Abstract: A method of manufacturing a liquid crystal display device is provided. The method of manufacturing a liquid crystal display device includes performing an overlapping partitioned exposure process in one or two processes selected from a mask process of forming a gate line, a mask process of forming an active layer, a mask process of forming a source/drain electrode and a mask process of forming a contact hole on a passivation layer.

Abstract: Provided are a positive resist composition for recording medium master showing excellent plating resistance and adhesion to a base plate such as glass or the like characterized by containing a vinyl polymer which has a monomer unit having an alkali-soluble group blocked by an alkyl vinyl ether, and a method of producing a recording medium master or stamper using this positive resist composition.

Abstract: A method for manufacturing a light guide plate includes the following steps: (12) providing a photo mask having certain patterns of dots associated therewith; (16) using the photo mask to form an imprinting stamper; and (18) using the imprinting stamper to imprint an original light guide plate, thereby forming a light guide plate having the certain pattern of dots. The dots on the light guide plate manufactured by the present method are fine (i.e., with respect to microstructure), due to a high precision of the imprinting stamper. This precision can result in substantial or even entire uniformity of emitted light beams from the light guide plate. Thus, liquid crystal display devices adopting the light guide plate can provide satisfactory display quality. Therefore, the present method can be advantageously applied in manufacturing the light guide plate used in the liquid crystal display devices.

Abstract: Thermo-optical devices providing heater recirculation in an integrated optical device are described. The thermo-optical devices include at least one waveguide having a non-linear path length in thermal communication with a thermal device. Methods of fabrication and use are also disclosed.

Abstract: A photosensitive resin composition according to the present invention includes: a copolymer having a repeating unit having a thermal crosslinking group; and a photosensitive agent. As such, the photosensitive resin composition according to the present invention can form a resin with improved heat resistance. Further, a microlens-forming photosensitive resin composition according to the present invention includes: a copolymer having a repeating unit having a thermal crosslinking group; and a photosensitive agent, the copolymer having a mass-average molecular weight of 10,000 to 30,000. As such, the microlens-forming photosensitive resin composition according to the present invention can form a resin with improved heat resistance.

Abstract: A photo-conductor layer for constituting a radiation imaging panel, which photo-conductor layer is capable of recording radiation image information as an electrostatic latent image, is produced. The photo-conductor layer contains a Bi12MO20 sintered material, in which M represents at least one kind of element selected from the group consisting of Ge, Si, and Ti. Sintering processing for the formation of the Bi12MO20 sintered material is performed in an inert gas, atmosphere. Alternatively, the sintering processing is performed at a sintering temperature falling within the range of 800° C. to 900° C. and in an atmosphere, in which an oxygen partial pressure PO2 (Pa) satisfies the condition 10?3?PO2?10?1.

Abstract: The present invention relates to a photoalignable material comprising a photoactive stilbazolium-containing polymer of formula I: wherein, Ma, Mb, Mc are monomer units making up the polymer; x, y, z, are mole fractions of the monomer units Ma, Mb, Mc, wherein in each case 0<x?1; 0?y<1, 0?z<1; Sa and Sb are spacer units; Za is a stilbazolium unit which can undergo photochemical isomerization/dimerization reactions; Zb is a stilbazole unit, and n varies from 4 to 10,000. The present invention also relates to a display using a layer of the photoaligned material and methods for aligning the orientation layer as well as orienting a liquid crystal layer applied to the photoaligned orientation layer.

Abstract: The invention relates to an alternative composite mask that is substantially composed of a transparent support film coated with a transparent polymer matrix that contains light-absorbing pigment particles or metal particles having an average particle size d50 ranging between 0.5 and 10 ?m.

Abstract: A method for manufacturing electrodes of a plasma display panel includes providing a front transparent substrate including transparent electrodes on the front transparent substrate, coating a black photosensitive paste film and a main photosensitive conductive paste film of negative-working type on the transparent electrodes, exposing the black photosensitive paste film and main photosensitive conductive paste film to define bus electrodes on the transparent electrodes, wherein exposure energy acting on main regions of the bus electrodes is greater than exposure energy acting on edge regions of the bus electrodes, developing the black photosensitive paste film and main photosensitive conductive paste film to form the bus electrodes, in which a thickness of the edge regions of the bus electrodes is less than a thickness of the main regions of the bus electrodes, and firing the black photosensitive paste film and main photosensitive conductive paste film.

Abstract: A sulfide phosphor paste composition comprising a sulfur-containing dispersant, and a fluorescent film prepared therefrom, are provided. The sulfur-containing dispersant has a dual head structure containing both a carboxyl group and a thiol group or a structure containing a thiol or thiophene group as a head group. An oligomeric sulfur-containing dispersant is also provided. Adsorption of the dispersant on the surface of the sulfide phosphor prevents aggregation of the phosphor particles, and thereby improves the dispersibility of the sulfide phosphor paste composition, the homogeneity of the phosphor in the paste composition, and the density of a film produced from the paste composition. Fluorescent films and display devices produced from the phosphor paste composition exhibit improved luminescent properties and excellent processability.

Abstract: A method for manufacturing micro-lenses of image sensors includes providing a semiconductor substrate having at least a planarization layer, performing a first photolithography process to form a first set of micro-lens blocks on the planarization layer, performing a first baking process to form a first set of micro-lenses, performing a first surface treatment to harden surfaces of the first set of micro-lenses, performing a second photolithography to form a second set of micro-lens blocks on the planarization layer, and performing a second baking process to form a second set of micro-lenses.

Abstract: A method of manufacturing a device includes the steps of (i) providing a near-field photomask including a light shield film for constituting a light shield portion and openings formed in the light shield film, wherein the openings include two or more parallel first slit openings lengthening in a first direction and a second slit opening lengthening in a second direction that is perpendicular to the first directions, wherein the second slit opening interlinks the first slit openings, (ii) forming a photoresist layer on a substrate, (iii) exposing the photoresist layer to near-field light through the near-field photomask using polarized exposure light having an electrical field component parallel to the first direction, to form a latent image on the photoresist only in discrete regions at which the second slit opening crosses the light shield portion, (iv) forming a pattern of the photoresist layer based on the latent image, and (v) etching a surface of the substrate based on the pattern.

Abstract: A fabrication method of a color filter panel of a display device and the structure of the color filter panel are provided. The method includes forming a color filter layer on a substrate where the color filter layer defines an opening, forming a photosensitive layer on the color filter layer, and forming a spacer by back-exposing the photosensitive layer through the opening.

Abstract: The present invention provides a method for manufacturing hybrid microlenses of a light guiding plate using a semiconductor reflow process, comprising: a first step of aligning a mask on a substrate coated with a photoresist, wherein the mask is formed with a first region through which light can be transmitted and a plurality of second regions through which light cannot be transmitted, and the second regions have different sizes and shapes to form hybrid arrays; a second step of performing slant light exposure and vertical light exposure at least once in such a manner that light radiated from the top to the bottom of the second regions forming the hybrid arrays has an unsymmetrical inclination angle in at least one direction; a third step of developing the slant light-exposed substrate to obtain hybrid photoresist posts with various sizes and shapes; a fourth step of performing a reflow process to allow the hybrid photoresist posts to be curved so that a hybrid microlens pattern can be obtained; a fifth step

Abstract: A light shielding film for a display device, comprising a polymer binder, metal particles dispersed in the polymer binder, and a compound including a sulfur atom or a nitrogen atom. A substrate for a display device comprising the light shielding film. And a color filter comprising the light shielding film.

Abstract: A method for manufacturing barrier ribs of a plasma display panel includes providing a substrate, forming a rib material layer on the substrate, forming a patterned photo resist on the rib material layer, and forming a plurality of barrier ribs. Therein, the patterned photo resist includes a plurality of first parallel lines and a plurality of second parallel lines intersecting and perpendicular to the first parallel lines. A thickness of the first parallel lines is thicker than a thickness of the second parallel lines.

Abstract: We are able to reduce the average process bias in a patterned reticle by treating the developed, patterned photoresist which is used to transfer a pattern to the reticle with a silicon-containing reagent prior to the pattern transfer. The process bias is a measure of the difference between a nominal feature critical dimension (CD) produced in a patterned reticle and the nominal isofocal CD for the feature. Improvement of the average process bias is directly related to an improved resolution in the mask features. The reduction in average process bias achievable using the method of the invention typically ranges from about 30% to about 70%. This reduction in average process bias enables the printing of smaller features.

Abstract: A plurality of mask images defines an optical circuit image in photoresist. Each of the mask images comprises parts of the optical circuit and the totality of all mask images together defines an optical circuit. The optical circuit is thus made up of plural optical elements some of which may be positioned in drop-in locations within the boundary of another optical circuit element. A photolithography system globally aligns and exposes the mask images in photoresist. The resultant composite image is substantially indistinguishable from a single image of the entire optical circuit. Different images for each of the mask image parts can be substituted with other images or image parts and thereby exponentially increasing the number of circuit permutations from a predetermined number of available mask images. A unique optical circuit, for example, can be generated from a pre-existing library of reticle images. The images are printed in predetermined locations on a substrate to define the desired optical circuit.

Abstract: A mask for photolithography in which a semi-transmission film is formed so that the phase difference of lights passing through a semi-transmission portion and a transmission portion of the mask for photolithography is between (?¼+2 m) ? and (¼+2 m) ? inclusive, where m is an integer. The invention makes it possible to efficiently and properly form a thin film having a multi-step structure by a single process.

Abstract: A method and apparatus to fabricate a patterned structure using a template supported on a carrier. The method includes patterning a material to conform to the patterned structure. The patterned material is cured while remaining on the template. The carrier is removable during the curing process. The template is later removed from the patterned material to obtain the patterned structure. A patterning device is also provided, which is formed by a template and a carrier releasably attached to each other. The template and the carrier can be separated from each other when the patterning device is subjected to curing of the patterned structure.

Abstract: An inorganic resist material is provided, which is an incomplete oxide of a phase-change material. The oxygen content in the inorganic resist material is lower than the stoichiometric oxygen content of a complete oxide of the phase-change material, and a general formula of the inorganic resist material is A1-xOx, in which A represents the phase-change material, and x is between 5 at. % and 65 at. %. The inorganic resist material can be used to form line patterns or recording pits with size smaller than the exposure light spot by using the laser of conventional lithography process as an exposure source.

Abstract: This invention is a method for fabricating polymer ridged waveguides by using tilted immersion lithography. It includes the steps of: 1. preparing step; 2. calculating step; 3. first tilted immersion lithography step; 4. rotating 180-degree step; 5. second tilted immersion lithography step; and 6. finishing step. By these two tilted immersion lithography steps as well as the rotating 180-degree step between them, the UV light refracts and makes the photoresist forming a 45-degree ridged waveguide. This fabricating method is simple and stable. It can reduce the fabricating time and cost. Also, it is suitable for mass production and it has wide-ranged applications.

Abstract: An optical waveguide production method for producing an optical waveguide comprising the steps of: forming an under-cladding layer and an alignment mark from the same material on a substrate; forming a thin metal film on the alignment mark; forming a first transparent photosensitive resin layer on the resultant substrate to cover the under-cladding layer and the thin metal film; positioning an exposure mask with reference to the thin metal film formed on the alignment mark; and selectively exposing a predetermined portion of the first photosensitive resin layer on the under-cladding layer via the exposure mask to form a core defined by the exposed portion of the first photosensitive resin layer.

Abstract: A method for manufacturing micro-lenses of image sensors includes providing a semiconductor substrate having at least a planarization layer, performing a first photolithography process to form a first set of micro-lens blocks on the planarization layer, performing a first baking process to form a first set of micro-lenses, performing a first surface treatment to harden surfaces of the first set of micro-lenses, performing a second photolithography to form a second set of micro-lens blocks on the planarization layer, and performing a second baking process to form a second set of micro-lenses.

Abstract: The present invention provides a transfer method and a transfer apparatus capable of making the shape and quality of a transferred layer uniform and a method of manufacturing an organic light emitting element. A transfer method includes a step of disposing a transfer substrate and an acceptor substrate so as to face each other, a transfer layer being provided on the transfer substrate, and a plurality of areas being arranged in the acceptor substrate, and transferring the transfer layer to the plurality of areas by emitting a radiation ray from the transfer substrate side. The radiation ray is shaped in a band shape, and a short-axis width in a center portion in a long-axis direction of the radiation ray is set to be larger than that in an end portion.

Abstract: A substrate is subjected to holographic exposure to a sinusoidal or half-sinusoidal resist pattern corresponding to grating groove thereon. Thereafter, the substrate and the resist pattern are subjected to a first etching step at which they are irradiated with an ion beam obliquely at an angle that is identical to the blaze angle in the presence of CF4 as an etching gas, whereby they are cut until the height of the resist is about ? of the initial value. Thereafter, the substrate is subjected to a second etching step at which the substrate is irradiated with an ion beam in the direction corresponding to the bisector of the vertex in the presence of a mixture of CF4 and O2 as an etching gas, whereby the substrate is cut until the resist disappears completely to an extent such that some overetching occurs.

Abstract: A method is provided for bonding spacers (22) to an anode (12) and/or cathode (24) of a flat panel display. The method comprises forming a black matrix layer (26) between a ductile metal layer (28) and a first display plate (12), the black matrix layer (26) and the ductile metal layer (28) defining a plurality of regions (20) surrounding a plurality of pixels (16). A cathodoluminescent material (18) is formed within each of the pixels (16) and an aluminum layer (32) may be formed on the silver layer (28) and the cathodoluminescent layer (18). A first end (52) of each of a plurality of spacers is attached to one each of the regions (20), wherein a thermocompression bonding positions the spacer (22) contiguous to the ductile metal layer (28). The second display plate (24), e.g., cathode, is attached to a second end of each of the plurality of spacers (22).

Abstract: A method for manufacturing a lens forming master includes coating an organic insulation material on a substrate to form an organic insulation layer, removing a portion of the organic insulation layer with a laser which is irradiated through a first mask to form a lens shape on a surface of the organic insulation layer, and removing portions of the organic insulation layer with a laser irradiated through a second mask to form a contact hole and a bank area in the organic insulation layer.

Abstract: A patterned structure in a wafer is created using one or more fabrication treatment processes. The patterned structure has a treated and an untreated portion. One or more diffraction sensitivity enhancement techniques are applied to the structure, the one or more diffraction sensitivity enhancement techniques adjusting one or more properties of the patterned structure to enhance diffraction contrast between the treated portion and untreated portions. A first diffraction signal is measured off an unpatterned structure on the wafer using an optical metrology device. A second diffraction signal is measured off the patterned structure on the wafer using the optical metrology device. One or more diffraction sensitivity enhancement techniques are selected based on comparisons of the first and second diffraction signals.

Abstract: A method for forming an alignment layer for a liquid crystal display device, and a method for manufacturing a liquid crystal display device using the same are disclosed. The method includes preparing a substrate, coating an alignment material on the substrate, rubbing the substrate having the alignment material coated thereon, and irradiating ultraviolet (UV) rays onto the substrate having the alignment material coated thereon. The UV rays are irradiated over at least one area of the substrate having the alignment material coated thereon.

Abstract: To make high quality long-range periodic nanostructures in a transparent or semi-transparent substrate, the transparent or semi-transparent substrate is scanned with a linearly polarized laser beam generated by a femtosecond laser and exceeding a predetermined energy/pulse threshold along a scanning path. Sub-diffraction limit structures are formed as periodic planes of modified material in the transparent or semi-transparent substrate extending along the scanning path. The modified material can then be chemically etched to form cavities.

Abstract: A phosphor coating process for a light-emitting device is described. A light-emitting diode chip is bonded on a substrate. A light-sensitive layer is formed over the light-emitting diode and the substrate. The light-sensitive layer is patterned by a photolithography process to expose an area of the light-emitting diode chip, on which desires a phosphor coating. A phosphor-adhesive material is filled on the area of the light-emitting diode chip.

Abstract: A primary object of the present invention is to provide a process for the production of a pattern-forming body, the process enabling the formation of a highly precise pattern, requiring no post-exposure treatment and being free from a fear as to the deterioration of the pattern-forming body itself because no photocatalyst is contained in the produced pattern-forming body.

Abstract: The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimization and allocation control and to optical devices such as those produced thereby.

Abstract: A micro-electro-mechanical system (MEMS) micro mirror and a method of making the same. The micro mirror includes a body having a mirror support, opposed anchor s and flexible hinges which connect the mirror support to the anchor s. The mirror support has opposed comb edges with comb fingers. Electrodes, which have comb fingers to interact with the comb fingers of the mirror support, are spaced from the comb edges. The comb fingers along each of the comb edges of the mirror support surface are positioned on different horizontal planes from and the comb fingers on the electrodes so as to maximize electrostatic actuation.

Abstract: System and method for maximizing image quality by eliminating vias on a reflective surface. A preferred embodiment comprises depositing a first portion of a mirror surface over a support surface, applying a protective coating on the mirror surface, and then inverting the via. The preferred embodiment also comprises removing a portion of the inverted via and then depositing a second portion of the mirror surface. The remaining portion of the inverted via fills the via and provides a level surface for the depositing of the second portion of the mirror surface, reducing the amount of light scattered by the via.

Abstract: A liquid crystal display device includes a first substrate; a second substrate; a first alignment layer on the first substrate, the first alignment layer including a first additive; a second alignment layer on the second substrate; and a liquid crystal layer between the first substrate and the second substrate.

Abstract: Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer sandwiched between a pair of outer layers, on an imaging platform, to define the microstructures in the radiation sensitive layer. At least one of the outer layers is then removed. The microstructures that were defined in the radiation sensitive layer are developed. The radiation sensitive layer sandwiched between the pair of outer layers may be fabricated as webs, to provide microstructure master blanks.

Abstract: A method for producing a multilayer optical disk including a plurality of information storage layers is disclosed. The method includes a mastering step of preparing a plurality of metal dies, a replicating step of producing a base plate onto which a desired pattern is transferred using the plurality of metal dies and forming recordable/reproducible information storage layers. The desired pattern includes a wobbling tract pattern that is formed by combining a plurality of wobble patterns each having the same fundamental frequency. The mastering step produces the plurality of metal dies for the plurality of information storage layers having a shape that specifies a track groove whose shape factor differs from one information storage layer to another.

Abstract: Mastering techniques are described that can improve the quality of a master used in data storage disk manufacturing. In particular, the techniques described herein can improve resolution of the features created on the master by reducing mastering noise. The techniques include depositing a multi-layer structure adjacent a master substrate layer. The multi-layer structure includes an etch stop layer, an etch layer, and a photoresist layer. A thickness of each of the layers is selected to generate substantially no reflectivity for at least one interface of the multi-layer structure to substantially eliminate stray light effects. The photoresist layer defines a portable conformable mask (PCM) for the etch layer. The etch layer is etched through the contact mask to define a feature of the master in the etch layer. The etch stop layer thickness may be selected to be as thin as possible to reduce surface roughness of the multi-layer structure.

Abstract: A composition for forming anti-reflective coating for use in a lithographic process in manufacture of a semiconductor device, comprising as a component a resin containing cyanuric acid or a derivative thereof, or a resin containing a structural unit derived from cyanuric acid or a derivative thereof. The structural unit is preferably represented by formula (1): and can be contained in a main chain or a side chain, or both main chain and side chain of a resin. The anti-reflective coating for lithography obtained from the composition has a high reflection reducing effect and does not cause intermixing with a resist layer to give an excellent resist pattern. It has a higher selectivity in dry-etching compared with the resists.

Abstract: Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer sandwiched between a pair of outer layers, on an imaging platform, to define the microstructures in the radiation sensitive layer. At least one of the outer layers is then removed. The microstructures that were defined in the radiation sensitive layer are developed. The radiation sensitive layer sandwiched between the pair of outer layers may be fabricated as webs, to provide microstructure master blanks.

Abstract: An apparatus includes an optical wave guide and a ferrule. The optical wave guide has a prespecified horizontal-positioning surface and a prespecified vertical-positioning surface. The ferrule is to precisely couple with the optical wave guide. The ferrule defines a first datum plane mating with the prespecified vertical-positioning surface of the optical wave guide to precisely mechanically vertically position the optical wave guide within the ferrule. The ferrule defines a second datum plane mating with the prespecified horizontal-positioning surface of the optical wave guide to precisely mechanically horizontally position the optical wave guide within the ferrule.

Abstract: A method of accurately forming lower partitions than spacers on a substrate in an electrophoretic medium includes a first resist application step where a first negative resist is applied on the first substrate, a first exposure step where the first negative resist is exposed to light through a first mask having an aperture pattern for exposing a pattern of the partition to light, a second resist application step where a second negative resist is applied on the first negative resist, a second exposure step where the second negative resist and the first negative resist are exposed to light through a second mask having an aperture pattern for exposing a pattern of the spacer to light, and a development step where the first negative resist and the second negative resist are developed.

Abstract: Provided are a photoreactive compound represented by formula (1), a liquid crystal alignment layer using the compound, a method of manufacturing the alignment layer, and a liquid crystal display device including the alignment layer: where n is an integer of 20-1000; m is an integer of 1-5; and R is a hydrogen atom, CN, a C1-C5 alkyloxy group, a halogen atom, or a maleimide group.

Abstract: A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to each of the imide nitrogen atoms, a substituted or unsubstituted alicyclic ring system, optionally substituted with electron donating groups. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 100° C.

Abstract: A sub-wavelength anti-reflective diffractive structure is incorporated with a base diffractive structure having a small period to form a high efficiency diffractive structure. In the high efficiency diffractive structure, the anti-reflective structure and/or the base diffractive structure are altered from their ideal solo structure to provide both the desired performance and minimize reflections.

Abstract: A radiation sensitive composition containing inorganic oxide particles; a copolymer of at least one unsaturated compound selected from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic anhydride and other unsaturated compound different from the unsaturated compound; a polyfunctional unsaturated compound having at least two ethylenically unsaturated groups in the molecule; and a radiation sensitive polymerization initiator. The composition is useful for making a microlens.

Abstract: A manufacturing method of an optical device having a micro-asperity pattern that has various kinds of accurate three-dimensional shapes and is realized as thin films includes: a first step of coating a substrate with a resin thin film made of a photosensitive resin; a second step of forming a material-property-changed part at a part of the resin thin film by photolithography; a third step of controlling a temperature of the resin thin film to be a temperature that is lower than a photosensitivity extinction temperature or a hardening reaction starting temperature of the resin thin film; a fourth step of pressing a die having a micro-asperity pattern against the surface of the resin thin film to form a first micro-asperity pattern in a state in which the resin thin film has been softened or melted; and a fifth step of forming a second micro-asperity pattern at a part of the resin thin film by removing the material-property-changed part.

Abstract: A method of fabricating a micro lens, the method including: forming a photo-sensitive film on a substrate; placing a photo mask at a predetermined distance from a top of the photo-sensitive film; exposing the photo-sensitive film by varying an area of exposure of the photo-sensitive film so as to selectively expose three-dimensional structures of the photo-sensitive film corresponding to desired micro lenses; and developing the photo-sensitive film such that the exposed three-dimensional structures remain. Also, there is provided a method of fabricating a master for a micro lens, in which a master material is applied on the photo-sensitive film with the three-dimensional structures to form a master having the three-dimensional structures transferred thereonto.