Patents Assigned to J.A. Woollam Co. Inc.
  • Ellipsometer meeting scheimpflug condition with provision of an essentially circular electromagnetic radiation spot on a sample
    Patent number: 7567345
    Abstract: A reflectometer, ellipsometer, polarimeter or the like system with aperture, focusing means, sample and optionally detector planes oriented so that the Scheimpflug condition is substantially met on incident and/or, optionally, reflection sides of a sample. In addition beneficial aperture hole aspect ratio and aperture plane orientation is described.
    Type: Grant
    Filed: April 10, 2007
    Date of Patent: July 28, 2009
    Assignee: J.A. Woollam Co., Inc.
    Inventors: Martin M. Liphardt, Brooks A. Hitt, Jeffrey S. Hale, Ping He
  • Spatial filter means comprising an aperture with a non-unity aspect ratio in a system for investigating samples with electromagnetic radiation
    Patent number: 7554662
    Abstract: Systems which utilize electromagnetic radiation to investigate samples and include at least one spatial filter which has an aperture having a hole therethrough with a non-unity aspect ratio.
    Type: Grant
    Filed: December 29, 2006
    Date of Patent: June 30, 2009
    Assignee: J.A. Woollam Co., Inc.
    Inventors: Martin M. Liphardt, Ping He, Blaine D. Johs, Craig M. Herzinger
  • Beam chromatic shifting and directing means
    Patent number: 7535566
    Abstract: An electromagnetic beam chromatic shifting and directing means for use in reflectively directing a spectroscopic beam of electromagnetic radiation while simultaneously de-emphasizing intensity in a first range of wavelengths, (eg. the Visible wavelengths), and simultaneously relatively emphasizing intensity in another wavelength range, (eg. UV wavelengths).
    Type: Grant
    Filed: June 15, 2006
    Date of Patent: May 19, 2009
    Assignee: J.A. Woollam Co., Inc.
    Inventors: Blaine D. Johs, Galen L. Pfeiffer, Jeffrey S. Hale, Christopher A. Goeden, Brian D. Guenther, Martin M. Liphardt, Ping He
  • System for and method of investigating the exact same point on a sample substrate with multiple wavelengths
    Patent number: 7522279
    Abstract: Disclosed are system for and method of analyzing the substantially the exact same point on a sample system with at least two wavelengths, or at least two ranges of wavelengths for which the focal lengths do not vary more than within an acceptable amount.
    Type: Grant
    Filed: June 5, 2006
    Date of Patent: April 21, 2009
    Assignee: J.A. Woollam Co., Inc
    Inventors: Martin M. Liphardt, Blaine D. Johs, Craig M. Herzinger, Ping He, Christopher A. Goeden, John A. Woollam, James D. Welch
  • Temperature controlled lens
    Patent number: 7518725
    Abstract: Quasi-achromatic multi-element lens(es), the elements of which are mounted with respect to one another in a temperature controlled mounting system, and the application thereof in focusing, (and/or colliminating), a spectroscopic electromagnetic beam into a very small, chromatically relatively undispersed, area spot on a material system, and application thereof in ellipsometer, polarimeter and the like systems.
    Type: Grant
    Filed: October 23, 2006
    Date of Patent: April 14, 2009
    Assignee: J.A. Woollam Co., Inc.
    Inventor: Martin M. Liphardt
  • Automated ellipsometer and the like systems
    Patent number: 7505134
    Abstract: Systems and methodology for orienting the tip/tilt and vertical height of samples, preferably automated, as applied in ellipsometer and the like systems.
    Type: Grant
    Filed: April 21, 2006
    Date of Patent: March 17, 2009
    Assignee: J.A. Woollam Co., Inc
    Inventors: Blaine D. Johs, Ping He, Martin M. Liphardt, Christopher A. Goeden, John A. Woollam, James D. Welch
  • Discrete polarization state spectroscopic ellipsometer system and method of use
    Patent number: 7492455
    Abstract: A spectroscopic ellipsometer system comprising a plurality of individual sources which are sequentially energized to provide a sequence of beams, each of different polarization state but directed along a common locus toward a sample. The preferred spectroscopic ellipsometer system has no parts which move during data collection, and it provides a progressive plurality of sequentially discrete, rather than continuously varying, polarization states.
    Type: Grant
    Filed: July 10, 2006
    Date of Patent: February 17, 2009
    Assignee: J.A. Woollam Co., Inc.
    Inventors: Blaine D. Johs, Martin M. Liphardt, Ping He, Jeffrey S. Hale
  • System and method of applying xenon arc-lamps to provide 193 nm wavelengths
    Patent number: 7489400
    Abstract: Application of Xenon arc-lamps to provide UV/deep UV wavelengths in spectrophotometer, reflectometer, ellipsometer, polarimeter or the like systems.
    Type: Grant
    Filed: August 3, 2006
    Date of Patent: February 10, 2009
    Assignee: J.A. Woollam Co., Inc.
    Inventors: Ping He, Martin M. Liphardt, James D. Welch
  • Ellipsometric investigation of very thin films
    Patent number: 7483148
    Abstract: Use of spectroscopic data obtained by investigation of a witness sample having a relatively thick dielectric on a surface thereof during deposition of a thin film onto the witness sample and onto a process sample having no, or a relatively thin dielectric on its surface, in characterizing thin film deposited onto the process sample.
    Type: Grant
    Filed: March 16, 2007
    Date of Patent: January 27, 2009
    Assignee: J. A. Woollam Co., Inc.
    Inventor: Blaine D. Johs
  • Sample masking in ellipsometer and the like systems including detection of substrate backside reflections
    Patent number: 7477388
    Abstract: A system and method of preventing substrate backside reflected components in a beam of electromagnetic radiation caused to reflect from the surface of a sample in an ellipsometer or polarimeter system, involving placing a mask adjacent to the surface of the sample which allows electromagnetic radiation to access the sample over only a limited area, wherein the mask can include detector elements for collecting electromagnetic radiation reflected from the sample backside.
    Type: Grant
    Filed: May 24, 2006
    Date of Patent: January 13, 2009
    Assignee: J.A. Woollam Co., Inc.
    Inventors: Martin M. Liphardt, James D. Welch, Corey L. Bungay, John A. Woollam
  • Rotating compensator ellipsometer system with spatial filter equivalent
    Patent number: 7468794
    Abstract: Application of a spatial filter equivalent constructed from a converging lens and an optical fiber in rotating compensator ellipsometer systems, after a sample system. The purpose is to eliminate a radially outer annulus of a generally arbitrary Profile beam that presents with low intensity level irregular content, so that electromagnetic beam intensity is caused to quickly decay to zero as a function of radius.
    Type: Grant
    Filed: August 15, 2005
    Date of Patent: December 23, 2008
    Assignee: J.A. Woollam Co., Inc.
    Inventors: Martin M. Liphardt, Blaine D. Johs, Craig M. Herzinger, Ping He
  • Deviation angle self compensating substantially achromatic retarder
    Patent number: 7460230
    Abstract: A substantially achromatic multiple element compensator system for use in wide spectral range (for example, 190-1700 nm) rotating compensator spectroscopic ellipsometer and/or polarimeter systems. Multiple total internal reflections enter retardance into an entered beam of electromagnetic radiation, and the elements are oriented to minimize changes in the net retardance vs. the input beam angle resulting from changes in the position and/or rotation of the system of elements.
    Type: Grant
    Filed: October 31, 2006
    Date of Patent: December 2, 2008
    Assignee: J.A. Woollam Co., Inc.
    Inventors: Blaine D. Johs, Steven E. Green, Craig M. Herzinger, Duane E. Meyer
  • Deviation angle self compensating substantially achromatic retarder
    Patent number: 7450231
    Abstract: A substantially achromatic multiple element compensator system for use in wide spectral range (for example, 190-1700 nm) rotating compensator spectroscopic ellipsometer and/or polarimeter systems. Multiple total internal reflections enter retardance into an entered beam of electromagnetic radiation, and the elements are oriented to minimize changes in the net retardance vs. the input beam angle resulting from changes in the position and/or rotation of the system of elements.
    Type: Grant
    Filed: December 4, 2006
    Date of Patent: November 11, 2008
    Assignee: J.A. Woollam Co., Inc.
    Inventors: Blaine D. Johs, Steven E. Green, Craig M. Herzinger, Duane E. Meyer
  • Reduced gas flow purging system in reflectometer, ellipsometer, polarimeter and the like systems
    Patent number: 7426030
    Abstract: Reflectometer, ellipsometer, polarimeter or the like system, which functionally comprise means for providing gas confined in a mini-chamber near the surface of a sample, at a location at which a beam having UV, VUV, IR and NIR wavelengths of electromagnetic radiation is caused to be impinged thereupon.
    Type: Grant
    Filed: February 10, 2007
    Date of Patent: September 16, 2008
    Assignee: J.A. Woollam Co., Inc.
    Inventors: Martin M. Liphardt, James D. Welch
  • Sample analysis methodology utilizing electromagnetic radiation
    Patent number: 7385697
    Abstract: Simultaneous use of wavelengths in at least two ranges selected from RADIO, MICRO, FIR, IR, NIR-VIS-NUV, UV, DUV, VUV EUV, XRAY in a regression procedure to evaluate parameters in mathematical dispersion structures to model dielectric functions.
    Type: Grant
    Filed: May 20, 2004
    Date of Patent: June 10, 2008
    Assignee: J.A. Woollam Co., Inc.
    Inventors: John A. Woollam, Corey L. Bungay, Thomas E. Tiwald, Martin M. Liphardt, Ronald A. Synowicki, Gregory K. Pribil, Craig M. Herzinger, Blaine D. Johs, James N. Hilfiker
  • System and method of selectively monitoring sample front and backside reflections in ellipsometer and the like systems
    Patent number: 7385698
    Abstract: A spectrophotometer, reflectometer, ellipsometer polarimeter or the like system having a detector means for independently intercepting electromagnetic radiation reflected from a sample frontside or backside, and methodology for pursuing less correlated determination of refractive index and thickness values.
    Type: Grant
    Filed: November 30, 2005
    Date of Patent: June 10, 2008
    Assignee: J.A. Woollam Co., Inc.
    Inventors: James D. Welch, John A. Woollam, Martin M. Liphardt
  • System for reducing stress induced effects during determination of fluid optical constants
    Patent number: 7349092
    Abstract: A system for determination of optical constants of liquids, including provision for reducing stress induced effects while obtaining data.
    Type: Grant
    Filed: October 24, 2005
    Date of Patent: March 25, 2008
    Assignee: J.A. Woollam Co., Inc
    Inventors: Thomas E. Tiwald, John A. Woollam, Galen L. Pfeiffer, Blaine D. Johs, Craig M. Herzinger
  • Control of beam spot size in ellipsometer and the like systems
    Patent number: 7345762
    Abstract: Disclosed are system for and method of analyzing substantially the exact same spot size on a sample system with at least two wavelengths for which the focal lengths do not vary more than within an acceptable amount.
    Type: Grant
    Filed: August 15, 2005
    Date of Patent: March 18, 2008
    Assignee: J.A. Woollam Co., Inc.
    Inventors: Martin M. Liphardt, Blaine D. Johs, John A. Woollam, Duane E. Meyer, James D. Welch
  • Spectroscopic ellipsometer and polarimeter systems
    Patent number: 7336361
    Abstract: A spectroscopic ellipsometer or polarimeter system having a source of a polychromatic beam of electromagnetic radiation, a polarizer, a stage for supporting a material system, an analyzer, a dispersive optics and a detector system which comprises a multiplicity of detector elements, there being apertures before the stage for supporting a material system, and thereafter, the system further having at least one multi-element lens and optionally being present in an environmental control chamber.
    Type: Grant
    Filed: October 25, 2005
    Date of Patent: February 26, 2008
    Assignee: J.A. Woollam Co., Inc.
    Inventors: Martin M. Liphardt, Blaine D. Johs, Jeffrey S. Hale, Craig M. Herzinger, Steven E. Green, Ping He, John A. Woollam
  • Sample orientation system and method
    Patent number: 7333198
    Abstract: Disclosed are systems and methodology for orienting the vertical position, and tilt, of samples, as applied in ellipsometer and the like systems.
    Type: Grant
    Filed: July 29, 2006
    Date of Patent: February 19, 2008
    Assignee: J.A. Woollam Co., Inc.
    Inventor: Martin M. Liphardt