Patents Assigned to ASML Holding N.V.
  • Patent number: 10852247
    Abstract: An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path and configured to adjust a shape of a wave front of the beam of EM radiation, the adaptive optical system including: a first aspherical optical element; a second aspherical optical element adjacent the first aspherical optical element; and an actuator configured to cause relative movement between the first optical element and the second optical element in a direction different from a beam axis of the portion of the EM radiation path.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: December 1, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Stanislav Smirnov, Johannes Matheus Marie De Wit, Teunis Willem Tukker, Armand Eugene Albert Koolen
  • Publication number: 20200348606
    Abstract: Methods and systems are described for cleaning a support such as a clamp of a chuck that holds a patterning device or a wafer in a lithographic apparatus. The method includes loading a electrostatic cleaning substrate into a lithographic apparatus. The electrostatic cleaning substrate includes at least one electrode. The method further includes bringing the electrostatic cleaning substrate near to the clamping surface to be cleaned and connecting the electrode to a voltage source. Particles present on the support are then transferred to the electrostatic cleaning substrate.
    Type: Application
    Filed: July 31, 2018
    Publication date: November 5, 2020
    Applicant: ASML Holding N.V.
    Inventors: Victor Antonio PEREZ-FALCON, Michael Andrew CHIEDA
  • Patent number: 10809193
    Abstract: An inspection apparatus or lithographic apparatus includes an optical system and a detector. The optical system includes a non-linear prismatic optic. The optical system is configured to receive zeroth and first diffraction order beams reflected from a diffraction target and separate first and second polarizations of each diffraction order beam. The detector is configured to simultaneously detect first and second polarizations of each of the zeroth and first diffraction order beams. Based on the detected first and second polarizations of one or more diffraction orders, an operational parameter of a lithographic apparatus can be adjusted to improve accuracy or precision in the lithographic apparatus. The optical system can include a plurality of non-linear prismatic optics. For example, the optical system can include a plurality of Wollaston prisms.
    Type: Grant
    Filed: March 25, 2019
    Date of Patent: October 20, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Marinus Johannes Maria Van Dam, Richard Carl Zimmerman
  • Publication number: 20200326556
    Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.
    Type: Application
    Filed: June 26, 2020
    Publication date: October 15, 2020
    Applicant: ASML Holding N.V.
    Inventors: Douglas C. CAPPELLI, Stanislav SMIRNOV, Richard Carl ZIMMERMAN, Joshua ADAMS, Alexander Kenneth RAUB, Yevgeniy Konstantinovich SHMAREV
  • Publication number: 20200326640
    Abstract: A lithographic cluster includes a track unit and a lithographic apparatus. The lithographic apparatus includes an alignment sensor and at least one controller. The track unit is configured to process a first lot and a second lot. The lithographic apparatus is operatively coupled to the track unit. The alignment sensor is configured to measure an alignment of at least one alignment mark type of a calibration wafer. At least one controller is configured to determine a correction set for calibrating the lithographic apparatus based on the measured alignment of the at least one alignment mark type and apply first and second weight corrections to the correction set for processing the first and second lots, respectively, such that overlay drifts or jumps during processing the first and second lots are mitigated.
    Type: Application
    Filed: October 26, 2018
    Publication date: October 15, 2020
    Applicant: ASML Holding N.V.
    Inventors: Irit TZEMAH, Eric Brian CATEY, John David CONNELLY
  • Patent number: 10802208
    Abstract: A measurement apparatus, including: a tapered optical fiber, the tapered optical fiber having an input to receive radiation and having an output to provide spectrally broadened output radiation toward a measurement target, the tapered optical fiber configured to spectrally broaden the radiation received at the input; and a detector system configured to receive a redirected portion of the output radiation from the measurement target.
    Type: Grant
    Filed: March 17, 2017
    Date of Patent: October 13, 2020
    Assignee: ASML Holding N.V.
    Inventors: King Pui Leung, Tao Chen, Ronan James Havelin, Igor Matheus Petronella Aarts, Adel Joobeur, Joseph Carbone
  • Publication number: 20200278295
    Abstract: An optical system for beam pointing monitoring and compensation is provided. According to an embodiment, a beam pointing monitor and compensation system includes a surface plasmon resonance (SPR) optical element (800). The SPR optical element includes an optical element (801) that includes first (806) and second (802) surfaces. The first and second surfaces of the optical element are substantially parallel to each other. The SPR optical element further includes a first metal layer (803) provided on the second surface of the optical element, a dielectric layer (805) provided on the first metal layer, and a second metal layer (807) provided on the dielectric layer.
    Type: Application
    Filed: September 4, 2018
    Publication date: September 3, 2020
    Applicant: ASML Holding N.V.
    Inventors: Matthew E. HANSEN, Ronald A. WILKLOW
  • Patent number: 10761435
    Abstract: Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.
    Type: Grant
    Filed: January 17, 2018
    Date of Patent: September 1, 2020
    Assignee: ASML Holding N.V.
    Inventors: Enrico Zordan, Brandon Adam Evans, Daniel Nathan Burbank, Ankur Ramesh Baheti, Samir A. Nayfeh
  • Publication number: 20200271438
    Abstract: An inspection apparatus, including: an optical system configured to provide a beam of radiation to a surface to be measured and to receive redirected radiation from the surface; and a detection system configured to measure the redirected radiation, wherein the optical system includes an optical element to process the radiation, the optical element including a Mac Neille-type multilayer polarizing coating configured to produce a reduced chromatic offset of the radiation.
    Type: Application
    Filed: September 14, 2018
    Publication date: August 27, 2020
    Applicant: ASML Holding N.V.
    Inventors: Parag Vinayak KELKAR, Justin Lloyd KREUZER
  • Patent number: 10754259
    Abstract: An illumination system for a metrology apparatus that can achieve illumination spatial profile flexibility, high polarization extinction ratio, and high contrast. The illumination system includes a polarizing beam splitter (PBS), an illumination mode selector (IMS), and a reflective spatial light modulator (SLM). The PBS divides an illumination beam into sub-beams. The IMS has a plurality of apertures that transmits at least one sub-beam and may be arranged in multiple illumination positions corresponding to illumination modes. A pixel array of the reflective SLM and reflects a portion of the sub-beam transmitted by the IMS back to the IMS and PBS. The PBS, IMS, SLM collectively generates a complex amplitude or intensity spatial profile of the transmitted sub-beam.
    Type: Grant
    Filed: June 16, 2017
    Date of Patent: August 25, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Yevgeniy Konstantinovich Shmarev, Markus Franciscus Antonius Eurlings
  • Patent number: 10747010
    Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: August 18, 2020
    Assignee: ASML Holding N.V.
    Inventors: Douglas C. Cappelli, Stanislav Smirnov, Richard Carl Zimmerman, Joshua Adams, Alexander Kenneth Raub, Yevgeniy Konstantinovich Shmarev
  • Patent number: 10732524
    Abstract: An optical system for improving alignment measurement accuracy is discussed. The optical system includes first and second optical elements. The first optical element may be configured to change a first beam having a first polarization state into a second beam having a second polarization state. The second optical element may be configured to provide total internal reflection of the second beam and to change the second beam into a third beam having a third polarization state. The first, second, and third polarization states may be different from each other.
    Type: Grant
    Filed: July 19, 2016
    Date of Patent: August 4, 2020
    Assignee: ASML Holding N.V.
    Inventors: Krishanu Shome, Justin Lloyd Kreuzer
  • Patent number: 10724961
    Abstract: An inspection apparatus includes an inspection optical system configured to a direct an inspection beam onto a surface of a substrate, the inspection optical system having an objective, a focus measurement optical system configured to receive a focus measurement beam, redirected by the substrate, from the objective, the focus measurement optical system having a movable reflective element configured to receive the focus measurement beam, and a control system configured to cause movement of the reflective element with a direction component along a beam path of the focus measurement beam and configured to determine whether the substrate surface is in the focus of the objective based on the focus measurement beam.
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: July 28, 2020
    Assignee: ASML Holding N.V.
    Inventors: Yevgeniy Konstantinovich Shmarev, Stanislav Smirnov
  • Patent number: 10719019
    Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material.
    Type: Grant
    Filed: July 6, 2017
    Date of Patent: July 21, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Thomas Poiesz, Satish Achanta, Mehmet Ali Akbas, Pavlo Antonov, Jeroen Bouwknegt, Joost Wilhelmus Maria Frenken, Evelyn Wallis Pacitti, Nicolaas Ten Kate, Bruce Tirri, Jan Verhoeven
  • Publication number: 20200225591
    Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.
    Type: Application
    Filed: July 18, 2018
    Publication date: July 16, 2020
    Applicants: ASML Netherlands B,V., ASML Holding N.V.
    Inventors: Han-Kwang NIENHUYS, Ronald Peter ALBRIGHT, Jacob BRINKERT, Yang-Shan HUANG, Hendrikus Gijsbertus SCHIMMEL, Antonie Hendrik VERWEIJ
  • Patent number: 10705439
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: July 7, 2020
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
  • Patent number: 10698226
    Abstract: A method is disclosed that includes splitting a beam of radiation into a first part of the beam having a first polarization and a second part of the beam having a second polarization, forming a first beam with a first polarization distribution between the first polarization and the second polarization and/or a first intensity distribution by modulating the first part of the beam, forming a second beam with a second polarization distribution between the first polarization and the second polarization and/or a second intensity distribution by modulating the second part of the beam, and combining at least a portion of the first beam having the second polarization and at least a portion of the second beam having the first polarization.
    Type: Grant
    Filed: December 6, 2016
    Date of Patent: June 30, 2020
    Assignee: ASML Holding N.V.
    Inventor: Parag Vinayak Kelkar
  • Patent number: 10670978
    Abstract: A spectrally broadened radiation apparatus, including a laser configured to emit, through an output of the laser, radiation substantially only in the visible region of the electromagnetic spectrum, the radiation having a nominal wavelength, and an optical fiber optically coupled to the output of the laser, the optical fiber having an input to receive the radiation from the laser and having an output to provide spectrally broadened output radiation, the optical fiber configured to spectrally broaden the radiation from the laser to a spectral width of at least 0.5 nm around the nominal wavelength.
    Type: Grant
    Filed: August 11, 2015
    Date of Patent: June 2, 2020
    Assignee: ASML Holding N.V.
    Inventors: King Pui Leung, Tao Chen, Kevin J. Violette
  • Patent number: 10642166
    Abstract: A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: May 5, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Güneş Nakíbo{hacek over (g)}lu, Lowell Lane Baker, Ruud Hendrikus Martinus Johannes Bloks, Hakki Ergün Cekli, Geoffrey Alan Schultz, Laurentius Johannes Adrianus Van Bokhoven, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Christopher Charles Ward
  • Publication number: 20200124995
    Abstract: An alignment mark for determining a two-dimensional alignment position of a substrate is discussed. The alignment mark includes an array of patterns. The array of patterns includes a first set of patterns and a second set of patterns arranged. The first set of patterns is arranged in a first sequence along a first direction. The second set of patterns is arranged in a second sequence along the first direction. The second sequence is different from the first sequence. Each pattern of the array of patterns is different from other patterns of the array of patterns that are adjacent to the each pattern.
    Type: Application
    Filed: May 2, 2018
    Publication date: April 23, 2020
    Applicant: ASML Holding N.V.
    Inventors: Gerrit Johannes NIJMEIJER, Junqiang ZHOU, Piotr Jan MEYER, Jeffrey John LOMBARDO, Igor Matheus Petronella AARTS