Abstract: A semiconductor device is provided with a substrate made of a semiconductor material, an interconnect layer, at least one electronic element, and a sealing resin. The substrate has a main surface and a pair of lateral surfaces that are orthogonal to the main surface and face in opposite directions to each other. A recessed portion that is recessed from the main surface and has an opening portion that opens on at least one of the pair of lateral surfaces is formed in the substrate. The interconnect layer is formed on the substrate. The electronic element is an orientation sensor, for example, and is accommodated in the recessed portion of the substrate. The sealing resin covers the electronic element.

Abstract: Some embodiments include semiconductor constructions having first and second electrically conductive lines that intersect with one another at an intersection. The first line has primarily a first width, and has narrowed regions directly against the second line and on opposing sides of the second line from one another. Electrically conductive contacts are along the first line and directly electrically coupled to the first line, and one of the electrically conductive contacts is directly against the intersection. Some embodiments include methods of forming intersecting lines of material. First and second trenches are formed, and intersect with one another at an intersection. The first trench has primarily a first width, and has narrowed regions directly against the second trench and on opposing sides of the second trench from one another. Material is deposited within the first and second trenches to substantially entirely fill the first and second trenches.

Abstract: A method includes forming a multi-stacked electronic device having two or more electronic components, each of the electronic components includes a leadframe, the leadframes of each electronic component are physically joined together using a non-solder metal joining process to form a joint, and the joint is located outside a solder connection region.

Abstract: A method forming an interconnect structure includes depositing a first solder bump on a chip; depositing a second solder bump on a laminate, the second solder bump including a nickel copper colloid surrounded by a nickel or copper shell and suspended in a tin-based solder; aligning the chip with the laminate; performing a first reflow process to join the chip to the laminate; depositing an underfill material around the first solder bump and the second solder bump; and performing a second reflow process at a temperature that is lower than the first reflow process to convert the first solder bump and the second solder bump to an all intermetallic interconnect; wherein depositing the underfill material is performed before or after performing the second reflow process.

Abstract: The reliability of a copper wire is improved without inhibiting the wiring resistance of the copper wire. For example, another metallic element segregates in the boundary region between a copper film CUF1 and a copper film CUF2, and at the upper side face part of a wiring gutter leading to the boundary region. In a sectional view, a metallic element having a reducing power higher than copper segregates at the inner part of the copper wire apart from both the surface of the copper wire and the bottom face of the wiring gutter and at the side face part of the copper wire. In a sectional view, a metallic element different from copper segregates in the vicinity of the center part of the copper wire and at the side face part of the copper wire.

Abstract: A method for manufacturing a semiconductor device includes forming a transistor on a substrate. Precursor gases are provided from a showerhead of a chemical vapor deposition (CVD) apparatus to form a contact etch stop layer (CESL) to cover the transistor and the substrate. A temperature of the showerhead is controlled in a range of about 70° C. to about 100° C. to control a temperature of the precursor gases.

Abstract: An edge termination structure is disclosed. The edge termination structure includes an active cell in a semiconductor wafer, an edge termination region adjacent the active cell in the semiconductor wafer, where the edge termination region includes a recessed field oxide region and a termination charge region below the recessed field oxide region. The recessed field oxide region may be thermally grown in a recess in the semiconductor wafer. A top surface of the recessed field oxide region is substantially coplanar with a top surface of the semiconductor wafer. The active cell may include at least one insulated-gate bipolar transistor surrounded by the edge termination region in the semiconductor wafer. The termination charge region has a conductivity type opposite of that of the semiconductor wafer. The termination charge region is adjacent to at least one guard ring in the semiconductor wafer.

Abstract: The present invention provides a patterned substrate for gallium nitride-based light emitting diode, comprising: a patterned substrate having patterns, wherein the plurality of patterns are circle type having diameters (d) and the distances between the centers of the patterns are pitches (p), and the cross sections of the patterns are extruded shapes and have heights (h), and wherein the value of [diameter (d)/pitch (p)] is larger than (2.6)/3, and equal or smaller than 3/3.

Abstract: An integrated circuit package may include a first integrated circuit die having a first bump structure, a second integrated circuit die having a second bump structure, and a detachable interconnect structure having first and second conductive structures that is positioned between the first and second integrated circuit dies. In order to establish electrical communication between the first and second integrated circuit dies, the first conductive structure of the detachable interconnect structure is connected to the first bump structure of the first integrated circuit die, and the second conductive structure of the detachable interconnect structure is connected to the second bump structure of the second integrated circuit die. The detachable interconnect structure may also be used to facilitate wafer-level testing prior to packaging the first and second integrated circuit dies to form the integrated circuit package.

Abstract: A manufacturing method of a package substrate is provided. A conductive substrate is provided. A first photoresist layer is patterned to form first openings. A first conductive layer is formed in the first openings. A second photoresist layer is patterned to form second openings. A second conductive layer contacting the first conductive layer is formed in the second openings. The first and second photoresist layers are removed. A dielectric layer covers the first, second conductive layers and a portion of the conductive substrate. A portion of the dielectric layer is removed. A third photoresist layer is patterned to form a third opening. A portion of the conductive substrate is removed to form a fourth opening. The third photoresist layer is removed. A fourth photoresist layer is patterned to form a fifth opening. A bonding pad is formed in the fifth opening. The fourth photoresist layer is removed.

Abstract: A sensor device includes a first substrate of semiconductor material having opposing first and second surfaces, photodetectors configured to receive light impinging on the first surface, and first contact pads each exposed at both the first and second surfaces and electrically coupled to at least one of the photodetectors. A second substrate comprises opposing first and second surfaces, electrical circuits, a second contact pads each disposed at the first surface of the second substrate and electrically coupled to at least one of the electrical circuits, and a plurality of cooling channels formed as first trenches extending into the second surface of the second substrate but not reaching the first surface of the second substrate. The first substrate second surface is mounted to the second substrate first surface such that each of the first contact pads is electrically coupled to at least one of the second contact pads.

Abstract: A display apparatus, including a substrate; a display unit on the substrate; a bonding member on the substrate and surrounding at least edges of the display unit; and a barrier film on the substrate, the bonding member interposed between the substrate and the barrier film, the bonding member including a core-shell structure, including a core including an oxide, and a shell including a polymer chemically bonded to the core.

Abstract: Various embodiments may relate to an optoelectronic component, including an organic functional layer structure, and an electrode on or above the organic functional layer structure. The electrode is electrically conductively coupled to the organic functional layer structure. The electrode includes an optically transparent or translucent matrix including at least one matrix material, and particles embedded into the matrix. The particles have a refractive index that is greater than the refractive index of the at least one matrix material. A difference in refractive index between the at least one matrix material and the particles embedded into the matrix is at least 0.05.

Abstract: How a flat panel display is bent by external forces is controlled. A display panel 40 has display elements, formed corresponding to the arrangement of pixels, on a first principal surface of a flexible display panel substrate 46. The display panel substrate 46 has a linear groove 48 on at least part of a second principal surface of the display panel substrate 46. A resin is stacked on a support substrate having a linear ridge on at least part of the surface of the support substrate. The surface shape of the support substrate is transferred to the resin so that the groove 48 is molded. Thus, the display panel substrate 46 made of the resin is formed on the support substrate. After the display elements are formed on the display panel substrate 46, the support substrate is removed from the display panel substrate 46.

Abstract: A method for fabricating an electronic device includes providing a first semiconductor chip and a second semiconductor chip. The first semiconductor chip has a first semiconductor die and a first solder interconnect layer applied to a main face of the first semiconductor die. The second semiconductor chip has a second semiconductor die, an insulating layer applied to a main face of the second semiconductor die, and a second solder interconnect layer applied to the insulating layer. The method further includes attaching the first semiconductor chip with the first solder interconnect layer to a first carrier and attaching the second semiconductor chip with the second solder interconnect layer to a second carrier.

Abstract: A conductive interconnect structure includes a contact pad; a conductive body connected to the contact pad at a first end; and a conductive layer positioned on a second end of the conductive body. The conductive body has a longitudinal direction perpendicular to a surface of the contact pad. The conductive body has an average grain size (a) on a cross sectional plane (Plane A) whose normal is perpendicular to the longitudinal direction of the conductive body. The conductive layer has an average grain size (b) on Plane A. The conductive body and the conductive layer are composed of same material, and the average grain size (a) is greater than the average grain size (b).

Abstract: A display device is disclosed. In one aspect, the display device includes a first power wire is disposed in a non-display area of a substrate and includes a first wiring extending in a first direction and a second wiring spaced apart from the first wiring. A second power wire is disposed in the non-display area and includes an extension portion extending in a second direction crossing the first direction, the extension portion located between the first and second wirings. A protective layer covers the first and second power wires, and a bridge wire is disposed on the protective layer and configured to electrically connect the first wiring to the second wiring. A vertical gap between the bridge wire and the extension portion is greater than a vertical gap between the bridge wire and the first wiring or a vertical gap between the bridge wire and the second wiring.

Abstract: An electrical contact upon an interposer and/or upon a processing device includes a minor axis and a major axis. The contact is positioned such that the major axis is generally aligned with the direction of expansion of the interposer and/or the processing device. The electrical contact may further be positioned within a power/ground or input/output (I/O) region of the interposer and/or processing device. The electrical contact may further be positioned within a center region that is surrounded by a perimeter region of the interposer and/or the processing device. The dimensions or aspect ratios of major and minor axes of neighboring electrical contacts within an electrical contact grid may differ relative thereto. Further, the angle of respective major and minor axes of neighboring electrical contacts within the electrical contact grid may differ relative thereto.

Abstract: A color image sensor including an array of pixels is formed in a semiconductor layer having a back side that receives an illumination. Insulated conductive walls penetrate into the semiconductor layer from the back side and separate the pixels from one another. For each pixel, a color pixel penetrates into from 5 to 30% of a thickness of the semiconductor layer from the back side and occupies at least 90% of the surface area delimited by the walls. An electrically-conductive layer extends from the lateral wall of the filter all the way to the walls.

Abstract: A semiconductor device package includes a carrier, a sensor element disposed on or within the carrier, a cover and a filter. The cover includes a base substrate and a periphery barrier. The base substrate includes an inner sidewall. The inner sidewall of the base substrate defines a penetrating hole extending from a top surface of the base substrate to a bottom surface of the base substrate; at least a portion of the inner sidewall of the base substrate is tilted. The periphery barrier is coupled to the bottom surface of the base substrate and contacts a top surface of the carrier. The filter is disposed on the top surface of the base substrate and covers the penetrating hole.