Abstract: Implementations of a semiconductor package may include: a first wafer having a first surface and a first set of blade interconnects, the first set of blade interconnects extending from the first surface. The package may include a second wafer having a first surface and a second set of blade interconnects, the second set of blade interconnects extending from the first surface and oriented substantially perpendicularly to a direction of orientation of the first set of blade interconnects. The first set of blade interconnects may be hybrid bonded to the second set of blade interconnects at a plurality of points of intersection between the first and second set of blade interconnects. The plurality of points of intersection may be located along a length of each blade interconnect of the first set of blade interconnects, and along the length of each blade interconnect of the second set of blade interconnects.

Abstract: A planarization method is provided and includes the following steps. A substrate having a main surface is provided. A protruding structure is formed on the main surface. An insulating layer is formed conformally covering the main surface and the top surface and the sidewall of the protruding structure. A stop layer is formed on the insulating layer and at least covers the top surface of the protruding structure. A first dielectric layer is formed blanketly covering the substrate and the protruding structure and a chemical mechanical polishing process is then performed to remove a portion of the first dielectric layer until a portion of the stop layer is exposed thereby obtaining an upper surface. A second dielectric layer having a pre-determined thickness is formed covering the upper surface.

Abstract: Input and output terminals are arranged so as to be adapted for an environment in which they are to be used. A semiconductor module (5) is surface-mounted on a surface wiring layer (30a) of a main substrate (3). A first module terminal group (11) located on a module first side (2a) of the semiconductor module (5) and a first substrate terminal group (301) located on a substrate first side (3a) of the main substrate (3) are connected by a first surface wiring pattern (311) formed in a surface wiring layer (30a). A second module terminal group (12) located on a module second side (2c) and a second substrate terminal group (302) located on a substrate second side (3c) are connected by a second surface wiring pattern (312) formed in the surface wiring layer (30a).

Abstract: Composite heat sink structures and methods of fabrication are provided, with the composite heat sink structures including: a thermally conductive base having a main heat transfer surface to couple to, for instance, at least one electronic component to be cooled; a compressible, continuous sealing member; and a sealing member retainer compressing the compressible, continuous sealing member against the thermally conductive base; and an in situ molded member. The in situ molded member is molded over and affixed to the thermally conductive base, and is molded over and secures in place the sealing member retainer. A coolant-carrying compartment resides between the thermally conductive base and the in situ molded member, and a coolant inlet and outlet are provided in fluid communication with the coolant-carrying compartment to facilitate liquid coolant flow through the compartment.

Abstract: An electrode terminal includes a body and a first bonding part. The body includes a first metal material. Then, the first bonding part is bonded to one end of the body, and includes a second metal material which is a clad material other than the first metal material. The first bonding part is ultrasonically bondable to a first bonded member. An elastic part which is elastically deformable is provided between the one end of the body and the other end of the body.

Abstract: A method of fabricating a metallization layer of a semiconductor device in which one or more interconnect structures are to be formed includes depositing a dielectric layer and forming a trench for each interconnect structure to be formed in the metallization layer. An insulating liner layer is deposited that serves both as a metal diffusion barrier and as a metal adhesion layer for the interconnect structures.

Abstract: A composite semiconductor device with improved response performance and reliability is provided while an increase in wiring area being suppressed. Fingers 1 are arranged in a plurality of rows and a plurality of columns. A signal inputted via a gate terminal (3) is supplied from intermediate regions in a row-wise direction of gate wires (18) connected to gate electrodes (G) of the same row or two adjacent rows of fingers 1 of the fingers 1 and formed along the rows.

Abstract: Provided is a semiconductor device having a surface layer power supply path in a surface layer wiring layer, on which a chip module is mounted, of a main substrate that has a plurality of wiring layers and through holes, the surface layer power supply path supplying power to a semiconductor chip via an inner peripheral-side power supply terminal group and an outer peripheral-side power supply terminal group. The surface layer power supply path overlaps the inner peripheral-side power supply terminal group and the outer peripheral-side power supply terminal group as seen in the orthogonal direction, and is formed continuously so as to extend in a direction from a position at which the surface layer power supply path is connected to the inner peripheral-side power supply terminal group toward the outer peripheral side of the main substrate.

Abstract: A germanium semiconductor layer doped with a dopant such as boron becomes a p-type semiconductor. The semiconductor layer is preheated at a preheating temperature ranging from 200° C. to 300° C., and then heated at a treatment temperature ranging from 500° C. to 900° C., by extremely short-time irradiation of flash light. While oxygen is unavoidably mixed in germanium and becomes a thermal donor at 300° C. to 500° C., the semiconductor layer stays in a temperature range of 300° C. to 500° C. for a negligibly short period of time due to an extremely short irradiation time of 0.1 milliseconds to 100 milliseconds by the flash light. Therefore, the thermal donor can be prevented from being generated in the germanium semiconductor layer.

Abstract: A semi-conductor module with an encapsulating mass that covers a semi-conductor component, in which the encapsulating mass is cement.

Abstract: A composite structure is a stack of thinned substrates each having a plurality of active devices of the same or different technologies. An assembled carrier substrate includes die assembled into cavities formed on the carrier substrate such that when the die rest within the cavity, a gap is formed between a bottom surface of the die and a bottom surface of the cavity. This gap removes contact stress applied to the bottom of the die. Another gap can also be formed above the die. Either gap can be filled with a low-stress material. A yield improvement process functionally and physically partitions a conceptual large area die into an array of separate die modules of smaller area. The separate die modules are assembled into an array of cavities formed in a carrier substrate and interconnected to achieve a combined functionality equivalent to the functionality of the conceptual large area die.

Abstract: A quad flat no lead (“QFN”) package that includes a die having an active side positioned substantially in a first plane and a backside positioned substantially in a second plane parallel to the first plane; a plurality of separate conductive pads each having a first side positioned substantially in the first plane and a second side positioned substantially in the second plane; and mold compound positioned between the first and second planes in voids between the conductive pads and the dies. Also a method of producing a plurality of QFN packages includes forming a strip of plastic material having embedded therein a plurality of dies and a plurality of conductive pads that are wire bonded to the dies and singulating the strip into a plurality of QFN packages by cutting through only the plastic material.

Abstract: A chip packaging structure and a manufacturing method for the same are provided. The chip packaging structure includes a first chip, a second chip and a transfer component. The first chip has a plurality of first bonding pads formed on the top surface of the first chip. The second chip has a plurality of second bonding pads formed on the top surface of the second chip. The first chip and the second chip are arranged abreast and electrically connected to each other. The transfer component is disposed on the top surface of the first chip and electrically connected with the first chip. Via these arrangements, the chip packaging structure can have smaller dimensions.

Abstract: Provided is a semiconductor device capable of self-repairing cracks or peels occurring in sealing materials. A semiconductor module includes a member including a semiconductor element, an insulating substrate bonded onto one surface of the semiconductor element, and a printed circuit board for coupling with an external circuit connected to the other surface of the semiconductor element, which are sealed with a sealing material. In the semiconductor module, the sealing material includes a first thermosetting resin and a microcapsule particle containing a second thermosetting resin precursor.

Abstract: Packaged semiconductor assemblies including interconnect structures and methods for forming such interconnect structures are disclosed herein. One embodiment of a packaged semiconductor assembly includes a support member having a first bond-site and a die carried by the support member having a second bond-site. An interconnect structure is connected between the first and second bond-sites and includes a wire that is coupled to at least one of the first and second bond-sites. The interconnect structure also includes a third bond-site coupled to the wire between the first and second bond-sites.

Abstract: A method for fabricating a semiconductor device includes forming an insulating layer on a substrate; forming a first mask pattern including silicon on the insulating layer and forming a second mask pattern including an oxide on the first mask pattern; forming a coating layer that includes carbon and which covers an upper surface of the insulating layer, a sidewall of the first mask pattern, and the second mask pattern; removing a portion of the coating layer and the second mask pattern; forming a metal layer on an upper surface of the first mask pattern and on a sidewall of the coating layer; exposing the upper surface of the insulating layer by removing the coating layer; and etching the insulating layer by using the first mask pattern and the metal layer as a mask.

Abstract: A technique disclosed in the specification relates to a semiconductor device capable of minimizing restrictions on wire bonding activities and to a method for producing the semiconductor device. The semiconductor device of the present technique includes: a plurality of semiconductor chips disposed on a circuit pattern within a case defined by an outer frame in a plan view; and bonding wires for electrically connecting the semiconductor chips and the circuit pattern together. The semiconductor chips are arranged along a longer-side direction of the case. The bonding wires are strung along the longer-side direction of the case.

Abstract: An array substrate and a display device are provided, which relate to the field of display and are for alleviating or mitigating the problem of bad contact between the pixel electrode and the drain pad caused by deep via holes. The array substrate includes a plurality of pixel units, each including a drain pad, a pixel electrode and an insulating layer above the drain pad. The drain pad has a first via hole, and the insulating layer has a second via hole that exposes at least a portion of the first via hole and a portion of the drain pad around the first via hole. The pixel electrode extends along an inner wall of the second via hole and contacts the exposed portion of the drain pad.

Abstract: Devices and methods of forming a device are disclosed. The device includes a substrate defined with at least a device region. A multi-gate transistor disposed in the device region which includes first and second gates both having first and second gate sidewalls. The multi-gate transistor also includes first source/drain (S/D) regions disposed adjacent to the first gate sidewall of the first and second gate, a common second S/D region disposed adjacent to the second gate sidewall of the first and second gate. A negative capacitance element is disposed within the second gate to reduce total overlap capacitance of the transistor. An interlevel dielectric (ILD) layer is disposed over the substrate and covering the transistor. First and second contacts are disposed in the ILD layer which are coupled to the first and second S/D regions respectively.

Abstract: A semiconductor device has a first semiconductor die stacked over a second semiconductor die which is mounted to a temporary carrier. A plurality of bumps is formed over an active surface of the first semiconductor die around a perimeter of the second semiconductor die. An encapsulant is deposited over the first and second semiconductor die and carrier. A plurality of conductive vias is formed through the encapsulant around the first and second semiconductor die. A portion of the encapsulant and a portion of a back surface of the first and second semiconductor die is removed. An interconnect structure is formed over the encapsulant and the back surface of the first or second semiconductor die. The interconnect structure is electrically connected to the conductive vias. The carrier is removed. A heat sink or shielding layer can be formed over the encapsulant and first semiconductor die.