Patents Assigned to ASML Holding N.V.
  • Lithographic cluster, lithographic apparatus, and device manufacturing method
    Patent number: 10895813
    Abstract: A lithographic cluster includes a track unit and a lithographic apparatus. The lithographic apparatus includes an alignment sensor and at least one controller. The track unit is configured to process a first lot and a second lot. The lithographic apparatus is operatively coupled to the track unit. The alignment sensor is configured to measure an alignment of at least one alignment mark type of a calibration wafer. At least one controller is configured to determine a correction set for calibrating the lithographic apparatus based on the measured alignment of the at least one alignment mark type and apply first and second weight corrections to the correction set for processing the first and second lots, respectively, such that overlay drifts or jumps during processing the first and second lots are mitigated.
    Type: Grant
    Filed: October 26, 2018
    Date of Patent: January 19, 2021
    Assignee: ASML Holding N.V.
    Inventors: Irit Tzemah, Eric Brian Catey, John David Connelly
  • Scan Signal Characterization Diagnostics
    Publication number: 20200401053
    Abstract: A system for and method of processing a wafer in which a scan signal is analyzed locally to extract information about alignment, overlay, mark quality, wafer quality, and the like.
    Type: Application
    Filed: December 19, 2018
    Publication date: December 24, 2020
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Cornelis Melchior BROUWER, Krishanu SHOME
  • Athermalization of an alignment system
    Patent number: 10866531
    Abstract: An alignment system configured to be substantially insensitive to thermal variations in its system during alignment measurements. The alignment system includes a sensor system, a support structure, a sensing element, a position measurement system, and an athermal interface between the sensing element and the support structure. The sensor system is configured to determine a position of an alignment mark on a substrate and the support structure is configured to support the sensor system. The sensing element is configured to detect an unintentional displacement of the support structure and the position measurement system is configured to measure the unintentional displacement relative to a reference element based on the detected unintentional displacement. The athermal interface is configured to prevent detection of temperature induced displacement of the support structure by the sensing element.
    Type: Grant
    Filed: September 4, 2017
    Date of Patent: December 15, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Suzanne Johanna Antonetta Geertruda Cosijns, Maarten Van Der Heijden, Frederikus Johannes Maria De Vreede, David Taub, Eric Emery, Joseph Ashwin Franklin
  • Metrology method and device
    Patent number: 10866526
    Abstract: An inspection apparatus, including: an objective configured to receive diffracted radiation from a metrology target having positive and negative diffraction order radiation; an optical element configured to separate the diffracted radiation into portions separately corresponding to each of a plurality of different values or types of one or more radiation characteristics and separately corresponding to the positive and negative diffraction orders; and a detector system configured to separately and simultaneously measure the portions.
    Type: Grant
    Filed: September 19, 2018
    Date of Patent: December 15, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Yevgeniy Konstantinovich Shmarev, Nitesh Pandey, Armand Eugene Albert Koolen
  • Truncated Flat Wire Coil
    Publication number: 20200381153
    Abstract: A flat wire coil lacking electrically insulating material on its upper and/or lower surfaces. The lack of insulating material aids in maintaining the coil temperature as well as providing other benefits.
    Type: Application
    Filed: October 5, 2018
    Publication date: December 3, 2020
    Applicant: ASML Holding N.V.
    Inventor: Michael Emerson BROWN
  • Variable corrector of a wave front
    Patent number: 10852247
    Abstract: An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path and configured to adjust a shape of a wave front of the beam of EM radiation, the adaptive optical system including: a first aspherical optical element; a second aspherical optical element adjacent the first aspherical optical element; and an actuator configured to cause relative movement between the first optical element and the second optical element in a direction different from a beam axis of the portion of the EM radiation path.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: December 1, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Stanislav Smirnov, Johannes Matheus Marie De Wit, Teunis Willem Tukker, Armand Eugene Albert Koolen
  • Apparatus for and Method Cleaning a Support Inside a Lithography Apparatus
    Publication number: 20200348606
    Abstract: Methods and systems are described for cleaning a support such as a clamp of a chuck that holds a patterning device or a wafer in a lithographic apparatus. The method includes loading a electrostatic cleaning substrate into a lithographic apparatus. The electrostatic cleaning substrate includes at least one electrode. The method further includes bringing the electrostatic cleaning substrate near to the clamping surface to be cleaned and connecting the electrode to a voltage source. Particles present on the support are then transferred to the electrostatic cleaning substrate.
    Type: Application
    Filed: July 31, 2018
    Publication date: November 5, 2020
    Applicant: ASML Holding N.V.
    Inventors: Victor Antonio PEREZ-FALCON, Michael Andrew CHIEDA
  • APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A PELLICLE
    Publication number: 20200341366
    Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.
    Type: Application
    Filed: November 27, 2018
    Publication date: October 29, 2020
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Derk Servatius Gertruda BROUNS, Joshua ADAMS, Aage BENDIKSEN, Richard JACOBS, Andrew JUDGE, Veera Venkata Narasimha Narendra Phani KOTTAPALLI, Joseph Harry LYONS, Theodorus Marinus MODDERMAN, Manish RANJAN, Marcus Adrianus VAN DE KERKHOF, Xugang XIONG
  • Inspection apparatus having non-linear optics
    Patent number: 10809193
    Abstract: An inspection apparatus or lithographic apparatus includes an optical system and a detector. The optical system includes a non-linear prismatic optic. The optical system is configured to receive zeroth and first diffraction order beams reflected from a diffraction target and separate first and second polarizations of each diffraction order beam. The detector is configured to simultaneously detect first and second polarizations of each of the zeroth and first diffraction order beams. Based on the detected first and second polarizations of one or more diffraction orders, an operational parameter of a lithographic apparatus can be adjusted to improve accuracy or precision in the lithographic apparatus. The optical system can include a plurality of non-linear prismatic optics. For example, the optical system can include a plurality of Wollaston prisms.
    Type: Grant
    Filed: March 25, 2019
    Date of Patent: October 20, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Marinus Johannes Maria Van Dam, Richard Carl Zimmerman
  • Beam Splitting Prism Systems
    Publication number: 20200326556
    Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.
    Type: Application
    Filed: June 26, 2020
    Publication date: October 15, 2020
    Applicant: ASML Holding N.V.
    Inventors: Douglas C. CAPPELLI, Stanislav SMIRNOV, Richard Carl ZIMMERMAN, Joshua ADAMS, Alexander Kenneth RAUB, Yevgeniy Konstantinovich SHMAREV
  • Lithographic Cluster, Lithographic Apparatus, and Device Manufacturing Method
    Publication number: 20200326640
    Abstract: A lithographic cluster includes a track unit and a lithographic apparatus. The lithographic apparatus includes an alignment sensor and at least one controller. The track unit is configured to process a first lot and a second lot. The lithographic apparatus is operatively coupled to the track unit. The alignment sensor is configured to measure an alignment of at least one alignment mark type of a calibration wafer. At least one controller is configured to determine a correction set for calibrating the lithographic apparatus based on the measured alignment of the at least one alignment mark type and apply first and second weight corrections to the correction set for processing the first and second lots, respectively, such that overlay drifts or jumps during processing the first and second lots are mitigated.
    Type: Application
    Filed: October 26, 2018
    Publication date: October 15, 2020
    Applicant: ASML Holding N.V.
    Inventors: Irit TZEMAH, Eric Brian CATEY, John David CONNELLY
  • Broad spectrum radiation by supercontinuum generation using a tapered optical fiber
    Patent number: 10802208
    Abstract: A measurement apparatus, including: a tapered optical fiber, the tapered optical fiber having an input to receive radiation and having an output to provide spectrally broadened output radiation toward a measurement target, the tapered optical fiber configured to spectrally broaden the radiation received at the input; and a detector system configured to receive a redirected portion of the output radiation from the measurement target.
    Type: Grant
    Filed: March 17, 2017
    Date of Patent: October 13, 2020
    Assignee: ASML Holding N.V.
    Inventors: King Pui Leung, Tao Chen, Ronan James Havelin, Igor Matheus Petronella Aarts, Adel Joobeur, Joseph Carbone
  • Lithographic apparatus
    Patent number: 10788763
    Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: September 29, 2020
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
  • Beam Pointing Monitor and Compensation Systems
    Publication number: 20200278295
    Abstract: An optical system for beam pointing monitoring and compensation is provided. According to an embodiment, a beam pointing monitor and compensation system includes a surface plasmon resonance (SPR) optical element (800). The SPR optical element includes an optical element (801) that includes first (806) and second (802) surfaces. The first and second surfaces of the optical element are substantially parallel to each other. The SPR optical element further includes a first metal layer (803) provided on the second surface of the optical element, a dielectric layer (805) provided on the first metal layer, and a second metal layer (807) provided on the dielectric layer.
    Type: Application
    Filed: September 4, 2018
    Publication date: September 3, 2020
    Applicant: ASML Holding N.V.
    Inventors: Matthew E. HANSEN, Ronald A. WILKLOW
  • Reticle clamping device
    Patent number: 10761435
    Abstract: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.
    Type: Grant
    Filed: January 17, 2018
    Date of Patent: September 1, 2020
    Assignee: ASML Holding N.V.
    Inventors: Enrico Zordan, Brandon Adam Evans, Daniel Nathan Burbank, Ankur Ramesh Baheti, Samir A. Nayfeh
  • Optical Arrangement for an Inspection Apparatus
    Publication number: 20200271438
    Abstract: An inspection apparatus, including: an optical system configured to provide a beam of radiation to a surface to be measured and to receive redirected radiation from the surface; and a detection system configured to measure the redirected radiation, wherein the optical system includes an optical element to process the radiation, the optical element including a Mac Neille-type multilayer polarizing coating configured to produce a reduced chromatic offset of the radiation.
    Type: Application
    Filed: September 14, 2018
    Publication date: August 27, 2020
    Applicant: ASML Holding N.V.
    Inventors: Parag Vinayak KELKAR, Justin Lloyd KREUZER
  • Method and device for pupil illumination in overlay and critical dimension sensors
    Patent number: 10754259
    Abstract: An illumination system for a metrology apparatus that can achieve illumination spatial profile flexibility, high polarization extinction ratio, and high contrast. The illumination system includes a polarizing beam splitter (PBS), an illumination mode selector (IMS), and a reflective spatial light modulator (SLM). The PBS divides an illumination beam into sub-beams. The IMS has a plurality of apertures that transmits at least one sub-beam and may be arranged in multiple illumination positions corresponding to illumination modes. A pixel array of the reflective SLM and reflects a portion of the sub-beam transmitted by the IMS back to the IMS and PBS. The PBS, IMS, SLM collectively generates a complex amplitude or intensity spatial profile of the transmitted sub-beam.
    Type: Grant
    Filed: June 16, 2017
    Date of Patent: August 25, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Yevgeniy Konstantinovich Shmarev, Markus Franciscus Antonius Eurlings
  • Beam splitting prism systems
    Patent number: 10747010
    Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: August 18, 2020
    Assignee: ASML Holding N.V.
    Inventors: Douglas C. Cappelli, Stanislav Smirnov, Richard Carl Zimmerman, Joshua Adams, Alexander Kenneth Raub, Yevgeniy Konstantinovich Shmarev
  • Optical system of an alignment system
    Patent number: 10732524
    Abstract: An optical system for improving alignment measurement accuracy is discussed. The optical system includes first and second optical elements. The first optical element may be configured to change a first beam having a first polarization state into a second beam having a second polarization state. The second optical element may be configured to provide total internal reflection of the second beam and to change the second beam into a third beam having a third polarization state. The first, second, and third polarization states may be different from each other.
    Type: Grant
    Filed: July 19, 2016
    Date of Patent: August 4, 2020
    Assignee: ASML Holding N.V.
    Inventors: Krishanu Shome, Justin Lloyd Kreuzer
  • Method and device for focusing in an inspection system
    Patent number: 10724961
    Abstract: An inspection apparatus includes an inspection optical system configured to a direct an inspection beam onto a surface of a substrate, the inspection optical system having an objective, a focus measurement optical system configured to receive a focus measurement beam, redirected by the substrate, from the objective, the focus measurement optical system having a movable reflective element configured to receive the focus measurement beam, and a control system configured to cause movement of the reflective element with a direction component along a beam path of the focus measurement beam and configured to determine whether the substrate surface is in the focus of the objective based on the focus measurement beam.
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: July 28, 2020
    Assignee: ASML Holding N.V.
    Inventors: Yevgeniy Konstantinovich Shmarev, Stanislav Smirnov