negative resist is exposed to light through a first mask having an aperture pattern for exposing a pattern of the partition to light, a second resist application step where a second negative resist is applied on the first negative resist, a second exposure step where the second negative resist and the first negative resist are exposed to light through a second mask having an aperture pattern for exposing a pattern of the spacer to light, and a development step where the first negative resist and the second negative resist are developed.

Abstract: A reflector capable of suppressing contrast reduction caused by retro-reflection, a display device having the same, and a method of manufacturing the same are provided. The reflector includes: a base having first and second surfaces which are opposed to each other, the second surface being provided with a reflective element; and a plurality of burying layers formed around the reflective element and including at least one light absorption burying layer.

Abstract: A coating for the protection of optical surfaces exposed to a high energy erosive plasma. A gas that can be decomposed by the high energy plasma, such as the xenon plasma used for extreme ultraviolet lithography (EUVL), is injected into the EUVL machine. The decomposition products coat the optical surfaces with a protective coating maintained at less than about 100 ? thick by periodic injections of the gas. Gases that can be used include hydrocarbon gases, particularly methane, PH3 and H2S. The use of PH3 and H2S is particularly advantageous since films of the plasma-induced decomposition products S and P cannot grow to greater than 10 ? thick in a vacuum atmosphere such as found in an EUVL machine.

Abstract: An enhanced optical interference pattern, such as a diffraction grating, is incorporated into a photodefineable surface by shining three or more beams of coherent light from a single source at a photodefinable surface, such as a photosensitive emulsion/photoresist covered glass or an ablatable substrate and mapping the diffraction grating pattern to the photodefinable surface. Mapping of the optical interference pattern is created by interference of three or more light beams, such as laser light or other light sources producing a suitable spectrum of light. The mapped photodefinable surface can be used to create embossing shims. The embossing shim can then be used to emboss film or paper. The embossed film/paper can be metalized and laminated onto a substrate to create a product that has shifting patterns at a variety of viewing angles when exposed to white light.

Abstract: A substrate for detecting samples includes; a body, and a plurality of micro lenses arranged on the body and configured for attachment to at least one sample, wherein the at least one sample emits fluorescent light, and wherein the plurality of micro lenses condense the fluorescent light emitted from the at least one sample via refraction.

Abstract: Methods of forming a microlens are disclosed. In one embodiment, a method for forming a microlens of an image sensor includes: coating a photoresist for forming microlenses on a substrate of an image sensor; allowing laser light to be incident on the inside of the photoresist to create a standing wave, the laser light affecting portions of the photoresist positioned in the amplitude range of the laser light; and forming microlenses by curing the photoresist having the laser light affected portions. With the proposed method for forming the microlens, various sizes of microlenses can be formed and fine size of microlenses can be formed by, for example, adjusting the wavelength of the laser light.

Abstract: A method for forming an optical deflection device includes providing a semiconductor substrate comprising an upper surface region and a plurality of drive devices within one or more portions of the semiconductor substrate. The upper surface region includes one or more patterned structure regions and at least one open region to expose a portion of the upper surface region to form a resulting surface region. The method also includes forming a planarizing material overlying the resulting surface region to fill the at least one open region and cause formation of an upper planarized layer using the fill material. The method further includes forming a thickness of silicon material at a temperature of less than 300° C. to maintain a state of the planarizing material.

Abstract: A large mask with random apertures may be formed by forming a smaller mask (also called a cell mask) with a random pattern of transmissive apertures which is then repeatedly replicated to create the large mask. The random pattern may be created by perturbing the aperture locations by a small amount or the apertures may be randomly placed within the cell mask provided certain criteria are met. Alternatively, a large mask with a random pattern of transmissive apertures may be formed without using a cell mask. This large mask may be used to fabricate diffusers and other devices that do not suffer from the interference, diffraction and other optical effects common in devices having structures that are non-randomly patterned.

Abstract: A (meth)acrylate ester includes a (meth)acrylate monomer moiety having an ester oxygen, an anthraquinone moiety having a transmittance spectrum producing red light, and a linking group covalently coupled to the ester oxygen and the anthraquinone moiety, the linking group including phenyl, naphthyl, a linear alkyl group having from 2 to about 10 carbons, a branched alkyl group having from 3 to about 10 carbons, a cycloalkyl group having from about 3 to about 20 carbons, or a substituted aromatic group.

Abstract: A method for manufacturing an optical disc master using an existing exposure system, and a method for manufacturing an optical disc having higher recording capacity. The method for manufacturing an optical disc, using a master to produce the optical disc having an irregular pattern thereon, the master being produced by the steps of forming a resist layer composed of a resist material including an incomplete oxide of a transition metal such as W or Mo on a substrate, the oxygen content of the incomplete oxide being smaller than the oxygen content of the stoichiometric composition corresponding to a valence of the transition metal; selectively exposing the resist layer with laser according to a recording signal pattern using a light source with an irradiation power that is less than an irradiation threshold power at which exposure of the resist starts; and developing the resist layer to form the predetermined irregular pattern.

Abstract: A method for forming micro lenses includes the step of performing an etching treatment to an object to be processed, which includes a lens material layer and a mask layer having lens shapes and formed on the lens material layer, using an etching gas including SF6 gas and CHF3 gas, an etching gas including SF6 gas and CO gas, an etching gas including a gas having therein carbon and fluorine and CO gas, or an etching gas including two or more kinds of gases from a first gas having therein carbon and fluorine and a second gas having therein carbon and fluorine, to etch the lens material layer and the mask layer and transfer the lens shapes of the mask layer to the lens material layer, thereby forming the micro lenses.

Abstract: There are provided a compound represented by the following formula (I), a photopolymerizable composition containing (A) a photopolymerization initiator represented by the formula (I) and (B) a radical polymerizable monomer, a color filter produced by using the photopolymerizable composition, and a process for producing the color filter.

Abstract: A composition for an optical waveguide is provided which contains no halogen atom and has no light absorption band in a visible to near-infrared spectral range. A method of preparing the composition is also provided. The composition includes: (A) a fine particulate zirconium oxide material including zirconium oxide fine particles, and a silicone oligomer and a silicone oligomer polymer bonded to outer peripheral surfaces of the zirconium oxide fine particles; and (B) a photoacid generator. For preparation of the composition, the fine particulate zirconium oxide material (A) is prepared by mixing a silicone oligomer in an aqueous dispersion of zirconium oxide fine particles, polymerizing the silicone oligomer in an acidic pH range to provide a silicone oligomer polymer, and bonding the silicone oligomer and the silicone oligomer polymer to outer peripheral surfaces of the zirconium oxide fine particles. Then, the photoacid generator (B) is blended with the fine particulate zirconium oxide material (A).

Abstract: The method of manufacturing the optical fiber having the Bragg grating includes the steps of applying heat from a heat source to a predetermined portion of the optical fiber and thus diffusing impurities existing in a core of the optical fiber into a cladding of the optical fiber, so as to adjust an effective refractive index for a guided mode in the fiber corresponding to a predetermined wavelength, exposing UV light from an optical source to a phase mask having a periodic surface relief structure, and fabricating the Bragg grating having a predetermined period in the optical fiber using diffraction and interference of the UV light due to the periodic surface relief structure of the phase mask.

Abstract: The invention provides a process for producing at least one optical filter layer segment on a substrate. The process includes applying a masking comprising a resist layer on a surface of the substrate, depositing an optical filter layer on the surface and the resist layer by vacuum deposition, and removing the resist layer with a portion of the optical filter layer thereon from the surface. The deposition of the optical filter layer, at least at times, takes place at a temperature of over 150° C., preferably in a range from over 150° C. up to and including 400° C.

Abstract: Systems and methods are disclosed herein to provide zoom and/or autofocus lenses. For example, in accordance with an embodiment of the present invention, a lens is provided with at least one tunable lens. The focal length and/or focus of the lens may be varied without mechanically moving or changing the separation between one or more lens components.

Abstract: A microlens for an image sensor fabricated using a seed layer and a method for fabrication of the same that does not involve a reflow process. The method of fabricating a microlens includes forming a seed layer pattern on a wafer, rounding the corner portions of the seed layer pattern by applying plasma, and then depositing an oxide film on the seed layer pattern.

Abstract: An object is to manufacture a substrate having a black matrix pattern with excellent ink repellency on the surface by an easy method. A fluorine-containing compound coated film in which 1 to 60 mm3 of an organic material layer containing 30 to 100% of a fluorine-containing compound is provided on a supporting film per 1 m2 of the supporting film and the organic material layer has a contact angle to xylene of 20 degrees or more is used.

Abstract: A method of manufacturing an optical waveguide device capable of suppressing the surface roughening of core side surfaces of an optical waveguide. Forming an under cladding layer on the front surface of a substrate; forming a photosensitive resin layer for core formation on a surface of the under cladding layer; wherein, in forming the cores, (A) irradiation light transmitted through the photosensitive resin layer, reaching the front surface of the substrate having an arithmetic mean roughness (Ra) in the range of 1 to 2 nm, or (B) irradiation light transmitted through the photosensitive resin layer and reflected from the bottom surface, where the front surface and back surface both have an arithmetic mean roughness (Ra) in the range of 1 to 2 nm.

Abstract: The present invention is a microscope microscope slide coverslip constructed of a glass or plastic plate having one or more indicia thereon which can be used to uniquely or non-uniquely identify the microscope slide coverslip or the microscope slide to which the microscope slide coverslip is attached and/or provide information therefor. Preferably the indicium, such as a barcode, is machine readable. The microscope microscope slide coverslip may have an adherent surface and a non-adherent surface, the adherent surface having a solvent activated dry adhesive film (adhesive coating) bonded thereto and having an indicium thereon for indicating the adherent side of the microscope slide coverslip. The dry adhesive film of the adherent surface is non-tacky (non-sticky) in its storage or preapplication condition. At use, the adhesive of the adherent side can be activated by a solvent.

Abstract: In general, in one aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, the mask feature having a surface comprising a depression, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. In general, in another aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure.

Abstract: A manufacturing method of an optical waveguide device and an optical waveguide device obtained thereby. An under cladding layer is formed on the front surface of a colored-layer-coated PET substrate including a PET substrate portion and a colored layer of a color that absorbs irradiation light and formed on the back surface of the PET substrate portion, and then a photosensitive resin layer for the formation of cores is formed thereon. In forming the cores, when the irradiation light reaches the bottom surface of the PET substrate portion, most of the irradiation light is absorbed by the colored layer, so that there is little irradiation light reflected from the bottom surface of the PET substrate portion. This significantly reduces the irradiation light reflected diffusely from the PET substrate portion and reaching the photosensitive resin layer to thereby effectively suppress the surface roughening of the side surfaces of the cores.

Abstract: A manufacturing method of an optical waveguide device which is capable of suppressing the surface roughening of core side surfaces of an optical waveguide when the optical waveguide is formed on a roughened surface of a substrate. An under cladding layer is formed on a roughened surface of a substrate made of a material that absorbs irradiation light, and then a photosensitive resin layer for the formation of cores is formed thereon. Irradiation light is directed toward this photosensitive resin layer to expose the photosensitive resin layer in a predetermined pattern to the irradiation light. When the irradiation light transmitted through the photosensitive resin layer for the formation of the cores and the under cladding layer reaches the surface of the substrate, the irradiation light is absorbed by the substrate, so that there is little irradiation light reflected from the surface of the substrate.

Abstract: Embodiments in accordance with the present invention provide waveguide structures and methods of forming such structures where core and laterally adjacent cladding regions are defined. Some embodiments of the present invention provide waveguide structures where core regions are collectively surrounded by laterally adjacent cladding regions and cladding layers and methods of forming such structures.

Abstract: The present invention relates to a method for manufacturing a color filter and a color filter manufactured by using the same. More particularly, the present invention pertains to a method for manufacturing a color filter, which includes performing plasma treatment of a black matrix (BM) pattern formed on a substrate to increase a difference in ink repellency of the black matrix pattern and a pixel unit, and a color filter manufactured by using the same. When the production method of the present invention is used, it is possible to provide the color filter in which color mixing does not occur in a pixel unit or between pixel units during discharging of ink by using an inkjet printing process, discoloration due to unfilling does not occur, a surface is uniform, and there is an insignificant step in the pixel unit or between the pixel units.

Abstract: A method of manufacturing a periodic grating structure for a component. The method includes forming first structured layer including a final periodic grating structure of a first material and a second material filling spaces between individual features of the final periodic grating structure, removing the second material using a first chemical process and annealing a portion of the first material into a third material using a second chemical process.

Abstract: An exposure method for an LCD is provided. In the method, a sub-pixel region of an array substrate is divided into a first exposure region and a second exposure region, and the first exposure region and the second exposure region are sequentially exposed.

Abstract: Disclosed are membranes including a nanohole penetrating the membrane and two opposing faces. Method of making the membranes are also disclosed.

Abstract: The present invention relates generally to electro-optically active waveguide segments, and more particularly to the use of a selective voltage input to control the phase, frequency and/or amplitude of a propagating wave in the waveguide. Particular device structures and methods of manufacturing are described herein.