Abstract: A three-dimensional semiconductor device includes a semiconductor substrate, fin(s) coupled to the substrate and surrounded at a bottom portion thereof by isolation material, each fin including a source region, a drain region and a channel region therebetween, a first gate and spacers over a portion of each fin, and a second gate and spacers, the second gate encompassing a common end portion of each fin. The first gate and corresponding source and drain regions act as an access transistor, and the second gate and common end portion(s) of the fin(s) act as a storage capacitor, and a top surface of the second gate acts as a plate for the storage capacitor, when multiple cells are arranged in an array.

Abstract: Methods are providing for fabricating transistors having at least one source region or drain region with a stressed portion. The methods include: forming, within a cavity of a substrate structure, the at least one source region or drain region with the internal stress; and resurfacing the at least one source region or drain region to reduce surface defects of the at least one source region or drain region without relaxing the stressed portion thereof. For instance, the resurfacing can include melting an upper portion of the at least one source region or drain region. In addition, the resurfacing can include re-crystallizing an upper portion of the at least one source region or drain region, and/or providing the at least one source region or drain region with at least one {111} surface.

Abstract: Methods to connect to back-plate (BP) or well contacts or diode junctions through a RMG electrode in FDSOI technology based devices and the resulting devices are disclosed. Embodiments include providing a polysilicon dummy gate electrode between spacers and extending over a BP, an active area of a transistor, and a shallow-trench-isolation (STI) region therebetween; providing an interlayer dielectric surrounding the spacers and polysilicon dummy gate electrode; removing the polysilicon dummy gate electrode creating a cavity between the spacers; forming a high-k dielectric layer and a work-function (WF) metal layer in the cavity; removing a section of the WF metal layer, high-k dielectric layer, and STI region exposing an upper surface of the BP; filling the cavity with a metal forming a replacement metal gate electrode; and planarizing the metal down to an upper surface of the spacers.

Abstract: Embodiments of the present invention provide an improved shallow trench isolation structure and method of fabrication. The shallow trench isolation cavity includes an upper region having a sigma cavity shape, and a lower region having a substantially rectangular cross-section. The lower region is filled with a first material having good gap fill properties. The sigma cavity is filled with a second material having good stress-inducing properties. In some embodiments, source/drain stressor cavities may be eliminated, with the stress provided by the shallow trench isolation structure. In other embodiments, the stress from the shallow trench isolation structure may be used to complement or counteract stress from a source/drain stressor region of an adjacent transistor. This enables precise tuning of channel stress to achieve a desired carrier mobility for a transistor.

Abstract: A method of forming a single diffusion break includes etching rows of fins into a substrate of a structure from a patterned fin hardmask, the remaining fin hardmask being self-aligned with the fins. A first dielectric fill material is disposed and planarized over the structure to expose the fin hardmask. A photoresist layer is disposed over the structure. An isolation region is patterned across the fins to form first and second parallel fin arrays, wherein any remaining photoresist layer has self-aligned edges which are self-aligned with the isolation region. The self-aligned edges are trimmed to expose end portions of the fin hardmask. The exposed end portions are removed. The remaining photoresist layer is removed. A second dielectric fill material is disposed and planarized over the structure to form a base for a single diffusion break (SDB) in the isolation region.

Abstract: A method of forming a single diffusion break includes patterning a fin hardmask disposed over a substrate. First and second fin arrays separated by an isolation region are etched into the substrate from the patterned fin hardmask. Any remaining fin hardmask being self-aligned with the fins. A first dielectric fill material is disposed and planarized over the arrays to expose top surfaces of the remaining fin hardmask. A second dielectric strip is formed over the first dielectric fill material to cover the isolation region and end portions of the remaining fin hardmask. Any exposed portions of the remaining fin hardmask are anisotropically etched away. The end portions of the remaining fin hardmask form base extensions of a base for a single diffusion break (SDB) in the isolation region. The first dielectric fill material and second dielectric strip are etched to complete formation of the base for the single diffusion break.

Abstract: Methods for creating self-aligned FINFET SDBs for minimum gate junction pitch and epitaxy formation. Embodiments include forming separated openings in a hard mask on upper surfaces of Si fins; forming cavities in the fins, each of the cavities having a concave shape and a width extending under the hard mask on each side of the cavity; forming trenches in the fins, the trenches having an upper width substantially equal to a width of the openings and less than the width of a cavity; removing the hard mask; filling the trenches and the cavities with oxide, forming STI regions; forming an oxide mask layer on the upper surfaces of the fins and the STI regions; removing upper portions of the oxide in sections between the STI regions; and removing remaining portions of the oxide mask revealing the fins and upper surfaces of the STI regions.

Abstract: Diodes and fabrication methods thereof are presented. The diodes include, for instance: a first semiconductor region disposed at least partially within a substrate, the first semiconductor region having a first conductivity type; and a second semiconductor region disposed at least partially within the first semiconductor region, the second semiconductor region having a second conductivity type, wherein the first semiconductor region separates the second semiconductor region from the substrate. In one embodiment, the substrate and the first semiconductor region have a sigma-shaped boundary. In another embodiment, the substrate and the first semiconductor region have U-shaped boundary.

Abstract: Methods are presented for fabricating nanowire structures, such as one or more nanowire field effect transistors. The methods include, for instance: providing a substrate and forming a fin above the substrate so that the fin has a first sidewall including one or more elongate first sidewall protrusions and a second sidewall including one or more elongate second sidewall protrusions, with the one or more elongate second sidewall protrusions being substantially aligned with the one or more elongate first sidewall protrusions; and, anisotropically etching the fin with the elongate first sidewall protrusions and the elongate second sidewall protrusions to define the one or more nanowires. The etchant may be chosen to selectively etch along a pre-defined crystallographic plane, such as the (111) crystallographic plane, to form the nanowire structures.

Abstract: Methods are provided for fabricating multi-layer semiconductor structures. The methods include, for example: providing a first layer and a second layer over a substrate, the first layer including a first metal and the second layer including a second metal, where the second layer is disposed over the first layer and the first metal and second metal are different metals; and annealing the first layer, the second layer, and the substrate to react at least a portion of the first metal of the first layer to form a first reacted layer and at least a portion of the second metal of the second layer to form a second reacted layer, where at least one of the first reacted layer or the second reacted layer includes at least one of a first metal silicide of the first metal or a second metal silicide of the second metal.

Abstract: A method of fabricating a raised fin structure including a raised contact structure is provided. The method may include: providing a base fin structure; providing at least one ancillary fin structure, the at least one ancillary fin structure contacting the base fin structure at a side of the base fin structure; growing a material over the base fin structure to form the raised fin structure; and, growing the material over the at least one ancillary fin structure, wherein the at least one ancillary fin structure contacting the base fin structure increases a volume of material grown over the base fin structure near the contact between the base fin structure and the at least one ancillary fin structure to form the raised contact structure.

Abstract: Fin field-effect transistor (FinFET) devices and methods of forming the same are provided herein. In an embodiment, a FinFET device includes a semiconductor substrate having a plurality of fins disposed in parallel relationship. A first insulator layer overlies the semiconductor substrate, with the fins extending through and protruding beyond the first insulator layer to provide exposed fin portions. A gate electrode structure overlies the exposed fin portions and is electrically insulated from the fins by a gate insulating layer. Epitaxially-grown source regions and drain regions are disposed adjacent to the gate electrode structure. The epitaxially-grown source regions and drain regions have an asymmetric profile along a lateral direction perpendicular to a length of the fins.

Abstract: A semiconductor structure includes a semiconductor substrate, fins coupled to the substrate and surrounded at a bottom portion thereof by isolation material, and resistor(s) situated in the gate region(s), the gate regions being filled with undoped dummy gate material. As part of a replacement gate process, the resistor(s) are realized by forming silicide over dummy gate material, i.e., the dummy gate material for the resistor(s) is not removed.

Abstract: Integrated devices and fabrication methods thereof are presented. The methods include, for instance fabricating an integrated device comprising an inductive portion and a capacitive portion, the integrated device being at least partially embedded within an electrode. The fabricating includes providing a conductive coil at least partially within an insulator layer above a substrate, the conductive coil comprising exposed portions, wherein the inductive portion of the integrated device comprises the conductive coil; covering exposed portions of the conductive coil with a dielectric material; and forming the electrode at least partially around the dielectric covered portions of the conductive coil, the electrode being physically separated from the conductive coil by the dielectric material, wherein the capacitive portion of the integrated device comprises the electrode, the dielectric material, and the conductive coil.

Abstract: Semiconductor fuses with nanowire fuse links and fabrication methods thereof are presented. The methods include, for instance: fabricating a semiconductor fuse, the semiconductor fuse including at least one nanowire fuse link, and the fabricating including: forming at least one nanowire, the at least one nanowire including a semiconductor material; and reacting the at least one nanowire with a metal to form the at least one nanowire fuse link of the semiconductor fuse, the at least one nanowire fuse link including a semiconductor-metal alloy. In another aspect, a structure is presented. The structure includes: a semiconductor fuse, the semiconductor fuse including: at least one nanowire fuse link, the at least one nanowire fuse link including a semiconductor-metal alloy.

Abstract: Devices including stacking faults in sources, or sources and drains, of TFETs are disclosed to improve tunneling efficiency. Embodiments may include a tunneling field-effect transistor comprising a substrate; a source and a drain within the substrate; a gate between the source and the drain; and a stacking fault within the source.

Abstract: A semiconductor structure includes a semiconductor substrate, at least one first elongated region of n-type or p-type, and at least one other second elongated region of the other of n-type or p-type, the first and second elongated regions crossing such that the first elongated region and the second elongated region intersect at a common area, and a shared gate structure over each common area.

Abstract: A method of removing RMG sidewall layers, and the resulting device are provided. Embodiments include forming a TiN layer in nFET and pFET RMG trenches; forming an a-Si layer over the TiN layer; implanting O2 vertically in the a-Si layer; removing the a-Si layer and TiN layer from the side surfaces of the RMG trenches followed by the a-Si layer from the bottom surfaces; forming a TiN layer in the RMG trenches; forming a a-Si layer over the TiN layer; implanting O2 vertically in the a-Si layer; removing the a-Si layer and TiN layer from the side surfaces of the RMG trenches, the a-Si layer from the bottom surfaces, and a remainder of the TiN layer from only the nFET RMG trench; forming a Ti layer in the RMG trenches; implanting Al or C in the Ti layer vertically and annealing; and filling the RMG trenches with Al or W.

Abstract: Methods and transistors for circuit structures are provided. The methods include, for instance: defining a channel region in a substrate, the channel region having at least one channel region sidewall adjoining an isolation material; recessing the isolation material to expose an upper portion of the at least one channel region sidewall; and providing a gate structure over a gate interface area with the channel region. The gate interface area includes at least the upper portion of the at least one channel region sidewall and an upper surface of the channel region so that a threshold voltage of the gate structure may be reduced. The methods may also include etching an elongate notch in the upper portion of the at least one channel region sidewall to increase a size of the gate interface area and further reduce the threshold voltage of the gate structure.

Abstract: Methods for integrating core and I/O components in IC devices utilizing a TFT I/O device formed on STI regions, and the resulting devices are disclosed. Embodiments include forming STI and FinFET regions in a Si substrate, the FinFET region having first and second adjacent sections; forming a nitride layer and a silicon layer, respectively, over the STI region and both sections of the FinFET region; removing a first section of the silicon and nitride layers through a mask to expose the first FinFET section; implanting the exposed FinFET section with a dopant; removing remaining sections of the mask; removing a second section of the silicon and nitride layers through a second mask to expose the second FinFET section; implanting the second FinFET section with another dopant; removing remaining sections of the second mask; and forming a TFT on the remaining silicon layer, wherein the TFT channel includes the silicon layer.