Abstract: A method for forming a DRAM MIM capacitor stack having low leakage current involves the use of a first electrode that serves as a template for promoting the high k phase of a subsequently deposited dielectric layer. The high k dielectric layer comprises a doped material that can be crystallized after a subsequent annealing treatment. A metal oxide second electrode layer is formed above the dielectric layer. The metal oxide second electrode layer has a crystal structure that is compatible with the crystal structure of the dielectric layer. Optionally, a second electrode bulk layer is formed above the metal oxide second electrode layer.

Abstract: According to the system of the present invention, data (DQ) signals are outputted/received between a controller 100 and a memory 200 based on a data strobe signal sent out from the controller 100. The data strobe signal is independently and completely separated from a clock signal. The data strobe signal has a frequency different from a clock signal. Therefore, the memory 200 is not required to generate a read data strobe signal from the clock signal nor to send the read data strobe signal in synchronization with the clock signal.

Abstract: The method of the present invention comprises forming a word line crossing with an active region on a semiconductor substrate; forming a diffusion layer region; forming a first insulating film as high as a bit line to be formed; etching the first insulating film, while using, as a mask, a pattern having a linear aperture extending to the active region on the first insulating film so as to form a groove pattern for exposing the surface of the semiconductor substrate; embedding a conductive film in the groove pattern; forming a mask pattern passing over a portion, in which a bit contact is formed, on the first insulating film; and removing the first insulating film and the conductive layer until the upper layer insulating film of the word line is exposed, while using the mask pattern as a mask so as to isolate a bit contact from another contact.

Abstract: A method for forming a DRAM MIM capacitor stack having low leakage current involves the use of a first electrode that serves as a template for promoting the high k phase of a subsequently deposited dielectric layer. The high k dielectric layer comprises a doped material that can be crystallized after a subsequent annealing treatment. A metal oxide second electrode layer is formed above the dielectric layer. The metal oxide second electrode layer has a crystal structure that is compatible with the crystal structure of the dielectric layer. Optionally, a second electrode bulk layer is formed above the metal oxide second electrode layer.

Abstract: For example, to include plural data input/output terminals and a strobe terminal that are electrically connected in common by a test probe, a command address terminal that is connected to a test probe, and an output control circuit that performs a selecting operation of data output circuits based on a signal that is supplied to the command address terminal. According to the present invention, it is possible to perform a test that uses non-compressed actual data while allocating plural data input/output terminals to one determination circuit within a tester. With this configuration, it is possible to test a large number of semiconductor devices in parallel by using a limited number of determination circuits within the tester.

Abstract: A semiconductor apparatus includes a semiconductor chip in which a plurality of electrode pads are provided on a main surface, and a plurality of bump electrodes are provided on the electrode pads of the semiconductor chip. The semiconductor apparatus also includes a wired board which is allocated in a side of the main surface of the semiconductor chip, and is positioned in a central area of the main surface of the semiconductor chip so as to be separated from an edge part of the semiconductor chip by at least 50 ?m or more. The semiconductor apparatus also includes a plurality of external terminals which are provided on the wired board, and which are electrically connected to a plurality of bump electrodes through wirings of the wired board, and sealing part which is provided between the semiconductor chip and the wired board, is made of underfill material that covers a connection part between the bump electrode and the wiring.

Abstract: To provide a plurality of memory banks, each of which is divided into a plurality of segments; a bank address register that designates a memory bank that becomes a refresh target; a segment address register that designates a segment that becomes a refresh target; and a refresh control circuit that prohibits a refresh operation of the memory bank or the segment not designated by at least one of the bank address register and the segment address register. This semiconductor device is capable of designating whether to perform a refresh operation not only in a memory bank unit but also in a segment unit within the memory bank, and thus it achieves a further reduction of the power consumption.

Abstract: A semiconductor device comprises a memory cell including a capacitor and a select transistor with a floating body structure, a bit line connected to the select transistor, a bit line control circuit, and a sense amplifier amplifying a signal read out from the memory cell. The bit line control circuit sets the bit line to a first potential during a non-access period of the memory cell, and thereafter sets the bit line to a second potential during an access period of the memory cell. Thereby, the data retention time can be prolonged by reducing leak current at a data storage node of the memory cell so that an average consumption current for the data retention can be reduced.

Abstract: A method for doping a dielectric material by pulsing a first dopant precursor, purging the non-adsorbed precursor, pulsing a second precursor, purging the non-adsorbed precursor, and pulsing a oxidant to form an intermixed layer of two (or more) metal oxide dielectric dopant materials. The method may also be used to form a blocking layer between a bulk dielectric layer and a second electrode layer. The method improves the control of the composition and the control of the uniformity of the dopants throughout the thickness of the doped dielectric material.

Abstract: A semiconductor device includes a first semiconductor chip that includes a driver circuit, a second semiconductor chip that includes a receiver circuit and an external terminal, and a plurality of through silicon vias that connect the first semiconductor chip and the second semiconductor chip. The first semiconductor chip further includes an output switching circuit that selectively connects the driver circuit to any one of the through silicon vias, the second semiconductor chip further includes an input switching circuit that selectively connects the receiver circuit to any one of the through silicon vias and the external terminal, the input switching circuit includes tri-state inverters each inserted between the receiver circuit and an associated one of the through silicon vias and the external terminal, and the input switching circuit activates any one of the tri-state inverters.

Abstract: A method for forming a DRAM MIM capacitor stack having low leakage current involves the use of a first electrode that serves as a template for promoting the high k phase of a subsequently deposited dielectric layer. The high k dielectric layer comprises a doped material that can be crystallized after a subsequent annealing treatment. An amorphous blocking is formed on the dielectric layer. The thickness of the blocking layer is chosen such that the blocking layer remains amorphous after a subsequent annealing treatment. A second electrode layer compatible with the blocking layer is formed on the blocking layer.

Abstract: A semiconductor device reduces the impedance of a wiring for supplying the circuit excluding a data output circuit with a power source voltage or a ground voltage and of speedup of data signal transmission in the data output circuit. Additional substrates 2a, 2b are on the upper surface of semiconductor chip 1. First additional wiring layer for power source 10d and first additional wiring layer for ground 10s formed on respective additional substrates 2a, 2b form prescribed conductive areas on semiconductor chip 1. First power source wiring 40C1d or first ground wiring 40C1s are interconnected through additional wiring layers 10d and 10s. Second power source wiring 40C2d and second ground wiring 40C2s, which is extended in the same direction as with DQ system signal wiring 40CDQ, forms a feedback current path. Second power source wiring 40C2d and second ground wiring 40C2s are disposed adjacent to DQ system signal wiring 40CDQ.

Abstract: Disclosed herein is a device that includes: a set of address terminals supplied with a set of address signals, each of the address signals being changed in logic level; memory mats to which address ranges are allocated, respectively, the address ranges being different from each other, each of the memory mats including memory cells; and decoder units each provided correspondingly to corresponding memory mat. Each of the decoder units includes a set of first input nodes and a set of second input nodes, the set of first input nodes of each of the decoder units being coupled to the set of address terminals to receive the set of address signals, the set of second input nodes of each of the decoder units being coupled to receive an associated one of sets of control signals, each of the control signals being fixed in logic level.

Abstract: Disclosed herein is a device that includes a first register temporarily storing first information indicative of a reference latency, a second register temporarily storing second information indicative of an offset latency, a third register temporarily storing third information indicative of one of first and second operation modes, and a logic circuit configured to produce latency information in response to the first information when the third information is indicative of the first operation mode and to both of the first information and the second information when the third information is indicative of the second operation mode.

Abstract: Disclosed herein is a device that includes a first semiconductor chip. The first semiconductor chip includes a first data storage area storing data, a first refresh circuit repeating a first refresh operation on the first data storage area to make the first data storage area retain the data, a first terminal supplied with a first control signal from outside of the first semiconductor chip, and a first control circuit coupled between the first terminal and the first refresh circuit to control a repetition cycle of the first refresh operation in response to the first control signal.

Abstract: A method for forming a DRAM MIM capacitor stack having low leakage current involves the use of a first electrode that serves as a template for promoting the high k phase of a subsequently deposited dielectric layer. The high k dielectric layer comprises a doped material that can be crystallized after a subsequent annealing treatment. A metal oxide second electrode layer is formed above the dielectric layer. The metal oxide second electrode layer has a crystal structure that is compatible with the crystal structure of the dielectric layer. Optionally, a second electrode bulk layer is formed above the metal oxide second electrode layer.

Abstract: To provide an output driver that outputs read data to outside and a mode register that sets a swing capability of the output driver. A transition start timing of the read data driven by the output driver is made relatively earlier when a swing capability of the output driver set by the mode register is set to be relatively large, and the transition start timing is relatively delayed when the swing capability of the output driver set by the mode register is set to be relatively small. With this configuration, a timing when the read data exceeds a threshold level can be caused to coincide with a desired timing regardless of the swing capability of the output driver.

Abstract: In a semiconductor device of the invention, a semiconductor pillar configuring a vertical MOS transistor has an upper pillar having a first width and a lower pillar having a second width. A side surface of the upper pillar is covered with a second insulation film and a third insulation film and the lower pillar is covered with a first insulation film, which is a gate insulation film, from a side surface thereof to the second insulation film. A gate electrode is insulated from an upper conductive layer by the second and third insulation films.

Abstract: A voltage level shift circuit in which a difference in response characteristic depending on the signal level of an input signal is suppressed. The voltage level shift circuit generates an output signal VOUT having a voltage amplitude different from that of the input signal. An inverter INV2 generates a voltage V1 in the range of VSS to VDDI according to the input signal. An inverter INV3 generates a voltage V2 in the range of VSS to VPERI according to the input signal. An inverter INV4 generates the output signal VOUT according to V1 and V2.

Abstract: A nonvolatile RAM for reading and writing data in a random manner includes a memory area configured by a plurality of memory cells suited to a nonvolatile-mode write operation, in which the stored content thereof is not lost irrespective of a power-off event, and a volatile-mode write operation, in which the stored content thereof is lost in the power-off event. A register designates a first portion of the memory area adapted to the nonvolatile-mode write operation regarding fixed data such as program codes and a second portion of the memory area serving as a work area adapted to the volatile-mode write operation. A control circuit performs the nonvolatile-mode write operation on the first portion of the memory area while performing the volatile-mode write operation on the second portion of the memory area.