Patents Assigned to ASML Holding N.V.
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Publication number: 20180299793Abstract: A method and apparatus to measure a target (e.g., an alignment mark (e.g., on a substrate)) is disclosed. Relative movement between the target and a measurement spot of a measurement system in a “fly-in” direction (e.g., movement of the target towards the measurement spot) is performed so that a first measurement for the target can be made. Thereafter, relative movement between the target and the measurement spot is made in an opposite “fly-in” direction so that a second measurement for the target can be made. By combining (e.g., averaging) these two measurements, an error is cancelled out, and higher accuracy in the measurement may be achieved.Type: ApplicationFiled: September 30, 2016Publication date: October 18, 2018Applicant: ASML Holding N.VInventors: Hong YE, Gerrit Johannes NIJMEIJER
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Patent number: 10082740Abstract: An alignment system having long term stability in illumination center wavelength is discussed. The alignment system includes a tunable radiation source and a feedback control system. The tunable radiation source includes a light source configured to provide a broadband radiation beam and a tunable multi-passband filter configured to filter the broadband radiation beam into narrow band radiation beam having a center wavelength value. The feedback control system is configured to measure the center wavelength value of the narrow band radiation beam and compare the measured center wavelength value with a desired center wavelength value. The feedback control system is further configured to generate a control signal based on the comparison in response to a difference being present between the measured center wavelength value and the desired center wavelength value and tune the tunable filter based on the control signal to eliminate or substantially reduce the difference.Type: GrantFiled: November 26, 2015Date of Patent: September 25, 2018Assignee: ASML Holding N.V.Inventors: Tao Chen, King Pui Leung, Kevin J. Violette
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Publication number: 20180267414Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.Type: ApplicationFiled: May 18, 2018Publication date: September 20, 2018Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Santiago E. DELPUERTO, Antonius Franciscus Johannes De Groot, Kenneth C. HENDERSON, Raymond Wilhelmus Louis LAFARRE, Matthew Lipson, Louis John Markoya, Tammo Uitterdijk, Ronald Van Der Wilk, Johannes Petrus Martinus Bernardus Vermeulen
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Publication number: 20180224759Abstract: An optical system for improving alignment measurement accuracy is discussed. The optical system includes first and second optical elements. The first optical element may be configured to change a first beam having a first polarization state into a second beam having a second polarization state. The second optical element may be configured to provide total internal reflection of the second beam and to change the second beam into a third beam having a third polarization state. The first, second, and third polarization states may be different from each other.Type: ApplicationFiled: July 19, 2016Publication date: August 9, 2018Applicant: ASML Holding N.V.Inventors: Krishanu SHOME, Justin LIoyd KREUZER
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Patent number: 10031428Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.Type: GrantFiled: February 20, 2014Date of Patent: July 24, 2018Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Koen Cuypers, Marcelo Henrique De Andrade Oliveira, Marinus Jan Remie, Chattarbir Singh, Laurentius Johannes Adrianus Van Bokhoven, Henricus Anita Jozef Wilhemus Van De Ven, José Nilton Fonseca Junior, Frank Johannes Jacobus Van Boxtel, Daniel Nathan Burbank, Erik Roelof Loopstra, Johannes Onvlee, Mark Josef Schuster, Robertus Nicodemus Jacobus Van Ballegoij, Christopher Charles Ward, Jan Steven Christiaan Westerlaken
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Publication number: 20180196360Abstract: A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.Type: ApplicationFiled: June 17, 2016Publication date: July 12, 2018Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Laurentius Johannes Adrianus VAN BOKHOVEN, Christopher Charles WARD, Marc Léon VAN DER GAAG, Johan Gertrudis Cornelis KUNNEN
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Patent number: 10001713Abstract: A support such as a clamp (310) is configured to releasably hold a patterning device such as a reticle (300) to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate (312) having opposing first (313) and second (315) surfaces, a plurality of burls (316) located on the first surface and configured to contact the reticle, a second substrate (314) having opposing first (317) and second (319) surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements (318) are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.Type: GrantFiled: February 5, 2014Date of Patent: June 19, 2018Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Santiago E. Del Puerto, Matthew Lipson, Kenneth C. Henderson, Raymond Wilhelmus Louis LaFarre, Louis John Markoya, Tammo Uitterdijk, Johannes Petrus Martinus Bernardus Vermeulen, Antonius Franciscus Johannes De Groot, Ronald Van Der Wilk
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Patent number: 9983487Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.Type: GrantFiled: November 20, 2015Date of Patent: May 29, 2018Assignees: ASML Holding N.V, ASML Netherlands B.V.Inventors: Robert Gabriël Maria Lansbergen, George Hilary Harrold, Richard John Johnson, Hugo Jacobus Gerardus Van Der Weijden
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Patent number: 9977351Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: July 13, 2017Date of Patent: May 22, 2018Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Patent number: 9970747Abstract: An apparatus (AS) measures positions of marks (202) on a lithographic substrate (W). An illumination arrangement (940, 962, 964) provides off-axis radiation from at least first and second regions. The first and second source regions are diametrically opposite one another with respect to an optical axis (O) and are limited in angular extent. The regions may be small spots selected according to a direction of periodicity of a mark being measured, or larger segments. Radiation at a selected pair of source regions can be generated by supplying radiation at a single source feed position to a self-referencing interferometer. A modified half wave plate is positioned downstream of the interferometer, which can be used in the position measuring apparatus. The modified half wave plate has its fast axis in one part arranged at 45° to the fast axis in another part diametrically opposite.Type: GrantFiled: February 22, 2017Date of Patent: May 15, 2018Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Justin Lloyd Kreuzer, Arie Jeffrey Den Boef, Simon Gijsbert Josephus Mathijssen
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Patent number: 9927726Abstract: Apparatus, systems, and methods are used for detecting the alignment of a feature on a substrate using a polarization independent interferometer. The apparatus, system, and methods include optical elements that receive light that has diffracted or scattered from a mark on a substrate. The optical elements may split the diffracted light into multiple subbeams of light which are detected by one or more detectors. The diffracted light may be combined optically or during processing after detection. The system may determine alignment and/or overlay based on the received diffracted light having any polarization angle or state.Type: GrantFiled: September 11, 2014Date of Patent: March 27, 2018Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Justin Lloyd Kreuzer, Simon Gijsbert Josephus Mathijssen
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Patent number: 9910368Abstract: A system (300) for supporting an exchangeable object (302) can include a movable structure (304) and an object holder (306) configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly (308) and second actuator assembly (316). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.Type: GrantFiled: September 20, 2013Date of Patent: March 6, 2018Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Christiaan Louis Valentin, Erik Roelof Loopstra, Christopher Charles Ward, Daniel Nathan Burbank, Mark Josef Schuster, Peter James Graffeo
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Patent number: 9904173Abstract: An inspection apparatus may determine precise OV measurements of a target on a substrate using an optical pupil symmetrizer to reduce the inspection apparatus's sensitivity to asymmetry and non-uniformity of the illumination beam in the pupil plane. The inspection apparatus includes an illumination system that forms a symmetrical illumination pupil by (1) splitting an illumination beam into sub-beams, (2) directing the sub-beams along different optical branches, (3) inverting or rotating at least one of the sub-beams in two dimensions, and recombining the sub-beams along the illumination path to symmetrize the intensity distribution. The illumination system is further configured such that the first and second sub-beams have an optical path difference that is greater than a temporal coherence length of the at least one beam and less than a depth of focus in the pupil plane of the objective optical system.Type: GrantFiled: December 15, 2015Date of Patent: February 27, 2018Assignee: ASML Holding N.V.Inventors: Yevgeniy Konstantinovich Shmarev, Stanislav Smirnov
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Patent number: 9857694Abstract: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.Type: GrantFiled: March 5, 2015Date of Patent: January 2, 2018Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Bearrach Moest, Peter A. Delmastro, Johannes Onvlee, Adrianus Martinus Van Der Wielen, Christopher Charles Ward
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Patent number: 9857703Abstract: An alignment sensor for a lithographic apparatus is arranged and constructed to measure an alignment of a movable part of the lithographic apparatus in respect of a stationary part of the lithographic apparatus. The alignment sensor comprises a light source configured to generate a pulse train at a optical wavelength and a pulse repetition frequency, a non-linear optical element, arranged in an optical propagation path of the pulse train, the non-linear optical element configured to transform the pulse train at the optical wavelength into a transformed pulse train in an optical wavelength range, an optical imaging system configured to project the transformed pulse train onto an alignment mark comprising a diffraction grating; a detector to detect a diffraction pattern as diffracted by the diffraction grating, and a data processing device configured to derive alignment data from the detected diffraction pattern as detected by the detector.Type: GrantFiled: July 7, 2015Date of Patent: January 2, 2018Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Simon Gijsbert Josephus Mathijssen, Arie Jeffrey Den Boef, Justin Lloyd Kreuzer, Patricius Aloysius Jacobus Tinnemans
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Publication number: 20170363973Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.Type: ApplicationFiled: December 2, 2015Publication date: December 21, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Thomas VENTURINO, Geoffrey Alan SCHULTZ, Daniel Nicholas GALBURT, Daniel Nathan BURBANK, Santiago E. DELPUERTO, Herman VOGEL, Johannes ONVLEE, Laurentius Johannes Adrianus VAN BOKHOVEN, Christopher Charles WARD
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Publication number: 20170363975Abstract: A lithographic apparatus injects gas between a patterning device and a patterning device masking blade to help protect the patterning device from contamination. The gas may be injected into the space defined between the patterning device and the patterning device blade by one or more gas supply nozzles that are arranged on at least one side of the patterning device. The one or more gas supply nozzles are coupled to a frame which a patterning device support structure moves relative to. Each nozzle may be constructed and arranged to supply gas over at least the patterning region of the reflective patterning device.Type: ApplicationFiled: December 7, 2015Publication date: December 21, 2017Applicant: ASML Holding N.V.Inventors: Peter KOCHERSPERGER, David RAMIREZ
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Publication number: 20170357166Abstract: An alignment system having long term stability in illumination center wavelength is discussed. The alignment system includes a tunable radiation source and a feedback control system. The tunable radiation source includes a light source configured to provide a broadband radiation beam and a tunable multi-passband filter configured to filter the broadband radiation beam into narrow band radiation beam having a center wavelength value. The feedback control system is configured to measure the center wavelength value of the narrow band radiation beam and compare the measured center wavelength value with a desired center wavelength value. The feedback control system is further configured to generate a control signal based on the comparison in response to a difference being present between the measured center wavelength value and the desired center wavelength value and tune the tunable filter based on the control signal to eliminate or substantially reduce the difference.Type: ApplicationFiled: November 26, 2015Publication date: December 14, 2017Applicant: ASML Holding N.V.Inventors: Tao CHEN, King Pui LEUNG, Kevin J. VIOLETTE
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Publication number: 20170307986Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: July 13, 2017Publication date: October 26, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Patent number: 9766557Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: February 21, 2017Date of Patent: September 19, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame