Abstract: A memory cell with an etch stop layer is provided. The memory cell comprises a bottom electrode disposed over a substrate. A switching dielectric is disposed over the bottom electrode and having a variable resistance. A top electrode is disposed over the switching dielectric. A sidewall spacer layer extends along sidewalls of the bottom electrode, the switching dielectric, and the top electrode and an upper surface of a lower dielectric layer. A lower etch stop layer is disposed over the lower dielectric layer and lining an outer sidewall of the sidewall spacer layer. The the sidewall spacer layer separates the lower etch stop layer from the lower dielectric layer.

Abstract: A semiconductor structure includes a first substrate, a metallic pad disposed over the first substrate, a dielectric structure disposed over the first substrate and exposing a portion of the metallic pad, a bonding structure disposed over and electrically connected to the metallic pad, a barrier ring surrounding the bonding structure, and a through-hole penetrating the first substrate and the dielectric structure. The bonding structure includes a bottom and a sidewall, the bottom of the bonding structure is in contact with the metallic pad, a first portion of the sidewall of the bonding structure is in contact with the dielectric structure, and a second portion of the sidewall of the bonding structure is in contact with the barrier ring.

Abstract: The present disclosure provides a semiconductor structure, including providing a metal layer, an adhesion-enhancing layer over the metal layer, a dielectric stack over the adhesion-enhancing layer, a contact penetrating the dielectric stack and the adhesion-enhancing layer and connecting with the metal layer, a barrier layer disposed between the contact and the dielectric stack, and a high-k dielectric layer disposed between the contact and the barrier layer.

Abstract: A non-volatile memory and a program method thereof are provided. The program method includes: setting one of a plurality of word lines to be a program word line, setting the word lines except the program word line to be a plurality of unselected word lines; raise a voltage on the program word line from a reference voltage to a first program voltage during a first sub-time period of a program time period; raising the voltage on the program word line from the first program voltage to a second program voltage during a second sub-time period of the program time period; and raising voltages on at least part of the unselected word lines from the reference voltage to a pass voltage during the second sub-time period.

Abstract: A memory device comprises an array of two-transistor memory cells, two-transistor memory cells in the array including a vertical select transistor and a vertical data storage transistor. The array comprises a plurality of stacks of conductive lines, a stack of conductive lines including a select gate line and a word line adjacent the select gate line. The device comprises an array of vertical channel lines disposed through the conductive lines to a reference line, gate dielectric structures surrounding the vertical channel lines at channel regions of vertical select transistors in the array of vertical channel lines and the select gate lines, charge storage structures surrounding the vertical channel lines at channel regions of vertical data storage transistors in the array of vertical channel lines and the word lines, and bit lines coupled to the vertical channel lines via upper ends of the vertical channel lines.

Abstract: A non-volatile memory and a program method thereof are provided. The program method includes: setting one of a plurality of word lines to be a program word line, setting the word lines except the program word line to be a plurality of unselected word lines; raise a voltage on the program word line from a reference voltage to a first program voltage during a first sub-time period of a program time period; raising the voltage on the program word line from the first program voltage to a second program voltage during a second sub-time period of the program time period; and raising voltages on at least part of the unselected word lines from the reference voltage to a pass voltage during the second sub-time period.

Abstract: A non-volatile memory device driving method, applicable to a non-volatile memory device comprising a row decoder and a memory array, comprises: utilizing the row decoder to transmit multiple word line signals to multiple word lines of the memory array; according to an address, utilizing the row decoder to switch a selected word line signal of the multiple word line signals from a predetermined voltage level to a program voltage level; utilizing the row decoder to switch at least one support word line signal of the multiple word line signals from the predetermined voltage level to a first pass voltage level; when the selected word line signal is remained at the program voltage level, utilizing the row decoder to switch the at least one support word line signal from the first pass voltage level to a higher second pass voltage level.

Abstract: A programming operation for high density memory, like 3D NAND flash memory, modifies the waveforms applied during program operations to mitigate unwanted disturbance of memory cells not selected for programming during the operation. Generally, the method provides for applying a bias arrangement during an interval of time between program verify pass voltages and program pass voltages in a program sequence that can include a soft ramp down, and pre-turn-on voltages designed to reduce variations in the potential distribution on floating channels of unselected NAND strings during a program operation.

Abstract: A non-volatile memory and a program method thereof are provided. The program method includes: selecting a programmed word line, where the programmed word line has a plurality of segments respectively corresponding to a plurality of bit lines; providing a program voltage to a voltage receiving end of the programmed word line, and sequentially transmitting the program voltage to the segments; respectively providing a plurality of bit line voltages to the bit lines at a plurality of enable time points and turning on a string selection switch at a setting time point; and setting voltage values of the bit line voltages according to the segments corresponding to the bit lines, respectively, or setting the enable time points according to the segments corresponding to the bit lines, or setting the setting time point according to a voltage transmission delay of the programmed word line.

Abstract: A bump structure with a barrier layer, and a method for manufacturing the bump structure, are provided. In some embodiments, the bump structure comprises a conductive pad, a conductive bump, and a barrier layer. The conductive pad comprises a pad material. The conductive bump overlies the conductive pad, and comprises a lower bump layer and an upper bump layer covering the lower bump layer. The barrier layer is configured to block movement of the pad material from the conductive pad to the upper bump layer along sidewalls of the lower bump layer. In some embodiments, the barrier layer is a spacer lining the sidewalls of the lower bump layer. In other embodiments, the barrier layer is between the barrier layer and the conductive pad, and spaces the sidewalls of the lower bump layer from the conductive pad.

Abstract: The present application relates to a method for forming a top-electrode cap structure on a memory cell. In some embodiments, a method for forming a top-electrode cap structure on a memory cell. The method includes providing a memory cell comprising a top electrode, a bottom electrode, and a resistive memory element sandwiched between the top and bottom electrodes. An etch is performed into an interlayer dielectric (ILD) layer covering the memory cell to form a via opening exposing the top electrode of the memory cell. A getter layer is then formed to line the via opening, and further, over and abutting the top electrode of the memory cell. An oxygen-resistant layer is formed over and abutting the getter layer.

Abstract: A memory cell with an etch stop layer is provided. The memory cell comprises a bottom electrode disposed over a substrate. A switching dielectric is disposed over the bottom electrode and having a variable resistance. A top electrode is disposed over the switching dielectric. A sidewall spacer layer extends upwardly along sidewalls of the bottom electrode, the switching dielectric, and the top electrode. A lower etch stop layer is disposed over the lower dielectric layer and lining an outer sidewall of the sidewall spacer layer. The lower etch stop layer is made of a material different from the sidewall spacer layer and protects the top electrode from damaging during manufacturing processes.

Abstract: A method related to legalize mixed-cell height standard cells of an IC is provided. A global placement of the IC is obtained. A plurality of standard cells of the IC are placed in the global placement. Each standard cell is moved from a position to the nearest row in the global placement. A displacement value of each moved standard cell is obtained in the global placement. The global placement of the IC is divided into a plurality of windows according to the displacement values of the moved standard cells in each window and a dead space corresponding to each moved standard cell in each window. All overlapping areas among the standard cells of each window are removed to obtain a detailed placement. The IC is manufactured according to the detailed placement. The standard cells have different cell heights in each window.

Abstract: Various embodiments of the present application are directed towards a trench capacitor with a conductive cap structure. In some embodiments, the trench capacitor comprises a lower capacitor electrode, a capacitor dielectric layer overlying the lower capacitor electrode, and an upper capacitor electrode overlying the capacitor dielectric layer. The capacitor dielectric layer and the upper capacitor electrode are depressed into the substrate and define a gap sunken into the substrate. The conductive cap structure overlies and seals the gap on the upper capacitor electrode. In some embodiments, the conductive cap structure comprises a metal layer formed by physical vapor deposition (PVD) and further comprises a metal nitride layer formed overlying the metal layer by chemical vapor deposition (CVD). In other embodiments, the conductive cap structure is or comprises other suitable materials and/or is formed by other deposition processes.

Abstract: A bump structure with a barrier layer, and a method for manufacturing the bump structure, are provided. In some embodiments, the bump structure comprises a conductive pad, a conductive bump, and a barrier layer. The conductive pad comprises a pad material. The conductive bump overlies the conductive pad, and comprises a lower bump layer and an upper bump layer covering the lower bump layer. The barrier layer is configured to block movement of the pad material from the conductive pad to the upper bump layer along sidewalls of the lower bump layer. In some embodiments, the barrier layer is a spacer lining the sidewalls of the lower bump layer. In other embodiments, the barrier layer is between the barrier layer and the conductive pad, and spaces the sidewalls of the lower bump layer from the conductive pad.

Abstract: A programming operation for high density memory, like 3D NAND flash memory, modifies the waveforms applied during program operations to mitigate unwanted disturbance of memory cells not selected for programming during the operation. Generally, the method provides for applying a bias arrangement during an interval of time between program verify pass voltages and program pass voltages in a program sequence that can include a soft ramp down, and pre-turn-on voltages designed to reduce variations in the potential distribution on floating channels of unselected NAND strings during a program operation.

Abstract: A semiconductor structure includes an Nth metal layer, a diffusion barrier layer over the Nth metal layer, a first deposition of bottom electrode material over the diffusion barrier layer, a second deposition of bottom electrode material over the first deposition of bottom electrode material, a magnetic tunneling junction (MTJ) layer over the second deposition of bottom electrode material, a top electrode over the MTJ layer; and an (N+1)th metal layer over the top electrode; wherein the diffusion barrier layer and the first deposition of bottom electrode material are laterally in contact with a dielectric layer, the first deposition of bottom electrode material spacing the diffusion barrier layer and the second deposition of bottom electrode material apart, and N is an integer greater than or equal to 1. An associated electrode structure and method are also disclosed.

Abstract: A memory device comprises an array of two-transistor memory cells, two-transistor memory cells in the array including a vertical select transistor and a vertical data storage transistor. The array comprises a plurality of stacks of conductive lines, a stack of conductive lines including a select gate line and a word line adjacent the select gate line. The device comprises an array of vertical channel lines disposed through the conductive lines to a reference line, gate dielectric structures surrounding the vertical channel lines at channel regions of vertical select transistors in the array of vertical channel lines and the select gate lines, charge storage structures surrounding the vertical channel lines at channel regions of vertical data storage transistors in the array of vertical channel lines and the word lines, and bit lines coupled to the vertical channel lines via upper ends of the vertical channel lines.

Abstract: A method for operating a memory array is provided. The memory array comprises a first NAND memory string comprising a ith memory cell, a i?1th memory cell, a ith word line, and a i?1th word line. The ith memory cell and the i?1th memory cell are arranged in a sequent order with a series electrical connection. The ith word line is electrically connected to the ith memory cell. The i?1th word line is electrically connected to the i?1th memory cell. The method for operating the memory array comprises in an operating time interval, performing a program inhibiting process to the ith memory cell, and simultaneously performing a first process to the ith memory cell. The program inhibiting process comprises providing a first pre-turn on voltage to the ith word line. The first process comprises providing a second pre-turn on voltage to the i?1th word line.

Abstract: A method of redistribution layer routing for 2.5D integrated circuit packages is proposed, which is executed by a computer, the method comprising using the computer to perform the following: performing a MMSIM (modulus-based matrix splitting iteration method) based routing to assign pre-assignment nets to tracks such that total vertical distance from each bump pair to the assigned track is minimized; and performing a MWMCBM (minimum weighted maximum cardinality bipartite matching) based routing for bumps connected to the assigned tracks according to matching result to complete redistribution layer routing for integrated circuit packages.