Patents Assigned to DSM
  • Publication number: 20090011478
    Abstract: The invention relates to a process for biochemical synthesis of 1,4-butanediamine in a microorganism having an increased level of an ornithine decarboxylase activity (increased ODC activity) as compared to the native level of the ornithine decarboxylase activity, wherein in the microorganism also an increased activity of N-acetylglutamate formation is present as compared to the native level of activity of N-acetylglutamate formation in the microorganism and wherein 1,4-butanediamine produced in the microorganism is excreted into a fermentation broth, and is recovered from the fermentation broth. The invention also relates to vectors, plasmids and hosts carrying a corresponding increased ODC activity and an increased activity of N-acetylglutamate formation.
    Type: Application
    Filed: July 11, 2005
    Publication date: January 8, 2009
    Applicant: DSM IP ASSETS B.V.
    Inventors: Katrin Eppelmann, Petrus M.M. Nossin, Leon J.R.M. Raeven, Susanne M. Kremer, Marcel G. Wubbolts
  • Patent number: 7473792
    Abstract: A process for transition metal-catalyzed, asymmetric hydrogenation of acrylic acid derivatives of the formula (I) in which R1 is H or an optionally substituted alkyl, aryl or heteroaryl radical, R2 is an optionally substituted alkyl, aryl or heteroaryl radical, and R3 is H or a C1-C6-alkyl radical, which comprises hydrogenating compounds of the formula (I), optionally in a solvent, in the presence of one or more hydrogen donors, using a catalyst system which comprises a transition metal from the group of ruthenium, rhodium and iridium and a combination of a chiral phosphorus ligand of the formula (II) in which Cn, together with the two oxygen atoms and the phosphorus atom, forms an optionally substituted ring having from 2 to 6 carbon atoms and R4 is an optionally substituted alkyl, aryl, alkoxy or aryloxy radical or NR5R6 where R5 and R6 may each independently be H or an optionally substituted alkyl, aryl, aralkyl or alkaryl radical, or, together with the nitrogen atom, may form a ring, and an achiral phosph
    Type: Grant
    Filed: December 5, 2005
    Date of Patent: January 6, 2009
    Assignee: DSM Fine Chemicals Austria Nfg GmbH & Co KG
    Inventors: Jeroen Boogers, Ulfried Felfer, Martina Kotthaus, Andreas H. M. De Vries, Johannes G. De Vries, Laurent Lefort, Gerhard Steinbauer
  • Patent number: 7474125
    Abstract: A method for using an inverter with a pair of complementary junction field effect transistors (CJFET) with a small linewidth is provided. The method includes having an input capacitance for said CJFET inverter to be less than the corresponding input capacitance of a CMOS inverter of similar linewidth. The CJFET operates at a power supply with a lesser value than the voltage drop across a forward-biased diode having a reduced switching power as compared to said CMOS inverter and having a propagation delay for said CJFET inverter that is at least comparable to the corresponding delay of said CMOS inverter.
    Type: Grant
    Filed: December 7, 2006
    Date of Patent: January 6, 2009
    Assignee: DSM Solutions, Inc.
    Inventor: Ashok Kumar Kapoor
  • Publication number: 20090004579
    Abstract: The invention is a radiation curable liquid resin that can be used to make a clear and colorless, three-dimensional article by a stereolithography process. The clear and colorless three-dimensional articles have a clarity and transmittance of greater than about 67% as measured by UV-Visible spectrophotometer in the 400-500 nm range; and a lack of color as measured by a b* value of between about minus 0.5 (?0.5) and about positive 2.5 (+2.5) in the CIELAB color space using a spectrophotometer in the visible wavelengths of 400-750 nm.
    Type: Application
    Filed: June 27, 2007
    Publication date: January 1, 2009
    Applicant: DSM IP Assets B.V.
    Inventors: Satyendra Kumar Sarmah, Kevin Andrew Zaras
  • Patent number: 7470527
    Abstract: The present invention provides a process for the production of a microbial oil comprising culturing a micro-organism in a two stage fermentation process where, in a last stage that precedes the end of fermentation, the carbon source is: consumed by the micro-organisms at a rate greater than it is added to the medium; added at a rate ?0.30 M carbon/kg medium; or is rate limiting on the growth of the micro-organism. The micro-organisms thus have the carbon source restricted so that they preferentially metabolise fats or lipids other than arachidonic acid (ARA), so increasing the proportion of ARA in the cells. A microbial oil is then recovered from the micro-organism, using hexane as a solvent, that has at least 50% ARA and at least 90% triglycerides.
    Type: Grant
    Filed: June 20, 2003
    Date of Patent: December 30, 2008
    Assignee: DSM IP Assets B.V.
    Inventors: Hugo Streekstra, Petrus Joseph Maria Brocken
  • Publication number: 20080311620
    Abstract: The present invention is directed to novel genes mediating the carbon catabolite repression (CCR) of gluconeogenic genes. Furthermore, the polypeptides encoded by said genes as well as the use of said genes in a process for the production of a target fermentation product is provided. Processes for generating such microorganisms are also provided by the present invention. The invention is also related to a genetically engineered microorganism and its use for the production of a target fermentation product, wherein the gluconeogenic genes are relieved from CCR within said microorganism.
    Type: Application
    Filed: December 22, 2005
    Publication date: December 18, 2008
    Applicants: DSM IP ASSETS B.V., INSTITUTE NATIONAL DE LA RECHERCHE AGRONOMIQUE
    Inventors: Stephane Aymerich, Hans-Peter Hohmann, Uwe Sauer
  • Publication number: 20080311255
    Abstract: Powder compositions having particle average diameters of about 50 to 500 microns which comprise droplets containing a long chain polyunsaturated fatty acid (I.C-PUFA) embedded in a matrix of a modified polysaccharide and wherein the particles are characterized by a surface oil content of less than 0.5% (w/w), a process for their manufacture and their applications in the preparation of food with increased nutritional value.
    Type: Application
    Filed: January 23, 2006
    Publication date: December 18, 2008
    Applicant: DSM IP ASSETS B.V.
    Inventors: Karin Feltes, Nicolle Kleemann, Bruno H. Leuenberger, Loni Schweikert, Johann Ulm
  • Patent number: 7465563
    Abstract: A process for producing L-ascorbic acid from 2-keto-L-gulonic acid or D-erythorbic acid from 2-keto-D-gluconic acid by contacting 2-keto-L-gulonic acid or 2-keto-D-gluconic acid, respectively, with an enzym having ?-amylase activity in solution. The solvent for this reaction can be water, an aqueous alcohol, an organic solvent or a mixture thereof. In each case, the starting material can be in the form of the free acid, the sodium salt, or the calcium salt.
    Type: Grant
    Filed: October 31, 2002
    Date of Patent: December 16, 2008
    Assignee: DSM IP Assets B.V.
    Inventors: Tatsuo Hoshino, Tatsuya Kiyasu, Masako Shinjoh
  • Publication number: 20080305133
    Abstract: The present invention relates to novel cosmetic or dermatological compositions comprising multiply coated titanium dioxide particles with a water content of less than 1.5%. More particularly, the present invention relates to novel cosmetic or dermatological compositions comprising multiply coated titanium dioxide particles with a water content of less than 1.5% and a dibenzoyl methane derivative.
    Type: Application
    Filed: November 27, 2006
    Publication date: December 11, 2008
    Applicant: DSM IP ASSETS B.V.
    Inventors: Katja Berg-Schultz, Fintan Sit, Horst Westenfelder, Christine Mendrok-Edinger
  • Publication number: 20080305523
    Abstract: The present invention relates to isolated fungal promoter DNA sequences, to DNA constructs, vectors, and fungal host cells comprising these promoters in operative association with coding sequences encoding polypeptides. The present invention also relates to methods for expressing a gene and/or producing a polypeptide using the new promoters isolated. The present invention also relates to methods for altering the transcription level and/or regulation of an endogenous gene using the new promoter of the invention.
    Type: Application
    Filed: April 18, 2005
    Publication date: December 11, 2008
    Applicant: DSM IP Assets B.V.
    Inventors: Thibaut Jose Wenzel, Noel Nicolaas Maria Elisabeth Van Peij, Hein Stam
  • Patent number: 7462464
    Abstract: The present invention relates to a novel method for the rapid detection of the presence or absence of antimicrobial residues in products preferably food products.
    Type: Grant
    Filed: October 3, 2000
    Date of Patent: December 9, 2008
    Assignee: DSM IP Assets B.V.
    Inventors: Pieter Cornelis Langeveld, Jacobus Stark, Petrus Andreas Van Paridon
  • Publication number: 20080293093
    Abstract: A test system for the determination of the presence of an antibiotic in a fluid using Bromthymol Blue as an indicator.
    Type: Application
    Filed: August 1, 2008
    Publication date: November 27, 2008
    Applicant: DSM IP ASSETS B.V.
    Inventors: Angelina Dekker, Comelis Jacobus Bouwknecht, Johannes Theodorus Arie Van Pelt, Angelique de Rijk, Stark Jacobus, Pieter Comelis Langeveld
  • Publication number: 20080286450
    Abstract: Waste reduction, including hazardous waste reduction in photoimaging processes can be accomplished by improving diffusional resolution of cationic curable compositions. The addition of fluorinated polymers including fluorinated surfactants provides improved diffusional resolution in cationic and/or radical based photoimaging formulations allowing for image accuracy improvements, and reduced product and process waste quantity and disposal cost. These fluorinated surfactants also allow for increased cure speed, and non-hazardous constituent formulations that result in less wasted material and time.
    Type: Application
    Filed: January 26, 2007
    Publication date: November 20, 2008
    Applicant: DSM IP Assets B.V.
    Inventors: John Lawton, Jigeng Xu, John Southwell, Gordon Smith, Willem Weenink
  • Publication number: 20080287990
    Abstract: The invention relates to an elongated surgical repair product comprising an elongated member of core-sheath structure, wherein the core contains a plurality of high-strength ultra-high molar mass polyethylene (UHMWPE) filaments, and wherein the elongated member has a UHMWPE sheath that is substantially non-porous. This product combines high tensile strength, good flexibility and favourable knotting characteristics. The invention also relates to a process of making said elongated surgical repair product, comprising a step wherein an elongated precursor member containing a plurality of UHMWPE filaments is subjected to a heat treatment while keeping the filaments under tension.
    Type: Application
    Filed: July 14, 2005
    Publication date: November 20, 2008
    Applicant: DSM IP ASSETS B.V.
    Inventor: Leo Smit
  • Patent number: 7452940
    Abstract: The present invention relates to a process for the preparation of a dynamically vulcanized thermoplastic elastomer comprising simultaneously mixing a thermoplastic polyolefin, a vulcanizable rubber and a curing agent in a co-rotating twin-screw extruder whereby the vulcanizable rubber is cured during mixing. The residence time in the extruder is less than 40 sec, the ratio of specific Energy (Espec)/residence time is at least 24 kW/kg and the ratio of the residence time/(Length/Diameter) is less than 0.60 sec. The invention further relates to the dynamically vulcanized thermoplastic elastomer obtainable by the process and to the use of the dynamically vulcanized thermoplastic elastomer in sealing systems, building profiles and extrusion applications.
    Type: Grant
    Filed: October 10, 2002
    Date of Patent: November 18, 2008
    Assignee: DSM I.P. Assets B.V.
    Inventors: Alberto O Dozeman, Ryszard Brzoskowski, Yundond Wang
  • Patent number: 7453107
    Abstract: A semiconductor device includes a substrate of semiconductor material. A source region, a drain region, and a conducting region of the semiconductor device are formed in the substrate and doped with a first type of impurities. The conducting region is operable to conduct current between the drain region and the source region when the semiconductor device is operating in an on state. A gate region is also formed in the substrate and doped with a second type of impurities. The gate region abuts a channel region of the conducting region. A stress layer is deposited on at least a portion of the conducting region. The stress layer applies a stress to the conducting region along a boundary of the conducting region that strains at least a portion of the conducting region.
    Type: Grant
    Filed: May 4, 2007
    Date of Patent: November 18, 2008
    Assignee: DSM Solutions, Inc.
    Inventor: Ashok K. Kapoor
  • Patent number: 7452934
    Abstract: The invention relates to a flame retardant polyamide composition, comprising a polyamide polymer, a polyamide prepolymer, a halogen containing flame retardant, and an antimony containing synergist having a low lead content. The composition shows surprisingly improved mechanical properties. The invention also relates to a process for preparing the flame retardant polyamide composition, use the flame retardant polyamide composition for preparing moulded parts and to a moulded part obtainable from the flame retardant polyamide composition.
    Type: Grant
    Filed: May 14, 2004
    Date of Patent: November 18, 2008
    Assignee: DSM IP Assets B.V.
    Inventor: Johannes H. G. Ottenheijm
  • Publication number: 20080272401
    Abstract: A junction field effect transistor includes a substrate and a well region on the substrate. A channel region lies in the well region. A source region lies in the channel region. A drain region lies in the channel region and apart from the source region. A gate region is isolated from the source, drain, and channel regions. The gate region is in contact with a portion of the well region.
    Type: Application
    Filed: May 3, 2007
    Publication date: November 6, 2008
    Applicant: DSM Solutions, Inc.
    Inventors: Madhu Vora, Ashok K. Kapoor
  • Publication number: 20080272408
    Abstract: Integrated active area isolation structure for transistor to replace larger and more expensive Shallow Trench Isolation or field oxide to isolate transistors. Multiple well implant is formed with PN junctions between wells and with surface contacts to substrate and wells so bias voltages applied to reverse bias PN junctions to isolate active areas. Insulating layer is formed on top surface of substrate and interconnect channels are etched in insulating layer which do not go down to the semiconductor substrate. Contact openings for surface contacts to wells and substrate are etched in insulating layer down to semiconductor layer. Doped silicon or metal is formed in contact openings for surface contacts and to form interconnects in channels. Silicide may be formed on top of polycrystalline silicon contacts and interconnect lines to lower resistivity. Any JFET or MOS transistor may be integrated into the resulting junction isolated active area.
    Type: Application
    Filed: April 30, 2008
    Publication date: November 6, 2008
    Applicant: DSM SOLUTIONS, INC.
    Inventor: Madhukar B. Vora
  • Publication number: 20080272406
    Abstract: Double gate JFET with reduced area consumption and fabrication method therefore. Double-gate semiconductor device including a substrate having a shallow trench isolator region comprising a first STI and a second STI, a channel region having a first and second channel edges, the channel region formed in the substrate and disposed between and in contact with the first STI and the second STI at the first and second channel edge. The first STI has a first cavity at the first channel edge, and the second STI has a second cavity at the second channel edge. The device further includes a gate electrode region comprising conductive material filling at least one of the first and second cavities. At least one of the first and second cavities is physically configured to provide electrical coupling of the gate electrode region to a back-gate P-N junction.
    Type: Application
    Filed: April 30, 2008
    Publication date: November 6, 2008
    Applicant: DSM SOLUTIONS, INC.
    Inventor: Srinivasa R. Banna