Patents Assigned to ASML Holding N.V.
  • MEASUREMENT METHOD COMPRISING IN-SITU PRINTING OF APPARATUS MARK AND CORRESPONDING APPARATUS
    Publication number: 20190196341
    Abstract: A method, including printing an apparatus mark onto a structure while the structure is at least partly within a lithographic apparatus. The structure may be part of, or is located on, a substrate table, but is separate from a substrate to be held by the apparatus. The method further includes measuring the apparatus mark using a sensor system within the apparatus.
    Type: Application
    Filed: August 18, 2017
    Publication date: June 27, 2019
    Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.
    Inventors: Kevin J VIOLETTE, Igor Matheus Petronella AARTS, Haico Victor KOK, Eric Brian CATEY
  • Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus
    Patent number: 10324383
    Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.
    Type: Grant
    Filed: October 5, 2016
    Date of Patent: June 18, 2019
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Adrianus Hendrik Koevoets, Michael Leo Nelson, Jacobus Cornelius Gerardus Van Der Sanden, Geoffrey O'Connor, Michael Andrew Chieda, Tammo Uitterdijk
  • Beam Splitting Prism Systems
    Publication number: 20190179162
    Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.
    Type: Application
    Filed: December 12, 2018
    Publication date: June 13, 2019
    Applicant: ASML Holding N.V.
    Inventors: Douglas C. CAPPELLI, Stanislav SMIRNOV, Richard Carl ZIMMERMAN, Joshua ADAMS, Alexander Kenneth RAUB, Yevgeniy Konstantinovich SHMAREV
  • A Membrane Assembly and Particle Trap
    Publication number: 20190171119
    Abstract: Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.
    Type: Application
    Filed: July 17, 2017
    Publication date: June 6, 2019
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Ronald Peter ALBRIGHT, Lowell Lane BAKER, Daniel Nathan BURBANK
  • Electrostatic clamp and a method for manufacturing the same
    Patent number: 10310391
    Abstract: An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low expansion (ULE) material, a second layer (304) coupled to the first layer, having a second ULE material, and a third layer (306), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels (316) located between the first layer and the second layer and a composite layer (308) interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: June 4, 2019
    Assignee: ASML Holding N.V.
    Inventors: Matthew Lipson, Vincent Dimilia, Ronald Peter Totillo, Tammo Uitterdijk, Steven Michael Zimmerman
  • Method and Device for Pupil Illumination in Overlay and Critical Dimension Sensors
    Publication number: 20190155172
    Abstract: An illumination system for a metrology apparatus that can achieve illumination spatial profile flexibility, high polarization extinction ratio, and high contrast. The illumination system includes a polarizing beam splitter (PBS), an illumination mode selector (IMS), and a reflective spatial light modulator (SLM). The PBS divides an illumination beam into sub-beams. The IMS has a plurality of apertures that transmits at least one sub-beam and may be arranged in multiple illumination positions corresponding to illumination modes. A pixel array of the reflective SLM and reflects a portion of the sub-beam transmitted by the IMS back to the IMS and PBS. The PBS, IMS, SLM collectively generates a complex amplitude or intensity spatial profile of the transmitted sub-beam.
    Type: Application
    Filed: June 16, 2017
    Publication date: May 23, 2019
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Yevgeniy Konstantinovich SHMAREV, Markus Franciscus Antonius EURLINGS
  • BROAD SPECTRUM RADIATION BY SUPERCONTINUUM GENERATION USING A TAPERED OPTICAL FIBER
    Publication number: 20190154910
    Abstract: A measurement apparatus, including: a tapered optical fiber, the tapered optical fiber having an input to receive radiation and having an output to provide spectrally broadened output radiation toward a measurement target, the tapered optical fiber configured to spectrally broaden the radiation received at the input; and a detector system configured to receive a redirected portion of the output radiation from the measurement target.
    Type: Application
    Filed: March 17, 2017
    Publication date: May 23, 2019
    Applicant: ASML HOLDING N.V.
    Inventors: King Pui LEUNG, Tao CHEN, James Ronan HAVELIN, Igor Matheus Petronella AARTS, Adel JOOBEUR, Joseph CARBONE
  • Method and apparatus for optical fiber connection
    Patent number: 10288810
    Abstract: A system including a first component having a lensed facet; and a second component optically coupled to the first component, the second component having a tapered facet, the tapered facet and lensed facet spaced from each other so as to establish evanescent-wave coupling between the first component and the second component.
    Type: Grant
    Filed: April 11, 2016
    Date of Patent: May 14, 2019
    Assignee: ASML Holding N.V.
    Inventors: Louis Zhongliang Lu, Tao Chen, Francisco Javier Berrios, Jiazong Zhang
  • Patterning device cooling systems in a lithographic apparatus
    Patent number: 10281830
    Abstract: A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: May 7, 2019
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Laurentius Johannes Adrianus Van Bokhoven, Christopher Charles Ward, Marc Léon Van Der Gaag, Johan Gertrudis Cornelis Kunnen
  • Electrostatic clamp and a method for manufacturing the same
    Patent number: 10274842
    Abstract: An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low expansion (ULE) material, a second layer (304) coupled to the first layer, having a second ULE material, and a third layer (306), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels (316) located between the first layer and the second layer and a composite layer (308) interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: April 30, 2019
    Assignee: ASML Holding N.V.
    Inventors: Matthew Lipson, Vincent Dimilia, Ronald Peter Totillo, Tammo Uitterdijk, Steven Michael Zimmerman
  • PATTERNING DEVICE COOLING APPARATUS
    Publication number: 20190121248
    Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.
    Type: Application
    Filed: March 8, 2017
    Publication date: April 25, 2019
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Günes NAKIBOGLU, Lowell Lane BAKER, Ruud Hendrikus Martinus Johannes BLOKS, Hakki Ergün CEKLI, Geoffrey Alan SCHULTZ, Laurentius Johannes Adrianus VAN BOKHOVEN, Frank Johannes Jacobus VAN BOXTEL, Jean-Philippe Xavier VAN DAMME, Christopher Charles WARD
  • LITHOGRAPHIC APPARATUS, A DRYER AND A METHOD OF REMOVING LIQUID FROM A SURFACE
    Publication number: 20190121247
    Abstract: A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
    Type: Application
    Filed: December 20, 2018
    Publication date: April 25, 2019
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Martinus Hendrikus Antonius LEENDERS, Sjoerd Nicolaas Lambertus DONDERS, Harry SEWELL, Louis John MARKOYA, Marcus Martinus Petrus Adrianus VERMEULEN, Diane Elaine MARIKOYA
  • Pneumatic bearing with bonded polymer film wear surface and production method thereof
    Patent number: 10267360
    Abstract: Disclosed are pneumatic bearings with a bonded polymer film wear surface and production methods thereof. For example, a pneumatic bearing for supporting a payload is disclosed. The pneumatic bearing has a bearing surface having a polyimide film fastened to a substrate with a bonding layer. The polyimide film can comprise poly-oxydiphenylene-pyromellitimide and the bonding layer can comprise diglycidyl ether of bisphenol A, 1,4-butanediol diglycidyl ether, and 2,2,4-trimetylhexametylen-1,6-diamin.
    Type: Grant
    Filed: April 6, 2011
    Date of Patent: April 23, 2019
    Assignee: ASML Holding N.V.
    Inventors: Dragos Pariza, Santiago E. Del Puerto
  • Objective lens system
    Patent number: 10247940
    Abstract: An alignment system uses a self-referencing interferometer that incorporates an objective lens system having a plurality of lens element groups. In an embodiment, the objective is configured and arranged to provide a large numerical aperture, long working distance, and low wavefront error.
    Type: Grant
    Filed: November 21, 2016
    Date of Patent: April 2, 2019
    Assignee: ASML Holding N.V.
    Inventor: Kirill Urievich Sobolev
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20190079420
    Abstract: An apparatus including an illumination system to condition a radiation beam, a support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control system configured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signal to control a component of the apparatus based on the deformation of the pattern.
    Type: Application
    Filed: January 26, 2017
    Publication date: March 14, 2019
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Bearrach MOEST, Lowell Lane BAKER, James Robert DOWNES, Wijnand HOITINGA, Hermen Folken PEN
  • LITHOGRAPHIC APPARATUS AND ASSOCIATED METHOD
    Publication number: 20190056669
    Abstract: A method of determining compatibility of a patterning device with a lithographic apparatus. The method includes determining an intensity distribution of a conditioned radiation beam across a sensor plane of an illumination system of the lithographic apparatus. The method further includes using the determined intensity distribution to calculate a non-uniformity of intensity caused by contamination and/or degradation of a collector. The method further includes determining the effect of the non-uniformity on a characteristic of an image of the patterned radiation beam. The method further includes determining the compatibility of the patterning device with the lithographic apparatus based on the effect of the non-uniformity on the characteristic.
    Type: Application
    Filed: July 20, 2018
    Publication date: February 21, 2019
    Applicants: ASML NETHERLANDS B.V., ASML Holding N.V.
    Inventors: James Malcolm WEIDMAN, Franciscus Johannes BLOK, Erika Jane PRIME, Juliane Charlotte BEHREND
  • Lithographic apparatus with a patterning device environment
    Patent number: 10209635
    Abstract: A lithographic apparatus injects gas between a patterning device and a patterning device masking blade to help protect the patterning device from contamination. The gas may be injected into the space defined between the patterning device and the patterning device blade by one or more gas supply nozzles that are arranged on at least one side of the patterning device. The one or more gas supply nozzles are coupled to a frame which a patterning device support structure moves relative to. Each nozzle may be constructed and arranged to supply gas over at least the patterning region of the reflective patterning device.
    Type: Grant
    Filed: December 7, 2015
    Date of Patent: February 19, 2019
    Assignee: ASML Holding N.V.
    Inventors: Peter Kochersperger, David Ramirez
  • WAVELENGTH COMBINING OF MULTIPLE SOURCE
    Publication number: 20190049864
    Abstract: A light combiner (500) for use in a metrology tool includes a plurality of light sources (LED 1, LED 2, LED 3, LED 4, LED 5), a first filter (502), and a second filter (504). The first filter is designed to substantially reflect light generated from a first source of the plurality of light sources, and to substantially transmit light generated from a second source of the plurality of light sources. The second filter is designed to substantially reflect light generated from the first source and the second source of the plurality of light sources, and to substantially transmit light generated from a third source of the plurality of light sources. An angle of incidence of the light generated from the first source on a surface of the first filter is less than 30 degrees.
    Type: Application
    Filed: February 7, 2017
    Publication date: February 14, 2019
    Applicants: ASML Netherlands B.V, ASML Holding N.V.
    Inventors: Ronald Franciscus Herman HUGERS, Parag Vnayak KELKAR, Paulus Antonius Andreas TEUNISSEN
  • Lithographic apparatus, a dryer and a method of removing liquid from a surface
    Patent number: 10185231
    Abstract: A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: January 22, 2019
    Assignees: ASML HOLDING N.V., ASML NETHERLANDS B.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Sjoerd Nicolaas Lambertus Donders, Harry Sewell, Louis John Markoya, Marcus Martinus Petrus Adrianus Vermeulen, Diane Elaine Markoya
  • PELLICLE AND PELLICLE ASSEMBLY
    Publication number: 20180364561
    Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.
    Type: Application
    Filed: December 2, 2016
    Publication date: December 20, 2018
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: David Ferdinand VLES, Erik Achilles ABEGG, Aage BENDIKSEN, Derk Servatius Gertruda BROUNS, Pradeep K. GOVIL, Paul JANSSEN, Maxim Aleksandrovich NASALEVICH, Arnoud Willem NOTENBOOM, Mária PÉTER, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Johannes Petrus Martinus Bernardus VERMEULEN, Willem-Pieter VOORTHUIJZEN, James Norman WILEY