Abstract: A method for synchronizing an output clock signal with an input clock signal in a delay locked loop. A first count values decreasing the number of bypassed elements in a differential delay line until an edge of the output clock signal is delayed relative to an edge of the input clock signal or the first count value reaches a first count final value if the first count value reaches the first count final value, a second count value is adjusting to decrease the number of bypassed elements in a single-ended delay line until the edge of the output clock signal is delayed relative to the edge of the input clock signal. A third count value is adjusted to decrease the delay of an interpolator until the edge of the output clock signal is no longer delayed with respect to the edge of the input clock signal.

Abstract: A method of manufacturing a semiconductor device including a semiconductor substrate having first and second surfaces and a peripheral edge, the first and second surfaces being opposite to each other, includes forming an inter-layer insulator having a guard ring on the first surface, adjacent to the peripheral edge, forming a first groove on the second surface and adjacent to the peripheral edge, and forming a through electrode that penetrates the second surface to the inter-layer insulator near the first groove and on an opposite side of the groove with respect to the peripheral edge.

Abstract: A semiconductor device includes: a plurality of semiconductor chips stacked on each other, each of the plurality of semiconductor chips having a semiconductor substrate and a wiring layer; a through electrode penetrating the semiconductor substrate in a thickness direction and electrically connected to each other between the semiconductor chips adjacent to each other; a conductor penetrating the semiconductor substrate in the thickness direction and not electrically connected between the other semiconductor chips; and an insulating separator penetrating the semiconductor substrate in the thickness direction and formed in a shape of a ring surrounding the conductor.

Abstract: A method for reading data from a plurality of DRAM devices connected to common command, address, and data busses. A clock signal is provided to the plurality of DRAM devices. A read command and address to the plurality of DRAM devices on the command and address busses in synchronization with the clock signal. A read clock signal is provided to the plurality of DRAM devices to initiate a read operation in one of the plurality of DRAM devices that is selected by the address. The one DRAM device delays the read clock signal by an amount based on a speed of the one of the plurality of DRAM devices to generate. First delayed read clock and second delayed read clock signals are provided. The read data is received on the data bus in synchronization with the second delayed read clock signal.

Abstract: A metal oxide bilayer second electrode for a MIM DRAM capacitor is formed wherein the layer of the electrode that is in contact with the dielectric layer (i.e. bottom layer) has a desired composition and crystal structure. An example is crystalline MoO2 if the dielectric layer is TiO2 in the rutile phase. The other component of the bilayer (i.e. top layer) is a sub-oxide of the same material as the bottom layer. The top layer serves to protect the bottom layer from oxidation during subsequent PMA or other DRAM fabrication steps by reacting with any oxygen species before they can reach the bottom layer of the bilayer second electrode.

Abstract: A nonvolatile semiconductor memory device includes a first string including a first number of memory cells connected in series each storing therein information in a nonvolatile manner; and a second string including a second number of memory cells connected in series each storing therein information in a nonvolatile manner, wherein the second number is smaller than the first number.

Abstract: A semiconductor device capable of increasing ON current while reducing channel resistance and allowing transistors to operate independently and stably, having a fin formed to protrude from the bottom of a gate electrode trench, a gate insulating film covering the surfaces of the gate electrode trench and the fin, a gate electrode embedded in a lower part of the gate electrode trench and formed to stride over the fin via the gate insulating film, a first impurity diffusion region arranged on a first side face, and a second impurity diffusion region arranged on a second side face.

Abstract: A method for carrying out read and write operations in a synchronous memory device having a shared I/O, includes receiving a read command directed to a first internal memory bank during a first timeslot, activating the first internal memory bank to access read data at a read address requested by the read command, receiving a write command directed to a second internal memory bank during a second timeslot later than the first timeslot, determining whether a data collision between the read data for output to the shared I/O with normal read latency and write data to be received on the shared I/O with normal write latency would occur, and receiving the write data on the shared I/O with the normal write latency during a third timeslot later than the second timeslot.

Abstract: A method includes providing a partition command to a device that includes a memory array including a plurality of memory cells. In response to the providing of the partition command, the memory cells of the memory array are partitioned to select a portion of the memory array. In response to the providing of the partition command, one of bit numbers that are to be stored in one memory cell is selected, so that each of the memory cells included in the selected portion stores data with the selected one of the bit numbers.

Abstract: A method for accessing a plurality of DRAM devices each having a plurality of banks, the plurality of DRAM devices being interconnected to receive common address and command signals. The method includes receiving a first chip selection address and a first bank address with an active command to activate a first bank in a first DRAM device of the plurality of DRAM devices. A first bank active flag is set, corresponding to the first bank address, in the first DRAM device of the plurality of DRAM devices. A second bank address with a column command is received. A second bank is accessed in a second DRAM device of the plurality of DRAM devices having a set bank active flag corresponding to the second bank address.

Abstract: A semiconductor device comprises: a memory cell region having a first transistor and a peripheral circuit region having a second transistor. The first transistor has a first source electrode and a first drain electrode, a first buried gate insulating film which is formed along an inner wall of a trench and whose relative dielectric constant is higher than a relative dielectric constant of silicon oxide, and a buried gate electrode. The second transistor has a second source electrode and a second drain electrode, a first on-substrate gate insulating film whose relative dielectric constant is higher than a relative dielectric constant of silicon oxide, and an on-substrate gate electrode. A first Hf content percentage, which is a content percentage of hafnium in the first buried gate insulating film, is different from a second Hf content percentage, which is a content percentage of hafnium in the first on-substrate gate insulating film.

Abstract: Disclosed herein is a device that includes a bias line to which a bias current flows, a switch circuit controlling an amount of the bias current based on a control signal, a control line to which the control signal is supplied, and a cancellation circuit substantially cancelling a potential fluctuation of the bias line caused by changing the control signal, the potential fluctuation propagating via a parasitic capacitance between the control line and the bias line.

Abstract: A method of forming a dielectric film including a zirconium oxide film includes: forming a zirconium oxide film on a substrate to be processed by supplying a zirconium material and an oxidant, the zirconium material including a Zr compound which includes a cyclopentadienyl ring in a structure, and forming a titanium oxide film on the zirconium oxide film by supplying a titanium material and an oxidant, the titanium material including a Ti compound which includes a cyclopentadienyl ring in a structure.

Abstract: In a semiconductor device, there are provided first to third pairs of nMOS transistors between a GND and two sense nodes and first to third pairs of pMOS transistors between the two sense nodes and the power supply. A first internal clock signal and its inverted signal are supplied to gates of the first pair of nMOS transistors and the second pair of nMOS transistors, respectively. Complementary external clock signals are supplied to the gates of the third pairs of nMOS transistors and the third pairs of pMOS transistors. An inverted version of a second internal clock signal and the second internal clock signal are supplied to gates of the first and second pairs of pMOS transistors. The two sense nodes are connected to inputs of a differential amplifier. The output of the differential amplifier is latched by a latch circuit. An equalizing circuit precharges/equalizes the two sense nodes.

Abstract: A method for reducing leakage current in DRAM capacitor stacks by introducing dielectric interface layers between the electrodes and the bulk dielectric material. The dielectric interface layers are typically amorphous dielectric materials with a k value between about 10 and about 30 and are less than about 1.5 nm in thickness. Advantageously, the thickness of each of the dielectric interface layers is less than 1.0 nm. In some cases, only a single dielectric interface layer is used between the bulk dielectric material and the second electrode.

Abstract: A semiconductor random access memory device includes a memory cell including a resistor whose resistance varies by formation and disappearance of a filament due to an oxidation-reduction reaction of metal ions, a memory area configured to include a first memory area operable in a nonvolatile mode in which a stored content thereof is not lost by a power-off event, and a second memory area operable in a volatile mode in which the stored content thereof is lost by the power-off event, each of the first memory area and the second memory area including the plurality of the memory cells, a register circuit that stores information including a first address information indicating the first memory area, and a second address information indicating the second memory area, and a control circuit that controls the nonvolatile mode, and the volatile mode, with reference to the information stored in the register circuit.

Abstract: Disclosed herein is a device that includes first and second ports arranged in a first direction and first and second circuits arranged between the first and second ports. The first and second ports are coupled to the first and second circuits, respectively. The first and second circuits include first and second sub circuits that control an operation timing thereof based on a timing signal, respectively. The control signal is transmitted through a control line extending in a second direction. Distances between the control line and the first and second sub circuits in the first direction are the same as each other. A coordinate of the control line in the first direction is different from an intermediate coordinate between coordinates of the first and second ports in the first direction.

Abstract: Disclosed herein is a device that includes first and second current paths, first and second latch circuits electrically connected to the first and second current paths, respectively, a driver circuit supplying first data to the first latch circuit, and supplying second data representing a logical value opposite to a logical value of the first data to the second latch circuit, a control circuit controlling the driver circuit to be alternately and repeatedly in a first period in which the driver circuit supplies the first data to the first latch circuit and does not supply the second data to the second latch circuit, and in a second period in which the driver circuit supplies the second data to the second latch circuit and does not supply the first data to the first latch circuit, and a monitor circuit.

Abstract: A semiconductor device includes a semiconductor substrate, an impurity region in the semiconductor substrate, and a conductive layer contacting a top surface of the impurity region and at least a side surface of the impurity region.

Abstract: A current source includes a first MOS transistor of a first channel type including a drain connected to an output terminal, and a source directly connected to a first power supply, a second MOS transistor of the first channel type including a drain connected to a gate, the gate of the second MOS transistor being connected to the gate of the first transistor, and a source directly connected to the first power supply, a third MOS transistor of a second channel type opposite the first channel type including a drain connected to the drain of the second MOS transistor, a fourth MOS transistor of the second channel type including a drain connected to the source of the third MOS transistor, a gate connected to a first bias voltage, and a source directly connected to second power supply voltage, and a control voltage generator that detects an output voltage on the output terminal and provides a shifted version of the output voltage to the gate of the third MOS transistor.