Abstract: A method of optical fabrication comprises coating a substrate with a photocuring material, controlling the application of light to the photocuring material so as to control the intensity and pattern of the light both in-plane and out of plane, and developing the photocuring material.

Abstract: The invention provides a fluorescence microscope and a method for using this to measure fluorescence. The microscope comprises a silicon wafer filter membrane which is highly-planar and does not fluoresce. Moreover, it has a very high perforation density, so that a small surface area is sufficient for effective measurement. Using a camera as the location-sensitive detector moreover makes it possible to take advantage of better optical resolution, which means that optics having a smaller numerical aperture and a smaller magnification factor can be employed, with a greater working distance. All these factors together provide a fluorescence microscope capable of much more rapid measurements than the existing fluorescence microscopes.

Abstract: While gold wire grids have been used to polarize infrared wavelengths for over a hundred years, they are not appropriate for shorter wavelengths due to their large period. With embodiments of the present invention, grids with periods a few tens of nanometers can be fabricated. Among other things, such grids can be used to polarize visible and even ultraviolet light. As a result, such wire grid polarizers have a wide variety of applications and uses, such as, e.g., in the fabrication of semiconductors, nanolithography, and more.

Abstract: Optical fibers and optical fiber lasers including gratings and methods of writing gratings into fibers. A method can comprise providing a photosensitive optical fiber having a region having an original refractive index (RI) profile along the elongate direction of the fiber; exposing the optical fiber to actinic radiation to alter the original RI profile to form along a length of the fiber a grating having a RI profile including alternating higher RI and lower RI sections; and wherein the maximum RI difference between a RI of a higher RI section and a RI of an adjacent lower RI section of the grating RI profile is no greater than 85% of the difference between the average index of the grating RI profile and the original RI profile.

Abstract: A new fiber position monitoring method for sequential FBG UV-writing processes with a reference phase mask as the phase reference is proposed. Also, the new method by probing a reference phase mask can overcome the optical alignment difficulties in using reference fiber as well as provide more signal power for achieving better monitoring accuracy. Moreover, the present invention provides a method for sequentially joining a plurality of grating sections into a fiber grating longer than a phase mask.

Abstract: A main object of the present invention is to provide a method for manufacturing a microlens that can easily form a microlens having a smooth shape, in which a maximum thickness position is different from a gravity center position. To attain the object, the present invention provides a method for manufacturing a microlens comprising processes of: a basic shape forming-exposure process for performing exposure by using a microlens basic shape-forming mask to a photosensitive resin layer formed on a substrate; and a deforming-exposure process for performing exposure, with a unit cell-exposure profile different from that of the exposure performed in the basic shape forming-exposure process, to the photosensitive resin layer by using a microlens-shape-adjusting mask, wherein a microlens, having a maximum thickness position different from a gravity center position is formed.

Abstract: Imaging layers, imaging media, and methods of preparation of each, are disclosed.

Abstract: Composites, methods, and systems for production of multi-color images which are developable at various wavelengths are disclosed and described. The color forming composite can include a first color forming layer having a first polymer matrix, a first color former, and a first developer where the first color former and the first developer can be in separate phases within the first color forming layer; a second color forming layer having a second polymer matrix, a second color former, and a second developer where the second color former and the second developer can be in separate phases within the second color forming layer; and at least one radiation absorber. The radiation absorber can be present in at least one of the first or second color forming layers. Additionally, the first color forming layer can have a first extinction coefficient that is higher than the second extinction coefficient of the second color forming layer.

Abstract: A method for preparing a photonic crystal slab waveguides is disclosed, wherein the photonic crystal slab waveguides are prepared by combining near-field phase-shifting contact lithography (NFPSCL) with interference lithography (IL). Conventional methods used for preparing the photonic crystal slab waveguides, such as electron beam lithography or direct laser writing, are time consuming. In contrast, the present method allows rapid production of many photonic crystal slab waveguides over a large area composed of microstructures.

Abstract: There is provided a photosensitive resin composition for forming an optical waveguide which has high shape precision and excellent transmission characteristics under high temperature and high humidity. A composition of the present invention contains (A) a polymer having structures represented by the following general formulae (I) and (2) (in the formulae, each of R1 and R2 is independently a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R3 is an organic group containing a radical-polymerizable reactive group; X is a single bond or a bivalent organic group; and Y is a non-polymerizable organic group), (B) a compound having at least one ethylenic unsaturated group in the molecule thereof, having a molecular weight below 1,000 and having a boiling point of at least 130° C. at 0.1 MPa, and (C) a photoradical polymerization initiator.

Abstract: The invention is directed to black conductive composition(s), black electrodes made from such compositions and methods of forming such electrodes. In particular, the invention is directed to flat panel display applications, including alternating-current display panel applications. Still further, the invention is directed to composition(s) utilizing conductive metal oxides selected from an oxide of two or more elements selected from Ba, Ru, Ca, Cu, Sr, Bi, Pb, and the rare earth metals and photocrosslinkable polymers. These compositions are particularly useful in making photoimageable black electrodes for flat panel display applications.

Abstract: A method for manufacturing a pattern of a light shielding layer and a patter forming body of light shielding layer. After placing a photocatalyst containing layer side substrate having a base material and a photocatalyst containing layer, and a pattern forming body substrate having a substrate and a property changing layer, the property of an exposed part changes by the action of a photocatalyst in a photocatalyst containing layer, to form a wettability pattern having a lyophilic region and a liquid repellent region on the property changing layer. A light shielding layer composition is coated on the whole surface of the pattern forming body substrate on which the above-mentioned wettability pattern is formed, adhering and solidifying a light shielding layer composition only to the lyophilic region, to form a light shielding layer pattern.

Abstract: Thermal 3-D microstructuring of photonic structures is provided by depositing laser energy by non-linear absorption into a focal volume about each point of a substrate to be micromachined at a rate greater than the rate that it diffuses thereout to produce a point source of heat in a region of the bulk larger than the focal volume about each point that structurally alters the region of the bulk larger than the focal volume about each point, and by dragging the point source of heat thereby provided point-to-point along any linear and non-linear path to fabricate photonic structures in the bulk of the substrate. Exemplary optical waveguides and optical beamsplitters are thermally micromachined in 3-D in the bulk of a glass substrate. The total number of pulses incident to each point is controlled, either by varying the rate that the point source of heat is scanned point-to-point and/or by varying the repetition rate of the laser, to select the mode supported by the waveguide or beamsplitter to be micromachined.

Abstract: The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting the pattern to modulator signals, and feeding the signals to the modulator. An electronic control system may be provided to control a trigger signal to compensate for flash-to-flash time jitter in the light source.

Abstract: A method of manufacturing an optical waveguide device which is capable of connecting light-receiving and light-emitting elements mounted on a board and an optical waveguide to each other with high accuracy. Insulation layers are formed on a first surface of a metal substrate. A first photomask is positioned by using an alignment mark formed in the metal substrate, and exposure to light and development are performed to form conductor layers. A second photomask is positioned on a second surface of the metal substrate opposite from the first surface by similarly using the above-mentioned alignment mark, and exposure to light and development are performed to form an opening for optical coupling between a light-emitting element and an optical waveguide film. The light-emitting element is mounted on pads of the conductor layers, and the optical waveguide film is fixed to the metal substrate using the optical coupling opening.

Abstract: A lens structure and methods of forming the lens structure are disclosed. The method includes attaching a lens block to a substrate such that gravitational force acts to push the lens block against the substrate. The substrate is positioned such that gravitational force acts to pull the lens block from the substrate. The lens block is then heated such that gravity and surface tension of the block forms the lens structure.

Abstract: An optical integrated device comprises a substrate and a waveguide formed on a surface of the substrate. The waveguide includes a lower clad layer, a core layer formed on the lower clad layer and having a refractive index greater than that of the lower clad layer, and an upper clad layer formed on the core layer and having a refractive index smaller than that of the core layer. The waveguide further includes a straight waveguide part and a bending waveguide part curved in a plane parallel to the surface of the substrate. The lower clad layer in the bending waveguide part projects from the substrate by a projection height greater than that of the lower clad layer in the straight waveguide part.

Abstract: A manufacturing method of a minute structure having fine structures on opposing inner surfaces, includes the steps of forming a first pattern in a surface of a first layer, forming a sacrificial layer on the patterned surface of the first layer, forming a second pattern on a surface of the sacrificial layer, forming a second layer on the sacrificial layer and a portion of the surface of the first layer, and removing a member constituting the sacrificial layer. In the step of forming the first pattern on the first layer and the step of forming the second pattern on the sacrificial layer, the patterns are formed using the same alignment marks as references. This manufacturing method can realize highly accurate alignment even when plural lenses or DOEs are used.

Abstract: A method for manufacturing an image sensor is provided. The method includes forming a metal pad on a pad region of a semiconductor substrate having an active region and the pad region, forming a metal pad opening by forming a passivation layer on an entire surface of the semiconductor substrate including the metal pad and selectively removing the passivation layer to expose the metal pad, forming a color filter array on the passivation layer of the active region by removing a photosensitive layer used for forming the color filter array through an ashing process using an end point detection method, and forming a microlens on the color filter layer.

Abstract: In one embodiment, the invention provides a method for manufacturing an array of interferometric modulators. Each interferometric modulator comprises first and second optical layers which when the interferometric modulator is in an undriven state are spaced by a gap of one size, and when the interferometric modulator is in a driven state are spaced by a gap of another size, the size of the gap determining an optical response of the interferometric modulator.

Abstract: A photopolymerization process for producing pigmented and non-pigmented articles comprises irradiating with electromagnetic radiation in the range from 190 to 600 nm, or with electron beam or with X-rays a photosensitive composition which can be developed by alkali solution which composition comprises (A) a polymer containing at least one carboxylic acid group in the molecule and having a molecular weight of 200,000 or less, (B) selected ?-aminoalkylphenone compounds as photoinitiators and (C) an ester of a polyol, wherein the polyol is partially or fully esterified with an ethylenically unsaturated carboxylic acid a monomeric, oligomeric or polymeric compound having at least one olefinic double bond.

Abstract: A method for producing a fine structure includes: (a) forming a photosensitive film to cover a plurality of first convex portions formed in at least one surface of a substrate; (b) arranging liquid to cover the photosensitive film on the at least one surface of the substrate; (c) arranging a transparent parallel plate such that the parallel plate opposes the substrate via the liquid; (d) generating interference field by a laser beam to irradiate the interference field onto the photosensitive film via the parallel plate and the liquid; (e) removing the liquid and the parallel plate to develop the photosensitive film so as to form a photosensitive film pattern; and (f) etching the substrate using a mask of the photosensitive film pattern to form a plurality of fine convex portions smaller than the first convex portions on the at least one surface of the substrate.

Abstract: A process of forming a deflection mirror in a light waveguide with a use of a dicing blade having a cutting end with a flat top cutting face and at least one slanted side cutting face. The process includes a cutting step of cutting a surface of the light waveguide to a depth not greater than a width of the flat top cutting face, thereby forming a groove in the surface of the light waveguide. The groove has a slanted surface which is formed by the slanted cutting face to define the deflection mirror in the waveguide.

Abstract: A method of manufacturing a structure that includes a mask forming step for forming, on a monocrystal silicon substrate, a base etching mask corresponding to a target shape and a correction etching mask having a joint connecting to the base etching mask, and a target shape forming step for forming the target shape by anisotropically etching the silicon substrate, wherein, in the mask forming step, a lowered-strength portion where a mechanical strength is locally decreased is formed at least in a portion of the joint of the correction etching mask.

Abstract: A method for manufacturing the image sensor includes: forming a photoresist layer on a surface of an image sensor; exposing and developing the photoresist layer using a mask used for fabricating a plurality of micro-lenses, which has a number of first light shielding patterns aligned apart from one another and a number of second light shielding patterns, each being formed at a part, on which four adjacent edges of the first light shielding patterns are centered, so that a photoresist pattern is formed; and reflowing the photoresist pattern to fabricate a plurality of micro-lenses and a concave lens at each part, on which four adjacent edges of the micro-lenses are centered.

Abstract: A method for manufacturing an information storage medium in which information is stored as a concave-convex pattern includes forming an inorganic-resist master disc by depositing on a substrate an inorganic resist layer reactive to thermal reaction associated with laser beam irradiation, recording on the inorganic-resist master disc by differentiating depths of thermal reaction portions in the inorganic resist layer by inputting information to be stored in the information storage medium and varying power of the laser beam striking the inorganic-resist master disc over at least three levels according to the input information, forming an information storage master disc having a concave-convex pattern in the inorganic resist layer by developing the recorded inorganic-resist master disc, forming a stamper to which the concave-convex pattern formed on the inorganic resist layer has been transferred on the basis of the information storage master disc, and forming the information storage medium using the stamper.

Abstract: Provided is a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern with a smaller number of process steps, and a method of forming a pattern using such photosensitive silane coupling agent. Used is a photosensitive silane coupling agent having a secondary amino group protected by an o-nitrobenzyloxycarbonyl group.

Abstract: A method, apparatus and system providing a microlens having a substantially flat upper surface and having a plurality of holes arranged in a pattern in a microlens material which produces a focal point at a desired location.

Abstract: An optimized color filter array is formed in, above or below one or more damascene layers. The color filter array includes filter regions which are configured to optimize the combined optical properties of the layers of the device to maximize the intensity of the particular wavelength of light incident to a respective underlying photodiode.

Abstract: An optical element includes plural multilayer mirrors, wherein the multilayer mirrors are renewable.

Abstract: Provided is an optical fiber illuminator used for recording and reading high density optical information according to a near field recording (NFR) scheme, a method of fabricating the optical fiber illuminator, and an optical recording head and recording apparatus having the optical fiber illuminator. The optical fiber illuminator includes: an optical fiber having a core upon which light is incident and a clad that surrounds the core, one end of the optical fiber having a mirror formed in an inclined manner; and a lens formed on an outer surface of the optical fiber for focusing light reflected by the mirror. The optical fiber illuminator has an improved optical arrangement for optical illumination and detection, it is easy to manufacture, its optical input is easy to control, and it can be readily provided in an array form.

Abstract: An optical structure is provided. The optical structure includes a substrate structure. A photosensitive material layer is positioned on said substrate structure. The photosensitive material layer having uniform periodic geometry and a period length throughout associated with a 2D periodic pattern. The 2D periodic pattern includes a period length greater than the exposing light wavelength and spatial variation in the duty cycle of the features of a mask layer used in the formation of said 2D periodic pattern.

Abstract: An optical element has a plurality of structures including convex portions or concave portions arranged on a base member surface, wherein the arrangement pitch of the structures is 380 nm to 680 nm and the aspect ratio of the structure is 0.62 to 1.09.

Abstract: The present invention provides a method for manufacturing an EL element, capable of preferably carrying out the peeling operation at the time of peeling off an unnecessary layer such as a photoresist layer. This object is achieved by providing a method for manufacturing an EL element comprising: an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a peeling layer on the organic EL layer; a photoresist layer forming process of forming a photoresist layer on the peeling layer; a photoresist layer patterning process of patterning the photoresist layer by exposing and developing; an organic EL layer developing process of removing the organic EL layer of a part not covered with the photoresist layer; and a peeling layer peeling process of removing the photoresist layer laminated thereon by peeling off the peeling layer.

Abstract: An optical disk has a first and a second intermediate disk structure. The first structure includes at least a first transparent substrate, a first recording layer, and a first reflective layer. The first substrate has a first surface and a second surface. The first surface is a beam incidence surface for a laser beam in recording or reproduction of data. The second surface has a first concave section and a first convex section formed thereon. The first recording layer and the first reflective layer are stack in order on the second surface via the first concave and convex sections. The second structure includes at least a second substrate, a second reflective layer, and a second recording layer. The second substrate has a second concave section and a second convex section formed thereon. The second reflective layer and the second recording layer are stack in order on the second substrate via the second concave and convex sections.

Abstract: The invention provides systems and methods enabling high fidelity quantum communication over long communication channels even in the presence of significant loss in the channels. The invention involves laser manipulation of quantum correlated atomic ensembles using linear optic components (110, 120), optical sources of low intensity pulses (10), interferers in the form of beam splitters (150), and single-photon detectors (180, 190) requiring only moderate efficiencies. The invention provides fault-tolerant entanglement generation and connection using a sequence of steps that each provide built-in entanglement purification and that are each resilient to realistic noise levels. The invention relies upon collective rather single particle excitations in atomic ensembles and results in communication efficiency scaling polynomially with the total length of the communication channel.

Abstract: A multi-channel dispersion compensator comprising an optical signal waveguide that forms an input end for receiving an optical signal and an output end for providing a filtered optical signal. The multi-channel dispersion compensator also includes a series of closed-loop resonators providing frequency delay to at least one channel of the optical signal. The optical signal waveguide and each closed-loop resonator form a tunable coupler having a coupling value. The coupling value for each tunable coupler is selected to minimize constant dispersion and linear slope dispersion of the optical signal. Methods of fabrication and use are also described.

Abstract: A production device and a production method for a grating-type optical component enabling formation of a variety types of FBGs using a single phase mask and an optical component made by the production method or production device for a grating-type optical component are provided. The method involves diffusing at least one of hydrogen or deuterium into an optical fiber and altering the refractive index of the optical fiber by irradiating the fiber with non-interfering UV lamp light.

Abstract: Disclosed is an optical disk, card or media which comprises: a) a plurality of data structures that are readable by the interrogating beam of light; and b)a composition on or in the optical disk, card or media disposed so that when the optical disk, card or media is used in the optical read-out system, the interrogating beam of light passes through the composition before or after contacting some or all of the data structures. The composition comprises a polymeric matrix with an organometallic complex dissolved therein or with metal, transition metal, metal oxide or transition metal oxide nanoparticles uniformly dispersed therein. The composition is substantially transparent to the interrogating beam and/or is substantially colorless.

Abstract: An optical device includes a transparent thin film containing silicon, oxygen, carbon and hydrogen as main components, wherein the film includes local regions of a relatively high refractive index and local regions of a relatively low refractive index.

Abstract: A coloring matter absorbing a near-infrared ray which comprises a diimonium salt containing a sulfonimide as an anion moiety, represented by the general formula (1): wherein R may be the same or different and represents a moiety selected from the group consisting of an alkyl group, a halogenated alkyl group, a cyanoalkyl group, an aryl group, a hydroxyl group, a phenyl group, and a phenylalkylene group, and R1 and R2 may be the same or different and each represent a fluoroalkyl group, or together form a fluoroalkylene group. The coloring matter absorbing a near-infrared ray is excellent in the resistance to heat and moisture, and thus exhibits an ability of absorbing a near-infrared ray not lowering for a long period of time.

Abstract: A method of fabricating an external light blocking film for a display device is provided. The method includes a step of applying a curable resin in which a photochromic colorant is mixed on a backing of a transparent resin; a step of disposing a photo-mask having a predetermined pattern on the curable resin and then irradiating the photochromic colorant through the photo-mask with light having a first wavelength which makes the photochromic colorant color-changed; a step of removing the photo-mask and then curing the curable resin. The method can improve fabrication efficiency.

Abstract: An object of the present invention is to provide a silver paste composition suitable for use in laser direct imaging devices employing a light source emitting a laser having a maximum wavelength of 350 to 420 nm, useful in forming a high-definition conductive pattern efficiently, and superior in storage stability, a conductive pattern formed by using the composition, a plasma display having the pattern, and a method of forming the conductive pattern by using the composition. An alkali development-type silver paste composition of the present invention comprises (A) a carboxyl group-containing resin, (B) a glass frit, (C) a silver powder, (D) a compound having at least one radically polymerizable unsaturated group in its molecule, and (E-1) an oxime-based photopolymerization initiator represented by the following general formula (I).

Abstract: Object To provide a diffractive optical element manufacturing method through which a high-precision diffractive optical element is formed to assure an improvement in the diffraction efficiency. Means for Solving the Problems A diffractive optical element assuming cyclical stage patterns is manufactured through a procedural sequence of steps of exposing and developing a substrate 1 with a resist 2 applied thereupon by using a mask to form a resist pattern and then repeatedly etching the substrate by using resist pattern. In a first process, a pattern defining widths matching the widths of the stages to be formed is formed and greater pattern widths are set for subsequent processes.

Abstract: Aspects of the invention can provide a patterning forming method capable of patterning a thin film by a simple and inexpensive device. The thin film can be provided on a base member including a photothermal conversion material that converts optical energy into thermal energy and light is radiated onto the base member to remove the thin film corresponding to a light-radiated region, such that the thin film is patterned.

Abstract: A photoplate for manufacturing a deposition mask that is used to form a matrix of pixel areas used in a display panel. The photoplate comprises a layer of material such as quartz, on which a matrix of pixel etching areas is defined. The pixel etching areas are configured to form pixel areas having a specified separation from each other in a vertical direction. The pixel etching areas on the photoplate include an outer periphery having a generally rectangular shape with elongated corners.

Abstract: Vacuum compatible high frequency electromagnetic and millimeter wave source components, devices and methods of micro-fabricating such components and devices are disclosed. Embodiments of the methods may include using a UV-curable photoresist, such as SU-8 to form structures having height up to and exceeding 1 mm. High frequency electromagnetic wave sources including the inventive high frequency electromagnetic wave source components are also disclosed.

Abstract: At least one plasma display panel having barrier ribs for partitioning discharge cells is manufactured from first and second substrates. The manufacturing method includes forming the barrier ribs according to a process including forming a barrier rib forming layer on the first substrate, forming a resist covering the barrier rib forming layer, patterning the resist to form openings thereof corresponding to a predetermined discharge cell pattern, etching the barrier rib forming layer according to the resist pattern, and baking the etched barrier rib forming layer. During the patterning of the resist, an area of an opening distal from a center of the first substrate is formed different from an area of an opening in the vicinity of the center of the first substrate.

Abstract: In general, in a first aspect, the invention features a method that includes forming a first layer comprising a first material over a surface of a second layer, wherein forming the first layer includes sequentially forming a plurality of monolayers of the second material over the surface of the second layer, the second layer comprises a plurality of rows of a second material extending along a first direction and spaced from one another in a second direction orthogonal to the first direction, and the first layer conforms to the surface of the second layer.

Abstract: The invention provides a dye-containing curable composition that has the property of high sensitivity, and that even when formed into a thin film at high dye concentration, excels in patternability, and is free from dye elution and ensures high productivity; and a color filter making use of the dye-containing curable composition and a method for producing the same. The dye-containing curable composition contains an organic-solvent-soluble dye (A) and a curing agent (C), wherein a content of the organic-solvent-soluble dye (A) is 45% by mass or more based on a total solid content and a content of the curing agent (C) is 20% by mass to 55% by mass based on the total solid content.