Abstract: A laser desorption/ionization method, includes: a first step of preparing a sample support body including a substrate on which plurality of through holes opening to a first surface and a second surface facing each other are formed, and a conductive layer provided on at least the first surface; a second step of mounting a sample on a mounting surface of a mounting portion, and of disposing the sample support body on the sample such that the second surface is in contact with the sample; a third step of introducing a matrix solution into the plurality of through holes; and a fourth step of ionizing a component of the sample that is mixed with the matrix solution and is moved to the first surface side from the second surface side through the through hole by irradiating the first surface with laser light while a voltage is applied to the conductive layer.

Abstract: Provided is a sample support body that includes a substrate, an ionization substrate, a support, and a frame. The ionization substrate has a plurality of measurement regions for dropping a sample on second surface. A plurality of through-holes that open in a first surface and the second surface are formed at least in the measurement regions of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes at least on the second surface. The frame has a wall provided on peripheral edges of the measurement regions on the second surface to separate the plurality of measurement regions when viewed in the direction in which the substrate and the ionization substrate face each other.

Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.

Abstract: A mass spectrometer includes: a chamber; a support that, in a state in which, in a sample support body that includes a substrate in which a plurality of through-holes open in first and second surfaces are formed and a conductive layer that is at least provided on the first surface, the second surface thereof is in contact with a sample, supports the sample and the sample support body; a laser beam irradiation part that irradiates the first surface with a laser beam; a voltage application part that applies a voltage to the conductive layer; an ion detection part that, detects the ionized components of the sample in a space inside the chamber; a first light irradiation part that irradiates the sample with a first light from a side of the substrate; and an imaging part that obtains a reflected light image of the sample by the first light.

Abstract: Provided is a sample support body that includes a substrate and an ionization substrate. The ionization substrate has a measurement region for dropping a sample on a second surface. A plurality of through-holes that open in a first surface and the second surface are formed in at least the measurement region of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes on at least the second surface. At least a part of the substrate which is adjacent to the ionization substrate is formed to enable the sample to move to the inside of the substrate.

Abstract: A laser desorption/ionization method includes: a first process of preparing a sample support body that includes a substrate in which a plurality of through-holes are formed and a conductive layer that is provided on the first surface of the substrate; a second process of mounting a frozen sample on a mounting surface of a mount under a sub-freezing atmosphere, and fixing the sample support body to the mount in a state in which the second surface is in contact with the frozen sample; a third process of thawing the sample, and moving components of the thawed sample toward the first surface via the plurality of through-holes due to a capillary phenomenon; and a fourth process of irradiating the first surface with a laser beam while applying a voltage to the conductive layer, and ionizing the components that have moved toward the first surface.

Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.

Abstract: A mass spectrometry device according to one aspect of the invention includes: a sample stage on which a sample is placed and on which a sample support having a substrate, in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided, and a conductive layer, which covers at least a portion of the one surface which is not provided with the through-holes, is placed such that the other surface faces the sample; a laser beam application unit that controls application of a laser beam such that the laser beam is applied to an imaging target region on the one surface; and a detector that detects the sample ionized by the application of the laser beam in a state where a positional relation of the sample in the imaging target region is maintained.

Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.

Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support having a substrate in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided and a conductive layer that covers at least the one surface; a second process of placing a sample on a sample stage and arranging the sample support on the sample such that the other surface faces the sample; and a third process of applying a laser beam to the one surface and ionizing the sample moved from the other surface side to the one surface side via the through-holes due to a capillary phenomenon.

Abstract: A sample support according to an aspect is a sample support for a surface-assisted laser desorption/ionization method, and includes: a substrate in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided; and a conductive layer that is formed of a conductive material and covers at least the one surface. The through-holes have a width of 1 to 700 nm, and the substrate has a thickness of 1 to 50 ?m.

Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support having a substrate in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided and a conductive layer that covers at least the one surface; a second process of placing a sample on a sample stage and arranging the sample support on the sample such that the other surface faces the sample; and a third process of applying a laser beam to the one surface and ionizing the sample moved from the other surface side to the one surface side via the through-holes due to a capillary phenomenon.

Abstract: A sample support according to an aspect is a sample support for a surface-assisted laser desorption/ionization method, and includes: a substrate in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided; and a conductive layer that is formed of a conductive material and covers at least the one surface. The through-holes have a width of 1 to 700 nm, and the substrate has a thickness of 1 to 50 ?m.