Abstract: A system and method for generating a radio frequency (RF) waveform are described. The method includes defining a train of on-off pulses separated by an off state having no on-off pulses. The method further includes applying a multi-level pulse waveform that adjusts a magnitude of each of the on-off pulses to generate an RF waveform. The method includes sending the RF waveform to an electrode.

Abstract: A plasma processing system is provided. The system includes a chamber, a controller and a showerhead disposed in the chamber. A first gas manifold is connected to the showerhead for providing a first gas from a first gas source responsive to control from the controller. A shower-pedestal is disposed in the chamber and oriented opposite the showerhead. A second gas manifold is connected to the shower-pedestal for providing a second gas from a second gas source responsive to control from the controller. A substrate support for holding a substrate at a spaced apart relationship from the shower-pedestal is provided. A radio frequency (RF) power supply for providing power to the showerhead to generate a plasma is provided. The plasma is used for depositing a film on a back-side of the substrate, when present in the chamber. The substrate is held by the substrate support in the spaced apart relationship from the shower-pedestal, during backside deposition.

Abstract: A microneedle array is provided for administrating a drug or other substance into a biological tissue. The array includes a base substrate; a primary funnel portion extending from one side of the base substrate; and two or more solid microneedles extending from the primary funnel portion, wherein the two or more microneedles comprise the substance of interest. Methods for making an array of microneedles are also provided. The method may include providing a non-porous and gas-permeable mold having a two or more cavities each of which defines a microneedle; filling the cavities with a fluid material which includes a substance of interest and a liquid vehicle; drying the fluid material to remove at least a portion of the liquid vehicle and form a plurality of microneedles that include the substance of interest, wherein the filling is conducted with a pressure differential applied between opposed surfaces of the mold.

Abstract: A practically implementable robust direction-of-arrival (DoA) estimation approach that is resistant to localization errors due to mobility, multipath reflections, impulsive noise, and multiple-access interference. As part of the disclosed invention the inventors consider infrastructure-less 3D localization of autonomous underwater vehicles (AUVs) with no GPS assistance and no availability of global clock synchronization. The proposed method can be extended to challenging communication environments and applied for the localization of assets/objects in space, underground, intrabody, underwater and other complex, challenging, congested and sometimes contested environments. Each AUV leverages known-location beacon signals to self-localize and can simultaneously report its sensor data and measurement location.

Abstract: Various embodiments include methods and chemistries to etch metal-oxide films. In one embodiment, a method of etching tin oxide (SnO2) films includes using thionyl chloride (SOCl2) chemistry to produce an etch rate of the SnO2 films of up to 10-times higher as compared with Cl2 chemistry for similar flow-rates and process conditions, and gettering oxygen species from the SnO2 films by using the SOCl2, thereby forming volatile SO2 and volatile SnCl4 to provide human safety and machine safety and operations. Other methods, chemistries, and techniques are disclosed.

Abstract: Methods for evaluating synergy of modification and removal operations for a wide variety of materials to determine process conditions for self-limiting etching by atomic layer etching are provided herein. Methods include determining the surface binding energy of the material, selecting a modification gas for the material where process conditions for modifying a surface of the material generate energy less than the modification energy and greater than the desorption energy, selecting a removal gas where process conditions for removing the modified surface generate energy greater than the desorption energy to remove the modified surface but less than the surface binding energy of the material to prevent sputtering, and calculating synergy to maximize the process window for atomic layer etching.

Abstract: Compositions that selectively bind to coronaviruses, including but not limited to SARS-COV-2 and methods of use thereof are provided. The disclosed antibodies and antigen-binding fragments were developed against SARS-CoV-2. The antibodies bind to the spike protein of coronaviruses. The disclosed antibodies are useful for diagnosing, detecting, preventing, and treating coronavirus infections.

Abstract: Described herein are improved composite anodes and lithium-ion batteries made therefrom. Further described are methods of making and using the improved anodes and batteries. In general, the anodes include a porous composite having a plurality of agglomerated nanocomposites. At least one of the plurality of agglomerated nanocomposites is formed from a dendritic particle, which is a three-dimensional, randomly-ordered assembly of nanoparticles of an electrically conducting material and a plurality of discrete non-porous nanoparticles of a non-carbon Group 4A element or mixture thereof disposed on a surface of the dendritic particle. At least one nanocomposite of the plurality of agglomerated nanocomposites has at least a portion of its dendritic particle in electrical communication with at least a portion of a dendritic particle of an adjacent nanocomposite in the plurality of agglomerated nanocomposites.

Abstract: A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.

Abstract: An oral therapy tool is provided that comprises a mouthpiece including a first side and a second side, a pressure sensor operatively connected to the mouthpiece, and a microcontroller in communication with the pressure sensor. The microcontroller is configured to collect data relating to a usage of the oral therapy tool and to communicate the data to a central computer server. Systems and methods for monitoring oral therapy are further provided and collect, via a central computer server, data from the oral therapy device relating to a usage of the oral therapy device by a user. The central computer server then analyzes the data to determine the effectiveness of the oral therapy device, and transmits the analysis of the data to a remote device via a software application running on the remote device to assess and/or provide a recommended oral therapy regimen.

Abstract: A stuck-at fault mitigation method for resistive random access memory (ReRAM)-based deep learning accelerators, includes: confirming a distorted output value (Y0) due to a stuck-at fault (SAF) by using a correction data set in a pre-trained deep learning network, by means of ReRAM-based deep learning accelerator hardware; updating an average (?) and a standard deviation (?) of a batch normalization (BN) layer by using the distorted output value (Y0), by means of the ReRAM-based deep learning accelerator hardware; folding the batch normalization (BN) layer in which the average (?) and the standard deviation (?) are updated into a convolution layer or a fully-connected layer, by means of the ReRAM-based deep learning accelerator hardware; and deriving a normal output value (Y1) by using the deep learning network in which the batch normalization (BN) layer is folded, by means of the ReRAM-based deep learning accelerator hardware.

Abstract: The present invention features methods and composition directed to treating neuronal injury, CNS lesion, and/or promoting axon regeneration using a phosphine sulfide-stabilized phosphine.

Abstract: Compositions and methods are described for a polymer hydrogel created by a cycloaddition reaction between an azide and an alkyne that proceeds rapidly without catalyst to produce the polymer hydrogel in less than ninety seconds. The polymer hydrogel can be used in in vivo applications for the localized delivery of therapeutic agent in aqueous solutions. An example of therapeutic delivery of a protein in a mouse model is demonstrated.

Abstract: In an embodiment, an alloy is exposed to a hydrophilic solvent at least until at least one Group I or Group II element is substantially removed so as to produce a nanomaterial that substantially includes a metal, semimetal or non-metal material and that exhibits a desired set of microstructure characteristics. The hydrophilic solvent is configured to be reactive with respect to the at least one Group I or Group II element and substantially unreactive with respect to the metal, semimetal or non-metal material. In another embodiment, an active material is infiltrated into pores of a nanoporous metal or metal oxide, after which the infiltrated nanoporous metal or metal oxide material is annealed to produce an active material-based nanocomposite material. A protective coating layer is deposited on at least part of a surface of the active material-based nanocomposite material.

Abstract: A processing chamber such as a plasma etch chamber can perform deposition and etch operations, where byproducts of the deposition and etch operations can build up in a vacuum pump system fluidly coupled to the processing chamber. A vacuum pump system may have multiple roughing pumps so that etch gases can be diverted a roughing pump and deposition precursors can be diverted to another roughing pump. A divert line may route unused deposition precursors through a separate roughing pump. Deposition byproducts can be prevented from forming by incorporating one or more gas ejectors or venturi pumps at an outlet of a primary pump in a vacuum pump system. Cleaning operations, such as waferless automated cleaning operations, using certain clean chemistries may remove deposition byproducts before or after etch operations.

Abstract: A computational framework for designing a constellation that includes a plurality of cube satellites (CubeSats) includes an orbit propagation module, a coverage estimation module, a connectivity estimation module and an annealing module. The orbit propagation module receives a plurality of static parameters for the constellation and determines a position vector, a ground track and sub-satellite points for each of the plurality of CubeSats. The coverage estimation module receives the plurality of static parameters for the constellation and estimates Earth coverage for the constellation. The connectivity estimation module receives the plurality of static parameters for the constellation and determines active inter-satellite links (ISL) in the constellation. The annealing module receives input from the orbit propagation module, the coverage estimation module and the connectivity module and employs an annealing algorithm that generates a constellation design.

Abstract: An assembly for use in a process chamber for depositing a film on a wafer. The assembly includes a pedestal having a pedestal top surface extending from a central axis of the pedestal to an outer edge, the pedestal top surface having a plurality of wafer supports for supporting a wafer. A pedestal step having a step surface extending from a step inner diameter towards the outer edge of the pedestal. A focus ring rests on the step surface and having a mesa extending from an outer diameter of the focus ring to a mesa inner diameter. A shelf steps downwards from a mesa surface at the mesa inner diameter, and extends between the mesa inner diameter and an inner diameter of the focus ring. The shelf is configured to support at least a portion of a wafer bottom surface of the wafer at a process temperature.

Abstract: Review systems and methods facilitate active reading by providing a flexible environment in which users can examine documents. A review system can comprise a virtual workspace, a document view region, a preview region, and optional document objects. The virtual workspace can simulate a desktop or other physical workspace. The document view region can display a portion of an open document at a magnification sufficient for reading. The preview region can display the document at a magnification sufficient to enable the general layout of the entire document to be determined. The document objects can be created from the document through tools of the review system. These document objects can be independently moveable throughout the virtual workspace as needed to facilitate the user's active reading process.

Abstract: Methods of generating spinal cord glutamatergic interneurons (V2a interneurons) from human pluripotent stem cells (hPSCs) are provided. A method of the present disclosure may include culturing a first population of hPSCs in vitro in a neural induction medium that includes: a retinoic acid signaling pathway activator; a sonic hedgehog (Shh) signaling pathway activator; and a Notch signaling pathway inhibitor, wherein the culturing results in generation of a second population of cultured cells containing CHX10+ V2a interneurons. Also provided are non-human animal models that include the hPSC-derived spinal cord glutamatergic interneurons, and methods of producing the non-human animal models.

Abstract: Computer-implemented methods of optimizing a process simulation model that predicts a result of a semiconductor device fabrication operation to process parameter values characterizing the semiconductor device fabrication operation are disclosed. The methods involve generating cost values using a computationally predicted result of the semiconductor device fabrication operation and a metrology result produced, at least in part, by performing the semiconductor device fabrication operation in a reaction chamber operating under a set of fixed process parameter values. The determination of the parameters of the process simulation model may employ pre-process profiles, via optimization of the resultant post-process profiles of the parameters against profile metrology results. Cost values for, e.g., optical scatterometry, scanning electron microscopy and transmission electron microscopy may be used to guide optimization.