Abstract: A chemical mechanical polishing process includes rotating at least one of a semiconductor substrate and polishing pad relative to the other. A chemical mechanical polishing slurry is provided intermediate the substrate and pad. The substrate is polished with the slurry and pad during the rotating. The chemical mechanical polishing slurry includes liquid and abrasive solid components. At least some of the abrasive solid component includes individually non-homogeneous abrasive particles.

Abstract: A semiconductor component includes a thinned semiconductor die having protective polymer layers on up to six surfaces. The component also includes contact bumps on the die embedded in a circuit side polymer layer, and terminal contacts on the contact bumps in a dense area array. A method for fabricating the component includes the steps of providing a substrate containing multiple dice, forming trenches on the substrate proximate to peripheral edges of the dice, and depositing a polymer material into the trenches. In addition, the method includes the steps of planarizing the back side of the substrate to contact the polymer filled trenches, and cutting through the polymer trenches to singulate the components from the substrate. Prior to the singulating step the components can be tested and burned-in while they remain on the substrate.

Abstract: A two part lens system. The first part is a ring-like supporting component that is implanted in the capsular bag following cataract surgery. The first component is a non-optical component and contains a pair of haptics for fixating the first component within the capsular bag. The second component is an optical component that contains all of the corrective optical power of the lens system. The second component has a pair of tabs for locking the second component within the first component.

Abstract: A first precursor gas is flowed to the substrate within the chamber effective to form a first monolayer on the substrate. A second precursor gas different in composition from the first precursor gas is flowed to the first monolayer within the chamber under surface microwave plasma conditions within the chamber effective to react with the first monolayer and form a second monolayer on the substrate which is different in composition from the first monolayer. The second monolayer includes components of the first monolayer and the second precursor. In one implementation, the first and second precursor flowings are successively repeated effective to form a mass of material on the substrate of the second monolayer composition. Additional and other implementations are contemplated.

Abstract: A semiconductor component includes a thinned semiconductor die having protective polymer layers on up to six surfaces. The component also includes contact bumps on the die embedded in a circuit side polymer layer, and terminal contacts on the contact bumps in a dense area array. A method for fabricating the component includes the steps of providing a substrate containing multiple dice, forming trenches on the substrate proximate to peripheral edges of the dice, and depositing a polymer material into the trenches. In addition, the method includes the steps of planarizing the back side of the substrate to contact the polymer filled trenches, and cutting through the polymer trenches to singulate the components from the substrate. Prior to the singulating step the components can be tested and burned-in while they remain on the substrate.

Abstract: In a Dickson type charge pump in which a plurality of serially connected diodes sequentially respond to anti-phase 50/50 clock cross over or overlapped (?1, ?2), efficiency of the charge pump is increased by providing with each diode a charge transfer transistor in parallel therewith between two adjacent nodes, and driving the charge transfer transistor to conduction during a time when the parallel diode is conducting thereby transferring any residual trapped charge at one node through the charge transfer transistor to the next node. Operating frequency can be increased by providing a pre-charge diode coupling an input node to the gate of the charge transfer transistor to facilitate conductance of the charge transfer transistor, and by coupling the control terminal of the charge transfer transistor to an input node in response to charge on an output node to thereby equalize charge on the control terminal and on the input node during a recovery period.

Abstract: Disclosed herein are techniques for using diblock copolymer (DBCP) films as etch masks to form small dots or holes in integrated circuit layers. In an embodiment, the DBCP film is deposited on the circuit layer to be etched. Then the DCBP film is confined to define an area of interest in the DCBP film in which hexagonal domains will eventually be formed. Such confinement can constitute masking and exposing the DCBP film using photolithographic techniques. Such masking preferably incorporates knowledge of the domain spacing and/or grain size of the to-be-formed domains in the area of interest to ensure that a predictable number and/or orientation of the domains will result in the area of interest, although this is not strictly necessary in all useful embodiments. Domains are then formed in the area of interest in the DBCP film which comprises a hexagonal array of cylindrical domains in a matrix. The film is then treated (e.g.

Abstract: A semiconductor package component includes a base die and a secondary die flip chip mounted to the base die. The base die includes a set of stacking contacts for flip chip mounting the secondary die to the base die, and a set of interconnect contacts configured as an internal signal transmission system, and a physical structure for supporting a terminal contact system of the package component. The package component also includes an encapsulant on the base die encapsulating the interconnect contacts, an underfill layer between the dice, and terminal contacts configured for flip chip mounting the package component to a supporting substrate. A method for fabricating the package component includes the steps of providing a base wafer containing a plurality of base dice, and flip chip mounting the secondary dice to the base dice on the base wafer.

Abstract: An atomic layer deposition method includes positioning a plurality of semiconductor wafers into an atomic layer deposition chamber. Deposition precursor is emitted from individual gas inlets associated with individual of the wafers received within the chamber effective to form a respective monolayer onto said individual wafers received within the chamber. After forming the monolayer, purge gas is emitted from individual gas inlets associated with individual of the wafers received within the chamber. An atomic layer deposition tool includes a subatmospheric load chamber, a subatmospheric transfer chamber and a plurality of atomic layer deposition chambers. Other aspects and implementations are disclosed.

Abstract: A downloadable postage rate calculating device including a platform for receiving a parcel and providing a weight for the parcel, and a processor configured to receive current rates information downloaded from a computer or other similar device. The processor calculates a postage amount for the parcel based on at least a portion of the current rates information and the weight of the parcel. The processor can also compare the postage amount for a first carrier and shipping method, with that of a second carrier and shipping method, or between two shipping methods offered by the same carrier.

Abstract: A two part lens system. The first part is a ring-like supporting component that is implanted in the capular bag following cataract surgery. The first component is a non-optical component and contains a pair of haptics for fixating the first component within the capular bag. The second component is an optical component that contains all of the corrective optical power of the lens system. The second component has a pair of tabs for locking the second component within the first component.

Abstract: In accordance with an aspect of the invention, a method of forming a trench isolation region includes forming a trench within a substrate. A silanol layer is formed to partially fill the trench and then converted, at least some of the silanol, to a compound including at least one of SiOn and RSiOn, where R includes an organic group. An electrically insulative material is formed over the converted silanol to fill the trench. In another aspect of the invention, a method of forming a trench isolation region includes forming a trench within a substrate. A first layer of at least one of Si(OH)x and (CH3)ySi(OH)4-y is formed to partially fill the trench. At least some of the Si(OH), if present is converted to SiO2 and at least some of (CH3)ySi(OH)4-y if present is converted to (CH3)xSiO2-x. Next, a layer of an electrically insulative material is formed to fill the trench.

Abstract: In accordance with an aspect of the invention, a method of forming a trench isolation region includes forming a trench within a substrate. A silanol layer is formed to partially fill the trench and then converted, at least some of the silanol, to a compound including at least one of SiOn and RSiOn, where R includes an organic group. An electrically insulative material is formed over the converted silanol to fill the trench. In another aspect of the invention, a method of forming a trench isolation region includes forming a trench within a substrate. A first layer of at least one of Si(OH)x and (CH3)ySi(OH)4-y is formed to partially fill the trench. At least some of the Si(OH)x if present is converted to SiO2 and at least some of (CH3)ySi(OH)4-y if present is converted to (CH3)xSiO2-x. Next, a layer of an electrically insulative material is formed to fill the trench.

Abstract: The present disclosure provides methods for preparing samples for atom probe analysis and methods for analyzing such samples. In one exemplary implementation, a surface of the sample may be positioned with respect to a laser source and laser energy may be directed from the laser source toward the sample surface, removing material from the sample to define an annulus about a sample column. The sample column may be provided with a reduced-diameter apex at its outward end, e.g., by etching. This apex may be juxtaposed with an electrode of an atom probe and material may be selectively removed from the apex for analysis by controlling energy delivered to the apex, e.g., by the electrode.

Abstract: A semiconductor component includes a thinned semiconductor die having protective polymer layers on up to six surfaces. The component also includes contact bumps on the die embedded in a circuit side polymer layer, and terminal contacts on the contact bumps in a dense area array. A method for fabricating the component includes the steps of providing a substrate containing multiple dice, forming trenches on the substrate proximate to peripheral edges of the dice, and depositing a polymer material into the trenches. In addition, the method includes the steps of planarizing the back side of the substrate to contact the polymer filled trenches, and cutting through the polymer trenches to singulate the components from the substrate. Prior to the singulating step the components can be tested and burned-in while they remain on the substrate.

Abstract: A contact structure is provided incorporating an amorphous titanium nitride barrier layer formed via low-pressure chemical vapor deposition (LPCVD) utilizing tetrakis-dialkylamido-titanium, Ti(NMe2)4, as the precursor. The contact structure is fabricated by etching a contact opening through a dielectric layer down to a diffusion region to which electrical contact is to be made. Titanium metal is deposited over the surface of the wafer so that the exposed surface of the diffusion region is completely covered by a layer of the metal. At least a portion of the titanium metal layer is eventually converted to titanium silicide, thus providing an excellent conductive interface at the surface of the diffusion region. A titanium nitride barrier layer is then deposited using the LPCVD process, coating the walls and floor of the contact opening. Chemical vapor deposition of polycrystalline silicon or of a metal follows.

Abstract: A welding gun includes a motor, a wire feed mechanism, a power block, a welding tip, a and a cup. A substantially rigid shell surrounds the motor to form a handle. The gun includes a spindle, a spool and a quick disconnect mechanism for coupling the spool to the spindle.

Abstract: A method for forming a floating gate semiconductor device such as an electrically erasable programmable read only memory is provided. The device includes a silicon substrate having an electrically isolated active area. A gate oxide, as well as other components of a FET (e.g., source, drain) are formed in the active area. A self aligned floating gate is formed by depositing a conductive layer (e.g., polysilicon) into the recess and over the gate oxide. The conductive layer is then chemically mechanically planarized to an endpoint of the isolation layer so that all of the conductive layer except material in the recess and on the gate oxide is removed. Following formation of the floating gate an insulating layer is formed on the floating gate and a control gate is formed on the insulating layer.

Abstract: An improved semiconductor device fabrication method comprises insertion of a semiconductor wafer into a high-pressure heated chamber and deposition of a low melting-point aluminum material into a contact hole or via and over an insulating layer overlying a substrate of the wafer. The wafer is heated up to the melting point of the aluminum material and the chamber is pressurized to force the aluminum material into the contact holes or vias and eliminate voids present therein. A second layer of material, comprising a different metal or alloy, which is used as a dopant source, is deposited over an outer surface of the deposited aluminum material layer and allowed to diffuse into the aluminum material layer in order to form a homogenous aluminum alloy within the contact hole or via. A semiconductor device structure made according to the method is also disclosed.

Abstract: A chemical mechanical polishing process includes rotating at least one of a semiconductor substrate and polishing pad relative to the other. A chemical mechanical polishing slurry is provided intermediate the substrate and pad. The substrate is polished with the slurry and pad during the rotating. The chemical mechanical polishing slurry includes liquid and abrasive solid components. At least some of the abrasive solid component includes individually non-homogeneous abrasive particles.