Patents Assigned to DSM
  • Publication number: 20090080851
    Abstract: The present invention relates to a radiation curable coating composition comprising a radiation curable oligomer comprising a backbone derived from polypropylene glycol and a dimer acid based polyester polyol, wherein said coating composition, when cured, is having: a) a hardening temperature (Th) of from ?10° C. to about ?20° C. and a modulus measured at said Th of lower than 5.0 MPa; or b) a hardening temperature (Th) of from ?20° C. to about ?30° C. and a modulus measured at said Th of lower than 20.0 MPa; or c) a hardening temperature (Th) of lower than about ?30° C. and a modulus measured at said Th of lower than 70.0 MPa.
    Type: Application
    Filed: November 12, 2008
    Publication date: March 26, 2009
    Applicant: DSM IP ASSETS B.V.,
    Inventors: Sandra Joanna Nagelvoort, Johannes Adrianus Van Eekelen, Adrianus Gijsbertus Maria Abel, Gouke Dirk-Jan Geus, Duurt Pieter Willem Alkema, Giacomo Stefano Roba, Marco Arimondi, Lidia Terruzzi, Sabrina Fogliani
  • Publication number: 20090081329
    Abstract: The present invention describes a method of producing curd or cheese from a milk composition consisting of the following steps:—heating the milk, —adding to the heat treated milk a protein hydrolysate, —adding to the heat treated milk a coagulant to form a gel, and—processing the formed gel into a cheese curd and separating the whey from the curd.
    Type: Application
    Filed: December 21, 2005
    Publication date: March 26, 2009
    Applicant: DSM IP ASSETS B.V.
    Inventors: Albertus Alard Van Dijk, Baukje Folkertsma, Lambertus Jacobus Otto Guillonard
  • Publication number: 20090075435
    Abstract: A process for manufacturing a Junction Field-Effect Transistor, comprises doping a semiconductor material formed on an insulating substrate with impurities of a first conductivity type to form a well region. The process continues by implanting impurities of a second conductivity type into said well region to form a channel region, and by implanting impurities of the first conductivity type in said well region to form a back gate region. The process continues by forming a trench to expose at least one sidewall of said channel region, wherein the trench extends far enough along the sidewall to expose at least a portion of said back gate region. The process continues by depositing polysilicon to fill said trench along the at least one sidewall of said channel region and at least a portion of said back gate region, wherein at least a portion of the polysilicon will form a gate contact. The polysilicon is then doped with impurities of a first conductivity type.
    Type: Application
    Filed: November 14, 2008
    Publication date: March 19, 2009
    Applicant: DSM Solutions, Inc.
    Inventor: Madhukar B. Vora
  • Publication number: 20090072278
    Abstract: A semiconductor device includes a substrate of semiconductor material. A source region, a drain region, and a conducting region of the semiconductor device are formed in the substrate and doped with a first type of impurities. The conducting region is operable to conduct current between the drain region and the source region when the semiconductor device is operating in an on state. A gate region is also formed in the substrate and doped with a second type of impurities. The gate region abuts a channel region of the conducting region. A stress layer is deposited on at least a portion of the conducting region. The stress layer applies a stress to the conducting region along a boundary of the conducting region that strains at least a portion of the conducting region.
    Type: Application
    Filed: November 17, 2008
    Publication date: March 19, 2009
    Applicant: DSM Solutions, Inc.
    Inventor: Ashok K. Kapoor
  • Publication number: 20090076209
    Abstract: The present invention is directed to a thermoplastic elastomer composition comprising a thermoplastic polyolefine, an elastomer and oil whereby the composition comprises less than 15% by weight of the thermoplastic polyolefine, relative to the total weight of the thermoplastic elastomer composition, the elastomer is peroxide vulcanized and the weight ratio oil/elastomer is above 1.5. Preferably the elastomer is a copolymer of ethylene, propylene (EPM) or a copolymer of ethylene, propylene and a third monomer (EPDM) or a mixture of EPDM and EPM. The thermoplastic polyolefine is preferably polyethylene, polypropylene or a mixture thereof.
    Type: Application
    Filed: November 7, 2008
    Publication date: March 19, 2009
    Applicant: DSM IP Assets B.V.
    Inventor: Albertus O. DOZEMAN
  • Patent number: 7501082
    Abstract: The invention relates to an oven for drawing fibers at elevated temperature, which oven is on two sides opposite one another provided with guide rolls dictating a zigzag up-and-down drawing trajectory for the fiber in the oven. In the oven according to the invention the drawing trajectory is at least 20 meters long and the rolls are driven. The invention also relates to a process for drawing fibers using the oven according to the invention, in particular to a process for producing highly oriented polyethylene fibers.
    Type: Grant
    Filed: September 27, 2001
    Date of Patent: March 10, 2009
    Assignee: DSM IP Assets B.V.
    Inventor: Jacobus Johannes Mencke
  • Publication number: 20090057727
    Abstract: This invention describes a method of building complementary logic circuits using junction field effect transistors in silicon. This invention is ideally suited for deep submicron dimensions, preferably below 65 nm. The basis of this invention is a complementary Junction Field Effect Transistor which is operated in the enhancement mode. The speed-power performance of the JFETs becomes comparable with the CMOS devices at sub-70 nanometer dimensions. However, the maximum power supply voltage for the JFETs is still limited to below the built-in potential (a diode drop). To satisfy certain applications which require interface to an external circuit driven to higher voltage levels, this invention includes the structures and methods to build CMOS devices on the same substrate as the JFET devices.
    Type: Application
    Filed: November 3, 2008
    Publication date: March 5, 2009
    Applicant: DSM Solutions, Inc.
    Inventor: Ashok K. Kapoor
  • Patent number: 7498055
    Abstract: Process for the preparation of urea granules in a fluid-bed granulator, by using at least one feeding device to feed a urea melt in the form of a film to a fluidized bed of solid urea nuclei, upon which the nuclei grow by solidification of the urea melt on the nuclei, in which the amounts of biuret and water in the urea melt and in the urea granules fulfill the following relation b m · b g w m · ( w m - w g ) = 0.1 - 20 wherein bm=the % by weight of biuret in the urea melt bg=the % by weight of biuret in the urea granules wm=the % by weight of water in the urea melt wg=the % by weight of water in the urea granules.
    Type: Grant
    Filed: October 15, 2004
    Date of Patent: March 3, 2009
    Assignee: DSM IP Assets B.V.
    Inventor: Stanislaus Martinus Petrus Mutsers
  • Publication number: 20090053342
    Abstract: The present invention provides a process for the production of a microbial oil comprising culturing a micro-organism in a two stage fermentation process where, in a last stage that precedes the end of fermentation, the carbon source is: consumed by the micro-organisms at a rate greater than it is added to the medium; added at a rate #0.30 M carbon/kg medium; or is rate limiting on the growth of the micro-organism. The micro-organisms thus have the carbon source restricted so that they preferentially metabolise fats or lipids other than arachidonic acid (ARA), so increasing the proportion of ARA in the cells. A microbial oil is then recovered from the micro-organism, using hexane as a solvent, that has at least 50% ARA and at least 90% triglycerides.
    Type: Application
    Filed: October 1, 2008
    Publication date: February 26, 2009
    Applicant: DSM IP Assets B.V.
    Inventors: Hugo STREEKSTRA, Petrus Joseph Maria Brocken
  • Patent number: 7495057
    Abstract: The invention relates to resin compositions that contains as components: (A) a monomer with at least one ethylenic unsaturation and with an isocyanate reactive group, (B) an ethylenically unsaturated monomer that can react with component (A) by means of radical polymerization, (C) a polyisocyanate that can react with component (A) by means of a polyurethane reaction and that on average has at least 1.75 isocyanate groups, (D) a catalyst for the radical polymerization, and that also contains (E) a thermoplastic polymer with an average molecular weight of at least 10,000 Dalton. The invention also relates to a process for the preparation of moulded articles from such resin compositions, as well as the moulded articles themselves.
    Type: Grant
    Filed: April 8, 2002
    Date of Patent: February 24, 2009
    Assignee: DSM IP Assets B.V.
    Inventors: Adrianus J De Koning, Markus R Luesken, Peter Dijkink
  • Patent number: 7495101
    Abstract: A process for manufacturing a 3-unsubstituted, 3-monosubstituted or 3,3-disubstituted 9-acyloxy-1,5-dihydro-8-methylpyrido[3,4-e] [1,3]dioxepin (I) and optionally for manufacturing pyridoxine involves performing an addition reaction between a 4-methyl-5-alkoxy-oxazole (II) and a 2-unsubstituted, 2-monosubstituted or 2,2-disubstituted 4,7-dihydro-(1,3)-dioxepin (III) in the substantial absence of a solvent and a catalyst to give a product mixture consisting essentially of the appropriate Diels-Alder adduct (IV) in a major proportion and the appropriate 3-unsubstituted, 3-monosubstituted or 3,3-disubstituted 1,5-dihydro-8-methylpyrido[3,4-e] [1,3]dioxepin 9-ol (V) in a minor proportion, removal of a substantial proportion of the unreacted oxazole and dioxapin starting materials from the product mixture by distillation under reduced pressure, addition of a substantially anhydrous organic acid to said product mixture and rearrangement of the Diels-Alder adduct IV to further V in the presence of said substantially
    Type: Grant
    Filed: November 9, 2004
    Date of Patent: February 24, 2009
    Assignee: DSM IP Assets B.V.
    Inventors: Jocelyn Fischesser, Helmut Fritsch, Andrew George Gum, Reinhard Karge, Ralf Keuper
  • Patent number: 7491520
    Abstract: The invention relates to biochemical synthesis of 6-amino caproic acid from 6-aminohex-2-enoic acid compound or from 6-amino-2-hydroxyhexanoic acid, by treatment with an enzyme having ?,?-enoate reductase activity towards molecules containing an ?,?-enoate group and a primary amino group. The invention also relates to processes for obtaining suitable genetically engineered cells for being used in such biotransformation process, and to precursor fermentation of 6-amino caproic acid from intermediates leading to 6-amino caproic acid. Finally, the invention relates to certain novel biochemically produced compounds, namely 6-aminohex-2-enoic acid, 6-aminohexanoic acid, as well as to caprolactam produced therefrom and to nylon-6 and other derivatives produced from such biochemically produced compounds or caprolactam.
    Type: Grant
    Filed: January 17, 2005
    Date of Patent: February 17, 2009
    Assignee: DSM IP Assets B.V.
    Inventors: Petronella C. Raemakers-Franken, Petrus M. M. Nossin, Paul M. Brandts, Marcel G. Wubbolts, Wijnand P. H. Peeters, Sandra Ernste, Stefaan M. A. Wildeman De, Martin Schuermann
  • Patent number: 7493000
    Abstract: The present invention provides a curable liquid resin composition which, when cured, exhibits excellent removability from an adjacent coating layer and is suitable for an optical fiber upjacket material. The curable liquid resin optical fiber upjacket composition comprising a urethane (meth)acrylate or a (meth)acrylate oligomer, a reactive diluent, a polymerization initiator, and a polyol compound having a molecular weight of 1500 or more.
    Type: Grant
    Filed: August 30, 2005
    Date of Patent: February 17, 2009
    Assignees: DSM IP Assets B.V., JSR Corporation
    Inventors: Hiroshi Yamaguchi, Satoshi Kamo, Masanobu Sugimoto, Takeo Shigemoto, Kenneth Dake
  • Publication number: 20090043112
    Abstract: The present invention relates to a process for the preparation of an enantiomerically enriched optionally substituted indoline-2-carboxylic acid or a salt thereof, wherein an enantiomerically enriched chiral ortho-X-substituted phenylalanine compound, wherein X is a leaving group, is subjected to cyclisation, preferably at a temperature of below about 140° C., upon formation of the enantiomerically enriched indoline-2-carboxylic acid compound.
    Type: Application
    Filed: December 22, 2005
    Publication date: February 12, 2009
    Applicant: DSM IP ASSETS B.V.
    Inventors: Andreas Hendrikus Maria De Vries, Johannes Gerardus De Vries, Friso Bernard Jan Van Assema, Ben De Lange, Daniel Mink, David John Hyett, Peter Johannes Maas
  • Publication number: 20090035336
    Abstract: The present invention is directed to isoflavone nanoparticle compositions comprising isoflavone in the form of nanoparticles and preferably a carrier. The isoflavone nanoparticle compositions are particularly useful for preparing cosmetic compositions, pharmaceutical compositions, foodstuff, food and feed additives. In the compositions comprising the isoflavone nanoparticle compositions recrystallization of the isoflavone to bigger particles is retarded.
    Type: Application
    Filed: January 31, 2006
    Publication date: February 5, 2009
    Applicant: DSM IP ASSETS B.V.
    Inventors: Juergen H. Vollhardt, Philippe Emmanuel Maillan, Raphael Beumer, Chyi-Cheng Chen, Heinz Gutzwiller, Ernst Zedi
  • Publication number: 20090029145
    Abstract: The invention relates to a new process for the preparation of nano-structured and/or nano-porous surfaces, coatings having a nano-structured and/or nano-porous surface and articles comprising said coatings. The invention also relates to the use of coatings according to the invention, in particular as anti-reflective coatings. The process for the preparation of the surface nano-structured and/or nano-porous coatings is a process comprising the steps of a) applying a mixture to a substrate which mixture comprises i) reactive nano-particles ii) at least one solvent iii) optionally a compound having at least one polymerisable group, in an amount that results in an increase in the transmission of at least 0.5%, for at least part of the electromagnetic spectrum between 400 and 800 nm, after the mixture has been applied and cured on a transparent substrate, in comparison with the same substrate without a coating b) inducing crosslinking and/or polymerisation in the mixture applied to the substrate.
    Type: Application
    Filed: July 30, 2008
    Publication date: January 29, 2009
    Applicant: DSM IP Assets B.V.
    Inventors: Jens Christoph THIES, Guido Josefina Wilhelmus Meijers, Atze Jan Nijenhuis, Edwin Currie, Christopher Tronche, John Southwell
  • Publication number: 20090022950
    Abstract: Processes for making a plastic moulded article with a decorated surface includes introducing a decorated film in a mould, and filling of the mould with a plastic composition by means of injection moulding. The decorated film is preferably at least one layer consisting essentially of a thermoplastic elastomer containing polyether segments. The plastic composition is preferably injection moulded to form a moulded article thereof having openings therethrough which are covered by the decorated film. In especially preferred embodiments, the moulded article is a housing front for a cellular telephone.
    Type: Application
    Filed: September 26, 2008
    Publication date: January 22, 2009
    Applicant: DSM IP Assets B.V.
    Inventors: Henricus J.J. GOERTZ, Johannes J. Guns
  • Publication number: 20090023005
    Abstract: The invention relates to a process for the production of a layered composite structure comprising (1) a semi-permeable membrane made of a polymer composition comprising a polyetherester elastomer and (2) at least one web layer bonded to the membrane, wherein the process comprises a step wherein a melt layer of the polymer composition is applied onto the at least one web layer, and wherein the polyetherester elastomer comprises polyether soft segments formed from poly(alkylene-ether)glycols comprising alkylene-ether segments formed from ethylene oxide and polyester hard segments consisting of ester units derivable from short chain diols and dicarboxylic acid consisting of 98-65 mole % terephthalic acid (TPA), 2-35 mole % isophthalic acid (IPA) and optionally 0-20 mole % other dicarboxylic acids, wherein the mole % is relative to the total molar amount of dicarboxylic acid.
    Type: Application
    Filed: May 30, 2006
    Publication date: January 22, 2009
    Applicant: DSM IP ASSETS B.V.
    Inventors: Hermanus P. Snuverink Ook Lansink, Hendricos F. Aussems, Paul W.J. Heuvel Van Den, Angelika Schmidt
  • Publication number: 20090018293
    Abstract: The invention relates to a process for the preparation of a metalorganic compound, comprising at least one imine ligand, characterized in that an imine ligand according to formula 1, or the HA adduct thereof, wherein HA represents an acid, of which H represents its proton and A its conjugate base, is contacted with a metal-organic reagent of formula 2 in the presence of at least 1, respectively 2 equivalents of an inorganic or metal-organic base, wherein Y?N—R (formula 1), Y is selected from a substituted carbon, nitrogen or phosphorous atom, R represents a proton, a protic or an aprotic substituent, and the metal organic compound is: Mv(L1)k(L2)I(L3)m(L4)nX (formula 2) wherein: M represents a group 4 or group 5 metal ion, V represents the valency of the metal ion, being 3, 4 or 5, L1, L2, L3, and L4 represent ligands on M and may be equal or different, X represents a group 17 halogen atom, and k, l, m, n=0, 1, 2, 3, 4 with k+l+m+n+1=V.
    Type: Application
    Filed: September 9, 2008
    Publication date: January 15, 2009
    Applicant: DSM IP Assets B.V., TE
    Inventors: Edwin IJPEIJ, Arts Henricus, Gerardus van Doremaele, Beijer Felix
  • Publication number: 20090017585
    Abstract: A JFET integrated onto a substrate having a semiconductor layer at least and having source and drain contacts over an active area and made of first polysilicon (or other conductors such as refractive metal or silicide) and a self-aligned gate contact made of second polysilicon which has been polished back to be flush with a top surface of a dielectric layer covering the tops of the source and drain contacts. The dielectric layer preferably has a nitride cap to act as a polish stop. In some embodiments, nitride covers the entire dielectric layer covering the source and drain contacts as well as the field oxide region defining an active area for said JFET. An embodiment with an epitaxially grown channel region formed on the surface of the substrate is also disclosed.
    Type: Application
    Filed: September 22, 2008
    Publication date: January 15, 2009
    Applicant: DSM Solutions, Inc.
    Inventor: Ashok Kumar Kapoor