Abstract: The present invention provides a numerically controlled machine tool and a program transforming method therefor where a NC program is transformed into an optimum program even by a non-expert programmer. Particularly, the present invention provides a method for optimizing a NC program for operating a numerically controlled machine tool, comprising: making the NC program to be loaded into the numerically controlled machine tool; designating a portion of the NC program to be determined whether it is transformable and/or a portion of the NC program to be determined whether a command position is changeable; storing the NC program in a memory; determining whether the designated portion is transformable and/or whether the designated command position is changeable; and transforming the designated portion and/or changing the designated command position, and making an operating program file for the numerically controlled machine tool.

Abstract: An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation, comprising the actions of, providing a data representation of at least one image to be imaged onto a plurality of locations of said workpiece, fracturing said data representation into a plurality of field stripes, repeating the actions of rasterizing a first field stripe of said data representation, modulating a modulator according to said rasterized field stripe, imaging said first field stripe onto a plurality of locations of said workpiece, rasterizing a second field stripe of said data representation while imaging said first field stripe onto said plurality of locations of said workpiece, terminating the repetition when a predetermined amount of said image is imaged onto said plurality of locations of said workpiece. Other aspects of the present invention are reflected in the detailed description, figures and claims.

Abstract: An aspect of the present invention includes a method for reshaping sub-objects in at least one object in pattern design data to be presented to a mask writer or a direct writer for producing a pattern onto a workpiece, where said object comprises a plurality of slivers in a first direction, comprising the actions of: a) generating a list of slivers, repeating the actions of: b) comparing a dynamic object in an object list with the slivers in said list of slivers to look for adjacent slivers, c) removing adjacent slivers from said list of slivers to said object list, d) merging adjacent slivers with said dynamic object, e) terminating the repetition when no slivers in said list of slivers are adjacent to said dynamic object in said object list. Other aspects of the present invention are reflected in the detailed description, figures and claims.

Abstract: The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting the pattern to modulator signals, and feeding the signals to the modulator. An electronic control system may be provided to control a trigger signal to compensate for flash-to-flash time jitter in the light source.

Abstract: The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus comprises a source for emitting electromagnetic radiation, a spatial modulator having multitude of modulating elements (pixels), adapted to being illuminated by said radiation, and a projection system creating an image of the modulator on the workpiece.

Abstract: A scanning pattern generator and a method for microlithographic multi-beam writing of high precision patterns on a photosensitive substrate (11), the system comprising a light source (1), preferably a laser, for generating at least two light beams, a computer-controlled light modulator (4), a deflector for scanning the beams on the substrate and an objective lens (10) to contract the at least one light beam from the light source before it reaches the substrate, wherein at least the objective lens is arranged on a carrier (22) being movable relative to the substrate (11) and the light source (1). Hereby, the carrier defines a movable optical path relative to the remaining, stationary optical path. Further, the system comprises means for altering the stationary optical path in order to maintain telecentricity for the beams as they impinge on the photosensitive substrate during the movement of the carrier and the movable optical path.

Abstract: A method is provided for fixedly joining a cloth, a cloth-like fabric or a synthetic mesh to a filter plate using a flanged cloth connector ring. The flanged cloth connector ring is attached to the filter cloth around the feed port of the cloth and inserted into a receiving channel in the filter plate. A locking ring or a distribution ring may be inserted into the channel adjacent to the connector ring to retain the connector ring and attached filter cloth in place. Filter cloths may be individually and independently attached to each side of a filter plate using a cloth connector ring.

Abstract: The present invention relates to a method for calibrating elements in a spatial light modulator (SLM) as a function of an applied element control signal. A plurality of elements are calibrated simultaneously. A beam of electromagnetic radiation is projected onto at least a part of the SLM. An image of said part of said SLM is formed on a device for measuring intensity of electromagnetic radiation. Element calibrating data is generated by using the intensity data as a function of the applied element control signal by either driving a sub-matrix comprising at least two elements out of said part of the SLM to a sequence of applied element control signals or by seeking out the control signal for each element which give the same predetermined intensity value on the device for measuring the intensity of electromagnetic radiation and stepping through N different predetermined intensity values. The invention also relates to an apparatus for patterning a workpiece having such a calibration method.

Abstract: The present invention relates to a method to reduce charging effects affecting a degree of movement of at least one movable micro mirror in a spatial light modulator, said at least one movable micro mirror is electrostatically attractable to at least one electrode, including the action of attracting electrostatically said at least one micro mirror in a sequence of reversed electrical field between said micro mirror and said at least one electrode.

Abstract: In a printer, when a cover is closed, a paper issuing path, and a paper setting path are formed downstream from a cutter mechanism in a paper transport path. The paths are switched over by a movable guide. During a normal printing process, the movable guide is swung by its own weight to close the paper setting path, and guides a paper to the paper issuing path. By contrast, during a process of setting paper, the movable guide is swung by the rigidity of the paper itself toward the paper issuing path, whereby the paper is prevented from being deformed with respect to the cutter mechanism.

Abstract: Pressing plates press side faces of a roll paper loaded into a roll paper holder unit of the drop-in type, thereby preventing overrun of the roll paper caused by an inertia force from occurring. Each of the pressing plates is urged by two coil springs which are placed respectively on inner and outer circumference sides of the roll paper. The coil spring on the outer circumference side has a higher elasticity than the coil spring on the inner circumference side. According to the configuration, the pressing force of the pressing plates due to the elasticity of the coil springs is gradually reduced in accordance with reduction of a diameter of the roll paper.

Abstract: A method and an apparatus for controlling exposure of a surface of a substrate in a process of structuring the substrate with light of a predetermined intensity are described, wherein the light is directed to the surface by means of a deflectable mirror. The intensity has a first maximum at a first deflection of the deflectable mirror, a first minimum at a second deflection of the deflectable mirror, a second maximum at a third deflection of the deflectable mirror, and a second minimum at a fourth deflection of the deflectable mirror. A signal representing the predetermined intensity, and a signal representing a threshold intensity are received, the threshold intensity being equal to or less than the intensity of the second maximum. It is determined whether the predetermined intensity is greater than the threshold intensity.

Abstract: The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus comprises a source for emitting electromagnetic radiation, a spatial modulator having multitude of modulating elements (pixels), adapted to being illuminated by said radiation, and a projection system creating an image of the modulator on the workpiece.

Abstract: The present invention relates to Optical Maskless Lithography (OML). In particular, it relates to providing OML with a recognizable relationship to mask and phase-shift mask techniques.

Abstract: An aspect of the present invention includes a method for manufacturing a mask blank. A substrate is provided. A masking layer is formed on said substrate. At least one layer of material is formed on said substrate such that a reflectivity of a writing wavelength to a film sensitive to the writing wavelength is below 4%. Other aspects of the present invention are reflected in the detailed description, figures and claims.

Abstract: The present invention relates to a method for calibrating a metrology stage in at least two dimensions using an artefact plate having marks forming a pattern, comprising the steps of: placing the artefact plate on the metrology stage in at least three positions, assuming the geometrical properties of the metrology stage and the artefact plate, and the positions of the artefact plate for each measurement, forming a model predicting the measurements of the artefact plate, measuring the marks by the metrology stage, and inverting said model to improve the assumptions on metrology stage and artefact plate.

Abstract: The present invention relates in general to detection of an alignment mark on a workpiece. More particularly, interferometry is applied to detect alignment signals from the surface of a workpiece such as a wafer or reticle. Other aspects of the present invention are reflected in the detailed description, figures and claims.

Abstract: A pneumatic valve for use in laminated plastic microfluidic structures. This zero or low dead volume valve allows flow through microfluidic channels for use in mixing, dilution, particulate suspension and other techniques necessary for flow control in analytical devices.

Abstract: A microfluidic device for concentrating particles in a concentrating solution. A sample and a concentrating fluid flow laminarly with a microfluidic channel wherein the concentrating fluid is formulated such that it extracts fluid from the sample and thus concentrates the particles in the sample.