Abstract: Disclosed is a solid-state imaging device including a plurality of pixels and a plurality of on-chip lenses. The plurality of pixels are arranged in a matrix pattern. Each of the pixels has a photoelectric conversion portion configured to photoelectrically convert light incident from a rear surface side of a semiconductor substrate. The plurality of on-chip lenses are arranged for every other pixel. The on-chip lenses are larger in size than the pixels. Each of color filters at the pixels where the on-chip lenses are present has a cross-sectional shape whose upper side close to the on-chip lens is the same in width as the on-chip lens and whose lower side close to the photoelectric conversion portion is shorter than the upper side.

Abstract: A method of fabricating an integrated circuit includes applying photoresist to a MESA dielectric layer of a semiconductor structure, to generate a photoresist layer. The method also includes exposing the photoresist layer with a grayscale mask, to generate an exposed photoresist layer. The photoresist exposed layer includes a thick photoresist pattern in a first region, a thin photoresist pattern in a second region where a height of the thin photoresist pattern is less than half a height of the thick photoresist pattern, and a gap region between the thick photoresist pattern and the thin photoresist pattern.

Abstract: According to one embodiment, the stacked body includes a first stacked portion including a plurality of electrode layers, a second stacked portion including a plurality of electrode layers, and being disposed separately from the first stacked portion in the first direction, and a connection portion including a high dielectric layer provided between the first stacked portion and the second stacked portion and having a dielectric constant higher than a dielectric constant of the insulator. The column-shaped portion includes a first portion provided in the first stacked portion and extending in the first direction of the stacked body, a second portion provided in the second stacked portion and extending in the first direction, and an intermediate portion provided in the connection portion and connected the first portion to the second portion.

Abstract: A method is presented for forming a semiconductor device. The method may include forming a first gate structure on a first portion of a semiconductor material located on a surface of an insulating substrate, the first gate structure including a first sacrificial layer and a second sacrificial layer and forming a second gate structure on a second portion of the semiconductor material located on the surface of the insulating substrate, the second gate structure including a third sacrificial layer. The method further includes etching the first and second dielectric sacrificial layers to create a first contact region within the first gate structure and etching the third dielectric sacrificial layer to create a second contact region within the second gate structure. The method further includes forming silicide in at least the first and second contact regions of the first and second gate structures, respectively.

Abstract: The method for producing a preform integrating at least one electronic chip included between insulating and/or conductive laminated internal layers; mechanically securing metal bus-bar segments at given spaced-apart positions on opposing upper and lower faces of the preform, using dielectric portions of a resin prepreg; and for each of the upper and lower opposing faces, electrodepositing a metal layer in order to interconnect bus-bar segments secured to the face in question and an electrode of the electronic chip, thereby forming an electronic power circuit comprising bus-bars forming heat sinks.

Abstract: First and second circuit patterns (5,6) are provided on an insulating substrate (1). First and second semiconductor chips (7,8) are provided on the first circuit pattern (5). A relay circuit pattern (10) is provided between the first semiconductor chip (7) and the second semiconductor chip (8) on the insulating substrate (1). A wire (11) is continuously connected to the first semiconductor chip (7), the relay circuit pattern (10), the second semiconductor chip (8) and the second circuit pattern (6) which are sequentially arranged in one direction.

Abstract: A method of forming a semiconductor device includes attaching a first semiconductor device to a first surface of a substrate; forming a sacrificial structure on the first surface of the substrate around the first semiconductor device, the sacrificial structure encircling a first region of the first surface of the substrate; and forming an underfill material in the first region.

Abstract: A MEMS assembly includes a housing having an internal volume V, wherein the housing has a sound opening to the internal volume V, a MEMS component in the housing adjacent to the sound opening, and a layer element arranged at least regionally at a surface region of the housing that faces the internal volume V, wherein the layer element includes a layer material having a lower thermal conductivity and a higher heat capacity than the housing material of the housing that adjoins the layer element.

Abstract: An apparatus including a semiconductor substrate; an absorption layer coupled to the semiconductor substrate, the absorption layer including a photodiode region configured to absorb photons and to generate photo-carriers from the absorbed photons; one or more first switches controlled by a first control signal, the one or more first switches configured to collect at least a portion of the photo-carriers based on the first control signal; and one or more second switches controlled by a second control signal, the one or more second switches configured to collect at least a portion of the photo-carriers based on the second control signal, where the second control signal is different from the first control signal.

Abstract: The present disclosure provides a semiconductor structure including a first insulation, a second insulation over the first insulation, a third insulation over the second insulation, a first conductor proximal to a boundary between the first insulation and the second insulation, and an electronic device electrically connected to the first conductor and at least partially surrounded by the second insulation. A coefficient of thermal expansion (CTE) of the second insulation is larger than a CTE of the first insulation and larger than a CTE of the third insulation.

Abstract: Disclosed is a switch branch structure having an input terminal, an output terminal, and a series stack of an N-number of transistors formed in an active device layer within a first plane, wherein a first one of the N-number of transistors is coupled to the input terminal, and an nth one of the N-number of transistors is coupled to the output terminal, where n is a positive integer greater than one. A metal layer element has a planar body with a proximal end that is electrically coupled to the input terminal and distal end that is electrically open, wherein the planar body is within a second plane spaced from and in parallel with the first plane such that the planar body capacitively couples a radio frequency signal at the input terminal to between 10% and 90% of the N-number of transistors when the switch branch structure is in an off-state.

Abstract: A display device includes: a first substrate including a display area and a non-display area bordering at least a portion of the display area; a first transistor disposed in the display area, and includes a semiconductor layer, a gate electrode, a source electrode, and a drain electrode. A driving circuit is disposed in the non-display area, and includes a second transistor including a semiconductor layer, a gate electrode, a source electrode, and a drain electrode. An insulating layer disposed between the source and drain electrodes of the second transistor and the source and drain electrodes of the first transistor over the second transistor; a signal transmission line disposed in the non-display area, and transmitting a signal to the driving circuit; a second substrate facing the first substrate; and a sealant disposed in the non-display area between the first substrate and the second substrate, and overlapping the second transistor.

Abstract: A photoelectronic sensor or the like capable of improving operation stability is provided. The photoelectronic sensor includes a light projecting unit having a light projecting lens that converges light and a light projecting element that projects light toward a reflective plate via the light projecting lens, and a light receiving unit disposed alongside the light projecting unit and having a light receiving lens that concentrates reflected light from the reflective plate and a light receiving element that receives the reflected light via the light receiving lens. The light projecting element has a light emitting area located on a side closer to the light receiving element than an optical axis of the light projecting lens and emitting light, and a non-light emitting area located on a side farther from the light receiving element than the optical axis and not emitting light.

Abstract: A die of an integrated circuit and an upper layer of a circuit assembly are thermally connected by applying a thermal interface material (TIM) on the die, such that the TIM is between the die and an upper layer. The TIM comprises an emulsion of liquid metal droplets and uncured polymer. The method further comprises compressing the circuit assembly thereby deforming the liquid metal droplets and curing the thermal interface material thereby forming the circuit assembly.

Abstract: A rectifier has a rectification circuit configured to rectify multi-phase alternating current generated by a rotating electric machine into direct current. The rectifier includes upper-arm semiconductor switching elements included in an upper arm of the rectification circuit, upper-arm protection diodes included in the upper arm and each being electrically connected in parallel with one of the upper-arm semiconductor switching elements, lower-arm semiconductor switching elements included in a lower arm of the rectification circuit, and lower-arm protection diodes included in the lower arm and each being electrically connected in parallel with one of the lower-arm semiconductor switching elements.

Abstract: A power control module includes a power device having a first side and a second side opposite from the first. The power control module includes a printed wiring board (PWB) spaced apart from the first side of the power device. The PWB is electrically connected to the power device. A heat sink plate is soldered to a second side of the transistor for heat dissipation from the transistor. The PWB and/or the heat sink plate includes an access hole defined therein to allow for access to the transistor during assembly. A method of assembling a power control module includes soldering at least one lead of a power device to a printed wiring board (PWB), pushing the power device toward a heat sink plate, and soldering the power device to the heat sink plate.

Abstract: A wireless sensor circuit and sensor tag in which the output is directly converted to a frequency response. The sensor circuit includes a buffer transistor having gate, source and drain terminals configured as a source-follower, a gate resistor connected to the gate terminal of the buffer transistor, a supply voltage connected to the drain terminal of the buffer transistor, and an active load element and a capacitive load element connected to the source terminal of the buffer transistor. An input signal having an input frequency is applied to the buffer transistor via the gate resistor and an output signal is generated at the source terminal of the buffer transistor. The output frequency represents a response of the sensor circuit.

Abstract: A fabrication method for a semiconductor device is provided. The method includes: forming a semiconductor substrate including a first region and a second region; forming intrinsic fins protruding from the first region of the semiconductor substrate, and dummy fins protruding from the second region of the semiconductor substrate; forming a first isolation layer to cover a portion of sidewalls of the dummy fins and a portion of sidewalls of the intrinsic fins; forming a protection layer on surfaces of the intrinsic fins, to cover a portion of the intrinsic fins above a surface of the first isolation layer; removing the dummy fins and a portion of the first isolation layer in the second region; and forming a second isolation layer on the second region of the semiconductor substrate.

Abstract: The power circuit includes: a main substrate; a first electrode pattern disposed on the main substrate and connected to a positive-side power terminal P; a second electrode pattern disposed on a main substrate and connected to a negative-side power terminal N; a third electrode pattern disposed on the main substrate and connected to an output terminal O; a first MISFET Q1 of which a first drain is disposed on the first electrode pattern; a second MISFET Q4 of which a second drain is disposed on the third electrode pattern; a first control circuit (DG1) connected between a first gate G1 and a first source S1 of the first MISFET, and configured to control a current path conducted from the first source towards the first gate.

Abstract: A semiconductor device comprising a first field insulating film around at least a part of a first fin type pattern and at least a part of a second fin type pattern, a second field insulating film between the first fin type pattern and the second fin type pattern and protruding from the first field insulating film and a first gate structure which extends over the first and second field insulating films in a second direction intersecting with a first direction, and includes a first portion on the first field insulating film, and a second portion on the second field insulating film, wherein a first width of the first portion of the first gate structure is greater than a second width of the second portion of the first gate structure.