Abstract: A method of forming a gate structure on a fin structure includes the steps of providing a fin structure covered by a first silicon oxide layer, a silicon nitride layer, a gate material and a cap material in sequence, wherein the silicon nitride layer contacts the first silicon oxide layer. Later, the cap material is patterned to form a first cap layer and the gate material is patterned to form a first gate electrode by taking the silicon nitride layer as an etching stop layer. Then, the silicon nitride layer not covered by the first gate electrode is removed to expose part of the first silicon oxide layer. Finally, a first dielectric layer is formed to conformally cover the first silicon oxide layer, the first gate electrode and the first cap layer.

Abstract: A method of manufacturing a semiconductor device is provided. The method includes: providing a substrate including a first semiconductive region of a first conductive type and gate structures over the first semiconductive region, wherein a gap between the gate structures exposes a portion of the first semiconductive region; and forming a second semiconductive region of a second conductive type in the gap starting from the exposed portion of the first semiconductive region. The forming of the second semiconductive region includes: growing, in a chamber, an epitaxial silicon-rich layer having a first sidewall adjacent to the gate structures and a first central portion; and, in the chamber, shaping the epitaxial silicon-rich layer to form a second sidewall adjacent to the gate structures and a second central portion, wherein a first height difference between the first sidewall and the first central portion is greater than a second height difference between the second sidewall and the second central portion.

Abstract: A semiconductor device and a method of forming the same, the semiconductor device includes a substrate, a gate structure and an epitaxial structure. The gate structure is disposed on the substrate, and the epitaxial structure is disposed in the substrate, at one side of the gate structure. The epitaxial structure includes a portion being protruded from a top surface of the substrate, and the portion includes a discontinuous sidewall, with a distance between a turning point of the discontinuous sidewalls and the gate structure being a greatest distance between the epitaxial structure and the gate structure.

Abstract: A method for forming a resistive random access memory includes forming a layer stack, patterning the layer stack to form a plurality of stack structures, forming a protection layer along sidewalls of the plurality of stack structures, forming a first isolation structure between the plurality of stack structures, forming at least one recess in at least one stack structure to define a plurality of filament units, and forming a second isolation structure in the at least one recess. The layer stack includes a bottom electrode and a resistive switching layer on the bottom electrode.

Abstract: A semiconductor device and method of manufacture are provided. In an embodiment a first semiconductor device and a second semiconductor device are formed within a semiconductor wafer and a scribe region between the first semiconductor device and the second semiconductor device is patterned. A singulation process is then utilized within the scribe region to singulate the first semiconductor device from the second semiconductor device. The first semiconductor device and the second semiconductor device are then bonded to a second semiconductor substrate and thinned in order to remove extension regions from the first semiconductor device and the second semiconductor device.

Abstract: A semiconductor device is disclosed. The semiconductor device comprises a substrate, a gate structure disposed on the substrate, a spacer disposed on the substrate and covering a sidewall of the gate structure, an air gap sandwiched between the spacer and the substrate, and a source/drain region disposed in the substrate and having a faceted surface exposed from the substrate, wherein the faceted surface borders the substrate on a boundary between the air gap and the substrate.

Abstract: A structure of semiconductor device includes a substrate. An interconnection layer is formed on the substrate including a first inter-layer dielectric (ILD) layer over the substrate. A lower wiring structure is formed in the ILD layer. A hard mask layer is disposed on the first ILD layer. The hard mask layer has a first opening and a second opening being adjacent to expose the lower wiring structure. A second ILD layer is disposed on the hard mask layer. The second ILD layer has a via opening aligned to the first opening of the mask layer and a trench pattern connecting with the via opening. The second ILD layer has a protruding portion to fill the second opening of the mask layer. A metal line layer fills the via opening and the trench pattern in the second ILD layer and the first opening of the hard mask layer.

Abstract: A resistive random access memory is provided. The resistive random access memory includes a bottom electrode over a substrate, a top electrode, a resistance-switching layer, an oxygen exchange layer, and a sidewall protective layer. The top electrode is disposed over the bottom electrode. The resistance-switching layer is disposed between the bottom electrode and the top electrode. The oxygen exchange layer is disposed between the resistance-switching layer and the top electrode. The sidewall protective layer containing metal or semiconductor is disposed at sidewalls of the resistance-switching layer, and the sidewalls of the resistance-switching layer is doped with the metal or semiconductor from the sidewall protective layer.

Abstract: A structure of semiconductor device includes a substrate. An interconnection layer is formed on the substrate including a first inter-layer dielectric (ILD) layer over the substrate. A lower wiring structure is formed in the ILD layer. A hard mask layer is disposed on the first ILD layer. The hard mask layer has a first opening and a second opening being adjacent to expose the lower wiring structure. A second ILD layer is disposed on the hard mask layer. The second ILD layer has a via opening aligned to the first opening of the mask layer and a trench pattern connecting with the via opening. The second ILD layer has a protruding portion to fill the second opening of the mask layer. A metal line layer fills the via opening and the trench pattern in the second ILD layer and the first opening of the hard mask layer.

Abstract: An optical device including a first substrate, a light source, a second substrate, an image capturing device, a microstructure layer, and an infrared pass layer is provided. The light source is disposed on the first substrate. The second substrate is disposed above the first substrate. The second substrate includes a first surface and a second surface opposite to the first surface. The image capturing device is disposed on the first substrate to receive a light beam, which is originated from scattered light beams scattered by an object touching the first surface of the second substrate. The microstructure layer is disposed on the first surface of the second substrate. The microstructure layer is adapted to increase a light beam, which is scattered by the object and transmitted to the image capturing device. The infrared pass layer is adapted to pass the infrared light.

Abstract: An inspection mechanism for metal blank, adapted for sensing the surface condition of a metal blank, includes a framework, a holding device, a shuffling device, and an inductive control device. It mainly utilizes the inductive control device to drive the holding device to hold and position the metal blank and control the shuffling device to move the sensor of the inductive control device to the path of sensing the metal blank, so as to conduct the sensing operation.

Abstract: A two-way distribution, charging, and vending system permits a subscriber to exchange one or more partially or completely discharged portable electric energy storage devices for a comparable number of charged portable electric energy storage devices. The two-way distribution, charging, and vending system includes a number of charging modules, each with a dedicated power converter, communicably coupled to at least one two-way distribution system controller and to a power distribution grid. Upon receipt of a discharged portable electric energy storage device, the at least one two-way distribution system controller validates a manufacturer identifier and a subscriber identifier stored in a nontransitory storage media carried by the discharged portable electric energy storage device. Responsive to a successful authentication and validation, the at least one two-way distribution system controller dispenses a charged portable electric energy storage device to the subscriber.

Abstract: A network of collection, charging and distribution machines collect, charge and distribute portable electrical energy storage devices (e.g., batteries, supercapacitors or ultracapacitors). Locations of collection, charging and distribution machines having available charged portable electrical energy storage devices are communicated to or acquired by a mobile device of a user, or displayed on a collection, charging and distribution machine. The locations are indicated on a graphical user interface on a map on a user's mobile device relative to the user's current location. The user may use their mobile device select particular locations on the map to reserve an available portable electrical energy storage device. The system nay also warn the user that the user is near an edge of the pre-determined area having portable electrical energy storage device collection, charging and distribution machines. Reservations may also be made automatically based on information regarding a potential route of a user.

Abstract: A virtual reality system includes a head-mounted display and a processing device. The head-mounted display is configured for displaying a virtual reality content. The processing device is coupled to the head-mounted display device and communicated with an accessory kit. The processing device is configured to collect descriptor information from the accessory kit, obtain an accessory type identification of the accessory kit from the descriptor information, and process input-output data of the accessory kit according to the accessory type identification. The input-output data corresponds to interaction between at least one virtual reality object in the virtual reality content and the accessory kit.

Abstract: A method of manufacturing a semiconductor device includes: providing a substrate including a first semiconductive region of a first conductive type and gate structures over the first semiconductive region, where a gap between the gate structures exposes a portion of the first semiconductive region; and forming a second semiconductive region of a second conductive type in the gap starting from the exposed portion of the first semiconductive region. The forming of the second semiconductive region includes: growing, in a chamber, an epitaxial silicon-rich layer with a first growth rate around a sidewall adjacent to the gate structures that is greater than a second growth rate at a central portion; and, in the chamber, partially removing the epitaxial silicon-rich layer with an etchant with a first etching rate around the sidewall adjacent to the gate structures that is greater than a second etching rate at the central portion.

Abstract: Provided is a die structure including a die, a bonding structure, and a protection structure. The die includes a substrate and a metal feature disposed over the substrate. The bonding structure is disposed over the die. The bonding structure includes a bonding dielectric layer and a bonding metal layer disposed in the bonding dielectric layer. The bonding metal layer is electrically connected to the metal feature of the die. The protection structure is disposed between a top portion of the bonding metal layer and a top portion of the bonding dielectric layer. A die stack structure and a method of fabricating the die structure are also provided.

Abstract: A method includes forming a first conductive feature and a second conductive feature, forming a metal pad over and electrically connected to the first conductive feature, and forming a passivation layer covering edge portions of the metal pad, with a center portion of a top surface of the metal pad exposed through an opening in the metal pad. A first dielectric layer is formed to cover the metal pad and the passivation layer. A bond pad is formed over the first dielectric layer, and the bond pad is electrically coupled to the second conductive feature. A second dielectric layer is deposited to encircle the bond pad. A planarization is performed to level a top surface of the second dielectric layer with the bond pad. At a time after the planarization is performed, an entirety of the top surface of the metal pad is in contact with dielectric materials.

Abstract: A semiconductor device and method of manufacture are provided. In an embodiment a first semiconductor device and a second semiconductor device are formed within a semiconductor wafer and a scribe region between the first semiconductor device and the second semiconductor device is patterned. A singulation process is then utilized within the scribe region to singulate the first semiconductor device from the second semiconductor device. The first semiconductor device and the second semiconductor device are then bonded to a second semiconductor substrate and thinned in order to remove extension regions from the first semiconductor device and the second semiconductor device.

Abstract: An actuator is provided, including a fixed assembly and a movable assembly. The fixed assembly includes a coil module, a base, a first screwing member, and a linear rail. The first screwing member passes through the base and the linear rail, and the linear rail is positioned on the base. The movable assembly includes a U-shaped back board having an inner space, a first magnetic module, a second magnetic module aligned with the first magnetic module, and a sliding block. The first and second magnetic modules are disposed on the U-shaped back board and accommodated in the inner space. The coil module is disposed between the first magnetic module and the second magnetic module. The sliding block is positioned on the U-shaped back board in the inner space, and slidably connected to the linear rail.

Abstract: A semiconductor device includes: a substrate; a gate structure on the substrate; and an epitaxial layer in the substrate adjacent to the gate structure, in which the epitaxial layer includes a planar surface and protrusions adjacent to two sides of the planar surface. Preferably, a contact plug is embedded in part of the epitaxial layer, and a silicide is disposed under the contact plug, in which a bottom surface of the silicide includes an arc.