Patents Assigned to ASML Holding N.V.
  • Athermalization of an Alignment System
    Publication number: 20190219927
    Abstract: An alignment system configured to be substantially insensitive to thermal variations in its system during alignment measurements. The alignment system includes a sensor system, a support structure, a sensing element, a position measurement system, and an athermal interface between the sensing element and the support structure. The sensor system is configured to determine a in position of an alignment mark on a substrate and the support structure is configured to support the sensor system. The sensing element is configured to detect an unintentional displacement of the support structure and the position measurement system is configured to measure the unintentional displacement relative to a reference element based on the detected unintentional displacement. The athermal interface is configured to prevent detection of temperature induced displacement of the support structure by the sensing element.
    Type: Application
    Filed: September 4, 2017
    Publication date: July 18, 2019
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Suzanne Johanna Antonetta Geertruda COSIJNS, Maarten VAN DER HEIJDEN, Frederikus Johannes Maria DE VREEDE, David TAUB, Eric EMERY, Joseph Ashwin FRANKLIN
  • Alignment System Wafer Stack Beam Analyzer
    Publication number: 20190204759
    Abstract: An alignment system obtains the characteristics of the light coming back from a wafer stack. A beam analyzer measures changes in wavelength, polarization, and beam profile. This measured information allows for in-line process variation corrections. The correction provides optical monitoring of individual mark stack variations, and in turn provides information to reduce individual mark process variation-induced accuracy error.
    Type: Application
    Filed: May 17, 2017
    Publication date: July 4, 2019
    Applicant: ASML Holding N.V.
    Inventors: Krishanu SHOME, Igor Matheus Petronella AARTS, Justin Lloyd KREUZER, Irit TZEMAH
  • Polarization independent metrology system
    Patent number: 10338481
    Abstract: A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector.
    Type: Grant
    Filed: October 6, 2016
    Date of Patent: July 2, 2019
    Assignee: ASML Holding N.V.
    Inventors: Krishanu Shome, Justin Lloyd Kreuzer
  • Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus
    Patent number: 10324383
    Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.
    Type: Grant
    Filed: October 5, 2016
    Date of Patent: June 18, 2019
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Michael Leo Nelson, Jacobus Cornelius Gerardus Van Der Sanden, Geoffrey O'Connor, Michael Andrew Chieda, Tammo Uitterdijk
  • Beam Splitting Prism Systems
    Publication number: 20190179162
    Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.
    Type: Application
    Filed: December 12, 2018
    Publication date: June 13, 2019
    Applicant: ASML Holding N.V.
    Inventors: Douglas C. CAPPELLI, Stanislav SMIRNOV, Richard Carl ZIMMERMAN, Joshua ADAMS, Alexander Kenneth RAUB, Yevgeniy Konstantinovich SHMAREV
  • A Membrane Assembly and Particle Trap
    Publication number: 20190171119
    Abstract: Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.
    Type: Application
    Filed: July 17, 2017
    Publication date: June 6, 2019
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Ronald Peter ALBRIGHT, Lowell Lane BAKER, Daniel Nathan BURBANK
  • Electrostatic clamp and a method for manufacturing the same
    Patent number: 10310391
    Abstract: An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low expansion (ULE) material, a second layer (304) coupled to the first layer, having a second ULE material, and a third layer (306), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels (316) located between the first layer and the second layer and a composite layer (308) interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: June 4, 2019
    Assignee: ASML Holding N.V.
    Inventors: Matthew Lipson, Vincent Dimilia, Ronald Peter Totillo, Tammo Uitterdijk, Steven Michael Zimmerman
  • Method and Device for Pupil Illumination in Overlay and Critical Dimension Sensors
    Publication number: 20190155172
    Abstract: An illumination system for a metrology apparatus that can achieve illumination spatial profile flexibility, high polarization extinction ratio, and high contrast. The illumination system includes a polarizing beam splitter (PBS), an illumination mode selector (IMS), and a reflective spatial light modulator (SLM). The PBS divides an illumination beam into sub-beams. The IMS has a plurality of apertures that transmits at least one sub-beam and may be arranged in multiple illumination positions corresponding to illumination modes. A pixel array of the reflective SLM and reflects a portion of the sub-beam transmitted by the IMS back to the IMS and PBS. The PBS, IMS, SLM collectively generates a complex amplitude or intensity spatial profile of the transmitted sub-beam.
    Type: Application
    Filed: June 16, 2017
    Publication date: May 23, 2019
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Yevgeniy Konstantinovich SHMAREV, Markus Franciscus Antonius EURLINGS
  • Method and apparatus for optical fiber connection
    Patent number: 10288810
    Abstract: A system including a first component having a lensed facet; and a second component optically coupled to the first component, the second component having a tapered facet, the tapered facet and lensed facet spaced from each other so as to establish evanescent-wave coupling between the first component and the second component.
    Type: Grant
    Filed: April 11, 2016
    Date of Patent: May 14, 2019
    Assignee: ASML Holding N.V.
    Inventors: Louis Zhongliang Lu, Tao Chen, Francisco Javier Berrios, Jiazong Zhang
  • Patterning device cooling systems in a lithographic apparatus
    Patent number: 10281830
    Abstract: A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: May 7, 2019
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Laurentius Johannes Adrianus Van Bokhoven, Christopher Charles Ward, Marc Léon Van Der Gaag, Johan Gertrudis Cornelis Kunnen
  • Electrostatic clamp and a method for manufacturing the same
    Patent number: 10274842
    Abstract: An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low expansion (ULE) material, a second layer (304) coupled to the first layer, having a second ULE material, and a third layer (306), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels (316) located between the first layer and the second layer and a composite layer (308) interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: April 30, 2019
    Assignee: ASML Holding N.V.
    Inventors: Matthew Lipson, Vincent Dimilia, Ronald Peter Totillo, Tammo Uitterdijk, Steven Michael Zimmerman
  • Pneumatic bearing with bonded polymer film wear surface and production method thereof
    Patent number: 10267360
    Abstract: Disclosed are pneumatic bearings with a bonded polymer film wear surface and production methods thereof. For example, a pneumatic bearing for supporting a payload is disclosed. The pneumatic bearing has a bearing surface having a polyimide film fastened to a substrate with a bonding layer. The polyimide film can comprise poly-oxydiphenylene-pyromellitimide and the bonding layer can comprise diglycidyl ether of bisphenol A, 1,4-butanediol diglycidyl ether, and 2,2,4-trimetylhexametylen-1,6-diamin.
    Type: Grant
    Filed: April 6, 2011
    Date of Patent: April 23, 2019
    Assignee: ASML Holding N.V.
    Inventors: Dragos Pariza, Santiago E. Del Puerto
  • Objective lens system
    Patent number: 10247940
    Abstract: An alignment system uses a self-referencing interferometer that incorporates an objective lens system having a plurality of lens element groups. In an embodiment, the objective is configured and arranged to provide a large numerical aperture, long working distance, and low wavefront error.
    Type: Grant
    Filed: November 21, 2016
    Date of Patent: April 2, 2019
    Assignee: ASML Holding N.V.
    Inventor: Kirill Urievich Sobolev
  • LITHOGRAPHIC APPARATUS AND ASSOCIATED METHOD
    Publication number: 20190056669
    Abstract: A method of determining compatibility of a patterning device with a lithographic apparatus. The method includes determining an intensity distribution of a conditioned radiation beam across a sensor plane of an illumination system of the lithographic apparatus. The method further includes using the determined intensity distribution to calculate a non-uniformity of intensity caused by contamination and/or degradation of a collector. The method further includes determining the effect of the non-uniformity on a characteristic of an image of the patterned radiation beam. The method further includes determining the compatibility of the patterning device with the lithographic apparatus based on the effect of the non-uniformity on the characteristic.
    Type: Application
    Filed: July 20, 2018
    Publication date: February 21, 2019
    Applicants: ASML NETHERLANDS B.V., ASML Holding N.V.
    Inventors: James Malcolm WEIDMAN, Franciscus Johannes BLOK, Erika Jane PRIME, Juliane Charlotte BEHREND
  • Lithographic apparatus with a patterning device environment
    Patent number: 10209635
    Abstract: A lithographic apparatus injects gas between a patterning device and a patterning device masking blade to help protect the patterning device from contamination. The gas may be injected into the space defined between the patterning device and the patterning device blade by one or more gas supply nozzles that are arranged on at least one side of the patterning device. The one or more gas supply nozzles are coupled to a frame which a patterning device support structure moves relative to. Each nozzle may be constructed and arranged to supply gas over at least the patterning region of the reflective patterning device.
    Type: Grant
    Filed: December 7, 2015
    Date of Patent: February 19, 2019
    Assignee: ASML Holding N.V.
    Inventors: Peter Kochersperger, David Ramirez
  • WAVELENGTH COMBINING OF MULTIPLE SOURCE
    Publication number: 20190049864
    Abstract: A light combiner (500) for use in a metrology tool includes a plurality of light sources (LED 1, LED 2, LED 3, LED 4, LED 5), a first filter (502), and a second filter (504). The first filter is designed to substantially reflect light generated from a first source of the plurality of light sources, and to substantially transmit light generated from a second source of the plurality of light sources. The second filter is designed to substantially reflect light generated from the first source and the second source of the plurality of light sources, and to substantially transmit light generated from a third source of the plurality of light sources. An angle of incidence of the light generated from the first source on a surface of the first filter is less than 30 degrees.
    Type: Application
    Filed: February 7, 2017
    Publication date: February 14, 2019
    Applicants: ASML Netherlands B.V, ASML Holding N.V.
    Inventors: Ronald Franciscus Herman HUGERS, Parag Vnayak KELKAR, Paulus Antonius Andreas TEUNISSEN
  • Compact two-sided reticle inspection system
    Patent number: 10156527
    Abstract: An apparatus and method is provided to efficiently and more precisely inspect reticles for contamination. The inspection system is used to image the reticle back-side and pellicle-side separately by transferring the reticle while maintaining desired demagnification. An inspection system is disclosed that includes a reticle support to support the reticle at a first position and an illumination source to illuminate a first surface of the reticle at the first position. The inspection system further includes a first sensor to receive light from the illuminated first surface of the reticle when the reticle is at the first position and a second sensor to receive light from an illuminated second surface of the reticle when the reticle is at a second position.
    Type: Grant
    Filed: March 5, 2015
    Date of Patent: December 18, 2018
    Assignee: ASML Holding N.V.
    Inventors: Stanley G. Janik, Yuli Vladimirsky, James H. Walsh
  • ALIGNMENT SENSOR FOR LITHOGRAPHIC APPARATUS
    Publication number: 20180329316
    Abstract: A lithographic apparatus includes an alignment sensor configured to determine the position of an alignment target having a periodic structure. The alignment sensor includes a demultiplexer to demultiplex a number of intensity channels. The demultiplexer includes a number of stages arranged in series and a number of demultiplexing components, each demultiplexing component operable to divide an input radiation beam into two radiation beam portions. The first stage has a first demultiplexing component that is arranged to receive as an input radiation beam an incident radiation beam. Each successive stage is arranged such that it has twice the number of demultiplexing components as a preceding stage, each demultiplexing component of each stage after the first stage receiving as an input one of the radiation beam portions output from a demultiplexing component of the preceding stage.
    Type: Application
    Filed: August 23, 2016
    Publication date: November 15, 2018
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Alessandro POLO, Simon Gijsbert Josephus MATHIJSSEN, Patricius Aloysius Jacobus TINNEMANS, Scott Douglas COSTON, Ronan James HAVELIN
  • CHUCKS AND CLAMPS FOR HOLDING OBJECTS OF A LITHOGRAPHIC APPARATUS AND METHODS FOR CONTROLLING A TEMPERATURE OF AN OBJECT HELD BY A CLAMP OF A LITHOGRAPHIC APPARATUS
    Publication number: 20180321602
    Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.
    Type: Application
    Filed: October 5, 2016
    Publication date: November 8, 2018
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Adrianus Hendrik KOEVOETS, Michael Leo NELSON, Jacobus Cornelis Gerardus VAN DER SANDEN, Geoffrey O'CONNOR, Michael Andrew CHIEDA, Tammo UITTERDIJK
  • POLARIZATION INDEPENDENT METROLOGY SYSTEM
    Publication number: 20180299790
    Abstract: A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector.
    Type: Application
    Filed: October 6, 2016
    Publication date: October 18, 2018
    Applicant: ASML Holding N.V.
    Inventors: Krishanu SHOME, Justin Lloyd KREUZER