Abstract: A method of making a semiconductor device includes manufacturing a first transistor over a first side of a substrate. The method further includes depositing a spacer material against a sidewall of the first transistor. The method further includes recessing the spacer material to expose a first portion of the sidewall of the first transistor. The method further includes manufacturing a first electrical connection to the transistor, a first portion of the electrical connection contacts a surface of the first transistor farthest from the substrate, and a second portion of the electrical connect contacts the first portion of the sidewall of the first transistor. The method further includes manufacturing a self-aligned interconnect structure (SIS) extending along the spacer material, wherein the spacer material separates a portion of the SIS from the first transistor, and the first electrical connection directly contacts the SIS.

Abstract: A device includes a fin extending from a substrate, a gate stack over and along sidewalls of the fin, a gate spacer along a sidewall of the gate stack, and an epitaxial source/drain region in the fin and adjacent the gate spacer. The epitaxial source/drain region includes a first epitaxial layer on the fin, the first epitaxial layer including silicon, germanium, and arsenic, and a second epitaxial layer on the first epitaxial layer, the second epitaxial layer including silicon and phosphorus, the first epitaxial layer separating the second epitaxial layer from the fin. The epitaxial source/drain region further includes a third epitaxial layer on the second epitaxial layer, the third epitaxial layer including silicon, germanium, and phosphorus.

Abstract: Disclosed is a self-powered formaldehyde sensing device, comprising: a triboelectric material electrode layer including a first substrate and a first electrode layer formed on the first substrate; a triboelectric material dielectric layer including a second substrate, a second electrode layer formed on the second substrate, a dielectric reacting layer formed on the second electrode layer, and a reaction modification layer formed on the dielectric reacting layer to surface-modify the dielectric reacting layer, the reaction modification layer being a phosphomolybdic acid complex (cPMA) layer, the phosphomolybdic acid complex of the phosphomolybdic acid complex layer being obtained by dissolving 4,4?-bipyridine (BPY) in isopropanol (IPA) and then mixing with phosphomolybdic acid (PMA) solution; an elastic spacer; and an external circuit.

Abstract: The battery pack with the plurality of batteries is determined to have been fully charged and set in a stationary state, the discharge operation proceeds according to specified relationships of the voltage of each battery, a first predetermined voltage difference, and a discharge starting voltage, or the balance operation proceeds according to specified relationships of the voltage of each battery, the first predetermined voltage difference, a balance starting voltage and a second predetermined voltage difference.

Abstract: A method of decoding a bitstream by an electronic device is provided. The method receives an image frame of a bitstream and determines a block unit having a block width and a block height based on the received image frame. The method determines whether a geometric partitioning mode is disabled for the block unit based on a comparison between the block width and the block height. The method divides the block unit to generate multiple sub-blocks predicted by different merge candidates of the block unit when the geometric partitioning mode is enabled and applied on the block unit. The predicted block is generated by predicting block unit based on a prediction mode different from the geometric partitioning mode when the geometric partitioning mode is disabled for the block unit. The method them reconstructs the block unit based on the predicted block.

Abstract: A method of decoding a bitstream by an electronic device is provided. The method determines a block unit from an image frame received from the bitstream. To reconstruct the block unit, the method receives, from a candidate list, first motion information having a first list flag for selecting a first reference frame and second motion information having a second list flag for selecting a second reference frame. The method then stores a predefined one of the first and second motion information for a sub-block determined in the block unit when the first list flag is identical to the second list flag.

Abstract: A memory device and a method for operating the memory device are provided. The memory device includes a memory cell and a bit line connected to the memory cell. A negative voltage generator is connected to the bit line. The negative voltage generator, when enabled, is operative to provide a first write path for the bit line. A control circuit is connected to the negative voltage generator and the bit line. The control circuit is operative to provide a second write path for the bit line when the negative voltage generator is not enabled.

Abstract: The present disclosure provides a semiconductor device and a method for forming a semiconductor device. The semiconductor device includes a substrate, and a first gate dielectric stack over the substrate, wherein the first gate dielectric stack includes a first ferroelectric layer, and a first dielectric layer coupled to the first ferroelectric layer, wherein the first ferroelectric layer includes a first portion made of a ferroelectric material in orthorhombic phase, a second portion made of the ferroelectric material in monoclinic phase, and a third portion made of the ferroelectric material in tetragonal phase, wherein a total volume of the second portion is greater than a total volume of the first portion, and the total volume of the first portion is greater than a total volume of the third portion.

Abstract: An antenna apparatus includes a feeding antenna inside an electronic device and one or more antenna elements, such as a floating metal antenna, disposed on a rear cover of the electronic device. The floating metal antenna and a feeding antenna inside the electronic device may form a coupling antenna structure. The feeding antenna may be an antenna fastened on an antenna support (which may be referred to as a support antenna). The feeding antenna may alternatively be a slot antenna formed by slitting on a metal middle frame of the electronic device. The antenna apparatus may be implemented in limited design space, thereby effectively saving antenna design space inside the electronic device. The antenna apparatus may generate excitation of a plurality of resonance modes, so that antenna bandwidth and radiation characteristics can be improved.

Abstract: A layout of a semiconductor memory device includes a substrate and a ternary content addressable memory (TCAM). The TCAM is disposed on the substrate and includes a plurality of TCAM bit cells, where at least two of the TCAM bit cells are mirror-symmetrical along an axis of symmetry, and each of the TCAM bit cells includes two storage units electrically connected to two word lines respectively, and a logic circuit electrically connected to the storage units. The logic circuit includes two first reading transistors, and two second reading transistors, where each of the second reading transistors includes a gate and source and drain regions, the source and drain regions of the second reading transistors are electrically connected to two matching lines and the first reading transistors, respectively, where the word lines are disposed parallel to and between the matching lines.

Abstract: A compact optical imaging device with short optical length and low sensitivity, for use in an imaging module and an electronic device, comprises first to fifth lenses and a filter. An image-side surface of the fourth lens is convex near an optical axis of the optical imaging device. An image-side surface of the fifth lens is concave near the optical axis. The optical imaging device satisfies formulas 0.03 mm/°<TL5/FOV<0.1 mm/° and 2.4 mm<TL4/FNO<2.9 mm, TL5 being a distance from an object-side surface of the fifth lens to an image plane of the optical imaging device along the optical axis, FOV being a maximum field of view, TL4 being a distance from an object-side surface of the fourth lens to the image plane along the optical axis, and FNO being a F-number of the optical imaging device.

Abstract: A computing device obtains, using a camera of the computing device, an image depicting a hand at an initial zoom scale and estimates a pose of the hand depicted in the image. The computing device determines a distance between the hand and the camera of the computing device and adjusts the zoom scale based on the distance between the hand and the camera of the computing device. The computing device renders an augmented reality object on the hand depicted in the image according to the adjusted zoom scale and the pose of the hand depicted in the image.

Abstract: A semiconductor device includes a substrate, a first metal layer, a dielectric layer, and a second metal layer. The substrate includes a dense region and an isolation region. The first metal layer is disposed over the substrate and includes a first metal pattern and a second metal pattern. The first metal pattern is located in the dense region. There is at least one slot in the first metal pattern. The second metal pattern is located in the isolation region. The dielectric layer is disposed on the first metal layer. The second metal layer is disposed on the dielectric layer.

Abstract: The present disclosure relates to a semiconductor device includes a substrate and first and second spacers on the substrate. The semiconductor device includes a gate stack between the first and second spacers. The gate stack includes a gate dielectric layer having a first portion formed on the substrate and a second portion formed on the first and second spacers. The first portion includes a crystalline material and the second portion comprises an amorphous material. The gate stack further includes a gate electrode on the first and second portions of the gate dielectric layer.

Abstract: Three-dimensional memories are provided. A three-dimensional memory includes a plurality of memory cells, a plurality of word lines, a plurality of bit lines and a plurality of source lines. The memory cells are divided into a plurality of groups, and the groups of memory cells are formed in respective levels stacked along a first direction. The word lines extend along a second direction, and the second direction is perpendicular to the first direction. Each of the bit lines includes a plurality of sub-bit lines formed in the respective levels. Each of the source lines includes a plurality of sub-source lines formed in respective levels. In each of the levels, the memory cells of the corresponding group are arranged in a plurality of columns, and the sub-bit lines and the sub-source lines are alternately arranged between two adjacent columns.

Abstract: The invention disclosed herein is directed to compounds of Formula I and pharmaceutically acceptable salts thereof, which are useful in the treatment of prostate, breast, colon, pancreatic, human chronic lymphocytic leukemia, melanoma and other cancers. The invention also comprises pharmaceutical compositions comprising a therapeutically effective amount of compound of Formula I, or a pharmaceutically acceptable salt thereof. The invention disclosed herein is also directed to methods of treating prostate, breast, ovarian, liver, kidney, colon, pancreatic, human chronic lymphocytic leukemia, melanoma and other cancers. The invention disclosed herein is further directed to methods of treating prostate, breast, colon, pancreatic, chronic lymphocytic leukemia, melanoma and other cancers comprising administration of a therapeutically effective amount of a selective PPAR? antagonist.

Abstract: A plasma discharge detection system detects undesirable plasma discharge events within a semiconductor process chamber. The plasma discharge detection system includes one or more cameras positioned around the semiconductor process chamber. The cameras capture images from within the semiconductor process chamber. The plasma discharge detection system includes a control system that receives the images from the cameras. The control system analyzes the images and detects plasma discharge within the semiconductor process chamber based on the images. The control system can adjust a semiconductor process in real time responsive to detecting the plasma discharge.

Abstract: A method of fabricating the semiconductor device includes forming a bit line structure over a substrate, forming a spacer structure on a sidewall of the bit line structure, partially removing an upper portion of the spacer structure to form a slope on the spacer structure slanting to the bit line structure, forming a landing pad material to cover the spacer structure and contact the slope, and removing at least a portion of the landing pad material to form a landing pad against the slope.

Abstract: The present invention provides a detection chip for quantitative detection of neutralizing antibody and manufacturing method thereof. A sensing layer is disposed on a circuit layer. A shielding layer corresponds a shielding part on the sensing layer to form a sensing area. The surface of the sensing area is hydroxylated to form a self-assembled monolayer film including the aldehyde group. A protein solution is dripped on the sensing area. An external electric field is applied to the sensing layer at an external angle with respect to the normal of the substrate to deflect protein molecules in the protein solution correspondingly. This structure can be applied to rapid and quantitative detection. According to various embodiments of the present invention, the sensing efficiency of the detection chip can be enhanced.

Abstract: A method of making a semiconductor device includes forming a first active region on a first side of a substrate. The method further includes forming a first source/drain (S/D) electrode surrounding a first portion of the first active region. The method further includes forming an S/D connect via extending through the substrate. The method further includes flipping the substrate. The method further includes forming a second active region on a second side of the substrate, wherein the second side of the substrate is opposite to the first side of the substrate. The method further includes forming a second S/D electrode surrounding a first portion of the second active region, wherein the S/D connect directly contacts both the first S/D electrode and the second S/D electrode.