Abstract: Films for optical use, articles containing such films, methods for making such films, and systems that utilize such films, are disclosed.

Abstract: The invention concerns a security element for a security document comprising a structure layer and diffractive first and second relief structures, wherein the relief structures viewed parallel to the plane of the structure layer are arranged in different planes of the security element, wherein the first relief structure adjoins a partial first reflection layer and the second relief structure adjoins a partial second reflection layer, and wherein—if the first reflection layer is towards a viewer—a second item of information generated by the second relief structure is at least partially concealed and—if the second reflection layer is towards the viewer—a first item of information generated by the first relief structure is at least partially concealed, and processes for the production of such security elements and security documents formed therewith.

Abstract: A curable composition including (A) a compound which has a plurality of ethylenically unsaturated double bonds and secondary hydroxyl groups, (B) a photopolymerization initiator, and (C) a coloring agent, is used to provide a curable composition which exhibits excellent storage stability such as dispersion stability even in the case where a coloring agent is included at high concentration, highly sensitive curability by exposure, high adhesiveness to the surface of a hardening material in a curing region when applied in forming patterns on the surface of the hardening material, excellent uncured region removability, and excellent pattern formability; a color filter having colored patterns, which is formed by using the curable composition and has excellent resolution and adhesiveness to the support; and a manufacturing method of the coloring filter with high productivity.

Abstract: A method for producing surface convexes or concaves enabling easy and highly precise formation of desired convex/concave shapes using a photomask is provided. A mask member 20 having light transmitting sections and non-light transmitting sections is disposed over one side of a photosensitive film 10 consisting of a photosensitive resin composition with an interval with respect to the photosensitive film 10, and a light diffusing member 30 is disposed on the opposite side of the photosensitive film 10 across the mask member 20. Light is irradiated from a light source disposed on the opposite side of the mask member 20 across the light diffusing member 30 to subject the photosensitive film 10 to light exposure through the light diffusing member 30 and the light transmitting sections of the mask member 20.

Abstract: An optical element includes a substrate having a passive waveguide and a laser waveguide disposed therein. The laser waveguide is in direct contact with the passive waveguide over a surface of contact so as to provide a butt coupling between the passive waveguide and the laser waveguide. A step extends between an upper edge of the passive waveguide and an upper edge of the laser waveguide. A covering is disposed on the passive waveguide so that the covering and the substrate together provide a cladding of lower refractive index around the passive waveguide and so that a hollow space is disposed between a lower edge of the covering and the upper edge of the laser waveguide.

Abstract: The present invention relates to a process for producing an optical waveguide, including the steps of applying a cladding layer-forming resin onto a substrate and curing the resin to form a lower cladding layer; laminating a core layer-forming resin film on the lower cladding layer to form a core layer; subjecting the core layer to exposure to light and development to form a core pattern; and applying a cladding layer-forming resin over the core pattern to embed the core pattern therebeneath, and curing the resin to form an upper cladding layer, wherein the step of forming the core layer includes the steps of (1) allowing the core layer-forming resin film to be temporarily attached onto the lower cladding layer using a roll laminator, and (2) thermocompression-bonding the temporarily attached core layer-forming resin film onto the lower cladding layer under a reduced pressure. There is provided the process for producing an optical waveguide having a uniform core with a good productivity.

Abstract: A structure is presented for use in optic and electro-optic devices. The structure comprises at least one region of an amorphous KLTN-based material in a KLTN-based material. Also provided is a method of processing a KLTN-based material, comprising at least one of the following: bombarding said KLTN-based material with light ions: and etching said KLTN-based material when in amorphous state by an acid; thereby allowing fabrication of one or more optical components within the KLTN-based material.

Abstract: Disclosed are a method for manufacturing of a master for manufacturing of optical elements having optically effective structures by molding structures, which are formed on the master, onto a surface of an optical substrate, by providing a substrate; coating a surface of said substrate for forming a coating on said substrate; and patterning said coating for forming structures in said coating; a master for manufacturing of optical elements; and a method for manufacturing of optical elements as well as to an optical element having at least one surface, wherein at least in portions of said surface optically effective structures are formed.

Abstract: Embodiments of the invention relate to methods useful in the fabrication of nanostructured devices for optics, energy generation, displays, consumer electronics, life sciences and medicine, construction and decoration. Instead of nanostructuring using colloids of particles, special vacuum deposition methods, laser interference systems (holography), and other low-throughput limited surface area techniques, we suggest to use nanotemplate created by novel nanolithography method, “Rolling mask” lithography. This method allows fast and inexpensive fabrication of nanostructures on large areas of substrate materials in conveyor-type continuous process. Such nanotemplate is then used for selective deposition of functional materials. One of embodiments explains deposition of functional materials in the exposed and developed areas of the substrate. Another embodiment uses selective deposition of the functional material on top of such template.

Abstract: A Fresnel member for an optical system is configured to receive at least reflected light having a first wavelength at a first envelope and reflected light having a second wavelength different from the first wavelength at a second envelope. The Fresnel member includes a plurality of ring zone portions having predetermined surface heights for achieving a maximum diffraction efficiency.

Abstract: An optoelectronics chip-to-chip interconnects system is provided, including at least one packaged chip to be connected on the printed-circuit-board with at least one other packaged chip, optical-electrical (O-E) conversion mean, waveguide-board, and (PCB). Single to multiple chips interconnects can be interconnected provided using the technique disclosed in this invention. The packaged chip includes semiconductor die and its package based on the ball-grid array or chip-scale-package. The O-E board includes the optoelectronics components and multiple electrical contacts on both sides of the O-E substrate. The waveguide board includes the electrical conductor transferring the signal from O-E board to PCB and the flex optical waveguide easily stackable onto the PCB to guide optical signal from one chip-to-other chip. Alternatively, the electrode can be directly connected to the PCB instead of including in the waveguide board. The chip-to-chip interconnections system is pin-free and compatible with the PCB.

Abstract: It is a main object of the present invention to provide a wettability variable substrate provided with a wettability variable layer which is free from any cloud and is superior in adhesion to a substrate, transparency and liquid repellency.

Abstract: Disclosed is a polyorganosiloxane composition containing the following components (a)-(c). (a) 100 parts by mass of a polyorganosiloxane obtained by mixing at least one silanol compound represented by the general formula (1) below, at least one alkoxysilane compound represented by the general formula (2) below, and at least one catalyst selected from the group consisting of compounds represented by the general formula (3) below, compounds represented by the general formula (4) below and Ba(OH)2, and polymerizing the mixture without actively adding water thereinto [chemical formula 1] R2Si(OH)2 (1) [chemical formula 2] R?Si(OR?)3 (2) (chemical formula 3] M(OR??)4 (3) [chemical formula 4] M?(OR??)3 (4) (b) 0.1-20 parts by mass of a photopolymerization initiator (c) 1-100 parts by mass of a compound other than the component (a) having two or more photopolymerizable unsaturated bonding groups.

Abstract: An optical waveguide film includes: an optical waveguide film main body including an optical waveguide core through which light travels and a cladding portion that surrounds the optical waveguide core and has a lower refractive index than that of the optical waveguide core; an electric wiring portion including silver or a silver alloy and formed on at least a part of a principal surface of the optical waveguide film main body; and a protective layer including a titanium layer or a titanium alloy layer and disposed to cover the electric wiring portion.

Abstract: A diffractive optical element includes: a substrate having a first face and a second face; a diffractive structure section that is formed on the first face of the substrate, shaped in a rectangular form in a cross-sectional view of the diffractive structure section, and having an upper face and a plurality of protuberance portions; and a grid section that is formed of a dielectric material, formed on at least one of the upper face of the diffractive structure section and the second face of the substrate, and including micro protuberance portions that are smaller than each of the protuberance portions.

Abstract: The present invention relates to a method of preparing a photochromic film or plate comprising printing a photochromic substance in the unit of an independent spot on a part or the whole of a basic material and forming a protective layer on the basic material, on which the photochromic substance is coated, so as to protect the photochromic substance. According to the present invention, the photochromic substance is printed in the unit of an independent spot so that the printed unit spots are isolated from each other, thereby prolonging the life of the photochromic substance.

Abstract: A three-dimensional (3D) ordered polymer microstructure having a length, a width and a height and including a plurality of waveguides that can be formed utilizing a mask and collimated light. The plurality of waveguides includes a first waveguide having a first finite propagation distance extended along a first direction, a second waveguide having a second finite propagation distance extended along a second direction and a third waveguide having a third finite propagation distance extended along a third direction. Here, only one of the length, width and height of the 3D ordered polymer microstructure is limited by the first finite propagation distance of the first waveguide, the second finite propagation distance of the second waveguide and the third finite propagation distance of the third waveguide.

Abstract: An exemplary lens includes a light pervious substrate, a first optically active part, and a light blocking film. The light pervious substrate has a first surface, an opposite second surface, and a recess defined in the first surface. The recess includes a bottom surface. The first optically active part is formed on the bottom surface. The light blocking film is formed on the bottom surface surrounding the first optically active part.

Abstract: An object of the present invention is to provide a black paste composition suitable for use in laser direct imaging devices employing a light source emitting a laser having a maximum wavelength of 350 to 420 nm, useful in forming a high-definition black matrix pattern efficiently, and superior in storage stability, a black matrix pattern formed by using the composition, a plasma display having the pattern, and a method of forming the black matrix pattern by using the composition. An alkali development-type black paste composition of the present invention comprises (A) a carboxyl group-containing resin, (B) a glass frit, (C) a black pigment, (D) a compound having at least one radically polymerizable unsaturated group in its molecule, and (E-1) an oxime-based photopolymerization initiator represented by the following general formula (I).

Abstract: A material for forming a conductive antireflection film contains: a base resin having conductivity; a crosslinking agent; a thermal acid generator; and a solvent.

Abstract: A sulfide phosphor paste composition comprising a sulfur-containing dispersant, and a fluorescent film prepared therefrom, are provided. The sulfur-containing dispersant has a dual head structure containing both a carboxyl group and a thiol group or a structure containing a thiol or thiophene group as a head group. An oligomeric sulfur-containing dispersant is also provided. Adsorption of the dispersant on the surface of the sulfide phosphor prevents aggregation of the phosphor particles, and thereby improves the dispersibility of the sulfide phosphor paste composition, the homogeneity of the phosphor in the paste composition, and the density of a film produced from the paste composition. Fluorescent films and display devices produced from the phosphor paste composition exhibit improved luminescent properties and excellent processability.

Abstract: Providing a fabrication method of a periodic domain inversion structure. A nonlinear optical ferroelectric material substrate is provided. A photoresist layer is formed on the upper and the lower surface of the substrate, and periodic gratings formed by interference of two laser beams are employed to expose the photoresist layer on the upper surface. Meanwhile, the two laser beams pass through the substrate, so the periodic gratings are used to expose the photoresist layer on the lower surface. A development process is performed to form a periodic photoresist pattern on the two surfaces of the substrate. A conductive layer is formed above the substrate for covering the photoresist pattern and the surface of the exposed substrate. The photoresist pattern and a portion of the conductive layer thereon are removed by lift-off. A voltage is applied to the substrate via the remaining conductive layer to polarize parts of the substrate.

Abstract: A rotary apertured interferometric lithography (RAIL) system that includes interferometric lithography tools, a mask with a slit preferably with an arc shape, and a rotating stage is disclosed. The RAIL system could create a servo pattern of a recording-head trajectory of a hard disk drive in a master for magnetic-contact printing. The master can could be used to form arrays of sub-micron sized magnetic elements on a magnetic disk media for high-density magnetic recording applications.

Abstract: Methods of forming a lens master wafer having aspheric lens shapes. In one embodiment, a substrate is coated with a polymer material. Isolated sections are formed in the polymer material. The isolated sections are reflowed. The reflowed sections are formed into aspheric lens shapes using a lens stamp.

Abstract: A method for forming an electrochromic layer pattern includes forming a transparent electrode layer and a photoresist layer on a transparent substrate, forming a photoresist pattern by laser interference lithography, and depositing an electrochromic layer pattern on the transparent electrode through openings defined by the photoresist pattern by depositing an electrochromic layer on a front surface of the substrate and then lifting up the photoresist pattern. An insulation layer may be further formed between the transparent layer and the photoresist layer. Here, the electrochromic layer may be formed after an insulation layer pattern is formed using the photoresist pattern as an etching mask. In this case, the electrochromic layer pattern is formed in openings defined by the insulation layer pattern. As a result, a contact surface area between the electrochromic layer pattern and the ion conductive layer is increased to ensure a rapid response speed.

Abstract: A method for manufacturing a mold of a light guide plate is disclosed. The method includes following steps: providing a substrate and forming a plurality of microstructures on the substrate; depositing a first metal layer upon the substrate; spreading a photoresist layer on the first metal layer, exposing the photoresist layer to a photomask, and developing a photoresist pattern; removing a part of the first metal layer without cover of the photoresist pattern so as to form a sink pattern; depositing a second metal layer upon the sink pattern; electroforming a metal plate on the second metal layer; and remaining the metal plate and the second metal layer by separating the metal plate from the photoresist layer, the first metal layer, and the substrate so as to generate the mold of the light guide plate.

Abstract: This invention is a method for fabricating polymer ridged waveguides by using tilted immersion lithography. It includes the steps of: 1. preparing step; 2. calculating step; 3. first tilted immersion lithography step; 4. rotating 180-degree step; 5. second tilted immersion lithography step; and 6. finishing step. By these two tilted immersion lithography steps as well as the rotating 180-degree step between them, the UV light refracts and makes the photoresist forming a 45-degree ridged waveguide. This fabricating method is simple and stable. It can reduce the fabricating time and cost. Also, it is suitable for mass production and it has wide-ranged applications.

Abstract: The present invention relates to a process for producing an optical component, the process including: disposing a transparent stamp tool on a substrate or an imaging element through a transparent ultraviolet-curable resin composition layer; and irradiating the resin composition layer with an ultraviolet ray through the transparent stamp tool to thereby cure the resin composition layer, in which a resin composition contained in the resin composition layer contains a thermosetting resin as a main component and a photo-acid generator, and the ultraviolet ray passing through the transparent stamp tool is an ultraviolet ray having a wavelength of 320 nm or more.

Abstract: The present invention relates to a stamper used for an injection molding of a resin material and a manufacturing method thereof. It is provided with such stamper as being excellent in durability in use without causing corrosion at a portion contacting with the resin material, wherein an anti-corrosion film made of any one of alloy selected from a nickel alloy, a silver alloy or a copper alloy is formed on a surface of the stamper contacting with the resin material. Further, it is provided with a method comprising steps of: forming anti-corrosion film on the surface of a mold for manufacturing the stamper; forming the stamper on the anti-corrosion film; and separating the stamper and the anti-corrosion film in a body from the mold.

Abstract: An exemplary method for manufacturing an infrared (IR) cut-off filter coated lens array includes: providing a light pervious panel having a first surface and a second surface at opposite sides thereof; forming an infrared cut-off filter film on the first surface of the light pervious panel; and forming a plurality of discrete lens structures on the second surface of the light pervious panel through a photolithography process.

Abstract: An optical waveguide manufacturing method which obviates a developing step and stably provides greater differences in refractive index between a core and cladding layers. A core formation photosensitive resin layer is formed on a surface of an under-cladding layer, and then exposed in a predetermined pattern. A core is formed which is defined by an exposed portion of the core formation photosensitive resin layer. Surfaces of the exposed portion and an unexposed portion of the core formation photosensitive resin layer are covered with an over-cladding layer formation photosensitive resin layer. The two photosensitive resin layers are heated, whereby a resin of the unexposed portion of the core formation photosensitive resin layer and a resin of the over-cladding layer formation photosensitive resin layer are melt-mixed together to form a mixture layer. Then, the mixture layer is exposed, whereby a third cladding layer is formed defined by the exposed mixture layer.

Abstract: A method for forming micro lenses includes the step of performing an etching treatment to an object to be processed, which includes a lens material layer and a mask layer having lens shapes and formed on the lens material layer, using an etching gas including SF6 gas and CHF3 gas, an etching gas including SF6 gas and CO gas, an etching gas including a gas having therein carbon and fluorine and CO gas, or an etching gas including two or more kinds of gases from a first gas having therein carbon and fluorine and a second gas having therein carbon and fluorine, to etch the lens material layer and the mask layer and transfer the lens shapes of the mask layer to the lens material layer, thereby forming the micro lenses.

Abstract: A method of fabricating a one-way transparent optical system by which external light is effectively intercepted and internal light passes nearly without loss is provided. The method includes: forming a silver halide on a transparent substrate; aligning a mask in which a predetermined pattern is formed, on the transparent substrate and exposing the silver halide using the mask; developing and fixing the exposed silver halide and forming a plurality of light-absorbing materials on the transparent substrate; and forming protrusion structures having a shape of a convex lens shape for refracting incident light toward a corresponding light-absorbing material of the light-absorbing materials, on the transparent substrate on which the light-absorbing materials are formed.

Abstract: The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of a plurality of Mo/Si pair layers is provided upon the front surface of an EUV collector mirror, and blazed grooves are formed in this composite layer. Radiation emitted from a plasma is incident upon this EUV collector mirror, and is reflected or diffracted. The reflected EUV radiation (including diffracted EUV) proceeds towards an intermediate focal point IF. The radiation of other wavelengths proceeds towards some position other than this focal point IF, because its reflection angle or diffraction angle is different. A SPF shield having an aperture portion is provided at the focal point IF. Accordingly, only the EUV radiation passes through the aperture portion and is supplied to the exposure device, while the other radiation is intercepted by the shield.

Abstract: Methods of making MEMS devices including interferometric modulators involve depositing various layers, including stationary layers, movable layers and sacrificial layers, on a substrate. A non-planar surface is formed on one or more layers by flowing an etchant through a permeable layer. In one embodiment the non-planar surface is formed on a sacrificial layer. A movable layer formed over the non-planar surface of the sacrificial layer results in a non-planar interface between the sacrificial and movable layers. Removal of the sacrificial layer results in a released MEMS device having reduced contact area between the movable and stationary layers when the MEMS device is actuated. The reduced contact area results in lower adhesion forces and reduced stiction during actuation of the MEMS device. These methods may be used to manufacture released and unreleased interferometric modulators.

Abstract: Instances of data-storage media having pits and lands, such as individual DVDs or CDs, are manufactured by selectively illuminating a light-curable material to form cured regions corresponding to the lands. The selective illumination of the light-curable material can be implemented using mask-based illumination or selective laser illumination or both. The mask used in mask-based illumination can have one or more extra opaque portions and/or one or more extra transparent portions corresponding to false pits and/or false lands, respectively, where selective laser illumination is used to convert one or more false pits/lands produced during mask-based illumination into true pits/lands for the competed medium.

Abstract: Method for removing contaminants from a surface during semiconductor fabrication. A preferred embodiment comprises developing a resist layer on a top surface of a semiconductor substrate, curing the developed resist layer, and cleaning the developed resist layer with a developer solution to remove contaminants. The cleaning makes use of the same developer solution used to develop the resist layer, so the cleaning makes use of a process that already exists and requires no additional investment to implement, while the curing stabilizes the developed resist layer so that the cleaning does not damage the developed resist layer.

Abstract: To provide a manufacturing method of an optical waveguide device which is capable of suppressing the surface roughening of core side surfaces of an optical waveguide when the optical waveguide is formed on a surface of a metal substrate. An under cladding layer 2 containing an irradiation light absorbing agent is formed on a surface of a metal substrate 1 which is a roughened surface. Alternatively, an irradiation light absorbing layer is formed prior to the formation of the under cladding layer free from the irradiation light absorbing agent. In a subsequent step of forming cores 3, irradiation light directed onto a photosensitive resin layer for the formation of the cores 3 and transmitted through the photosensitive resin layer is absorbed or attenuated in the under cladding layer 2 containing the above-mentioned irradiation light absorbing agent or in the irradiation light absorbing layer.

Abstract: By using an existing, relatively inexpensive manufacturing device, micropatterns (e.g. guiding grooves, prepits) having such track pitch and pit pitch that are smaller than the diameter of a light spot are formed more finely. There are provided at least two layers, i.e. (i) a resin substrate and (ii) a depressed part inducing layer made of dielectric material or metal oxide. A light beam is radiated and focused onto the depressed part inducing layer so as to form pit parts and/or guiding grooves on irradiated parts of the resin substrate. The depressed part inducing layer is then removed, so as to expose the pit parts and/or guiding grooves.

Abstract: A method for fabricating micro-lenses and a method for fabricating micro-lenses by photolithography are provided. The method includes forming a plurality of micro-cavities in a substrate, filling lens material into each of the micro-cavities, and heating the lens material, thereby reflowing the lens material so as to form a plurality of micro-lenses in the substrate. The micro-cavities define a boundary of each of the micro-lenses formed by reflowing the lens material, thereby preventing adjacent micro-lenses from fusing together by reflowing when overheated. The process uses negative photoresist and positive photoresist as micro-cavities and lens material respectively, thereby streamlining the fabrication method and its steps.

Abstract: Novel photoresist materials, which can be photolithographically processed in biocompatible conditions are presented in this invention. Suitable lithographic scheme for the use of these and analogous resists for biomolecule layer patterning on solid substrates are also described. The processes described enable micropatterning of more than two different proteins on solid substrates without denaturation of the proteins. The preferred resist materials are based on (meth)acrylate copolymers that contain at least one acid cleavable ester group and at least one hydrophilic group such as an alcoholic or a carboxylic group.

Abstract: An airway adapter that comprises a housing and a pressure transducer. The housing comprises a flow path having a first end and a second end, a first pressure port that communicates with the flow path, and a second pressure port that communicates with the flow path. The first pressure port is spaced apart from the second pressure port. The flow restriction is disposed in the flow path between the first and second pressure ports that creates a pressure differential therebetween. The pressure transducer generates a signal that reflects the differential pressure created by the flow restriction between the first and second pressure ports, wherein the pressure transducer comprises an optical interferometer.

Abstract: Two methods are presented in order to properly compensate the changes of the optical characteristics, which are caused by the optical path length change. First, a path length compensation method in which the additional optical path length, equivalent to the dicing kerf width of the substrate, is added onto the diced-to-be waveguide part of the AWG chip during the waveguide design process and fabrication process so that the compensated optical path length is maintained even after dicing. In addition, a position compensation method is provided in which an additional waveguide is added at the position shifted by a distance equivalent to the kerf width of the substrate such that the additional waveguide undergoes the minimized path length change after dicing is performed.

Abstract: There is provided a method for producing highly purified fused aromatic ring compounds with high yield by a simpler method. A method for producing a fused aromatic ring compound comprising irradiating the bicyclo compound containing at least one bicyclo ring represented by formula (1) in a molecule with light to detach a leaving group X from a residual part to form an aromatic ring: wherein R1 and R3 each denotes a group to form an aromatic ring or a heteroaromatic ring which may be substituted, together with a group to which each thereof is bonded; R2 and R4 each denotes a hydrogen atom, an alkyl group, an alkoxy group, an ester group or a phenyl group; and X is a leaving group, which denotes a carbonyl group or —N?.

Abstract: Methods of fabricating optical elements that are encapsulated in monolithic matrices. The present invention is based, at least in one aspect, upon the concept of using multiphoton, multi-step photocuring to fabricate encapsulated optical element(s) within a body of a photopolymerizable composition. Imagewise, multi-photon polymerization techniques are used to form the optical element. The body surrounding the optical element is also photohardened by blanket irradiation and/or thermal curing to help form an encapsulating structure. In addition, the composition also incorporates one or more other, non-diffusing binder components that may be thermosetting or thermoplastic. The end result is an encapsulated structure with good hardness, durability, dimensional stability, resilience, and toughness.

Abstract: Provided is a stamper for producing a multilayer optical recording medium, which can be produced in simple steps and can be repeatedly used. Particularly, provided is a stamper for producing a multilayer optical recording medium, including: a translucent substrate; and a translucent inorganic resist layer in which a pit or a guide groove is formed on the substrate. Further, the stamper has an absorptivity of 10% or more with respect to exposure light which is used in patterning the inorganic resist layer, and has a transmittance of 19% or more with respect to an ultraviolet ray which is used when the stamper is used. Furthermore, the inorganic resist layer contains a tungsten oxide or a molybdenum oxide having a composition in which oxygen is lost from a stoichiometric composition.

Abstract: A method of fabricating a LCD device comprises preparing a substrate having a plurality of LCD panel regions within main exposure regions, performing a main exposure process at the LCD panel regions to define a non-exposure region between the main exposure regions; and performing a sub exposure process at the non-exposure region formed between the main exposure regions.

Abstract: An optical waveguide and process for forming an optical waveguide are provided. The optical waveguide includes a first cladding layer; a first waveguide core formed on the first cladding layer, the first waveguide core comprising a first long period grating formed in at least one sidewall of the first waveguide core; and a second cladding layer formed over the first waveguide core. The process for forming an optical waveguide includes forming a first waveguide core on a surface of a first cladding layer; patterning the first waveguide core with a long period grating that is perpendicular to a surface of the first cladding layer; and forming a second cladding layer on the first cladding layer so as to cover the first waveguide core.

Abstract: An antireflection film that has sufficient antireflection capability and antifouling property and is improved in scratch resistance, and a process for producing an antireflection film with considerably high productivity are provided, which is an antireflection film comprising a transparent support, a hard coat layer and a low refractive index layer, in this order, wherein the hard coat layer includes a polymerized product of (A) an ethylene oxide or propylene oxide adduct of a polyfunctional acrylate monomer and (B) a polyfunctional acrylate monomer having no oxide adduct.

Abstract: An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.