Abstract: A method of fabricating integrated circuits according to a first design by imaging a first layer on a substrate using a first mask having a block of first patterns in common with a second design, but without any other patterns of the first or second designs and imaging a second layer on the substrate using a second mask having a block of second patterns unique to the first design and at least one third layer pattern. The block of first patterns is repeatedly exposed in a first grid and the block of second patterns is repeatedly exposed in a second grid, each without overlap in the corresponding layer. The grids are aligned such that the integrated circuits and test structures in scribe lines between the integrated circuits are properly formed on the substrate. The first patterns can be for large fields and the second patterns can be for small fields.

Abstract: A signal-aligning circuit includes a phase-adjusting circuit, a first control circuit, a second control circuit, and a tuning circuit. The first control circuit outputs a first voltage signal reflecting a phase difference between a first input signal (reference signal) and a second input signal (adjusted signal) and having a static phase offset due to asymmetries in the first control circuit. The second control circuit is a replica of the first control circuit, and receives the reference signal at two inputs thereof and outputs a second voltage signal reflecting the same static phase offset. The tuning circuit compares the first and second voltage signals and tunes a bias current in the first and second control circuits, whereby the static phase offsets of the first and the second control circuits becomes zero when the adjusted signal is phase-aligned with the reference signal in the steady state.

Abstract: A method, apparatus, and computer instructions for configuring a set of controllers. The configuration of multiple controllers may be achieved through a combination of a host application and a controller application. A host application and a controller application are employed to configure the set of controllers in which the host application is employed to relay commands from the controller application to other controllers as well as provide other functions, such as, for example, a user interface to receive input for configuring the controllers. A request is sent from the controller application executing on a selected controller within the set of controllers to the host application executing in host memory. The request is for an execution of a command in at least one of the set of controllers in response to a requirement to configure the set of controllers.

Abstract: An optimization apparatus and method optimizes a functional block within a netlist of an integrated circuit design. A corresponding delay value is assigned to each of a plurality of pins of the block. Each pin corresponds to a respective signal path through the block. The delay values together form a delay value combination, which is selected from a continuous set of possible combinations in which each combination in the set satisfies a predetermined criteria. A circuit configuration for the block is then generated with a plurality of logic cells that are interconnected in the netlist such that the respective signal paths have delays through the block that are based on the corresponding delay values.

Abstract: An automated framework and methodology for the development, testing, validation, and documentation of the design of semiconductor products that culminates in the release of a design kit having a flow manager and flow file to actualize a methodology to design a semiconductor product. The flow framework and methodology receives a methodology and a technology description for the semiconductor product. Then the flow framework and methodology coordinates and tests flow files developed by flow developers using testcases from testcase developers, libraries from library developers and tools from tool from flow developers that may be constantly updated. When a flow file, a testcase, a library, and/or a tool is updated, added, or otherwise changed, ongoing regression testing is accomplished to update the correct flow file.

Abstract: A method of performing a characterization of an integrated circuit design that is customized during succeeding fabrication steps. The characterization is accomplished with respect to different levels of a processing parameter that is fixed during preceding fabrication steps. A wafer is processed through the preceding fabrication steps, including processing the wafer at at least one of the preceding fabrication steps using processing that produces the different levels of the processing parameter within different integrated circuits on the wafer. This produces a standardized characterization wafer. The standardized characterization wafer is processed through the succeeding fabrication steps using customized processing to produce a customized characterization wafer. The integrated circuits on the customized characterization wafer are tested to determine which of the different levels of the processing parameter produces integrated circuits having desired characteristics.

Abstract: The present invention provides an apparatus and method for selecting bus-width formats. In an exemplary preferred embodiment of the invention, the circuit includes a bus controller configured to provide a first bus-width control signal to select a first bus-width. The circuit also includes a bus controller extension circuit configured to force the first bus-width control signal to a predetermined level when the bus controller is applied to a bus with a second bus controller that is incompatible with the first bus-width. Advantages of the invention include controlling a number of data bits to be transferred between a PCI device and a data bus that does not violate PCI specifications. Other advantages include a programmability of the PCI device to adapt to legacy systems as PCI technology progresses.

Abstract: A processor is disclosed including several features allowing the processor to simultaneously execute instructions of multiple conditional execution instruction groups. Each conditional execution instruction group includes a conditional execution instruction and a code block specified by the conditional execution instruction. In one embodiment, the processor includes multiple state machines simultaneously assignable to a corresponding number of conditional execution instruction groups. In another embodiment, the processor includes multiple registers for storing marking data pertaining to a number of instructions in each of multiple execution pipeline stages. In another embodiment, the processor includes multiple attribute queues simultaneously assignable to a corresponding number of conditional execution instruction groups. In another embodiment, the processor includes write enable logic and an execution unit.

Abstract: A secondary cache controller, a method of operating a secondary cache and a secondary cache incorporating the controller or the method. In one embodiment, the controller includes: (1) configuration registers that allow at least one cacheable memory range to be defined and (2) a standard bus interface that cooperates with the configuration registers to allow the secondary cache controller to operate in: (2a) a configuration mode in which values are written to the configuration registers via only the standard bus interface to define the at least one cacheable memory range and (2b) an operating mode in which the values govern operation of the secondary cache controller absent external cache control instructions.

Abstract: A time-shifted video method has a real-time mode during which real-time video frames are delivered for display. In a time-shifted mode, time-shifted video frames are delivered for display. The time-shifted video frames are delayed relative to the real-time video frames. A real-time frame is paused during a transition from the real-time mode to the time-shifted mode.

Abstract: An integrated barrier and seed layer that is useful for creating conductive pathways in semiconductor devices. The barrier portion of the integrated layer prevents diffusion of the conductive material into the underlying dielectric substrate while the seed portion provides an appropriate foundation upon which to deposit the conductive material. The barrier portion of the integrated layer is formed of a metal nitride, while the seed portion is formed of ruthenium or a ruthenium alloy. The metal nitride forms an effective barrier layer while the ruthenium or ruthenium alloy forms an effective seed layer for a metal such as copper. In some embodiments, the integrated layer is formed in a way so that its composition changes gradually from one region to the next.

Abstract: A method for characterizing overlay errors between at least a first and a second mask layer for an integrated circuit. A first primary alignment structure is formed in a first position of the inter-layer region around the first mask layer, and a first secondary alignment structure is formed in a second position of the inter-layer region around the first mask layer. Similarly, a second primary alignment structure is formed in a first position of an inter-layer region around the second mask layer, and a second secondary alignment structure is formed in a second position of the inter-layer region around the second mask layer.

Abstract: The present invention is directed to a system and method for providing a collaborative integration of hybrid electronic and micro and sub-micro, including nano, level aggregates. A method of sampling aggregate nano behavior to determine progress by the nano aggregate toward a desired result may include sampling at least one of aggregate nano and aggregate micro behavior by a transducer. The aggregate behavior is measured through use of the sample by a macro level control apparatus. If the measured aggregate behavior is identified as diverging from progress toward a desired result, an effector is activated by the macro level control apparatus to influence the aggregate behavior toward progress toward the desired result.

Abstract: The invention provides a method of measuring a standard critical dimension feature and insuring that this feature is representative of cross-chip average critical dimension size in accordance with an embodiment of the invention. The method includes the steps of incorporating a cluster of CD features, determining a cross-chip average feature size, selecting the CD feature which is closest in size to the cross-chip average CD feature size as the standard feature for in-line measurement, and implementing the CD measurement of the appropriate feature on production wafers.

Abstract: An apparatus including a first circuit, a second circuit, and a third circuit. The first circuit may be configured to receive a plurality of input signals and present one of the plurality of input signals as a data signal in response to a control signal. The second circuit may be configured to generate the control signal and generate a trace data stream in response to the data signal. The third circuit may be configured to receive and store the trace data stream and read and present the stored trace data stream in response to one or more commands.

Abstract: The invention provides a process for forming a low k fluorine and carbon-containing silicon oxide dielectric material by reacting with an oxidizing agent one or more silanes containing one or more organofluoro silanes having the formula SiR1R2R3R4, where: (a) R1 is selected from H, a 3 to 10 carbon alkyl, and an alkoxy; (b) R2 contains at least one C atom bonded to at least one F atom, and no aliphatic C—H bonds; and (c) R3 and R4 are selected from H, alkyl, alkoxy, a moiety containing at least one C atom bonded to at least one F atom, and ((L)Si(R5)(R6))n(R7); where n ranges from 1 to 10; L is O or CFR8; each n R5 and R6 is selected from H, alkyl, alkoxy, and a moiety containing at least one C atom bonded to at least one F atom; R7 is selected from H, alkyl, alkoxy, and a moiety containing at least one C atom bonded to at least one F atom; and each R8 is selected from H, alkyl, alkoxy, and a moiety containing at least one C atom bonded to at least one F atom.

Abstract: A method for developing a circuit is disclosed. The method generally comprises the steps of (A) generating a solution space having a dimension for each of a plurality of parameters for the circuit, (B) evaluating a plurality of instances of the circuit in the solution space through a software simulation, (C) evaluating the instances through a hardware simulation, and (D) updating the instances in response to the software simulation and the hardware simulation to approach an optimum instance of the instances for the circuit.

Abstract: The subject invention is a system, apparatus and/or method of forming interconnects on a semiconductor wafer. Particularly, the subject invention provides interconnect routing using parallel lines on a semiconductor wafer. The method includes producing a plurality of spaced, parallel interconnects on a wafer, and producing interruptions in selective ones of the plurality of interconnects where the connection should be disrupted. Preferably, the plurality of spaced, parallel lines are formed over the entire die region of the wafer and are spaced from one another by a predetermined width. In one form, a mask having a plurality of spaced, parallel lines may be used.

Abstract: In one embodiment, bimetallic oxide compositions for gate dielectrics that include two or more of the elements Ca, Sr, Ba, Hf, and Zr are described.

Abstract: A method for storing data of a plurality of components of an image in a memory system with four banks comprising the steps of (A) placing a first portion of data of a first component of the plurality of components into a first bank of the four banks and (B) placing a second portion of the data of the first component in a second bank of the four banks, where all of the data of the first component is stored in the first and second banks and occupies at least three pages in the memory system.