Ring for a plasma processing apparatus

Description

This application contains subject matter related to the following co-pending U.S. design patent applications:

Application Ser. No. 29/610,995, filed herewith and entitled “Electrode Cover for a Plasma Processing Apparatus”;

Application Ser. No. 29/610,996, filed herewith and entitled “Electrode Cover for a Plasma Processing Apparatus”;

Application Ser. No. 29/610,999, filed herewith and entitled “Cover Ring for a Plasma Processing Apparatus”; and

Application Ser. No. 29/611,001, filed herewith and entitled “Discharge Chamber for a Plasma Processing Apparatus”.

FIG. 1 is a front, top and right side perspective view of a ring for a plasma processing apparatus, showing our new design;

FIG. 2 is a front, bottom and right side perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a right side elevational view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 5; and,

FIG. 10 is an enlarged view of the portion shown in box 10 in FIG. 9.

The broken lines showing a rectangular box labeled 10 in the drawings in FIG. 9 form no part of the claimed design.

Claims

The ornamental design for a ring for a plasma processing apparatus, as shown and described.