Abstract: A semiconductor device includes a gate electrode provided on a channel region in a semiconductor material layer having one type through a second insulating film; a capacitor electrode portion integrally formed with the gate electrode on the gate electrode; and a first electrode laterally surrounding the capacitor electrode portion through a first insulating film.

Abstract: Provided is a semiconductor device that includes: a first electrode formed on a principal surface of a semiconductor substrate via a first insulating film; a second electrode formed on the principal surface of the semiconductor substrate via a second insulating film; a compensation film buried between the first electrode and the second electrode; and wiring formed on the first electrode and the second electrode from an upper surface of the first electrode through an upper surface of the compensation film to an upper surface of the second electrode to make contact with the upper surface of the first electrode and the upper surface of the second electrode.

Abstract: A semiconductor memory device comprises a memory cell array, first and second bit lines, first and second amplifiers, and a sense amplifier control circuit. An amplifying element in the first sense amplifier amplifiers the signal of the first bit line and converts it into an output current. The second bit line is selectively connected to the first bit line via the first sense amplifier. A signal voltage decision unit in the second sense amplifier determines the signal level of the second bit line being supplied with the output current. The sense amplifier control circuit controls connection between the amplifying element and the unit in accordance with a determination timing, which switches the above connection from a connected state to a disconnected state at a first timing in a normal operation and switches in the same manner at a delayed second timing in a refresh operation.

Abstract: A semiconductor device includes a reduced-power-consumption circuit block which includes first and second power lines, and a first circuit cell. The first circuit cell includes a first functional-element-free region. The first functional-element-free region includes a first driver circuit configured to connect and disconnect the first power line and the second power line.

Abstract: A semiconductor device includes a silicon pillar formed substantially perpendicular to a principal surface of a silicon substrate, a first impurity diffusion layer and a second impurity diffusion layer arranged below and above the silicon pillar, respectively, a gate electrode arranged to penetrate through the silicon pillar in a horizontal direction, a gate dielectric film arranged between the gate electrode and the silicon pillar, a back-gate electrode arranged adjacent to the silicon pillar, and a back-gate dielectric film arranged between the back-gate electrode and the silicon pillar.

Abstract: A method of manufacturing a semiconductor device wherein a film containing Si and Ge is formed on a conducting film over a substrate by using a raw material gas containing Si and a raw material gas containing Ge, includes: forming Si nuclei on the conducting film at a first ratio of a flow rate of the raw material gas containing Ge to a flow rate of the raw material gas containing Si; and forming, on the Si nuclei, a film having Si and Ge at a second ratio of the flow rate of the raw material gas containing Ge to the flow rate of the raw material gas containing Si, the second ratio being greater than the first ratio.

Abstract: A semiconductor device may include: first and second wiring boards separated from each other via a gap; a semiconductor chip; first and second groups of electrode pads; and first and second groups of connection pads. The semiconductor chip is fixed to upper surfaces of the first and second wiring boards, and has a first portion adjacent to the gap. The first and second groups of electrode pads are disposed on the first portion. The first and second groups of electrode pads are aligned adjacent to side surfaces of the first and second wiring boards, respectively. The side surfaces of the first and second wiring boards face each other. The first and second groups of connection pads are disposed on lower surfaces of the first and second wiring boards, respectively. The first and second groups of connection pads are aligned adjacent to the side surfaces of the first and second wiring boards, respectively.

Abstract: There are provided: a silicon pillar that is formed almost perpendicularly to a main surface of a substrate; first and second impurity diffused layers that are arranged in a lower part and an upper part of the silicon pillar, respectively; a gate electrode that is arranged horizontally through the silicon pillar; and a gate insulating film that is arranged between the gate electrode and the silicon pillar. The silicon pillar consequently has a small volume, which makes it possible to reduce the leak current of the transistor or thyristor formed in the silicon pillar.

Abstract: The present invention efficiently decides line failure and contact failure in a semiconductor device. The semiconductor device has a plurality of bit line groups in which connection with local I/O lines is controlled by the same column selection signal line. A failure detecting circuit compares a first data group read from a first bit line group and a second data group read from a second bit line group to detect whether or not connection failure (contact failure) with the column selection signal line occurs in one of the first and second bit line groups.

Abstract: Disclosed herein is a device that includes a command decoder and a latency counter. The command decoder generates a first internal command in response to a first internal clock signal. The latency counter includes: a gate control signal generation unit generating output gate signals in response to a second internal clock signal; delay circuits each receiving an associated one of the output gate signals and generating an associated one of input gate signals; and a command signal latch unit fetching the first internal command in response to one of the input gate signals and outputting the first internal command in response to one of the output gate signals. Each of the delay circuit includes a first delay element that operates on a first power supply voltage and a second delay element that operates on a second power supply voltage different from the first power supply voltage.

Abstract: A device is disclosed which includes a register storing a plurality of latency data and a control unit responding to the latency data. Each of the latency data indicates a period of time between issue of a data transfer request command responsive to an access request from one of access request sources and initiation of a data transfer operation responsive to the data transfer request command. The control unit controls an order in issue of data transfer request commands responsive to access requests from the access request sources so that between issue of a first data transfer request command responsive to a first access request and initiation of a first data transfer operation responsive to the first data transfer request command, at least issue of a second data transfer request command responsive to a second access request is performed.

Abstract: A semiconductor device according to one embodiment has a wiring circuit board, a semiconductor chip, a die attach material and bumps. The semiconductor chip is mounted on the wiring circuit board. The die attach material is provided between the wiring circuit board and the semiconductor chip. A wiring layer is provided on one surface of the wiring circuit board. Leads are extended from the wiring layer and connected to the semiconductor chip. The bumps are provided at outer positions relative to the region where the semiconductor chip of the wiring circuit board is mounted. The wiring layer in the wiring circuit board is formed on the surface opposite from the surface on which the semiconductor chip is mounted.

Abstract: A bilayer second electrode for a MIM DRAM capacitor is formed wherein the layer of the electrode that is in contact with the dielectric layer (i.e. bottom layer) has a composition that is resistant to oxidation during subsequent anneal steps and have rutile templating capability. Examples include SnO2 and RuO2. The capacitor stack including the bottom layer is subjected to a PMA treatment to reduce the oxygen vacancies in the dielectric layer and reduce the interface states at the dielectric/second electrode interface. The other component of the bilayer (i.e. top layer) is a high work function, high conductivity metal or conductive metal compound.

Abstract: Disclosed herein a method of manufacturing a variable resistance memory, which comprises: forming a conductive plug on a substrate; forming a variable resistance film above the substrate, the variable resistance film covering a top surface of the conductive plug; forming an insulating interlayer above the substrate, the insulating interlayer covering a top surface of the conductive plug; forming a hole in the insulating interlayer by removing a part of the insulating interlayer disposed above the conductive plug; and forming a first electroconductive film in the hole extending from a top surface of the insulating interlayer so as to be in contact with the variable resistance film and to be electrically connected with the conductive plug via the variable resistance film.

Abstract: A layout data creation device includes a transistor adjustment unit. The transistor adjustment unit divides a pillar-type transistor including a plurality of unit pillar-type transistors into the unit pillar-type transistors groups. The unit pillar-type transistors can be placed in a placement area. The number of the unit pillar-type transistors in each group is an integer. The transistor adjustment unit generates sub-pillar-type transistors that are placed in the placement area.

Abstract: A semiconductor device includes a semiconductor pillar group having semiconductor pillars which are formed in a first direction with a space left therebetween. A dummy pillar is disposed near a particular semiconductor pillar in the semiconductor pillar group in a second direction perpendicular to the first direction that is any one of the semiconductor pillars which are positioned in an intermediate portion exclusive of both end portions. Gate insulating films are formed on outer circumferential surfaces of the semiconductor pillars. One gate insulating film is formed on a part of an outer circumferential surface of the dummy pillar. Formed over side faces of the semiconductor pillars and over a side face of the dummy pillar via the gate insulating films, gate electrodes fill gaps between the semiconductor pillars and a gap between the particular semiconductor pillar and the dummy pillar.

Abstract: A semiconductor device has a first controlled chip, including a first replica output circuit having the same configuration as a first output circuit, a first ZQ terminal connected to the first replica output circuit, a first through electrode connected to the first ZQ terminal, and a first control circuit which sets the impedance of the first replica output circuit. A control chip includes a second ZQ terminal connected to the first through electrode, a comparator circuit which compares a voltage of the second ZQ terminal with a reference voltage, and a second control circuit 123 which performs a process based on a comparison by the comparator circuit. The first control circuit and the second control circuit receive a common input signal to operate and sequentially change and set the impedance until the comparison result changes when an external resistance element is connected to the second ZQ terminal.

Abstract: Disclosed herein is a device that includes a plurality of first word lines each extending from an associated one of the first terminals in a second direction toward to the second terminals and terminating between the first and second terminals, the second direction being substantially perpendicular to the first direction, and a plurality of second word lines each extending from an associated one of the second terminals in a third direction toward to the first terminals and terminating near to an end of an associated one of the first word lines, the third direction being opposite to the second direction, each of the second word lines being substantially aligned with an associated one of the first word lines.

Abstract: A semiconductor device includes a first controlled chip and a control chip stacked therewith. The first controlled chip includes a first circuit outputting a data signal in response to a synchronization signal, an input/output circuit outputting the data signal to a data terminal in synchronization with a delayed synchronization signal, and a replica circuit replicating an output circuit and outputting a replica signal to a first replica terminal in synchronization with the delayed synchronization signal. The control chip includes a first control circuit outputting a synchronization signal and receiving a data signal, a delay adjustment circuit delaying the synchronization signal and outputting the same as a delayed synchronization signal, a phase comparator circuit comparing the phases of the replica signal and the synchronization signal, and a delay control circuit controlling the delay amount of the delay adjustment circuit based on a comparison result of the phase comparator circuit.

Abstract: A nonvolatile storage device includes a tunnel insulating film disposed on a surface of a semiconductor substrate and a charge trap layer disposed in contact with an upper surface of the tunnel insulating film. The charge trap layer includes a second charge trap film disposed in contact with the upper surface of the tunnel insulating film and a first charge trap film disposed in contact with an upper surface of the second charge trap film.