Abstract: A light emitting diode and a method of manufacturing the light emitting diode are provided. The light emitting diode includes an n-type semiconductor layer, an inclined type superlattice thin film layer, an active layer, and a p-type semiconductor layer. The n-type semiconductor layer is disposed on a substrate. The inclined type superlattice thin film layer is disposed on the n-type semiconductor layer and includes a plurality of thin film pairs in which InGaN thin films and GaN thin films are sequentially stacked. The active layer having a quantum well structure is disposed on the inclined type superlattice thin film layer. The p-type semiconductor layer is disposed on the active layer. Composition ratio of Indium (In) included in the InGaN thin film is increased as getting closer to the active layer. Thus, internal residual strain is reduced, and quantum confinement effect is enhanced, and internal quantum efficiency is increased.

Abstract: An optical sensor includes a sensing layer, a color filter, and a grid structure. The sensing layer includes a photodiode. The color filter includes a lower portion disposed on the sensing layer, and an upper portion disposed on the lower portion. The upper portion includes a bottom surface connected to the lower portion, a first inclined surface inclined relative to the bottom surface, and a second inclined surface that is opposite to the first inclined surface and inclined relative to the bottom surface. The grid structure surrounds the upper portion. Between the first inclined surface and the bottom surface is a first acute angle, and between the second inclined surface and the bottom surface is a second acute angle.

Abstract: Aspects of the present disclosure include integrated circuit (IC) structure and methods for increasing a pitch between gates. Methods according to the present disclosure can include: providing an IC structure including: a first gate structure and a second gate structure each positioned on a substrate, a dummy gate positioned between the first and second gate structures, and forming a mask over the first and second gate structures; and selectively etching the dummy gate from the IC structure to expose a portion of the substrate underneath the dummy gate of the IC structure, without affecting the first and second gate structures.

Abstract: An integrated package may be manufactured in a die face up orientation with a component proximate to the attached die by creating a cavity in the mold compound during fabrication. The cavity is created with an adhesive layer on the bottom to hold a component such that the top surface of the component is co-planar with the top surface of the attached die. This may allow backside grinding to take place that will not damage the component because the top surface alignment between the attached die and the component prevents the depth of the cavity from extending into the portion of the package that is ground away.

Abstract: A semiconductor structure containing at least two metal resistor structures having different amounts of nitrogen on the resistor surface is provided. The resulted resistances (and hence resisitivty) of the two metal resistors can be either the same or different. The semiconductor structure may include a first metal resistor structure located on a portion of a dielectric-containing substrate. The first metal resistor structure includes, from bottom to top, a first metal layer portion and a first nitridized metal surface layer having a first nitrogen content. The semiconductor structure further includes a second metal resistor structure located on a second portion of the dielectric-containing substrate and spaced apart from the first metal resistor structure. The second metal resistor structure includes, from bottom to top, a second metal layer portion and a second nitridized metal surface layer having a second nitrogen content that differs from the first nitrogen content.

Abstract: In various exemplary embodiments, a method for producing an optoelectronic component is provided. In this case, a high temperature solid is provided which is stable at least up to a predefined first temperature. A liquid glass solder having a second temperature, which is lower than the first temperature, is applied to the high temperature solid in a structured fashion. The glass solder is solidified, as a result of which a glass solid is formed. An optoelectronic layer structure is formed above the glass solid. The glass solid and the optoelectronic layer structure form the optoelectronic component. The optoelectronic component is removed from the high temperature solid.

Abstract: Provided is a method of forming a nanowire-based device. The method includes forming a first mask layer over a substrate; forming a first opening in the first mask layer; growing a first nanowire that protrudes through the first opening in the first mask layer, wherein the first nanowire has a first diameter; removing the first mask layer; oxidizing a sidewall of the first nanowire; etching the oxidized sidewall of the first nanowire; forming a second mask layer overlaying the substrate; removing the first nanowire thereby forming a second opening in the second mask layer; and growing a second nanowire that protrudes through the second opening in the second mask layer, wherein the second nanowire has a second diameter and the second diameter is different than the first diameter.

Abstract: A light-emitting element with high reliability that can keep favorable characteristics after long-time driving is provided. In addition, a light-emitting device having a long lifetime including the light-emitting element is provided. Moreover, an electronic device and a lighting device having a long lifetime are provided. In a light-emitting element including an EL layer between a pair of electrodes, a light-emitting layer included in the EL layer has a stacked-layer structure which is different from the conventional structure, whereby the light-emitting element can keep favorable characteristics after long-time driving even in the case where carrier balance is changed over time due to driving of the light-emitting element or a light-emitting region is shifted due to the change.

Abstract: A light emitting device includes a light emitting element; a light-transmissive member that has a lower surface positioned inside a peripheral edge of an upper surface of the light emitting element in plan view, a first lateral surface extending from the lower surface and having at least one inclined surface that is inclined with respect to the upper surface of the light emitting element, and a second lateral surface positioned above and outside the first lateral surface; a light-transmissive adhesive member positioned inside the second lateral surface in plan view, wherein the adhesive member adheres the upper surface of the light emitting element and the lower surface of the light-transmissive member to each other and covers the first lateral surface; and a light-reflective member covering the second lateral surface.

Abstract: A semiconductor structure is provided that includes a first metal resistor structure located on a portion of a dielectric-containing substrate. The first metal resistor structure includes, from bottom to top, a first nitridized dielectric surface layer portion having a first nitrogen content, a first metal portion, and a first dielectric capping layer portion. The semiconductor structure of the present application further includes a second metal resistor structure located on a second portion of the dielectric-containing substrate and spaced apart from the first metal resistor structure. The second metal resistor structure includes, from bottom to top, a second nitridized dielectric surface layer portion having a second nitrogen content that differs from the first nitrogen content, a second metal portion, and a second dielectric capping layer portion.

Abstract: A method of manufacturing a semiconductor device includes providing a semiconductor substrate having a front surface and a back surface; forming a transition metal layer on a surface of the semiconductor substrate; and exposing the semiconductor substrate having the transition metal layer formed thereon to a hydrogen plasma atmosphere formed by microwaves, to cause the transition metal layer to generate heat. During exposure of the semiconductor substrate, a portion of the semiconductor substrate contacting the transition metal layer is heated by a transfer of heat from the transition metal layer and, at an interface of the transition metal layer and the semiconductor substrate, an ohmic contact is formed by reaction of the transition metal layer and the semiconductor substrate, such as to form a transition metal silicide when the semiconductor substrate is silicon carbide. The ohmic contact provides a lower contact resistivity and device properties can be prevented from degrading.

Abstract: A semiconductor device includes an SOI substrate and a MISFET formed on the SOI substrate. The SOI substrate has a base substrate, a ground plane region formed on the base substrate, a BOX layer formed on the ground plane region and an SOI layer formed on the BOX layer. The base substrate is made of silicon and the ground plane region includes a semiconductor region made of silicon carbide.

Abstract: A semiconductor device may include a first inverter, a second inverter, a first access transistor, and a second access transistor. A drain electrode of the first access transistor or a source electrode of the first access transistor may be electrically connected to both an output terminal of the first inverter and an input terminal the second inverter. The drain electrode of the first access transistor may be asymmetrical to the source electrode of the first access transistor with reference to a gate electrode of the first access transistor. A drain electrode of the second access transistor or a source electrode of the second access transistor may be electrically connected to both an output terminal of the second inverter and an input terminal the first inverter.

Abstract: A wiring substrate includes a buried substrate disposed within a through-hole penetrating through a resin substrate of a core layer and including a plate-like body and a plurality of linear conductors penetrating the plate-like body, a first insulating layer covering a first surface of the resin substrate, a first wiring layer including a first pad pattern formed on a first surface of the buried substrate and a first wiring pattern formed on a first surface of the first insulating layer, and a third wiring pattern formed on the first surface of the resin substrate and covered by the first insulating layer. In the plurality of linear conductors, a gap between the adjacent linear conductors is smaller than a diameter of each of the linear conductors. The third wiring pattern is formed so as to have a thickness thicker than a thickness of the first wiring pattern.

Abstract: A semiconductor structure is provided. The semiconductor structure includes a conductive strip, a conductive layer, a first dielectric layer, and a second dielectric layer. The first dielectric layer is between the conductive strip and the conductive layer arranged in a crisscross manner. The second dielectric layer is different from the first dielectric layer. The second dielectric layer and the first dielectric layer are adjoined with the conductive strip in different positions on the same sidewall of the conductive strip.

Abstract: A structure of connecting a panel driver to a side of a display panel and an electrostatic discharge (ESD) structure are discussed. The display device comprises a display panel including an active area where an image is displayed and a pad area corresponding to a non-display area, the display device comprising a first substrate and a second substrate which face each other and are bonded to each other to constitute the display panel. A signal pad is arranged on the first substrate, and a connection electrode is connected with one side of the signal pad. A flexible circuit film connected with the connection electrode is arranged. In this case, the signal pad includes a plurality of lines arranged by interposing an insulating film therebetween, wherein the plurality of lines are electrically connected with each other.

Abstract: A substrate having a silicon region and a silicon germanium region is provided. A first set of fins in the silicon region and a second set of fins in the silicon germanium region is etched into the substrate. A set of protective caps on upper portions of the first and second sets of fins. A lower portion of each of the first and second sets of fins is oxidized. The silicon germanium portion of the lower portion of fin in the second set of fins is completely oxidized. The lower portion of the first set of fins is partially oxidized. A punchthrough stop isolation region is formed in the lower portion of the first set of fins. Another aspect of the invention is a device which is created by the method.

Abstract: Disclosed are methods and integrated circuit (IC) structures. The methods enable formation of a gate contact on a gate above (or close thereto) an active region of a field effect transistor (FET) and provide protection against shorts between the gate contact and metal plugs on source/drain regions and between the gate and source/drain contacts to the metal plugs. A gate with a dielectric cap and dielectric sidewall spacer is formed on a FET channel region. Metal plugs with additional dielectric caps are formed on the FET source/drain regions such that the dielectric sidewall spacer is between the gate and the metal plugs and between the dielectric cap and the additional dielectric caps. The dielectric cap, dielectric sidewall spacer and additional dielectric caps are different materials preselected to be selectively etchable, allowing for misalignment of a contact opening to the gate without risking exposure of any metal plugs and vice versa.

Abstract: In a particular embodiment, a method includes forming a second hardmask layer adjacent to a first sidewall structure and adjacent to a mandrel of a semiconductor device. A top portion of the mandrel is exposed prior to formation of the second hardmask layer. The method further includes removing the first sidewall structure to expose a first portion of a first hardmask layer. The method also includes etching the first portion of the first hardmask layer to expose a second portion of a dielectric material. The method also includes etching the second portion of the dielectric material to form a first trench. The method also includes forming a first metal structure within the first trench.

Abstract: An insulated gate turn-off (IGTO) device, formed as a die, has a layered structure including a p+ layer (e.g., a substrate), an n? epi layer, a p-well, vertical insulated gate electrodes formed in the p-well, and n+ regions between the gate electrodes, so that vertical npn and pnp transistors are formed. The device is formed of a matrix of cells. To turn the device on, a positive voltage is applied to the gate electrodes, referenced to the cathode. The cells further contain a vertical p-channel MOSFET, for shorting the base of the npn transistor to its emitter, to turn the npn transistor off when the p-channel MOSFET is turned on by a slight negative voltage applied to the gate. The p-channel MOSFET includes a Schottky source formed in the top surface of the npn transistor emitter.