Patents by Inventor Wen Liu

Wen Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12034077
    Abstract: A device includes a first semiconductor strip, a first gate dielectric encircling the first semiconductor strip, a second semiconductor strip overlapping the first semiconductor strip, and a second gate dielectric encircling the second semiconductor strip. The first gate dielectric contacts the first gate dielectric. A gate electrode has a portion over the second semiconductor strip, and additional portions on opposite sides of the first and the second semiconductor strips and the first and the second gate dielectrics.
    Type: Grant
    Filed: May 13, 2022
    Date of Patent: July 9, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Kuo-Cheng Chiang, Chi-Wen Liu, Ying-Keung Leung
  • Publication number: 20240217052
    Abstract: The present disclosure is directed to techniques of zone-based target control in chemical mechanical polishing of wafers. Multiple zones are identified on a surface of a wafer. The CMP target is achieved on each zone in a sequence of CMP processes. Each CMP process in the sequence achieves the CMP target for only one zone, using a CMP process selective to other zones.
    Type: Application
    Filed: March 11, 2024
    Publication date: July 4, 2024
    Inventors: Che-Liang CHUNG, Che-Hao TU, Kei-Wei CHEN, Chih-Wen LIU
  • Patent number: 12027522
    Abstract: Systems and methods are provided for fabricating semiconductor device structures on a substrate. A first fin structure is formed on a substrate. A second fin structure is formed on the substrate. A first semiconductor material is formed on both the first fin structure and the second fin structure. A second semiconductor material is formed on the first semiconductor material on both the first fin structure and the second fin structure. The first semiconductor material on the first fin structure is oxidized to form a first oxide. The second semiconductor material on the first fin structure is removed. A first dielectric material and a first electrode are formed on the first fin structure. A second dielectric material and a second electrode are formed on the second fin structure.
    Type: Grant
    Filed: June 13, 2022
    Date of Patent: July 2, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chi-Wen Liu, Chao-Hsiung Wang
  • Patent number: 12020997
    Abstract: In an embodiment, a method includes: stacking a plurality of first dies to form a device stack; revealing testing pads of a topmost die of the device stack; testing the device stack using the testing pads of the topmost die; and after testing the device stack, forming bonding pads in the topmost die, the bonding pads being different from the testing pads.
    Type: Grant
    Filed: June 21, 2023
    Date of Patent: June 25, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chen-Hua Yu, Sung-Feng Yeh, Ming-Fa Chen, Hsien-Wei Chen, Hui-Wen Liu, Ching-Pin Yuan
  • Patent number: 12009316
    Abstract: A semiconductor structure includes a first die having a first surface and a second surface opposite to the first surface, a conductive bump disposed at the first surface, and an RDL under the conductive bump. The RDL includes an interconnect structure and a dielectric layer, and the interconnect structure is electrically connected to the first die through the conductive bump. The semiconductor structure further includes a molding over the RDL and surrounding the first die and the conductive bump, an adhesive over the molding and the second surface, and a support element over the adhesive. A method includes providing a first die having a first surface and a second surface, a redistribution layer over the first surface, and a molding surrounding the first die; removing a portion of the molding to expose the second surface; and attaching a support element over the molding and the second surface.
    Type: Grant
    Filed: April 29, 2021
    Date of Patent: June 11, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Hsien-Wen Liu, Hsien-Wei Chen, Jie Chen
  • Patent number: 12008801
    Abstract: Disclosed is a tracking and identification method for multiple vessel targets, devices, electronic device, and storage media. The method comprises: determining the current position of the vessel based on effective AIS data, and projecting it into an image to obtain the visual motion trajectory of the vessel; obtaining target detection boxes corresponding to multiple vessels based on video surveillance data; determining an occluded area based on the target detection boxes of multiple vessels at the previous time, determining the predicted detection box of the occluded area, and loading the appearance features of the predicted detection boxes as the appearance features extracted at the last time before occlusion; integrating effective AIS data from multiple vessels into video surveillance data to determine the vessel's identity. This disclosure can solve the problem of anti-occlusion tracking for vessels in complex vessel navigation scenarios such as severe occlusion and complete occlusion.
    Type: Grant
    Filed: October 27, 2023
    Date of Patent: June 11, 2024
    Assignee: WUHAN UNIVERSITY OF TECHNOLOGY
    Inventors: Wen Liu, Jingxiang Qu, Yu Guo, Mengwei Bao, Chenjie Zhao, Jingxian Liu
  • Publication number: 20240178303
    Abstract: The present disclosure provides one embodiment of a semiconductor structure. The semiconductor structure includes a semiconductor substrate having a first region and a second region; a first semiconductor mesa formed on the semiconductor substrate within the first region; a second semiconductor mesa formed on the semiconductor substrate within the second region; and a field effect transistor (FET) formed on the semiconductor substrate. The FET includes a first doped feature of a first conductivity type formed in a top portion of the first semiconductor mesa; a second doped feature of a second conductivity type formed in a bottom portion of the first semiconductor mesa, the second semiconductor mesa, and a portion of the semiconductor substrate between the first and second semiconductor mesas; a channel in a middle portion of the first semiconductor mesa and interposed between the source and drain; and a gate formed on sidewall of the first semiconductor mesa.
    Type: Application
    Filed: February 5, 2024
    Publication date: May 30, 2024
    Inventors: Harry-Hak-Lay Chuang, Yi-Ren Chen, Chi-Wen Liu, Chao-Hsiung Wang, Ming Zhu
  • Publication number: 20240174727
    Abstract: The present invention relates to Atrial Natriuretic Peptide (ANP) polypeptides and methods of treatment with ANP polypeptides.
    Type: Application
    Filed: October 19, 2023
    Publication date: May 30, 2024
    Inventors: Jorge ALSINA-FERNANDEZ, Hana Elisabeth BAKER, Guillermo S. CORTEZ, Michael Lawrence ELMUCCIO, Wen LIU, Daniel Christopher LOPES, Avinash MUPPIDI, Francisco Alcides VALENZUELA, Yan WANG, Lin ZHANG
  • Patent number: 11988866
    Abstract: A light guide plate including a light emitting surface, a bottom surface, a light incident surface, multiple protrusion structures, and multiple grooves is provided. The light incident surface is connected between the light emitting surface and the bottom surface. The protrusion structures are disposed along a first direction and extend toward a second direction. The protrusion structures have a light condensing angle along the first direction, and the light condensing angle ranges from 10 degrees to 40 degrees. The grooves are disposed in the protrusion structures of the light guide plate. The grooves extend toward the first direction. The protrusion structures have a light receiving surface that defines each groove and is closer to the light incident surface. An angle between the light receiving surface and the bottom surface ranges from 35 degrees to 65 degrees. A display apparatus adopting the light guide plate is also provided.
    Type: Grant
    Filed: August 25, 2022
    Date of Patent: May 21, 2024
    Assignees: Nano Precision (SuZhou) CO., LTD., Coretronic Corporation
    Inventors: Ming-Yu Chou, Hsin Huang, Hao-Jan Kuo, Kuan-Wen Liu, Yun-Chao Chen
  • Patent number: 11991882
    Abstract: A method for fabricating a memory device includes: providing a substrate; forming a first dielectric layer over the substrate; forming a plurality of conductive layers and a plurality of dielectric layers alternately and horizontally disposed on the substrate; forming a channel column structure on the substrate and in the plurality of conductive layers and the plurality of dielectric layers, where a side wall of the channel column structure is in contact with the plurality of conductive layers; forming a second dielectric layer covering the first dielectric layer; and forming, in the first and second dielectric layers, a conductive column structure adjacent to the channel column structure and in contact with one of the plurality of conductive layers, where the conductive column structure includes a liner insulating layer as a shell layer.
    Type: Grant
    Filed: November 16, 2021
    Date of Patent: May 21, 2024
    Assignee: MACRONIX International Co., Ltd.
    Inventors: Yao-An Chung, Yuan-Chieh Chiu, Ting-Feng Liao, Kuang-Wen Liu, Kuang-Chao Chen
  • Publication number: 20240160642
    Abstract: A categorization system can include a computing device that is configured to obtain a plurality of data items over a threshold analysis period from an incoming data database in response to a threshold analysis interval elapsing. The computing device can also be configured to select a categorization model from a model database. The computing device can also be configured to, for each data item of the plurality of data items, apply the categorization model to the data item to identify at least one topic associated with the corresponding data item. The computing device can also be configured to generate a categorization visualization indicating a frequency of data items corresponding to each topic. The computing device can also be configured to transmit the categorization visualization to at least one of: (i) a user interface of an analyst device and (ii) a categorized database.
    Type: Application
    Filed: January 23, 2024
    Publication date: May 16, 2024
    Inventors: Tolgahan Cakaloglu, Wen Liu, Roshith Raghavan, Srujana Kaddevarmuth
  • Patent number: 11981403
    Abstract: Disclosed is a method and device for automatic detection of vessel draft depth, which processes the image of a vessel's hull and extracts local area image blocks with vessel's water gauge scale separately to improve the pertinence of data processing and reduce the complexity of data processing; and based on a multi-task learning network model, performing data processing on local area image blocks to extract scale characters and waterline position, reducing the computational complexity of the model; finally, based on the relative positions of the scale and waterline, determining the vessel's draft depth, thus achieving automatic acquisition of the vessel's draft depth, this method greatly improves the efficiency of reading the vessel's draft depth.
    Type: Grant
    Filed: November 12, 2023
    Date of Patent: May 14, 2024
    Assignee: Wuhan University of Technology
    Inventors: Wen Liu, Jingxiang Qu, Chenjie Zhao, Yang Zhang, Yu Guo
  • Publication number: 20240145398
    Abstract: A carrier structure is provided, in which at least one positioning area is defined on a chip-placement area of a package substrate, and at least one alignment portion is disposed on the positioning area. Therefore, the precision of manufacturing the alignment portion is improved by disposing the positioning area on the chip-placement area, such that the carrier structure can provide a better alignment mechanism for the chip placement operation.
    Type: Application
    Filed: December 8, 2022
    Publication date: May 2, 2024
    Applicant: SILICONWARE PRECISION INDUSTRIES CO., LTD.
    Inventors: Cheng-Liang HSU, Wan-Rou CHEN, Hsin-Yin CHANG, Tsung-Li LIN, Hsiu-Jung LI, Chiu-Lien LI, Fu-Quan XU, Yi-Wen LIU, Chih-Chieh SUN
  • Publication number: 20240128477
    Abstract: This disclosure relates to electrolyzer composite membranes, and in particular, to a composite membrane having at least two reinforcing layers comprising a microporous polymer structure and a surprisingly high resistance to piercing. The electrolyzer composite membranes have a recombination catalyst configured to be disposed closer to an anode than to a cathode in a membrane-electrode assembly (MEA). The disclosure also relates to membrane-electrode assemblies and electrolyzers comprising the membranes, and to method of manufacture of the membranes.
    Type: Application
    Filed: December 14, 2023
    Publication date: April 18, 2024
    Inventors: Joshua M. Bartels, Wen Liu, Alexander L. Agapov
  • Publication number: 20240124163
    Abstract: A magnetic multi-pole propulsion array system is applied to at least one external cathode and includes a plurality of magnetic multi-pole thrusters connected adjacent to each other. Each magnetic multi-pole thruster includes a propellant provider, a discharge chamber, an anode and a plurality of magnetic components. The propellant provider outputs propellant. The discharge chamber is connected with the propellant provider to accommodate the propellant. The anode is disposed inside the discharge chamber to generate an electric field. The plurality of magnetic components is respectively disposed on several sides of the discharge chamber. One of the several sides of the discharge chamber of the magnetic multi-pole thruster is applied for one side of a discharge chamber of another magnetic multi-pole thruster.
    Type: Application
    Filed: December 19, 2022
    Publication date: April 18, 2024
    Applicant: National Cheng Kung University
    Inventors: Yueh-Heng Li, Yu-Ting Wu, Chao-Wei Huang, Wei-Cheng Lo, Hsun-Chen Hsieh, Ping-Han Huang, Yi-Long Huang, Sheng-Wen Liu, Wei-Cheng Lien
  • Patent number: 11955474
    Abstract: An electrostatic discharge (ESD) protection circuit is provided. The protection circuit includes a MOS transistor and a resistor. The MOS transistor is electrically coupled to a core circuit. The resistor is electrically coupling to a gate of the MOS transistor for creating a bias on the gate to directing an ESD current to a ground when an ESD event occurs on the core circuit. A layout of the MOS transistor is spaced apart from a layout of the core circuit by a layout of a dummy structure. The resistor is formed by utilizing a portion of the dummy structure.
    Type: Grant
    Filed: August 22, 2022
    Date of Patent: April 9, 2024
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventor: Fang-Wen Liu
  • Patent number: 11951587
    Abstract: The present disclosure is directed to techniques of zone-based target control in chemical mechanical polishing of wafers. Multiple zones are identified on a surface of a wafer. The CMP target is achieved on each zone in a sequence of CMP processes. Each CMP process in the sequence achieves the CMP target for only one zone, using a CMP process selective to other zones.
    Type: Grant
    Filed: August 12, 2019
    Date of Patent: April 9, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Che-Liang Chung, Che-Hao Tu, Kei-Wei Chen, Chih-Wen Liu
  • Patent number: 11955554
    Abstract: A method of fabrication of a multi-gate semiconductor device that includes providing a fin having a plurality of a first type of epitaxial layers and a plurality of a second type of epitaxial layers. The plurality of the second type of epitaxial layers is oxidized in the source/drain region. A first portion of a first layer of the second type of epitaxial layers is removed in a channel region of the fin to form an opening between a first layer of the first type of epitaxial layer and a second layer of the first type of epitaxial layer. A portion of a gate structure is then formed in the opening.
    Type: Grant
    Filed: July 15, 2022
    Date of Patent: April 9, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Huan-Sheng Wei, Hung-Li Chiang, Chia-Wen Liu, Yi-Ming Sheu, Zhiqiang Wu, Chung-Cheng Wu, Ying-Keung Leung
  • Publication number: 20240097376
    Abstract: Compact electrical connectors with improved water resistance. A connector may have an outer shell and an inner shell disposed in the outer shell. A lead assembly may be partially disposed in the inner shell. A mating end of one of the outer shell and inner shell may extend beyond a mating end of the other shell, defining a corner. A seal may be disposed in the corner, such that the seal is mechanically supported when the connector is pressed, in a mating direction, against a mating component, blocking ingress of environmental contaminants. The seal may also block any opening between the mating end of the outer and inner shells. The seal is made from a curable material such that it may readily fill such an opening. The connector may also have a body seal in the lead assembly.
    Type: Application
    Filed: September 15, 2023
    Publication date: March 21, 2024
    Applicant: Amphenol East Asia Electronic Technology (Shenzhen) Co., Ltd.
    Inventors: Hui Wen Liu, Zhimin Qin
  • Publication number: 20240091758
    Abstract: The invention concerns a sonocatalyst which is suitable for promoting a chemical reaction initiated by ultrasound irradiation. The invention also relates to a method of catalysing a reaction by exposing the sonocatalyst to ultrasound. The invention also relates to the use of a sonocatalyst as described herein in a method as described herein.
    Type: Application
    Filed: December 6, 2021
    Publication date: March 21, 2024
    Inventors: James KWAN, Qianwenhao FAN, Xiaoqian SU, Paul Wen LIU, Umesh Sai JONNALAGADDA, Lakshmi Deepika BHARATULA