Abstract: A PWM controller for controlling a switching voltage regulator comprises a first comparator, a second comparator and a third comparator. The first comparator is configured to detect voltages of a first node and a second node so as to determine whether to stop the PWM controller. The PWM controller is stopped if a first potential is lower than a threshold, and the first potential derives from the voltage of the first node by a level shift of a first voltage difference. The second comparator is configured to detect the voltage of the first node and then to compare the voltage with a power reference voltage so as to determine whether the PWM controller receives necessary power. The third comparator is configured to compare the voltage of the second node with an enable reference voltage so as to determine whether to disable the PWN controller.

Abstract: Various integrated circuit devices, including a lateral DMOS transistor, a quasi-vertical DMOS transistor, a junction field-effect transistor (JFET), a depletion-mode MOSFET, and a diode, are formed inside an isolation structure which includes a floor isolation region and a trench extending from the surface of the substrate to the floor isolation region. The trench may be filled with a dielectric material or may have a conductive material in a central portion with a dielectric layer lining the walls of the trench. Various techniques for terminating the isolation structure by extending the floor isolation region beyond the trench, using a guard ring, and a forming a drift region are described.

Abstract: Devices, such as mobile devices, may be exposed to short circuit and output overload events. To protect against such events, mobile devices typically include circuitry to limit currents so as not to exceed a pre-programmed current limit. Various embodiments of the present invention include devices and methods for detecting pre-programmed current limits and for limiting currents in response to such detection. In some embodiments, both the current limit detector and the current limit controller circuitry include scaled current switches. The scaling may be substantially similar between the programmed-current limit detector and the current limit controller circuitry.

Abstract: A sample-data analog circuit includes a level-crossing detector. The level-crossing detector controls sampling switches to provide a precise sample of the output voltage when the level-crossing detector senses the predetermined level crossing of the input signal. A multiple segment ramp waveform generator is used in the sample-data analog circuits. The ramp waveform generator includes an amplifier, a variable current source, and a voltage detection circuit coupled to the current source to control the change in the amplitude of the current. The ramp generator produces constant slope within each segment regardless of the load condition. The sample-data analog circuit also utilizes variable bandwidths and thresholds.

Abstract: An isolation structure for a semiconductor device comprises a floor isolation region, a dielectric filled trench above the floor isolation region and a sidewall isolation region extending downward from the bottom of the trench to the floor isolation region. This structure provides a relatively deep isolated pocket in a semiconductor substrate while limiting the depth of the trench that must be etched in the substrate. A MOSFET is formed in the isolated pocket.

Abstract: An Electro-Static Discharge (ESD) protection device is formed in an isolated region of a semiconductor substrate. The ESD protection device may be in the form of a MOS or bipolar transistor or a diode. The isolation structure may include a deep implanted floor layer and one or more implanted wells that laterally surround the isolated region. The isolation structure and ESD protection devices are fabricated using a modular process that includes virtually no thermal processing. Since the ESD device is isolated, two or more ESD devices may be electrically “stacked” on one another such that the trigger voltages of the devices are added together to achieve a higher effective trigger voltage.

Abstract: A trim fuse circuit includes a metal fuse, a trim pad coupled to the first end of the metal fuse, a first transistor coupled to the first end of the metal fuse, a second transistor coupled to the second end of the metal fuse, an inverter coupled to the second end of the metal fuse, a switch coupled to the second end of the metal fuse, and a common trim pad coupled to the control end of the switch. The inverter outputs a data signal according to the status of the metal fuse. The trim pad can be disposed on the scribe line of a wafer. When the trim pad is cut and accordingly connects to the substrate of the wafer, the data signal is not affected.

Abstract: A transistor is formed inside an isolation structure which includes a floor isolation region and a trench extending from the surface of the substrate to the floor isolation region. The trench may be filled with a dielectric material or may have a conductive material in a central portion with a dielectric layer lining the walls of the trench.

Abstract: All low-temperature processes are used to fabricate a variety of semiconductor devices in a substrate the does not include an epitaxial layer. The devices include a non-isolated lateral DMOS, a non-isolated extended drain or drifted MOS device, a lateral trench DMOS, an isolated lateral DMOS, JFET and depletion-mode devices, and P-N diode clamps and rectifiers and junction terminations. Since the processes eliminate the need for high temperature processing and employ “as-implanted” dopant profiles, they constitute a modular architecture which allows devices to be added or omitted to the IC without the necessity of altering the processes used to produce the remaining devices.

Abstract: A slope rate compensation circuit includes a source follower level-shift amplifier, a capacitor, a first resistor and a second resistor. The source follower level-shift amplifier includes a first transistor and a second transistor. The first transistor allows a first current to flow therein, the second transistor allows a second current to flow therein, and the first current increases with the second current. The capacitor is connected to the source terminal of the first transistor. The first resistor is connected to the source terminal of the second transistor. The second resistor allows a third current to flow therein, and the third current increases with the second current. The second resistor is related to the output voltage of the slope rate compensation circuit.

Abstract: A variety of isolation structures for semiconductor substrates include a trench formed in the substrate that is filled with a dielectric material or filled with a conductive material and lined with a dielectric layer along the walls of the trench. The trench may be used in combination with doped sidewall isolation regions. Both the trench and the sidewall isolation regions may be annular and enclose an isolated pocket of the substrate. The isolation structures are formed by modular implant and etch processes that do not include significant thermal processing or diffusion of dopants so that the resulting structures are compact and may be tightly packed in the surface of the substrate.

Abstract: Exemplary systems and methods for charging a battery with a digital charge reduction loop are described herein. In some embodiments, a system comprises an exemplary digital charge reduction loop which comprises a circuit for determining a charge-current adjustment signal, a counter for generating a digital count value, and a digital-to-analog converter. The circuit for determining a charge-current adjustment signal may base the determination on a source voltage of an input source. The counter may generate a digital count value based on the charge-current adjustment signal. The digital-to-analog converter (DAC) may generate a DAC control signal based on the digital count value of the counter, the DAC control signal being representative of an amount of charge current to be used to charge a battery.

Abstract: All low-temperature processes are used to fabricate a variety of semiconductor devices in a substrate the does not include an epitaxial layer. The devices include a non-isolated lateral DMOS, a non-isolated extended drain or drifted MOS device, a lateral trench DMOS, an isolated lateral DMOS, JFET and depletion-mode devices, and P-N diode clamps and rectifiers and junction terminations. Since the processes eliminate the need for high temperature processing and employ “as-implanted” dopant profiles, they constitute a modular architecture which allows devices to be added or omitted to the IC without the necessity of altering the processes used to produce the remaining devices.

Abstract: All low-temperature processes are used to fabricate a variety of semiconductor devices in a substrate the does not include an epitaxial layer. The devices include a non-isolated lateral DMOS, a non-isolated extended drain or drifted MOS device, a lateral trench DMOS, an isolated lateral DMOS, JFET and depletion-mode devices, and P-N diode clamps and rectifiers and junction terminations. Since the processes eliminate the need for high temperature processing and employ “as-implanted” dopant profiles, they constitute a modular architecture which allows devices to be added or omitted to the IC without the necessity of altering the processes used to produce the remaining devices.

Abstract: A frequency divider circuit comprises a plurality of T flip-flops, a first transmission gate, a second transmission gate and an inverter. The plurality of T flip-flops is connected in series. The output of the inverter is connected to a clock input of a first T flip-flop. The first transmission gate connects a clock signal and the other clock input of the first T flip-flop and the input of the inverter. The second transmission gate connects the inverted signal of the clock signal and the output of the first transmission gate.

Abstract: Isolation regions for semiconductor substrates include dielectric-filled trenches and field oxide regions. Protective caps of dielectric materials dissimilar from the dielectric materials in the main portions of the trenches and field oxide regions may be used to protect the structures from erosion during later process steps. The top surfaces of the isolation structures are coplanar with the surface of the substrate. Field doping regions may be formed beneath the field oxide regions. To meet the demands of different devices, the isolation structures may have varying widths and depths.

Abstract: Devices, such as mobile devices, may be exposed to short circuit and output overload events. To protect against such events, mobile devices typically include circuitry to limit currents so as not to exceed a pre-programmed current limit. Various embodiments of the present invention include devices and methods for detecting pre-programmed current limits and for limiting currents in response to such detection. In some embodiments, both the current limit detector and the current limit controller circuitry include scaled current switches. The scaling may be substantially similar between the programmed-current limit detector and the current limit controller circuitry.

Abstract: A voltage level shifter with voltage boost mechanism is disclosed for interfacing two circuit units having different operating voltage swings. The voltage level shifter includes a first inverter, a second inverter, a first capacitor, a second capacitor and a plurality of transistors. The input and power ends of the first inverter function to receive an input voltage and a first voltage respectively. The output end of the second inverter functions to provide an output voltage. When the input voltage is a ground voltage, the output voltage is also a ground voltage; meanwhile, the switches are controlled for charging the first and second capacitors to a second voltage and a third voltage respectively. When the input voltage is the first voltage, a sum voltage of the first, second, and third voltages is furnished to the power end of the second inverter for providing the sum voltage as the output voltage.

Abstract: An structure for electrically isolating a semiconductor device is formed by implanting dopant into a semiconductor substrate that does not include an epitaxial layer. Following the implant the structure is exposed to a very limited thermal budget so that dopant does not diffuse significantly. As a result, the dimensions of the isolation structure are limited and defined, thereby allowing a higher packing density than obtainable using conventional processes which include the growth of an epitaxial layer and diffusion of the dopants. In one group of embodiments, the isolation structure includes a deep layer and a sidewall which together form a cup-shaped structure surrounding an enclosed region in which the isolated semiconductor device may be formed. The sidewalls may be formed by a series of pulsed implants at different energies, thereby creating a stack of overlapping implanted regions.

Abstract: Various integrated circuit devices, in particular a transistor, are formed inside an isolation structure which includes a floor isolation region and a trench extending from the surface of the substrate to the floor isolation region. The trench may be filled with a dielectric material or may have a conductive material in a central portion with a dielectric layer lining the walls of the trench. Various techniques for terminating the isolation structure by extending the floor isolation region beyond the trench, using a guard ring, and a forming a drift region are described.