Ring for a plasma processing apparatus

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Description

This application contains subject matter related to the following co-pending U.S. design patent applications:

Application Ser. No. 29/610,995, filed herewith and entitled “Electrode Cover for a Plasma Processing Apparatus”;

Application Ser. No. 29/610,996, filed herewith and entitled “Electrode Cover for a Plasma Processing Apparatus”;

Application Ser. No. 29/610,999, filed herewith and entitled “Cover Ring for a Plasma Processing Apparatus”; and

Application Ser. No. 29/611,001, filed herewith and entitled “Discharge Chamber for a Plasma Processing Apparatus”.

FIG. 1 is a front, top and right side perspective view of a ring for a plasma processing apparatus, showing our new design;

FIG. 2 is a front, bottom and right side perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a right side elevational view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 5; and,

FIG. 10 is an enlarged view of the portion shown in box 10 in FIG. 9.

The broken lines showing a rectangular box labeled 10 in the drawings in FIG. 9 form no part of the claimed design.

Claims

The ornamental design for a ring for a plasma processing apparatus, as shown and described.

Referenced Cited
U.S. Patent Documents
5310453 May 10, 1994 Fukasawa
D404372 January 19, 1999 Ishii
6068548 May 30, 2000 Vote
6602116 August 5, 2003 Prince
D490450 May 25, 2004 Hayashi
D494551 August 17, 2004 Doba
D494552 August 17, 2004 Tezuka
D496008 September 14, 2004 Takahashi
D552565 October 9, 2007 Nakamura
D557226 December 11, 2007 Uchino et al.
D557425 December 11, 2007 Nakamura et al.
D559994 January 15, 2008 Nagakubo et al.
D606952 December 29, 2009 Lee
D694790 December 3, 2013 Matsumoto
D697038 January 7, 2014 Matsumoto
D699199 February 11, 2014 Kuwabara
D699200 February 11, 2014 Nagakubo
D766849 September 20, 2016 Fukushima
D770992 November 8, 2016 Tauchi et al.
D793976 August 8, 2017 Fukushima
D794585 August 15, 2017 Nabeya
D797691 September 19, 2017 Joubert
D799437 October 10, 2017 Nabeya
D810705 February 20, 2018 Krishnan
20040025788 February 12, 2004 Ogasawara
20050277375 December 15, 2005 Young
20080308230 December 18, 2008 Takahashi
20160158910 June 9, 2016 Lee
Foreign Patent Documents
D1210213 June 2004 JP
D1361441 June 2009 JP
D1551512 June 2016 JP
Other references
  • Ichino et al., Design U.S. Appl. No. 29/610,995, filed Jul. 18, 2017.
  • Ichino et al., Design U.S. Appl. No. 29/610,996, filed Jul. 18, 2017.
  • Ichino et al., Design U.S. Appl. No. 29/610,999, filed Jul. 18, 2017.
  • Nunomura et al., Design U.S. Appl. No. 29/611,001, filed Jul. 18, 2017.
Patent History
Patent number: D836573
Type: Grant
Filed: Jul 18, 2017
Date of Patent: Dec 25, 2018
Assignee: Hitachi High-Technologies Corporation (Tokyo)
Inventors: Takamasa Ichino (Tokyo), Kohei Sato (Tokyo), Kazunori Nakamoto (Tokyo)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/610,998