Abstract: An aspect of the present invention includes a method to pattern a workpiece with improved CD uniformity using a partially coherent electromagnetic radiation source. Said method including the actions of: determining, for a plurality of layers in said workpiece, CD uniformity as a function of a number of exposure flashes, determining, for the plurality of layers in said workpiece, the cost of patterning as a function of the number of exposure flashes, and selecting the number of exposure flashes on a layer by layer basis, which gives a predetermined CD uniformity corresponding to a preferred cost. Other aspects of the present invention are reflected in the detailed description, figures and claims.
Abstract: Disclosed herein is a device comprising a pair of bellows pumps configured for efficient mixing at a microfluidic scale. By moving a fluid sample and particles in suspension through an aperture between the paired bellows pump mixing chambers, molecular collisions leading to binding between the particles and ligands in the sample are enhanced. Such devices provide an alternative for mixing that does not use a vent and can be used with a variety of particles in suspension such as magnetic beads to capture or purify useful cells and molecules.
Type:
Application
Filed:
November 22, 2006
Publication date:
August 9, 2007
Applicant:
Micronics, Inc.
Inventors:
John Clemmens, C. Battrell, John Gerdes, Denise Hoekstra
Abstract: Disclosed are micron-sized, electromagnetically actuated tongue valves, which find application in microfluidic devices and apparatuses. The present invention further relates to methods for manipulating fluid flow in a microfluidic assay system and for sorting and capturing target particles in fluid suspensions.
Abstract: The present invention includes a method to print patterns with improved edge acuity. The method for printing fine patterns comprises the actions of: providing an SLM and providing a pixel layout pattern with different categories of modulating elements, the categories differing in the phase of the complex amplitude.
Abstract: A method is for setting configuration data to a print data supplying device. The print data supplying device is operable to: store data associated with at least one of a plurality of items of group information in a first storage area; generate print data based on: (1) internal print data generated by an internal print data generation program; and (2) configuration data associated with one of the items of group information corresponding to a printer to which the print data is supplied; and supply the print data to the printer. The method includes: determining whether or not a target printer is connected; generating a new item of group information corresponding to the target printer when the target printer is connected; and storing reference configuration data that is stored in a second storage area to the first storage area, as the configuration data, in association with the new item of the group information.
Abstract: A print system includes: a printer; and a print data supplying device. The print data supplying device includes: a print data supplying unit that supplies the printer with a print data; an internal print data condition storage unit that stores a plurality of internal print data conditions in association with the respective print data generation processing operations, the internal print data conditions pertaining to the internal print data; a determination unit that determines whether or not the internal print data satisfies any one of the internal print data conditions; and a print data generation unit that generates the print data by performing one of a plurality of print data generation processing operations, in accordance with internal print data that is output as a result of a data processing operation, and in accordance with the result of the determination made by the determination unit.
Abstract: In a printer, an MPU makes a flash ROM store a temperature read by a temperature sensor at the time of setting of a correction value and a misalignment correction number indicating a misalignment correction value. At the time of reciprocating print motion of a printer, the printer makes the temperature sensor measure an actual ambient temperature before backward printing and obtains a difference between the present temperature and the temperature at the time of setting of the correction value. A print start delay time which indicates timing between a point of time of driving a carriage motor and a point of time of starting the backward printing is corrected in accordance with the temperature difference. The printer starts the backward printing at the timing delayed for the corrected print start delay time.
Abstract: Described herein is microfluidic device for joining fluids and a related method for doing the same. The device according to the present invention includes a microfluidic junction, an outlet channel, and a plurality of circuit units. A microfluidic junction is an area for converging multiple fluids. An outlet channel is capable of receiving fluid from the microfluidic junction. An outlet channel includes a first end connected with the microfluidic junction, a second end connected with a waste reservoir, and an analysis region positioned between the first end and the second end of the outlet channel. The device also includes a plurality of circuit units.
Type:
Grant
Filed:
February 20, 2003
Date of Patent:
May 29, 2007
Assignee:
Micronics, Inc.
Inventors:
Jon W. Hayenga, Bernhard H. Weigl, Ronald L. Bardell, Christopher J. Morris
Abstract: The present invention relates to preparation of patterned workpieces in the production of semiconductor and other devices. Methods and devices are described utilizing resist and transfer layers over a workpiece substrate. The methods and devices produce small feature dimensions in masks and phase shift masks. The methods described may apply to both masks and direct writing on other workpieces having similarly small features, such as semiconductor, cryogenic, magnetic and optical microdevices.
Abstract: The present invention relates to an apparatus for forming a pattern on a radiation sensitive material comprising a source to form a radiation beam, a scanning element to scan at least one beam from said radiation source over said radiation sensitive material, a modulator to modulate said at least one beam during scanning according to an input pattern data file, where said modulation of the beam creates a coherent sub-image on the workpiece and several sub-images are non-coherently superposed to create a final image. The invention also relates to a method of patterning a workpiece and a workpiece as such.
Abstract: Apparatus and method for depositing a banding material on the interior substrate of a tubular device, and the products formed therefrom. The tubular device is, generally, of relatively small diameter and comprises at least one band deposited from a first composition on the interior substrate. When the tubular device is a tubular capacitor and the band is a plating mask, the tubular capacitor comprises at least two electrodes deposited on the substrate in the presence of a deposited plating mask and comprises at least one conductive layer, deposited from a first composition, on the substrate and separated by the plating mask.
Abstract: A system for making small modifications to the pattern in standard processed semiconductor devices. The modifications are made to create a small variable part of the pattern against a large constant part of the same pattern. In a preferred embodiment the exposure of the variable and constant parts are done with the same wavelength in the same combined stepper and code-writer. The invention devices a way of writing variable parts of the chip that is automatic, inexpensive and risk-free. A system for automatic design and production of die-unique patterns is also shown.
Abstract: An NC automatic lathe including abase board, a headstock provided with a main spindle and so arranged as to move in a direction of Z1 axis, a back attachment provided with a sub spindle which is so arranged as to be opposed to the headstock, the back attachment being so arranged as to move in directions of Z2 axis, X2 axis and Y2 axis, a guide bush, a first turret tool post arranged at a side of the guide bush so as to move in directions of X1 axis and Y1 axis, a second turret tool post arranged at a side of the guide bush so as to move in directions of Z3 axis, X3 axis and Y3 axis, and a fixed back machining tool unit arranged at a position offset with respect to at least one of the first turret tool post and second turret tool post, to the back attachment in a direction of Z axis, and provided with tool holding portions in at least two rows and two lines in directions of X axis and Y axis.
Abstract: A processing-related information storage unit stores processing-related information pertaining to processing of an original image. A processed image generation unit generates a processed image based on print data and processing-relating information, both pertaining to an original image. A processing-related information alteration receipt unit guides a user in altering the processing-related information with a processed image being displayed, and receives alterations to the processing-related information. When alterations to the processing-related information have been received, an update unit updates the processing-related information stored in the processing-related information storage unit based on the alterations, and updates the processed image to be displayed.
Abstract: An aspect of the present invention includes a method of lithography to enhance uniformity of critical dimensions of features patterned onto a workpiece. Said workpiece is coated with a coating sensitive to electromagnetic radiation. An electromagnetic radiation source having an illumination intensity is provided. At least one object pixel of electromagnetic radiation is created. A predetermined pattern is exposed, by using said at least one object pixel, on at least a portion of said workpiece in a first exposure pass with a first dose to provide less than full exposure of said coating sensitive to electromagnetic radiation. Said exposing action is repeated at least until said portion of said coating sensitive to electromagnetic radiation is fully exposed, wherein said dose is increased for every following pass. Said fully exposed coating sensitive to electromagnetic radiation is developed.
Type:
Grant
Filed:
August 4, 2003
Date of Patent:
March 6, 2007
Assignee:
Micronic Laser Systems AB
Inventors:
Jonathan Walford, Per Askebjer, Robert Eklund
Abstract: The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus comprises a source for emitting electromagnetic radiation, a spatial modulator having multitude of modulating elements (pixels), adapted to being illuminated by said radiation, and a projection system creating an image of the modulator on the workpiece.