Abstract: A generation of a void in a recessed section is inhibited. A method for manufacturing a semiconductor device includes: an operation of forming recessed sections in an insulating film, which is formed on a semiconductor substrate; an operation of forming a seed film in the recessed section; an operation of forming a cover metal film in the recessed section; an operation of selectively removing the cover metal film to expose the seed film over the bottom section of the recessed section; and an operation to carrying out a growth of a plated film to fill the recessed section by utilizing the seed film exposed in the bottom section of the recessed section as a seed.

Abstract: A liquid crystal display device includes a liquid crystal display panel and a semiconductor integrated circuit for driving and controlling the liquid crystal display panel. The number of input/output wires connected to I/O terminals (bonding pads) of the semiconductor integrated circuit is reduced so as to simplify wiring patterns of the I/O wires, whereby degrees of freedom in arranging the I/O wiring patterns are enhanced. The panel has a pair of insulating substrate, and the semiconductor integrated circuit is mounted on one of the paired substrates. The semiconductor integrated circuit has a mode terminal which is fixed to a power supply potential or to a reference potential during operation of the integrated circuit, and power supply dummy terminals connected to the power supply potential or reference potential inside the semiconductor integrated circuit. The wiring patterns formed on the paired insulating substrates connect the mode terminal to the power supply dummy terminals.

Abstract: Provided is a semiconductor integrated circuit including: an anti-fuse element that electrically connects a first node and a first power supply terminal when data is written and electrically disconnect the first node and the first power supply terminal when data is not written; a first switch circuit that is connected between the first node and a first data line applied with a predetermine first voltage, and enters an off state from an on state according to a first control signal; and a detection part that detects write data of the anti-fuse element according to whether a voltage of the first node is substantially the same as the first voltage or substantially the same as a supply voltage of the first power supply terminal when the first switch circuit enters the off state.

Abstract: A phase change memory includes a memory cell with a phase change element storing data according to level change of a resistance value in association with phase change, a write circuit converting the phase change element to an amorphous state or a polycrystalline state according to the logic of write data in a write operation mode, a read circuit reading out stored data from the phase change element in a readout operation mode, and a discharge circuit applying a discharge voltage to the phase change element to remove electrons trapped in the phase change element in a discharge operation mode. Accordingly, variation in the resistance value at the phase change element can be suppressed.

Abstract: A method of manufacturing a semiconductor device, includes forming a first trench and a second trench in a semiconductor region of a first conductivity type simultaneously, forming a gate insulating film and a gate electrode in the first trench, forming a channel region of a second conductivity type in the semiconductor region, forming a source region of the first conductivity type in the channel region, forming a diffusion region of the first conductivity type which has a higher concentration than that of the semiconductor region in a part of the semiconductor region located immediately under the second trench by implanting impurity ions of the first conductivity type through the second trench, and forming a drain electrode in a part of the second trench.

Abstract: An integrated circuit is provided with a scan chain including a scan flip-flop and a dummy block. The dummy block has a clock terminal receiving a clock signal, a scan input terminal connected to a scan data line within the scan chain, and a scan output terminal connected to another scan data line within the scan chain. The dummy block is configured to output data on the scan output terminal in response to input data fed to the scan input terminal, not responsively to the clock signal.

Abstract: It was difficult to design an operational amplifier which can cancel an offset to drive a liquid crystal display. An operational amplifier includes: a first differential pair having a first transistor and a second transistor of a first conduction type; a second differential pair having a third transistor and a fourth transistor of a second conduction type; a first floating current source; a second floating current source; and an output stage having a fifth transistor and a sixth transistor, in which, when an input signal is applied to the first and third transistor, an electric current which flows into the fifth transistor and the sixth transistor is set by the first floating current source, and when the input signal is applied to the second and fourth transistor, an electric current which flows into the fifth transistor and the sixth transistor is set by the second floating current source.

Abstract: The electronic device includes the substrate, the electronic component mounted on a main surface of the substrate, a plurality of external terminals formed on a back surface of the substrate, and a plurality of interconnects formed on the back surface of the substrate, wherein the plurality of interconnects includes a first interconnect disposed so as to overlap with an outer edge of the electronic component in a plan view. A pitch between a first external terminal and a second external terminal, adjacent to each other in one direction with the first interconnect located therebetween, is wider than a pitch between a third external terminal and a fourth external terminal, adjacent to each other in the same direction without the first interconnect located therebetween.

Abstract: A first interlayer dielectric is formed over a substrate, and an electric conductor pillar is formed in the first interlayer dielectric. A damascene wiring part insulating film is formed over an upper surface of the first interlayer dielectric. The damascene wiring part insulating film above the electric conductor pillar is removed to form an opening part for capacitance, and an insulating film for capacitive element is formed over the upper surface of the first interlayer dielectric. The insulating film for capacitive element and the first interlayer dielectric above the electric conductor pillar are removed to form a trench for wiring. Metal bodies are embedded in the opening part for capacitance and the trench for wiring. The metal body in the opening part for capacitance is to be an upper electrode of the capacitive element, and the metal body in the trench for wiring is to be a logic wiring.

Abstract: A semiconductor device comprising a flat wiring board, a first LSI disposed on one surface of the wiring board, a sealing resin for covering the one surface and a side face of the first semiconductor element, and a second LSI disposed on another surface of the wiring board. The wiring board has conductive wiring as a wiring layer, an insulation resin as a support layer for the wiring layer, and a conductive through-hole that passes through the wiring layer and the support layer. Connection points between lands disposed in positions in which the external peripheral edges of the semiconductor elements transverse the interior of the lands as viewed vertically from above, which lands are selected from land portions on which the external connection terminals are formed, and the wiring board formed in the same plane as the lands, are unevenly distributed toward one side of the wiring board.

Abstract: Grooves are formed on the front surfaces of first and second semiconductor wafers each including an aggregate of a plurality of semiconductor chips. The grooves each extend on a dicing line set between the semiconductor chips and to have a larger width than the dicing line. Thereafter the first and second semiconductor wafers are arranged so that the front surfaces thereof are opposed to each other, and the space between the first semiconductor wafer and the second semiconductor wafer is sealed with underfill. Thereafter the rear surfaces of the first and second semiconductor wafers are polished until at least the grooves are exposed, and a structure including the first and second semiconductor wafers and the underfill is cut on the dicing line.

Abstract: The reliability of a semiconductor device is improved. A sealing resin (sealed body) is formed between a sub-substrate (first base member) and a base substrate (second base member) that are provided individually and distinctly to be integrated therewith, and then, the sub-substrate is electrically coupled to the second base member. As a means for electrically coupling the sub-substrate to the base substrate, lands (first lands) formed on the sub-substrate and lands (second lands) formed on the base substrate are disposed such that the respective positions thereof are aligned. After through holes are formed from the lands of the sub-substrate toward the lands of the base substrate, a solder member (conductive member) is formed in each of the through holes.

Abstract: The lens shift measuring apparatus calculates a position of a predetermined portion of a frame body, on the basis of an imaging result obtained by imaging reflected light from the frame body, in a state in which light is irradiated onto a lens-attached member having a lens and the frame body to hold the lens, such that the reflected light from the frame body is generated, and calculates a position of a focusing spot, on the basis of an imaging result obtained by imaging light transmitted through the lens, in a state in which the light is irradiated onto the lens-attached member, such that the focusing spot formed by focusing the light transmitted through the lens by the lens is generated, and calculates a shift amount of the position of the focusing spot with respect to the predetermined portion as the shift of the lens.

Abstract: A method of manufacturing a semiconductor device answerable to refinement of circuits by correctly connecting adjacent small patterns with each other with excellent reproducibility in connective exposure and a semiconductor device manufactured by this method are proposed. According to this method of manufacturing a semiconductor device, connective exposure is performed by dividing a pattern formed on a semiconductor substrate into a plurality of patterns and exposing the plurality of divided patterns in a connective manner, by forming marks for adjusting arrangement of the patterns to be connected with each other on the semiconductor substrate before exposing patterns of a semiconductor element and connectively exposing the patterns of the semiconductor element in coincidence with the marks for adjusting arrangement.

Abstract: An electronic device includes a semiconductor device; and a mounting substrate mounted with the semiconductor device and connected with predetermined voltages. The semiconductor device includes a filter circuit section configured to output a harmonic component of an input signal other than a desired frequency component to the mounting substrate and output the desired frequency component to an output node of the filter circuit section. The filter circuit section includes an inductor which is larger than a parasitic inductance component in the mounting substrate.

Abstract: To provide a fast charge means for a capacitor in a negative bias generation circuit. A capacitor is present in a down converter in a negative bias generation circuit. In order to perform fast charge, the capacitance of the capacitor is reduced and a necessary amount of charge is minimized. On the other hand, an external capacitance provided separately from the capacitor in the down converter is coupled directly to a power supply voltage and charged. After the capacitor in the down converter is charged, the external capacitance and the capacitor in the down converter are coupled in parallel. Due to this, it is made possible to aim at both the increase in charge speed and the improvement of resistance to ripple noise.

Abstract: It is an object of the present invention to surely protect a predetermined semiconductor element or a predetermined semiconductor element group in an analog block from a noise generated from a digital block. A semiconductor device according to the present invention includes a semiconductor substrate, a digital block to be a region in which a digital circuit is formed and an analog block to be a region in which an analog circuit is formed, arranged by separating an upper surface of the semiconductor substrate and a substrate potential fixing region provided on the semiconductor substrate so as to surround in a planar view the predetermined semiconductor element group in the analog block, and a pad connected to the substrate potential fixing region and receiving a predetermined potential from an external part.

Abstract: A semiconductor chip includes a plurality of electrode terminals having a fixed terminal which is supplied with a signal, an outside terminal for the signal being fixed when the semiconductor chip is mounted in both a face-up configuration and a face-down configuration on a package substrate that has the outside terminal, and which is arranged within 50% of the width of the semiconductor chip with a symmetric line of the semiconductor chip as a center. According to the present invention, it is possible to reduce the variation of the wiring delays of the fixed terminal and to keep the wiring routes from being complicated, when the semiconductor chip is mounted in both the face-up configuration and the face-down configuration.

Abstract: A network device that transfers frames by repeating, in a constant cycle, a reserved transfer interval that is a time band, in which a frame is transferred with a reservation, and a free transfer interval that is a time band, in which a frame is freely transferred, includes: a BPDU generation unit that generates a first BPDU; and a BPDU transmission instruction unit that instructs to arrange the first BPDU in the reserved transfer interval and transmit the first BPDU to a first other network device.

Abstract: A trench gate transistor whose gate changes depth intermittently in the gate width direction, has a first offset region and a second offset region formed below the source and drain, respectively. The first offset region and the second offset region are shallower where they contact the device isolation film than is the device isolation film in those areas. The first and second offset regions nevertheless extend below the bottom of the trench.