Abstract: Techniques for reducing post-routing delay variance are described herein. In an example embodiment, an initial netlist includes multiple instances that represent digital components of an electronic design. An base signature is assigned to each instance in the initial netlist, where the base signature is based on two or more design or connectivity attributes of the instance. The base signatures are then used to generate an initial instance ordering of the instances in the initial netlist. A subsequent netlist, different from the initial netlist but representing the same electronic design, is received. Base signatures are assigned to the instances on the subsequent netlist and a subsequent instance ordering is generated. The subsequent instance ordering preserves the same order as the initial instance ordering for those instances that are included in both the initial netlist and the subsequent netlist. In this manner, any later netlist-based processing (e.g.

Abstract: Defective artifact removal is described in photolithography masks corrected for optical proximity. In one example a method is described in which partitions are identified in a mask design for independent optimization. The partitions are grouped and ordering into stages. The first stage is processed. Geometries are extracted from the periphery of the first stage partitions. The extracted geometries are added to the peripheries of second stage partitions. Then the second stage partitions are processed.

Abstract: A processing part inputs a behavior description code in which a write access array to be accessed to write and a read access array to be accessed to read are used. The processing part analyzes the behavior description code, and determines an order of using each write access address and an order of using each read access address when the behavior description code is executed. Further, the processing part performs either one of a write access order changing process to change the order of using the write access addresses when the behavior description code is executed based on the order of using the read access addresses and a read access order changing process to change the order of using the read access addresses when the behavior description code is executed based on the order of using the write access addresses.

Abstract: The present disclosure relates to an arrangement and a method of performance-aware buffer zone placement for a high-density array of unit cells. A first feature density of the array is measured and maximum variation for a parameter within a unit cell is determined. A look-up table of silicon data is consulted to predict a buffer zone width and gradient value that achieves a variation that is less than the maximum variation for the unit cell. The look-up table contains a suite of silicon test cases of various array and buffer zone geometries, wherein variation of the parameter within a respective test structure is measured and cataloged for the various buffer zone geometries, and is also extrapolated from the suite of silicon test cases. A buffer zone is placed at the border of the array with a width that is less than or equal to the buffer zone width.

Abstract: Definition of a phase shifting layout from an original layout can be time consuming. If the original layout is divided into useful groups, i.e. clusters that can be independently processed, then the phase shifting process can be performed more rapidly. If the shapes on the layout are enlarged, then the overlapping shapes can be grouped together to identify shapes that should be processed together. For large layouts, growing and grouping the shapes can be time consuming. Therefore, an approach that uses bins can speed up the clustering process, thereby allowing the phase shifting to be performed in parallel on multiple computers. Additional efficiencies result if identical clusters are identified and processing time saved so that repeated clusters of shapes only undergo the computationally expensive phase shifter placement and assignment process a single time.

Abstract: An environment and method are provided for designing and implementing a circuit comprising an integrated circuit (IC) including a number of parametric analog elements for which operating parameters can be set. Generally, the method comprises: specifying requirements for the circuit including physical properties to be sensed by the circuit and actions to be taken by the circuit; designing the circuit based on the specified requirements and resources available on the IC; and setting parameters of at least one of the parametric analog circuit elements of the IC based on the circuit design. In one embodiment, the specifying, designing, and setting parameters steps are performed using a computer executable code embodied in a computer readable medium on a server coupled to a client computer through an internet protocol network. Other embodiments are also provided.

Abstract: A technique for routing signal wires in an integrated circuit design includes applying a first rule that attempts to route a signal wire along existing power supply shapes of the integrated circuit design and applying a second rule that provides shield wires along segments of the signal wire that are not routed along one of the existing power supply shapes. The technique also includes routing the signal wire between a first endpoint and a second endpoint while applying the first and second rules to substantially minimize a route cost for the signal wire between the first and second endpoints.

Abstract: A method for determining the layout of an interconnect line is provided including: providing a required width for the interconnect line; determining a layout of the interconnect line including slotting the interconnect line to provide two or more fingers extending along the interconnect line with an elongate slot separating adjacent fingers; and determining a number of elongate apertures to be arranged across the width of the interconnect line by comparing the required width with a maximal width for a solid metal feature, and a minimal elongate aperture width. The two or more fingers and elongate slot may be of constant width and equally spaced across the interconnect line width. The method may include selecting the number of fingers and the width of the slots to optimize the layout for a given layer technology.

Abstract: Optimized buffer placement is provided based on timing and capacitance assertions in a functional chip unit including a single source and multiple macros, each having a sink. Placement of the source and macros with the sinks is pre-designed and buffers are placed in branches connecting the source with the multiple sinks. An estimated slack is calculated for each branch, the branches are arranged according to the calculated slack, decoupling buffers are inserted in all branches except the most critical branch(es), the most critical branch(es) are globally routed and slew conditions are fixed within this branch, and at least one next branch is globally routed and slew conditions are fixed therein.

Abstract: A method and a system for timing analysis of a VLSI circuit or chip design considering manufacturing and environmental variations, where the design includes multiple instances of a gate or macro instantiated at more than one voltage domain by sharing and re-using abstracts. The timing analysis of the chip includes a macro abstract instantiated in a voltage domain different from the domain during abstract generation. Timing models are re-used across chip voltage domains or across chip designs. Moreover, a statistical timing analysis of a chip design takes into consideration the voltage domains wherein at least one timing abstract model generation time voltage domain condition differs from the macro instantiation domain in the chip. The invention further provides sharing and re-using the statistical timing models or abstracts.

Abstract: Graph analysis for double pattern lithography is described. Layout shapes are decomposed into rectangles and a vertex is provided for each rectangle. Double pattern spacing conflicts are determined and shown as edges for the graph analysis. Odd cycles are used to identify double pattern lithography violations. Cycles can be completed with the addition of edges between vertices where stitches have been included in the layout. Edges between touching shapes do not count toward the odd count in the cycles. Fixes are included by increasing space or by rerouting. A portion of the layout can be incrementally changed and a local update of the graph analysis performed. Correct by construction layout is implemented by avoiding certain odd cycle prone layout routings.

Abstract: A circuit simulation method for checking a circuit error is disclosed. The method may include generating a netlist with respect to a designed circuit, simulating an operation of the designed circuit using the generated netlist, and checking an error of the designed circuit using the generated netlist and using a waveform generated when performing the simulation.

Abstract: A method of computational lithography includes collecting a critical dimension (CD) data set including CD data from printing a test structure including a set of gratings which provide a plurality of feature types including different ratios of line width to space width, where the printing includes a range of different focus values. The CD data is weighted to form a weighted CD data set using a weighting algorithm (WA) that assigns cost weights to the CD data based its feature type and its magnitude of CD variation with respect to a CD value for its feature type at a nominal focus (nominal CD). The WA algorithm reduces a value of the cost weight as the magnitude of variation increases. At least one imaging parameter is extracted from the weighted CD data set. A computational lithography model is automatically calibrated using the imaging parameter(s).

Abstract: In one embodiment of the invention, a method for electronic circuit design is disclosed.

Abstract: A connection verification method is disclosed. A computer verifies a connection between a first node and a second node by starting from the first node in a designed integrated circuit, based on connection information stored in a storage part. The computer detects whether a module connected to the second node is a predetermined module predetermined module having a logic condition therein, based on connection relationship logic information stored in the storage part. The computer conducts a connection verification starting the module to verify a connection between the module and a third node when the module is the predetermined module.

Abstract: A design support apparatus acquires position information for a signal wire that is to be disposed in wiring layer stacked on an insulation layer. Subsequently, the design support apparatus acquires position information for an area obtained by projecting, in a direction for glass fiber bundles to be stacked on one another, the glass fiber bundles in an insulation layer actually used. The design support apparatus converts the position information for the signal wire that is to be disposed into position information for a position in the area of the glass fiber bundles such that the signal wire is included in the area of the glass fiber bundles in the insulation layer actually used. The design support apparatus outputs the converted position information.

Abstract: A method, system, and computer program product for verification of a state transition machine (STM) are provided in the illustrative embodiments. The STM representing the operation of a circuit configured to perform a computation is received. A segment of the STM is selected from a set of segments of the STM. A set of properties of the segment is determined. The set of properties is translated into a hardware description to form a translation. The segment is verified by verifying whether all relationships between a pre-condition and a post condition in the translation hold true for any set of inputs and any initial state of a hardware design under test. A verification result for the segment is generated. Verification results for each segment in the set of segments are combined to generate a verification result for the STM.

Abstract: The invention provides systems and methods for layout decomposition to produce exposure layouts that can be used to perform double patterning lithography (DPL). Preferred embodiment methods of the invention are executed by a computer and provide alternate methods for layout decomposition for double patterning lithography (DPL) using integer linear programming (ILP) formulations. Embodiments of the invention meet a key optimization goals, which is to reduce the total cost of layout decomposition, considering the abovementioned aspects that contribute to cost of prior conventional DPL techniques. Embodiments of the invention provide integer linear programming (ILP), phase conflict detection (PCD) and node election bipartization (NBD) formulations for the optimization of DPL layout decomposition, with a process-aware cost function that avoids small jogging line-ends, and maximizes overlap at dividing points of polygons. The cost function can also make preferential splits at landing pads, junctions and long runs.

Abstract: A design method of on-board wiring for a designed circuit includes determining a severity as a crosstalk prevention index for a pair of wires based on a generated noise level of a damaging side wire and a permissible noise level of a damaged side wire. The pair of wires is then assigned a severity class (SC) based on the severity determined. The SC is a pre-defined value range(s) for severity classification. Based on a preset SC specific permissible value list, one or more by-design permissible values belonging to the SC is generated for a design element of the pair of wires. A layout of the pair of wires on a board is constructed based on the by-design permissible value.

Abstract: A method of generating an area efficient power switch cell includes receiving, by a cell library design tool, a specification of a power switch circuit to be established as a power switch cell in a cell library. The cell library design tool also receives one or more attributes of the power switch cell including a height of the cell boundary and receiving, by the cell library design tool, a layout placement constraint requiring the power switch cell to be placed in a semiconductor layout so as to bridge two parallel rows of doped wells. The parallel rows of doped wells are interleaved with doped substrate and the doping of the wells is of a different type than that of the substrate. Based on the specification of the power switch circuit, the one or more attributes, and the layout placement constraint, the cell library design tool generates the power switch cell.