Patents Assigned to Micronics
-
Publication number: 20080037815Abstract: A condenser microphone includes: a condenser portion including a vibration film and a plate disposed opposed to each other; an impedance conversion unit that converts the variations of the electrostatic capacity of the condenser portion to electric impedances; and a box member that stores the condenser portion and the impedance conversion unit therein, and includes a heat insulating portion.Type: ApplicationFiled: August 10, 2007Publication date: February 14, 2008Applicant: STAR MICRONICS CO., LTD.Inventors: Motoaki ITO, Yoshio Imahori, Hiroshi Fujinami, Kentaro Yonehara
-
Patent number: 7328425Abstract: The invention relates to production and precision patterning of work pieces, including manufacture of photomask for photolithography and direct writing on other substrates, such as semiconductor substrates. In particular, it relates to applying corrections to pattern data, such as corrections for distortions in the field of an SLM exposure stamp. It may be used to produce a device on a substrate. Alternatively, the present invention may be practiced as a device practicing disclosed methods or as an article of manufacture, particularly a memory, either volatile or non-volatile memory, including a program adapted to carry out the disclosed methods.Type: GrantFiled: November 12, 2004Date of Patent: February 5, 2008Assignee: Micronic Laser Systems ABInventors: Martin Olsson, Torbjörn Sandström, Mats Rosling
-
Publication number: 20080025532Abstract: A microphone case includes: a plastic basic frame including a space for housing an electro-acoustic transducing unit; a plastic substrate for closing an opening of the space, the plastic substrate being bonded to the basic frame; conductive layers provided on the bonding surfaces of the basic frame and the substrate respectively, the conductive layers being electrically connected to each other; and exposed portions where the surfaces of the basic frame and the substrate are exposed, wherein the basic frame and the substrate are bonded to each other in the exposed portions.Type: ApplicationFiled: July 27, 2007Publication date: January 31, 2008Applicant: STAR MICRONICS CO., LTDInventors: Kentaro Yonehara, Motoaki ITO, Norihiro SAWAMOTO, Yasunori TSUKUDA
-
Patent number: 7323291Abstract: The present invention relates to preparation of patterned workpieces in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers over a workpiece substrate. The methods and devices produce small feature dimensions in masks and phase shift masks. The methods described may apply to both masks and direct writing on other workpieces having similarly small features, such as semiconductor, cryogenic, magnetic and optical microdevices.Type: GrantFiled: December 22, 2006Date of Patent: January 29, 2008Assignee: Micronic Laser Systems ABInventor: Torbjörn Sandström
-
Publication number: 20080012519Abstract: A movement control apparatus for a moving member, includes: a drive unit that moves a moving member by rapid traverse on a first axis and a second axis intersecting the first axis, and overlaps the rapid traverse movements in the two axis directions to thereby allow the moving member to move around the periphery of a given area; a reference arc setting unit that sets a reference arc inscribed in the first and second axes; a timing setting unit that sets an overlap movement start timing for the rapid traverse of the moving member based on the reference arc when switching the moving member from the first axis to the second axis; and a control unit that controls the operation of the drive unit to move the moving member at a timing set by the timing setting unit.Type: ApplicationFiled: June 29, 2007Publication date: January 17, 2008Applicant: Star Micronics Co., Ltd.Inventors: Satoru Ozawa, Noriyuki Yazaki
-
Publication number: 20080007282Abstract: A probe assembly having a plurality of probes, each of which is secured to an anchor portion on a probe base plate, extends in a direction apart from the anchor portion through a fulcrum, has a tip at the front end thereof, and the tip is elastically deformable at its front end side when pressed against a corresponding electrode pad. Two probe groups are constituted: in the first group, the tips are arranged on one side of an imaginary straight line of the probe base plate, while in the second probe group, the tips are arranged on the other side of the imaginary straight line. The numbers of the probes of both probe groups are different, and a part of the probes forming one probe group with more probes are arranged in the opposite direction to that of the other probes of the same probe group.Type: ApplicationFiled: June 4, 2007Publication date: January 10, 2008Applicant: KABUSHIKI KAISHA NIHON MICRONICSInventors: Yoshiei Hasegawa, Masashi Hasegawa
-
Publication number: 20070279777Abstract: We disclose a method for stabilizing against a drift of a deflection of a micromirror device having an electrostatic actuator, including the actions of: providing an actuator including at least two members beneath said micromirror and at least one electrode beneath said micromirror, at least one of said at least two members being formed of a semiconducting material, providing a surface layer on said at least one semiconducting member facing towards said other member of said actuator, said surface layer having a density of carriers being 1017 cm3 or higher.Type: ApplicationFiled: June 20, 2007Publication date: December 6, 2007Applicant: Micronic Laser Systems ABInventor: Torbjorn Sandstrom
-
Patent number: 7303404Abstract: A contact includes: a first and a second conductive contact pieces and at least one sheet-like electrical insulator such as polyimide. Each contact piece has a sheet-like body portion having a base portion, an elongate portion extending from the base portion, and a conductive contact portion formed in the base portion; and a terminal contact portion formed in the elongate portion. Both base potions are made to confront each other in their thickness direction with an electrical insulator interposed, such that one of the terminal contact portions, without being in electrical contact with the second contact piece, extends toward the second base portion, while the other terminal contact portion, without being in electrical contact with the first contact piece, extends toward the first base portion.Type: GrantFiled: November 21, 2006Date of Patent: December 4, 2007Assignee: Kabushiki Kaisha Nihon MicronicsInventors: Eichi Osato, Yoshihito Goto
-
Patent number: 7302111Abstract: The present invention includes a method to use a phase modulating micromirror array to create an intensity image that has high image fidelity, good stability through focus and good x-y symmetry. Particular aspects of the present invention are described in the claims, specification and drawings.Type: GrantFiled: September 12, 2001Date of Patent: November 27, 2007Assignee: Micronic Laser Systems A.B.Inventors: Martin Olsson, Stefan Gustavson, Torbjörn Sandström, Per Elmfors
-
Publication number: 20070269724Abstract: The technology disclosed relates to immersion lithography, in particular to the exposure of masks by deep and vacuum ultraviolet wavelengths with so-called sub-wavelength resolution. It also is likely to be useful for other methods of sub-wavelength lithography such as lithography on silicon wafers, surface-acoustic wave (SAW) and diffractive optical devices. In particular, it relates to controlling the contact angle between the immersion fluid and the top-most layer of the substrate, which is in contact with immersion fluid, by tuning the surface energy of the top-most layer and properties of the immersion fluid. It is useful to control this interface, in which issues such as entrainment of bubbles in the immersion fluid and puddles of fluid remaining after immersion have been encountered.Type: ApplicationFiled: May 16, 2007Publication date: November 22, 2007Applicant: Micronic Laser Systems ABInventor: Torbjorn Sandstrom
-
Publication number: 20070263187Abstract: The present disclosure relates to formation of latent images in a radiation sensitive layer applied to a substrate that is transparent to or transmissive of radiation at the exposing wavelength. In particular, it relates to so-called backside lithography, in which the final lens of an exposing system is positioned to project electromagnetic radiation through a first side of the transparent substrate and expose a radiation sensitive layer that overlays a second side of the transparent substrate that is opposite the first side. Five alternative embodiments for further treatment to form a radiation opaque layer corresponding to the latent image (the image or its inverse) are described. These methods and corresponding devices are useful for producing masks (sometimes called reticles), for producing latent images in semiconductor devices and for forming features of semiconductor devices using masks.Type: ApplicationFiled: May 15, 2007Publication date: November 15, 2007Applicant: Micronic Laser Systems ABInventors: Per-Erik Gustafsson, Ulric Ljungblad
-
Patent number: 7287327Abstract: A method for producing an electret capacitor microphone high in sensitivity and stable in acoustic characteristic. A PET film stretched with predetermined tension is bonded to a diaphragm support ring to perform stretch and fixation of a diaphragm to produce a diaphragm sub-assembly. The diaphragm sub-assembly is heated at a predetermined temperature (e.g. 200° C.) higher than a second order transition point of PET. Then, the diaphragm sub-assembly is packed in a housing. Because the diaphragm sub-assembly is heated at the predetermined temperature before packed in the housing, the stiffness of the diaphragm is reduced. Because the stiffness of the diaphragm 26 is reduced in such a manner, the tension at the time of stretch and fixation of the diaphragm can be set to a large value to prevent the diaphragm from being crinkled.Type: GrantFiled: December 18, 2002Date of Patent: October 30, 2007Assignee: Star Micronics Co., Ltd.Inventors: Motoaki Ito, Kentaro Yonehara
-
Publication number: 20070248478Abstract: [Problem] To provide a check valve and a diaphragm pump employing the same which has a good response, and in which a valve chamber can be made small so as to be hardly influenced by bubbles. [Means for Solution] A check valve includes a valve chamber 11 which is defined by a top wall 8 having an introducing port 8a of a fluid, a bottom wall 9 having an exhaust port 9a of the fluid, and a side wall, and a valve body 12a which is supported in the valve chamber 11 in a cantilever manner having its base end fixed to the side wall and its distal end formed as a free end, the valve body being arranged above the introducing port 8a. The bottom wall 9 is formed with a valve seat 9b having an inclined face 9b2 which is inclined so as to be gradually separated from the top wall 8 along the valve body 12a from the base end toward the distal end thereof.Type: ApplicationFiled: August 17, 2005Publication date: October 25, 2007Applicant: STAR MICRONICS CO., LTD.Inventors: Shigeru Sugiyama, Hidekazu Urano, Katsuyoshi Ohmori
-
Patent number: 7285365Abstract: An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation by using a plurality of exposure beams having a predetermined separation in at least a first direction for exposing a pattern onto said workpiece, where said predetermined separation is fixed to an initial system pitch in said first direction, comprising the actions of: scaling a pattern pitch in said first direction to be an integer multiple of said system pitch, adjusting the initial system pitch in said first direction to be an adjusted system pitch to maintain a scale of said pattern, adjusting said predetermined separation of exposure beams to said adjusted system pitch. Other aspects of the present invention are reflected in the detailed description, figures and claims.Type: GrantFiled: February 13, 2004Date of Patent: October 23, 2007Assignee: Micronic Laser Systems ABInventor: Peter Ekberg
-
Patent number: 7279792Abstract: According to this invention, a semiconductor device has an upper surface on which an external connection electrode is formed and a lower surface which opposes the upper surface and is in a mirror surface state. A roughened region roughened by laser marking is formed at part of the lower surface. The roughened region includes a product information mark of the semiconductor device itself. The product information mark is printed by laser marking. The number, size, shape, and layout position of the roughened regions are decided to make it possible to, when the lower surface is irradiated with light, read the product information from the difference in light reflectance between the roughened region and mirror-finished region.Type: GrantFiled: May 10, 2004Date of Patent: October 9, 2007Assignee: Casio Micronics Co., LtdInventor: Kinichi Naya
-
Patent number: 7278129Abstract: An aspect of the present invention includes a method for reshaping sub-objects in at least one object in pattern design data to be presented to a mask writer or a direct writer for producing a pattern onto a workpiece, where said object comprises a plurality of slivers in a first direction, comprising the actions of: a) generating a list of slivers, repeating the actions of: b) comparing a dynamic object in an object list with the slivers in said list of slivers to look for adjacent slivers, c) removing adjacent slivers from said list of slivers to said object list, d) merging adjacent slivers with said dynamic object, e) terminating the repetition when no slivers in said list of slivers are adjacent to said dynamic object in said object list. Other aspects of the present invention are reflected in the detailed description, figures and claims.Type: GrantFiled: September 9, 2004Date of Patent: October 2, 2007Assignee: Micronic Laser Systems ABInventor: Lars Ivansen
-
Publication number: 20070210813Abstract: A probe for electrical test comprises a probe body having a base end attached to a support base plate through a solder and a front end continuous with said base end and a surface layer showing a conductivity higher than that of the probe body and a solder wettability higher than that of the probe body and extending on the surface of the probe body from the base end to the front end. In the vicinity of the base end of the surface layer, a shield region having a smaller solder wettability than that of the surface layer is formed across the surface layer.Type: ApplicationFiled: January 26, 2007Publication date: September 13, 2007Applicant: KABUSHIKI KAISHA NIHON MICRONICSInventors: Hideki Hirakawa, Akira Souma, Takayuki Hayashizaki, Shinji Kuniyoshi
-
Publication number: 20070209029Abstract: Previously disclosed methods and devices are extended in this application by two-dimensional analysis of optical proximity interactions and by fashioning a computationally efficient kernel for rapid calculation of adjustments to be made. The computations can be made in realtime, whereby the use of OPC assist features can be reduced, with substantial savings in file size and computational requirements. Further aspects of the invention are disclosed in the descriptions, figures, claims and documents incorporated by reference.Type: ApplicationFiled: February 26, 2007Publication date: September 6, 2007Applicant: Micronic Laser Systems ABInventors: Igor Ivonin, Torbjorn Sandstrom
-
Publication number: 20070206264Abstract: An acousto-optic cell is used in a method and device for patterning a workpiece, for exposing a radiation sensitive layer on a workpiece such as a mask or a device substrate. The acousto-optic cell includes an array of transducers. The transducers may supply columns of ultrasound to the cell. They may produce a two dimensional modulation pattern within the cell. Electromagnetic radiation is modulated by the cell and related to a workpiece. The modulation of the cell may modulate the amplitude and/or phase of the electromagnetic radiation. In some embodiments, adjoining columns of ultrasound may be positioned so that portions of the electromagnetic radiation partially overlap and interfere, after they are modulated.Type: ApplicationFiled: May 7, 2007Publication date: September 6, 2007Applicant: MICRONIC LASER SYSTEMS ABInventor: Torbjorn Sandstrom
-
Publication number: 20070206036Abstract: In a printer, an MPU makes a flash ROM store a temperature read by a temperature sensor at the time of setting of a correction value and a misalignment correction number indicating a misalignment correction value. At the time of reciprocating print motion of a printer, the printer makes the temperature sensor measure an actual ambient temperature before backward printing and obtains a difference between the present temperature and the temperature at the time of setting of the correction value. A print start delay time which indicates timing between a point of time of driving a carriage motor and a point of time of starting the backward printing is corrected in accordance with the temperature difference. The printer starts the backward printing at the timing delayed for the corrected print start delay time.Type: ApplicationFiled: May 7, 2007Publication date: September 6, 2007Applicant: STAR MICRONICS CO., LTD.Inventors: Tetsuro OGINO, Yoshinori TAKEDA
