Patents by Inventor Kevin G. Duesman

Kevin G. Duesman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7208758
    Abstract: A semiconductor wafer or other bulk semiconductor substrate having a plurality of dice thereon is manufactured using conventional processing techniques. The wafer is subjected to testing to identify functional and nonfunctional dice. The locations of the functional dice are analyzed to determine the location of immediately adjacent or closely proximate functional dice. A group of functional dice is identified and an interconnection circuit is formed therebetween. The functional die group, once interconnected, is then segmented from the wafer while maintaining the unitary integrity of the functional die group as well as the associated interconnections between dice. Modules including one or more functional die groups and methods of fabricating functional die groups and modules are also disclosed.
    Type: Grant
    Filed: September 16, 2003
    Date of Patent: April 24, 2007
    Assignee: Micron Technology, Inc.
    Inventors: Aron T. Lunde, Kevin G. Duesman, Timothy B. Cowles
  • Patent number: 7205598
    Abstract: A memory structure has a vertically oriented access transistor with an annular gate region. A transistor is fabricated such that the channel of the transistor extends outward with respect to the surface of the substrate. An annular gate is fabricated around the vertical channel such that it partially or completely surrounds the channel. A buried annular bitline may also be implemented. After the vertically oriented transistor is fabricated with the annular gate, a storage device may be fabricated over the transistor to provide a memory cell.
    Type: Grant
    Filed: August 11, 2003
    Date of Patent: April 17, 2007
    Assignee: Micron Technology, Inc.
    Inventors: Thomas W. Voshell, Lucien J. Bissey, Kevin G. Duesman
  • Patent number: 7142446
    Abstract: A method and apparatus is provided for reducing the current in a memory device. Peripheral device control signals are translated to the wordline off voltage level, such as a negative wordline voltage. The translated signals prevent the peripheral devices from conducting current in the wordline off mode, even if a wordline-to-digitline short should occur. The control signals may include a column select signal for a column select device and an active pull-up signal for a sense amplifier, among others. Additionally, an equalization circuit having high and low resistance components is provided for the memory device. The equalization circuit limits current, even if a wordline-to-digitline short occurs.
    Type: Grant
    Filed: July 29, 2004
    Date of Patent: November 28, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Scott J. Derner, Stephen R. Porter, Scot M. Graham, Ethan A. Williford, Kevin G. Duesman
  • Patent number: 7128551
    Abstract: A stereolithographic method and apparatus for forming polymeric structures comprising a plurality of overlying layers, each layer formed by polymerizing a thin layer of liquid photopolymer on a prior layer. Crevices formed at the layer interfaces are filled by a stereolithographic method comprising lifting the multilayered structure from the liquid photopolymer, draining excess liquid therefrom, tilting the structure to provide an acute angle of incidence between an incident radiation beam and a side wall of the object, and applying radiation to the crevice to polymerize at least the surface of a quantity of liquid photopolymer therein. The structure may then be subjected to a separate final full cure to fully harden the structure. An exemplary use is the packaging of electronic components and the like.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: October 31, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Warren M. Farnworth, Kevin G. Duesman
  • Patent number: 7081385
    Abstract: Provided herein are vertical nanotube semiconductor devices and methods for making the same. An embodiment of the semiconductor devices comprises a vertical transistor/capacitor cell including a nanotube. The device includes a vertical transistor and a capacitor cell both using a single nanotube to form the individual devices.
    Type: Grant
    Filed: April 8, 2004
    Date of Patent: July 25, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Warren M. Farnworth, Kevin G. Duesman
  • Patent number: 7063524
    Abstract: A stereolithographic (STL) apparatus for forming structures such as semiconductor die packages is described which uses a laser beam focused to a generally annular “spot” having an annulus of enhanced laser power surrounding a central “hole” of reduced (or no) laser power. The structures are formed of a stack of light-polymerized photopolymer layers. Scanning of a beam having power concentrated in the annulus enables simultaneous production of a self-supporting structure having at least semisolid, smooth lateral outer polymer walls and an upper hardened polymer skin extending over liquid polymer still lying between the walls. The structure may be subjected to heat or broad source light of suitable wavelength after removal from the STL apparatus to accelerate complete polymerization of the structure to a solid state.
    Type: Grant
    Filed: August 20, 2002
    Date of Patent: June 20, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Warren M Farnworth, Kevin G. Duesman
  • Patent number: 7034560
    Abstract: An IC module, such as a Multi-Chip Module (MCM), includes multiple IC dice, each having a test mode enable bond pad, such as an output enable pad. A fuse incorporated into the MCM's substrate connects each die's test mode enable bond pad to one of the MCM's no-connection (N/C) pins, and a resistor incorporated into the substrate connects the test mode enable bond pads to one of the MCM's ground pins. By applying a supply voltage to the test mode enable bond pads through the N/C pin, a test mode is initiated in the dice. Once testing is complete, the fuse may be blown, and a ground voltage applied to the test mode enable bond pads through the ground pins so the resistor disables the test mode in the dice and initiates an operational mode. As a result, dice packaged in IC modules may be tested after packaging.
    Type: Grant
    Filed: March 16, 2004
    Date of Patent: April 25, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Warren M. Farnworth, James M. Wark, Eric S. Nelson, Kevin G. Duesman
  • Patent number: 6951789
    Abstract: A memory structure has a vertically oriented access transistor with an annular gate region. A transistor is fabricated such that the channel of the transistor extends outward with respect to the surface of the substrate. An annular gate is fabricated around the vertical channel such that it partially or completely surrounds the channel. A buried annular bitline may also be implemented. After the vertically oriented transistor is fabricated with the annular gate, a storage device may be fabricated over the transistor to provide a memory cell.
    Type: Grant
    Filed: June 29, 2004
    Date of Patent: October 4, 2005
    Assignee: Micron Technology, Inc.
    Inventors: Thomas W. Voshell, Lucien J. Bissey, Kevin G. Duesman
  • Patent number: 6946863
    Abstract: A method for passing a voltage between an internal node inside a memory device and an external pin outside the memory device. The method includes passing an internal voltage from the internal node to the external pin during a read mode. The method also includes passing an external voltage from the external pin to the internal node during a force mode.
    Type: Grant
    Filed: August 7, 2000
    Date of Patent: September 20, 2005
    Assignee: Micron Technology, Inc.
    Inventors: Daniel R. Loughmiller, Joseph C. Sher, Kevin G. Duesman
  • Patent number: 6893804
    Abstract: A stereolithographic method and apparatus for forming polymeric structures comprising a plurality of overlying layers, each layer formed by polymerizing a thin layer of liquid photopolymer on a prior layer. Crevices formed at the layer interfaces are filled by a stereolithographic method comprising lifting the multilayered structure from the liquid photopolymer, draining excess liquid therefrom, tilting the structure to provide an acute angle of incidence between an incident radiation beam and a side wall of the object, and applying radiation to the crevice to polymerize at least the surface of a quantity of liquid photopolymer therein. The structure may then be subjected to a separate final full cure to fully harden the structure. An exemplary use is the packaging of electronic components and the like.
    Type: Grant
    Filed: November 18, 2002
    Date of Patent: May 17, 2005
    Assignee: Micron Technology, Inc.
    Inventors: Warren M. Farnworth, Kevin G Duesman
  • Patent number: 6858891
    Abstract: Provided herein are vertical nanotube semiconductor devices and methods for making the same. An embodiment of the semiconductor devices comprises a vertical transistor/capacitor cell including a nanotube. The device includes a vertical transistor and a capacitor cell both using a single nanotube to form the individual devices.
    Type: Grant
    Filed: December 9, 2002
    Date of Patent: February 22, 2005
    Assignee: Micron Technology, Inc.
    Inventors: Warren M. Farnworth, Kevin G. Duesman
  • Patent number: 6841438
    Abstract: A memory structure having a vertically oriented access transistor with an annular gate region and a method for fabricating the structure. More specifically, a transistor is fabricated such that the channel of the transistor extends outward with respect to the surface of the substrate. An annular gate is fabricated around the vertical channel such that it partially or completely surrounds the channel. A buried annular bitline may also be implemented. After the vertically oriented transistor is fabricated with the annular gate, a storage device may be fabricated over the transistor to provide a memory cell.
    Type: Grant
    Filed: August 29, 2003
    Date of Patent: January 11, 2005
    Assignee: Micron Technology, Inc.
    Inventors: Lucien J. Bissey, Kevin G. Duesman
  • Publication number: 20040233705
    Abstract: A memory structure has a vertically oriented access transistor with an annular gate region. A transistor is fabricated such that the channel of the transistor extends outward with respect to the surface of the substrate. An annular gate is fabricated around the vertical channel such that it partially or completely surrounds the channel. A buried annular bitline may also be implemented. After the vertically oriented transistor is fabricated with the annular gate, a storage device may be fabricated over the transistor to provide a memory cell.
    Type: Application
    Filed: June 29, 2004
    Publication date: November 25, 2004
    Inventors: Thomas W. Voshell, Lucien J. Bissey, Kevin G. Duesman
  • Patent number: 6801048
    Abstract: An IC module, such as a Multi-Chip Module (MCM), includes multiple IC dice, each having a test mode enable bond pad, such as an output enable pad. A fuse incorporated into the MCM's substrate connects each die's test mode enable bond pad to one of the MCM's no-connection (N/C) pins, and a resistor incorporated into the substrate connects the test mode enable bond pads to one of the MCM's ground pins. By applying a supply voltage to the test mode enable bond pads through the N/C pin, a test mode is initiated in the dice. Once testing is complete, the fuse may be blown, and a ground voltage applied to the test mode enable bond pads through the ground pins so the resistor disables the test mode in the dice and initiates an operational mode. As a result, dice packaged in IC modules may be tested after packaging.
    Type: Grant
    Filed: March 25, 2003
    Date of Patent: October 5, 2004
    Assignee: Micron Technology, Inc.
    Inventors: Warren M. Farnworth, James M. Wark, Eric S. Nelson, Kevin G. Duesman
  • Publication number: 20040188738
    Abstract: Provided herein are vertical nanotube semiconductor devices and methods for making the same. An embodiment of the semiconductor devices comprises a vertical transistor/capacitor cell including a nanotube. The device includes a vertical transistor and a capacitor cell both using a single nanotube to form the individual devices.
    Type: Application
    Filed: April 8, 2004
    Publication date: September 30, 2004
    Applicant: Micron Technology, Inc.
    Inventors: Warren M. Farnworth, Kevin G. Duesman
  • Patent number: 6797545
    Abstract: Logic circuitry formed in street areas between adjacent fabricated electronic devices may be used as auxiliary or redundant components to salvage one or more otherwise defective devices. Logic circuitry is selectively coupled to the defective device(s) to directly replace or facilitate the replacement of defective components on one or more fabricated devices, thereby resulting in a single operable electronic device. The invention may be used to increase the production yield of electronic devices, particularly, semiconductor integrated circuits. The invention permits the fabrication of discretionary wiring during the normal metalization of semiconductor layers to interconnect electronic devices at the same time as the formation of the normal wiring/circuitry of the devices.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: September 28, 2004
    Assignee: Micron Technology, Inc.
    Inventors: Warren M. Farnworth, Kevin G. Duesman, Alan G. Wood
  • Patent number: 6794699
    Abstract: A memory structure having a vertically oriented access transistor with an annular gate region and a method for fabricating the structure. More specifically, a transistor is fabricated such that the channel of the transistor extends outward with respect to the surface of the substrate. An annular gate is fabricated around the vertical channel such that it partially or completely surrounds the channel. A buried annular bitline may also be implemented. After the vertically oriented transistor is fabricated with the annular gate, a storage device may be fabricated over the transistor to provide a memory cell.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: September 21, 2004
    Inventors: Lucien J. Bissey, Kevin G. Duesman, Warren M. Farnworth
  • Publication number: 20040177298
    Abstract: An IC module, such as a Multi-Chip Module (MCM), includes multiple IC dice, each having a test mode enable bond pad, such as an output enable pad. A fuse incorporated into the MCM's substrate connects each die's test mode enable bond pad to one of the MCM's no-connection (N/C) pins, and a resistor incorporated into the substrate connects the test mode enable bond pads to one of the MCM's ground pins. By applying a supply voltage to the test mode enable bond pads through the N/C pin, a test mode is initiated in the dice. Once testing is complete, the fuse may be blown, and a ground voltage applied to the test mode enable bond pads through the ground pins so the resistor disables the test mode in the dice and initiates an operational mode.
    Type: Application
    Filed: March 16, 2004
    Publication date: September 9, 2004
    Inventors: Warren M. Farnworth, James M. Wark, Eric S. Nelson, Kevin G. Duesman
  • Patent number: 6740476
    Abstract: A stereolithographic method and apparatus for forming polymeric structures comprising a plurality of overlying layers, each layer formed by polymerizing a thin layer of liquid photopolymer on a prior layer. Crevices formed at the layer interfaces are filled by a stereolithographic method comprising lifting the multilayered structure from the liquid photopolymer, draining excess liquid therefrom, tilting the structure to provide an acute angle of incidence between an incident radiation beam and a side wall of the object, and applying radiation to the crevice to polymerize at least the surface of a quantity of liquid photopolymer therein. The structure may then be subjected to a separate final full cure to fully harden the structure. An exemplary use is the packaging of electronic components and the like.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: May 25, 2004
    Assignee: Micron Technology, Inc.
    Inventors: Warren M. Farnworth, Kevin G. Duesman
  • Publication number: 20040089893
    Abstract: A memory structure having a vertically oriented access transistor with an annular gate region and a method for fabricating the structure. More specifically, a transistor is fabricated such that the channel of the transistor extends outward with respect to the surface of the substrate. An annular gate is fabricated around the vertical channel such that it partially or completely surrounds the channel. A buried annular bitline may also be implemented. After the vertically oriented transistor is fabricated with the annular gate, a storage device may be fabricated over the transistor to provide a memory cell.
    Type: Application
    Filed: August 29, 2003
    Publication date: May 13, 2004
    Inventors: Lucien J. Bissey, Kevin G. Duesman