Abstract: Methods for forming a group III-V device structure are provided. A method includes forming a first through via structure penetrating through group III-V compound layers over a front surface of a semiconductor substrate. The method also includes thinning the semiconductor substrate from a back surface of the semiconductor substrate. The method further includes etching the semiconductor substrate from the back surface to form a via hole substantially aligned with the first through via structure. In addition, the method includes etching the semiconductor substrate from the back surface to form a recess extending from a bottom surface of the recess towards the first through via structure. The first through via structure is exposed by the via hole and the recess. The method also includes forming a conductive layer in the via hole and the recess to form a second through via structure connected to the first through via structure.

Abstract: There is provided a low power memory device with JFET device structures. Specifically, a low power memory device is provided that includes a plurality memory cells having a memory element and a JFET access device electrically coupled to the memory element. The memory cells may be isolated using diffusion based isolation.

Abstract: A semiconductor device includes a cell structure; n first pad structures formed on one side of the cell structure and each configured to have a step form in which 2n layers form one stage; and n second pad structures formed on the other side of the cell structure each configured to have a step form in which 2n layers form one stage, wherein n is a natural number of 1 or higher, and the first pad structures and the second pad structures have asymmetrical step forms having different heights.

Abstract: A semiconductor memory package includes a base layer that communicates with a memory controller; at least one memory layer that is stacked on the base layer; and at least one through silicon via that penetrates through the at least one memory layer, wherein at least one signal bump for exchanging a signal with the memory controller is disposed in a first area of the base layer located to be adjacent to the memory controller, and wherein the first area corresponds to an edge area of the base layer, and a power bump for receiving power from outside of the semiconductor memory package for performing a signal processing operation on the signal is disposed in a second area of the base layer contacting the at least one through silicon via, wherein the second area corresponds to an area other than edge areas of the base layer.

Abstract: The present invention provides an AMOLED display device, which includes a cathode connection layer formed on a backing plate and provides connection between the cathode and the cathode connection layer through a via formed in and through structural layers thereof so that in a normal displaying operation of the AMOLED display device, an electrical current signal is conducted through the cathode connection layer to a cathode, achieving transmission of the electrical current signal through an interior of each pixel to the cathode, and making a conduction path of the electrical current signal shortened as compared to a conventional AMOLED display device and reducing electrical resistance of the conduction path of the electrical current signal, thereby lowering IR drop of a display circuit and helping improve displaying performance and power loss of the AMOLED display device.

Abstract: A base insulating film is formed over a substrate. A first oxide semiconductor film is formed over the base insulating film, and then first heat treatment is performed to form a second oxide semiconductor film. Then, selective etching is performed to form a third oxide semiconductor film. An insulating film is formed over the first insulating film and the third oxide semiconductor film. A surface of the insulating film is polished to expose a surface of the third oxide semiconductor film, so that a sidewall insulating film is formed in contact with at least a side surface of the third oxide semiconductor film. Then, a source electrode and a drain electrode are formed over the sidewall insulating film and the third oxide semiconductor film. A gate insulating film and a gate electrode are formed.

Abstract: In the case where a signal delay is found in a circuit operation in a semiconductor chip, when a repeater for delay reduction is additionally formed as a result of a design change, an increase in the area of the semiconductor chip and an increase in the manufacturing cost of a semiconductor device are prevented. The inverter forming the repeater is formed of transistors formed in the upper portion of stacked wiring layers, not transistors in the vicinity of a main surface of a semiconductor substrate. By thus implementing a design change such that the repeater is added, the number of the wiring layers which need a layout change is reduced.

Abstract: A photodiode according to example embodiments includes an anode, a cathode, and an intrinsic layer between the anode and the cathode. The intrinsic layer includes a P-type semiconductor and an N-type semiconductor, and composition ratios of the P-type semiconductor and the N-type semiconductor vary within the intrinsic layer depending on a distance of the intrinsic layer from one of the anode and the cathode.

Abstract: An organic light-emitting device including a first electrode, a second electrode facing the first electrode, and an organic layer between the first electrode and the second electrode and including an emission layer, wherein the organic layer includes a first compound and a second compound; the first compound is represented by one selected from Formulae 1-1 to 1-4, and does not include a nitrogen-containing heterocyclic group that includes *?N—*? as a ring-forming moiety, and the second compound is represented by Formula 2:

Abstract: According to one embodiment, a memory device includes a first interconnect group, a second interconnect group, and a memory cell. In the first interconnect group, first interconnects are stacked. The first interconnect group includes first regions in which the first interconnects are formed along a first direction, and a second region in which first contact plugs are formed on the first interconnects. In the second region, the first interconnect group includes a step portion. Heights of adjacent terraces of the step portion are different from each other by the two or more first interconnects.

Abstract: A 4D device comprises a 2D multi-core logic and a 3D memory stack connected through the memory stack sidewall using a fine pitch T&J connection. The 3D memory in the stack is thinned from the original wafer thickness to no remaining Si. A tounge and groove device at the memory wafer top and bottom surfaces allows an accurate stack alignment. The memory stack also has micro-channels on the backside to allow fluid cooling. The memory stack is further diced at the fixed clock-cycle distance and is flipped on its side and re-assembled on to a template into a pseudo-wafer format. The top side wall of the assembly is polished and built with BEOL to fan-out and use the T&J fine pitch connection to join to the 2D logic wafer. The other side of the memory stack is polished, fanned-out, and bumped with C4 solder. The invention also comprises a process for manufacturing the device.

Abstract: A method of forming a semiconductor device structure comprises forming at least one 2D material over a substrate. The at least one 2D material is treated with at least one laser beam having a frequency of electromagnetic radiation corresponding to a resonant frequency of crystalline defects within the at least one 2D material to selectively energize and remove the crystalline defects from the at least one 2D material. Additional methods of forming a semiconductor device structure, and related semiconductor device structures, semiconductor devices, and electronic systems are also described.

Abstract: Provided is an ink composition including the following components (A), (B), and (C). The component (A) is an anthracene derivative represented by the following formula (A1). The component (B) is an aromatic amine derivative represented by the following formula (B1) (in the formula (B1), one or more of Ar1 to Ar4 are a heterocyclic group represented by the following formula (B1?)). The component (C) is a solvent represented by the following formula (C1) and having a boiling point of 110° C. or higher and a solubility of 1 wt % or less in water.

Abstract: An organic light-emitting device having low-driving voltage, improved efficiency, and long lifespan includes: a first electrode; a second electrode facing the first electrode; a first layer between the first electrode and the second electrode, the first layer including a first compound; a second layer between the first layer and the second electrode, the second layer including a second compound; and a third layer between the second layer and the second electrode, the third layer including a third compound; wherein the first compound does not include a nitrogen-containing heterocyclic group comprising *?N—*? as a ring forming moiety, and wherein the first compound, the second compound, and the third compound each independently include at least one group selected from groups represented by Formulae A to C:

Abstract: An organic light emitting diode display includes: a substrate; a scan line formed over the substrate and transmitting a scan signal; a data line crossing the scan line and transmitting a data voltage; a driving voltage line crossing the scan line and transmitting a driving voltage; a switching transistor connected to the scan line and the data line; a driving transistor connected to the switching transistor; a driving connection member connected to a driving gate electrode of the driving transistor; a storage capacitor including a first storage electrode and a second storage electrode; a pixel electrode electrically connected to the driving transistor; and a contact hole connecting the first storage electrode and the driving connection member. the second storage electrode may include a cut-out by a curved edge at least partially surrounding the contact hole, and the pixel electrode may be formed not to overlap the cut-out.

Abstract: A pixel structure including scan lines, data lines, and sub-pixels is provided. The scan and data lines are disposed on the substrate. The sub-pixels include switch devices, contact pattern layer, color filter pattern layers, and pixel electrodes. The switch devices are electrically connected to one scan line and one data line respectively. The contact pattern layer and the color filter pattern layer are disposed on the substrate and the switch devices. The contact pattern layer covers part of two adjacent switch devices. At least two color filter pattern layers include a patterned opening respectively, and the contact pattern layer is disposed in the patterned opening. The pixel electrodes are disposed on the color filter pattern layer, the contact pattern layer, and the switch device. At least one pixel electrode is partially disposed between the color filter pattern layer and the corresponding switch device while electrically connected to the switch device.

Abstract: A method includes forming an isolation feature in a semiconductor substrate; forming a first fin-like active region and a second fin-like active region in the semiconductor substrate and interposed by the isolation feature; forming a dummy gate stack on the isolation feature, wherein the dummy gate extends to the first fin-like active region from one side and to the second fin-like active region from another side.

Abstract: An integrated circuit structure includes a substrate, and a first metal layer over the substrate. The integrated circuit structure further includes a second insulating layer over the first metal layer, the second insulating layer having a damascene opening and two via openings. The damascene opening has a first depth. The two via openings have a second depth greater than the first depth. The integrated circuit structure further includes a stress buffer having a flat upper surface extending from a first side of the stress buffer to a second side of the stress buffer, the first side and second side being parallel, the stress buffer having a thickness between the upper surface of the stress buffer and the first metal layer, the thickness being less than the second depth and greater than the first depth. The integrated circuit structure further includes a second metal layer over the stress buffer.

Abstract: A semiconductor device is disclosed. The semiconductor device includes an electrode disposed on a substrate and a plurality of vertical patterns passing through the electrode. The vertical patterns include first vertical patterns arranged to form a rhombus and second vertical patterns arranged to form a non-regular trapezoid or a rhombus.

Abstract: An image sensor includes a substrate, multiple pixel regions separately disposed in the substrate, and a pick up region including a doping region and a pick up plug obliquely disposed on the doping region and directly contacting the doping region.