Patents Assigned to ASML Netherlands
  • DETECTOR INSPECTION DEVICE, DETECTOR ASSEMBLY, DETECTOR ARRAY, APPARATUS, AND METHOD
    Publication number: 20240339291
    Abstract: The embodiments of the present disclosure provides a detector inspection device for interrogating at least part of a detector comprised in a charged particle-optical assessment apparatus, the detector inspection device comprising: a coupler configured to be positioned proximate to a detector element of a detector; and a device controller configured to apply a stimulating signal to the coupler to stimulate a response signal in the detector for interrogating at least part of the detector.
    Type: Application
    Filed: June 13, 2024
    Publication date: October 10, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Herre Tjerk STEENSTRA, Marco Jan-Jaco WIELAND, Alexius Otto LOOIJE, Richard Michel VAN LEEUWEN, Erwin Robert Alexander VISSER, Andre Luis RODRIGUES MANSANO, Gretchen Renée VAN T VEEN, Duije SEEKLES, Roelof Albert MARISSEN
  • METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGED PARTICLE INSPECTION SYSTEM, METHOD OF PROCESSING A SAMPLE, ASSESSMENT METHOD
    Publication number: 20240339295
    Abstract: Methods are disclosed for generating a sample map and processing a sample. In one arrangement, a method comprises measuring a position of a first mark in each of a plurality of field regions on sample. A first model is fitted to the measured positions of the first marks. The fitted first model represents positions of the field regions. The method comprises measuring positions of a plurality of second marks in one field region or in each of a plurality of field regions. A second model is fitted to the measured positions of the second marks. The fitted second model represents a shape of each field region. A sample map is output using the fitted first and second models.
    Type: Application
    Filed: June 14, 2024
    Publication date: October 10, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Tzu-Chao CHEN, Te-Sheng WANG
  • CHARGED PARTICLE DEVICE, CHARGED PARTICLE ASSESSMENT APPARATUS, MEASURING METHOD, AND MONITORING METHOD
    Publication number: 20240339292
    Abstract: There is provided a charged particle device for a charged particle inspection apparatus for projecting an array of sub-beams towards a sample, the charged particle device comprising: a charged particle optical element and a detector. The charged particle optical element has an up-beam surface having a plurality of openings to generate an array of sub-beams from a charged particle beam. In the charged particle optical element are defined: sub-beam apertures and monitoring apertures. The sub-beam aperture extend through the charged particle element for paths of the array of sub-beams towards a sample. The monitoring aperture extends through the charged particle element. The detector is in the monitoring aperture. At least part of the detector is down-beam of the up-beam surface. The detector measures a parameter of a portion of the charged particle beam incident on the detector.
    Type: Application
    Filed: June 20, 2024
    Publication date: October 10, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Yan REN, Marijke SCOTUZZI, Albertus Victor Gerardus MANGNUS, Erwin Paul SMAKMAN
  • METHOD OF PROCESSING A SAMPLE, AND CHARGED PARTICLE ASSESSMENT SYSTEM
    Publication number: 20240339290
    Abstract: Methods of processing a sample and charged particle assessment systems are disclosed. In one arrangement, a sample is processed using a multi-beam of sub-beams of charged particles. At least a portion of a sub-beam processable area is processed with each sub-beam. The sub-beam processable area comprising an array of sections having rows of sections and columns of sections. Each row of sections defines an elongate region that is substantially equal to or smaller than a pitch at the sample surface of the sub-beams in the multi-beam. A plurality of the sections are processed.
    Type: Application
    Filed: June 20, 2024
    Publication date: October 10, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jurgen VAN SOEST, Marco Jan-Jaco WIELAND, Vincent Sylvester KUIPER
  • Metrology apparatus and method for determining a characteristic of one or more structures on a substrate
    Patent number: 12112260
    Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: October 8, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Lorenzo Tripodi, Patrick Warnaar, Grzegorz Grzela, Mohammadreza Hajiahmadi, Farzad Farhadzadeh, Patricius Aloysius Jacobus Tinnemans, Scott Anderson Middlebrooks, Adrianus Cornelis Matheus Koopman, Frank Staals, Brennan Peterson, Anton Bernhard Van Oosten
  • IMAGE DISTORTION CORRECTION IN CHARGED PARTICLE INSPECTION
    Publication number: 20240331115
    Abstract: An improved systems and methods for correcting distortion of an inspection image are disclosed. An improved method for correcting distortion of an inspection image comprises acquiring an inspection image, aligning a plurality of patches of the inspection image based on a reference image corresponding to the inspection image, evaluating, by a machine learning model, alignments between each patch of the plurality of patches and a corresponding patch of the reference image, determining local alignment results for the plurality of patches of the inspection image based on a reference image corresponding to the inspection image, determining an alignment model based on the local alignment results, and correcting a distortion of the inspection image based on the alignment model.
    Type: Application
    Filed: June 2, 2022
    Publication date: October 3, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Haoyi LIANG, Zhichao CHEN, Lingling PU, Fang-Cheng CHANG, Liangjiang YU, Zhe WANG
  • CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING CHARGED-PARTICLE APPARATUS AND CONTROL METHOD
    Publication number: 20240331968
    Abstract: A charged-particle apparatus generates a plurality of sub-beams from a source beam of charged particles and direct the sub-beams downbeam toward a sample position. The charged-particle apparatus comprises a charged particle source, an aperture array, and a charged particle optical component. The charged-particle source comprises an emitter to emit a source beam of charged particles along a divergent path. The aperture array is positioned in the divergent path so the aperture array generates sub-beams from the source beam. The charged-particle-optical component acts on the source beam upbeam of the aperture array. The charged-particle-optical component comprises a multipole and/or a charged-particle lens. The multipole operates on the source beam to vary the position of the divergent path at the aperture array. The multipole may vary a cross-sectional shape of the divergent path at the aperture array.
    Type: Application
    Filed: June 13, 2024
    Publication date: October 3, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Yan REN, Albertus Victor Gerardus MANGNUS, Marijke SCOTUZZI, Erwin Paul SMAKMAN
  • LITHOGRAPHY SYSTEM, SUBSTRATE SAG COMPENSATOR, AND METHOD
    Publication number: 20240329546
    Abstract: A system includes a support table having one or more protrusions and a pressure device. The one or more protrusions contact and support a substrate such that the substrate is suspended with respect to the support table. Sagging of the substrate when supported by the support table is based on a material and/or dimensions of the substrate. The pressure adjusts a pressure on a side of the substrate such that the sagging is reduced.
    Type: Application
    Filed: June 28, 2022
    Publication date: October 3, 2024
    Applicant: ASML Netherlands B.V.
    Inventor: Marcus Adrianus VAN DE KERKHOF
  • SYSTEMS AND METHODS FOR THERMALLY STABLE MOUNTING OF OPTICAL COLUMNS
    Publication number: 20240329548
    Abstract: Systems and methods are disclosed for stabilizing an optical column. One system can include an optical column; a frame configured to support the optical column, the frame having a first coefficient of thermal expansion (CTE); and a subframe configured to be coupled to the optical column in at least two places by a first anchor and a second anchor to stabilize the optical column against a displacement or a rotation caused by thermal expansion in the frame or the optical column, the subframe having a second CTE lower than the first CTE.
    Type: Application
    Filed: January 17, 2024
    Publication date: October 3, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Jasper WINTERS, Erwin John VAN ZWET, Marcus Johannes VAN DER LANS, Pieter Willem Herman DE JAGER, Emiel Anton VAN DE VEN
  • METHOD AND SYSTEM FOR ANOMALY-BASED DEFECT INSPECTION
    Publication number: 20240331132
    Abstract: Systems and methods for detecting a defect on a sample include receiving a first image and a second image associated with the first image; determining, using a clustering technique, N first feature descriptor(s) for L first pixel(s) in the first image and M second feature descriptor(s) for L second pixel(s) in the second image, wherein each of the L first pixel(s) is co-located with one of the L second pixel(s), and L, M, and N are positive integers; determining K mapping probability between a first feature descriptor of the N first feature descriptor(s) and each of K second feature descriptor(s) of the M second feature descriptor(s), wherein K is a positive integer; and providing an output for determining whether there is existence of an abnormal pixel representing a candidate defect on the sample based on a determination that one of the K mapping probability does not exceed a threshold value.
    Type: Application
    Filed: June 3, 2022
    Publication date: October 3, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Haoyi LIANG, Yani CHEN, Ming-Yang YANG, Yang YANG, Xiaoxia HUANG, Zhichao CHEN, Liangjiang YU, Zhe WANG, Lingling PU
  • CHARGED PARTICLE ASSESSMENT SYSTEM AND METHOD
    Publication number: 20240331971
    Abstract: A charged particle assessment apparatus comprising: a charged particle beam device; an actuated sample stage; a hot component and a thermal compensator. The actuated sample stage is configured to hold a sample. The hot component is configured to operate such that, during operation, heat is radiated toward a sample held on the sample holder. The hot component is smaller than the sample. The thermal compensator is configured to heat the sample so as to reduce thermal gradients therein.
    Type: Application
    Filed: June 12, 2024
    Publication date: October 3, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jurgen VAN SOEST, Vincent Sylvester KUIPER, Yinglong LI
  • Metrology method and associated computer product
    Patent number: 12105432
    Abstract: Disclosed is a method comprising measuring radiation reflected from a metrology target and decomposing the measured radiation in components, for example Fourier components or spatial components. Further, there is disclosed a recipe selection method which provides an algorithm to select a parameter of the metrology apparatus based on re-calculated dependencies of 5 the measured radiation based on single components.
    Type: Grant
    Filed: July 7, 2020
    Date of Patent: October 1, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Narjes Javaheri, Maurits Van Der Schaar, Tieh-Ming Chang, Hilko Dirk Bos, Patrick Warnaar, Samira Bahrami, Mohammadreza Hajiahmadi, Sergey Tarabrin, Mykhailo Semkiv
  • Method and apparatus for monitoring beam profile and power
    Patent number: 12105036
    Abstract: A system and a method for monitoring a beam in an inspection system are provided. The system includes an image sensor configured to collect a sequence of images of a beam spot of a beam formed on a surface, each image of the sequence of images having been collected at a different exposure time of the image sensor, and a controller configured to combine the sequence of images to obtain a beam profile of the beam.
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: October 1, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Jian Zhang, Ning Ye, DanJing Huang, Bin-Da Chan
  • SYSTEM AND METHOD FOR INSPECTION BY FAILURE MECHANISM CLASSIFICATION AND IDENTIFICATION IN A CHARGED PARTICLE SYSTEM
    Publication number: 20240319123
    Abstract: Apparatuses, systems, and methods for providing beams for classifying and identifying failure mechanisms associated with a sample of charged particle beam systems. In some embodiments, a method may include analyzing a first plurality of voltage contrast images of a sample to identify a plurality of defects; and analyzing a pattern of a subset of the plurality of defects to determine a failure mechanism for the subset of the plurality of defects.
    Type: Application
    Filed: August 16, 2022
    Publication date: September 26, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Achim WOESSNER, Younghoon SONG, Pioter NIKOLSKI, Yun A SUNG, Antonio CORRADI, Hermanus Adrianus DILLEN
  • CHARGED-PARTICLE OPTICAL DEVICE
    Publication number: 20240321547
    Abstract: Charged-particle optical devices are disclosed. In one arrangement, a device includes a charged particle column and a light sensor. An objective lens array projects a plurality of beams towards a sample and has a plurality of electrodes arranged along a path of the plurality of beams. A plurality of scintillators receives signal particles emitted from the sample. Light is generated in response to the received signal particles. A light guiding arrangement guides light generated by the scintillators to the light sensor. The light guiding arrangement includes a mirror defining a plurality of apertures to allow passage of the plurality of beams through the mirror towards the sample.
    Type: Application
    Filed: July 5, 2022
    Publication date: September 26, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Marco Jan-Jaco WIELAND
  • METROLOGY TARGET OPTIMIZATION
    Publication number: 20240320528
    Abstract: A method of designing a target includes obtaining a model of an initial dataset, performing a Bayesian optimization using the model which provides an improved model, and performing an optimization of the target design using the improved model.
    Type: Application
    Filed: August 17, 2022
    Publication date: September 26, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Patrick Philipp HELFENSTEIN, Scott Anderson MIDDLEBROOKS, Markus Gerardus Martinus Maria VAN KRAAIJ, Maxim PISARENCO
  • METROLOGY SYSTEM AND METHOD FOR DETERMINING A CHARACTERISTIC OF ONE OR MORE STRUCTURES ON A SUBSTRATE
    Publication number: 20240319620
    Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
    Type: Application
    Filed: April 30, 2024
    Publication date: September 26, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Patricius Aloysius Jacobus TINNEMANS, Arie Jeffrey DEN BOEF, Armand Eugene Albert KOOLEN, Nitesh PANDEY, Vasco Tomas TENNER, Willem Marie Julia Marcel COENE, Patrick WARNAAR
  • MATCH THE ABERRATION SENSITIVITY OF THE METROLOGY MARK AND THE DEVICE PATTERN
    Publication number: 20240319581
    Abstract: Generating a design (e.g., a metrology mark or a device pattern to be printed on a substrate) that is optimized for aberration sensitivity related to an optical system of a lithography system. A metrology mark (e.g., a transmission image sensor (TIS) mark) is optimized for a given device pattern by matching the aberration sensitivity of the metrology mark with the aberration sensitivity of the device pattern. A cost function that includes the aberration sensitivity difference between the metrology mark and the device pattern is evaluated based on an imaging characteristic response (e.g., a critical dimension (CD) response to focus) obtained from a simulation model that simulates lithography. The cost function is evaluated by modifying the metrology mark until the cost function is minimized and an optimized metrology mark is output when the cost function is minimized.
    Type: Application
    Filed: July 15, 2022
    Publication date: September 26, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Stephen HSU, Jialei TANG, Dezheng SUN
  • Actuator unit for positioning an optical element
    Patent number: 12099307
    Abstract: Disclosed is an actuator unit for positioning an optical element, comprising a first reluctance actuator comprising a first stator part and a first mover part separated by a gap in a first direction. The first mover part is constructed and arranged to be connected to the optical element and for moving the optical element. The first stator part is constructed and arranged to exert a magnetic force on the first mover part along a first line of actuation. The first mover part is movable relative to the first stator part in the first direction. The first stator part and the first mover part are constructed and arranged such that the first line of actuation is, in operational use, moving along with the first mover part in a second direction perpendicular to the first direction, for at least a predetermined movement range of the first mover part in the second direction.
    Type: Grant
    Filed: March 19, 2021
    Date of Patent: September 24, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Sjoerd Martijn Huiberts, René Josephus Johannes Van Der Meulen, Johannes Petrus Martinus Bernardus Vermeulen
  • Method for controlling a lithographic system
    Patent number: 12099306
    Abstract: A lithographic system comprises a radiation source and a lithographic apparatus. The radiation source provides radiation to the lithographic apparatus. The lithographic apparatus uses the radiation for imaging a pattern onto multiple target areas on a layer of photo-resist on a semiconductor substrate. The imaging requires a pre-determined dose of radiation. The system is controlled so as to set a level of a power of the radiation in dependence on a magnitude of the pre-determined dose.
    Type: Grant
    Filed: February 20, 2020
    Date of Patent: September 24, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Oscar Franciscus Jozephus Noordman, Antonius Theodorus Wilhelmus Kempen, Jan Bernard Plechelmus Van Schoot, Marinus Aart Van Den Brink